• Title/Summary/Keyword: Oxygen-plasma effect

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The Effect of Ion-Beam Treatment on TiO2 Coatings Deposited on Polycarbonate Substrates

  • Park, Jung-Min;Lee, Jai-Yeoul;Lee, Hee-Young;Park, Jae-Bum
    • Transactions on Electrical and Electronic Materials
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    • v.11 no.6
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    • pp.266-270
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    • 2010
  • The effect of an Ar plasma treatment on polycarbonate substrates was investigated using $TiO_2$ coatings produced by reactive ion-beam assisted sputtering. The typical pressure used during sputtering was about $10^{-4}$ Torr. After the Ar plasma treatment, the contact angle of a water droplet was reduced from $88^{\circ}$ to $52^{\circ}$ and then further decreased to $12^{\circ}$ with the addition of oxygen into the chamber. The surface of the polycarbonate substrate hanged from hydrophobic to hydrophilic with these treatments and revealed its changing nano-scale roughness. The $TiO_2$ films on the treated surface showed various colors and periodic ordering dependant on the film thickness due to optical interference.

Influences of Plasma Treatment on the Electrical Characteristics of rf-magnefrom sputtered $BaTa_2O_6$ Thin Films (플라즈마 표면 처리가 $BaTa_2O_6$박막의 전기적 특성에 미치는 효과에 관한 연구)

  • Kim, Young-Sik;Lee, Yun-Hi;Ju, Byeong-Kwon;Sung, Mang-Young;Oh, Myung-Hwan
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.48 no.5
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    • pp.319-325
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    • 1999
  • Direct current(d.c.)leakage current voltage characteristics of radio-frequencymagnetron sputtered BaTa\sub 2\O\sub 6\ film capacitors with aluminum(A1) top and indium tin oxide (ITO) bottom electrodes have been investigatedas a function of applied field and temperature. In order to study surfacetreatment effect on the electrical characteristics of as-deposited film weperformed exposure of oxygen plasma on $BaTa_2O_6$ surface. d. c.current-voltage (I-V), bipolar pulse charge-voltage (Q-V), d. c. current-time (I-t) andcapacitance-frequency (C-f) analysis were performed on films. All ofthe films exhibita low leakage current, a high breakdown field strength (3MV/cm-4.5MV/cm), and high dielectric constant (20-30). From the temperature dependence of leakage current,we can conclude that the dominant conduction mechanism is ascribed toSchottky emission at high electric field (>1MV/cm) and hopping conduction at lowelectric field (<1MV/cm). According to our results, the oxide plasma surfacetreatmenton as-deposited $BaTa_2O_6$ resulted in lowering interfacebarrier height and thus, leakage current when a negative voltage applied to the A1 electrode. This can be explained by reduction of surface contamination via etching surface and filling defects such as oxygen vacancies.

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Filler-Elastomer Interactions. 11. Influence of Atmospheric Pressure Plasma on Surface Properties of Nanoscaled Silicas (충전재-탄성체 상호작용. 11. 상압플라즈마 처리가 나노구조의 실리카 표면특성에 미치는 영향)

  • Park, Soo-Jin;Jin, Sung-Yeol;Kaang, Shin-Young
    • Elastomers and Composites
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    • v.40 no.1
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    • pp.22-28
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    • 2005
  • In this work, the effect of oxygen plasma treatment of nano-scaled silica on the mechanical interfacial properties and thermal stabilities of the silica/rubber composites was investigated. The surface properties of the silica were studied in X-ray photoelectron spectroscopy (XPS) and contact angles. And, their mechanical interfacial properties and thermal stabilities of the composites were characterized by tearing energy ($G_{IIIC}$) and thermogravimetric analysis (TGA), respectively. As a result, it was found that the introduction rate of oxygen-containing polar functional groups onto the silica surfaces was increased by increasing the plasma treatment time, resulting in improving the tearing energy. Also, the thermal stabilities of the composites were increased by increasing the treatment time. These results could be explained that the polar rubber, such as acrylonitrile butadiene rubber (NBR), showed relatively a high degree of interaction with oxygen-containing functional groups of the silica surfaces in a compounding system.

