• Transactions on Electrical and Electronic Materials
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• v.8 no.5
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• pp.211-214
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• 2007

Chemical and morphological changes of phenol formaldehyde-based photoresist after $O_2$ radiofrequency(RF) plasma treatment depending on exposure time and source power were investigated. It was found that etch rate of photoresist sharply increased after discharge turn on and reached a limit with increase in plasma exposure time. Contact angle measurements and X-ray photoelectron spectroscopy(XPS) analysis showed that the surface chemical structure become nearly constant after 15 sec of the treatment. Atomic force microprobe(AFM) measurements were shown that surface roughness was increased with plasma exposure time.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.55 no.3
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• pp.122-126
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• 2006

In this study, composite materials were put to dry interfacial treatment by use of plasma technology It has been presented that the optimum parameters for the best wettability of the samples at the time of generation of plasma were oxygen atmosphere, 0.1 Torr of system pressure, 100 W of discharge power, and 3 minutes of discharge time. The decrease in surface potential of charged samples by corona discharge indicates that the amount of accumulated electrical charges reduces and the charges that have been injected lessen rapidly when the duration of UV irradiation increases. The surface resistivity and the tensile strength of plasma treated samples, a longer UV irradiation time resulted in decreased insulation.

• Laser Solutions
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• v.17 no.2
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• pp.1-4
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• 2014

With the PEO(Plasma electrolytic oxidation) surface treatment, the oxide film of aluminum alloy is growing in a short time. The reflectance measurement to find the oxygen atoms in the oxide could be investigated. In order to form a thicker oxide film, the PEO surface treatment should be uniformly controlled in processing time.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2001.05a
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• pp.15-17
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• 2001

A new possibility of our atmospheric cold plasma torch has been examined on the surface treatment of an air-exposed vulcanized rubber compound. The plasma treatment effect was evaluated by the bondability with another rubber compound using a polyurethane adhesive.

• Transactions on Electrical and Electronic Materials
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• v.11 no.6
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• pp.266-270
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• 2010

The effect of an Ar plasma treatment on polycarbonate substrates was investigated using $TiO_2$ coatings produced by reactive ion-beam assisted sputtering. The typical pressure used during sputtering was about $10^{-4}$ Torr. After the Ar plasma treatment, the contact angle of a water droplet was reduced from $88^{\circ}$ to $52^{\circ}$ and then further decreased to $12^{\circ}$ with the addition of oxygen into the chamber. The surface of the polycarbonate substrate hanged from hydrophobic to hydrophilic with these treatments and revealed its changing nano-scale roughness. The $TiO_2$ films on the treated surface showed various colors and periodic ordering dependant on the film thickness due to optical interference.

• Journal of the Semiconductor & Display Technology
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• v.9 no.1
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• pp.35-40
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• 2010

We have investigated the effects of hydrogen injection via in-situ gas addition ($O_2$, $H_2$, or $O_2$ + $H_2$ gas) and plasma post-treatment (Ar or Ar + H plasma) on material properties of ZnO that is considered to be as a channel layer in transparent thin film transistors