Effect of O2 Plasma Treatment on Electrochemical Performance of Supercapacitors Fabricated with Polymer Electrolyte Membrane (고분자 전해질막으로 제조한 슈퍼커패시터의 전기화학적 특성에 대한 산소 플라즈마 처리 영향)

  • Moon, Seung Jae;Kim, Young Jun;Kang, Du Ru;Lee, So Youn;Kim, Jong Hak
    • Membrane Journal
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    • v.32 no.1
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    • pp.43-49
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    • 2022
  • Solid-state supercapacitors with high safety and robust mechanical properties are attracting global attention as next-generation energy storage devices. As an electrode of a supercapacitor, an economical carbon-based electrode is widely used. However, when an aqueous electrolyte is introduced, the charge transfer resistance increases because the interfacial contact between the hydrophobic electrode surface and aqueous electrolyte is not good. In this regard, we propose a method to obtain higher electrochemical performance based on improved interfacial properties by treating the electrode surface with oxygen plasma. The surface hydrophilization induced by the enriched oxygen functionalities was confirmed by the contact angle measurement. As a result, the degree of hydrophilization was easily adjusted by controlling the power and duration of the oxygen plasma treatment. As the electrolyte of the supercapacitor, PVA/H3PO4, which is a typical solid-state aqueous electrolyte, was used. Free-standing membranes of PVA/H3PO4 electrolyte were prepared and then pressed onto the electrode. The optimal condition was to perform oxygen plasma treatment for 5 seconds with a low power of 15 W, and the energy density of the supercapacitor increased by about 8%.

Hydrophilic Effect of the Polyimide by Atmospheric Low-temperature Plasma Treatment (대기압 저온 플라즈마 처리에 의한 폴리이미드의 친수화 효과)

  • Cho, J.H.;Kang, B.K.;Kim, K.S.;Choi, B.K.;Kim, S.H.;Choi, W.Y.
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.18 no.2
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    • pp.148-152
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    • 2005
  • Atmospheric low-temperature plasma was produced using dielectric barrier discharge (DBD) plate-type plasma reactor and high frequency of 13.56 Hz. The surfaces of polyimide films for insulating and packaging materials were treated by the atmospheric low-temperature plasma. The contact angle of 67$^{\circ}$ was observed before the plasma treatment. The contact angle was decreased with deceasing the velocity of plasma treatment. In case of oxygen content of 0.2 %, electrode gap of 2 mm, the velocity of plasma treatment of 20 mm/sec, and input power of 400 W, the minimum contact angle of 13$^{\circ}$ was observed. The chemical characteristics of polyimide film after the plama treatment were investigated using X-ray photoelectron spectroscopy (XPS), and new carboxyl group bond was observed. The surfaces of polyimide films were changed into hydrophilic by the atmospheric low-temperature plasma. The polyimide films having hydrophilic surface will be very useful as a packaging and insulating materials in electronic devices.

Study of a MgO Protective Layer Deposited with Oxygen Ion Beam Assisted Deposition in an AC PDP (Oxygen Ion Beam Assisted Deposition법에 의해 형성된 AC PDP용 MgO 보호막의 특성 연구)

  • Kwon, Sang-Jik;Li, Zhao-Hui
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.20 no.7
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    • pp.615-619
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    • 2007
  • MgO layer plays an important role for plasma display panels (PDPs). In this experiment, ion beam assisted deposition (IBAD) methode was uesed to deposit a MgO thin film and the assisting oxygen ion beam energy was varied from 100 eV to 500 eV. In order to investigate the relationship between the secondary electron emission and the defect levels of the MgO layer, we measured the cathodoluminescence (CL) spectra of the MgO thin films, and we analyzed the CL peak intensity and peak transition. The results showed that the assisting ion beam energy played an important role in the peak intensity and the peak transition of the CL spectrum. The properties of MgO thin film were also analyzed using XRD and SEM, these results showed the assisting ion beam energy had direct effect on characteristics of MgO thin film.

Antioxidant Effect of Lutein on N-Nitrosodiethylamine-induced Oxidative Stress in Mice (생쥐에서 N-Nitrosodiethylamine에 의한 산화성 스트레스에 대한 Lutein의 항산화효과)

  • Choi, Byung-Chul;Sim, Sang-Soo
    • YAKHAK HOEJI
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    • v.53 no.4
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    • pp.189-193
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    • 2009
  • To investigate the antioxidant effect of lutein on N-nitrosodimethylamine (NDEA)-induced oxidative stress in mice, we measured lipid peroxidation, superoxide dismutase (SOD) and catalase of various tissues. Body weight was almost similar in lutein and control groups during 3 weeks. NDEA increased significantly the activities of typical marker enzymes of liver function (AST, ALT and ALP) in both groups. However, the increase of plasma aminotransferase activity significantly decreased in lutein group. Lipid peroxidation and SOD in various tissues, such as heart, lung, liver, kidney, spleen and plasma were significantly increased by NDEA, which were significantly reduced by lutein at a dose of 50 mg/kg. Catalase activity decreased significantly in control and lutein groups treated with NDEA, the effect being less in lutein group. Lesser effect on SOD and catalase in NDEA-treated lutein group indicates the improvement of protective mechanisms by lutein. Thus, it can be concluded from the present study that lutein can offer a useful protection against NDEA-induced oxidative stress.

Study on the Temporal Density Variation of Chemical Species in the Atmospheric Pressure Plasma Process (대기압 플라즈마 프로세스에 있어서 시간에 따른 화학종의 밀도변화 연구)

  • Han, Sang-Bo;Park, Sung-Su;Kim, Jong-Hyun;Park, Jae-Youn
    • Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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    • v.27 no.7
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    • pp.45-51
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    • 2013
  • This study is to discuss simulation results with 51 principal chemical reactions in non-thermal plasma space under atmospheric pressure, and the ambient gas was mainly composed of oxygen and nitrogen molecules. The initial density of O and OH radicals under the ambient temperature of 300K is largely generated in comparison with other higher temperature, and the density of O radical decreased from $20{\mu}s$ according to increase the temperature. The initial density of OH radical seemed to decrease steeply at the initial stage. By increasing the initial density of $H_2O$ molecules, O radical's effect was few and the density of OH radical was largely generated about 2 times. In addition, ozone density was increased as increasing the density of O radical, but it was decreased as increasing the density of $H_2O$. In case of the temperature more than 300K, $NO_2$ tend to be removed, but NO was increased than the initial density.

Deposition of Al Doped ZnO Films Using ICP-assisted Sputtering on the Plastic Substrate (유도결합 플라즈마 스퍼터링을 이용한 플라스틱 기판 상의 Al이 도핑된 ZnO 박막 증착)

  • Jung, Seung-Jae;Han, Young-Hun;Lee, Jung-Joong
    • Journal of the Korean institute of surface engineering
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    • v.39 no.3
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    • pp.98-104
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    • 2006
  • Al-doped ZnO (AZO) films were deposited on the plastic substrate by inductively coupled plasma (ICP) assisted DC magnetron sputtering. The AZO films were produced by sputtering a metallic target (Zn/Al) in a mixture of argon and oxygen gases. AZO films with an electrical resistivity of ${\sim}10^3\;{\Omega}cm$ and an optical transmittance of 80% were obtained even at a low deposition temperature. In-situ process control methods were used to obtain stable deposition conditions in the transition region without any hysteresis effect. The target voltage was controlled either at a constant DC power. It was found that the ratio of the zinc to oxygen emission intensity, I (O 777)/I (Zn 481) decreased with increasing the target voltage in the transition region. The $Ar/O_2$ plasma treatment improve the adhesion strength between the polycarbonate substrate and AZO films.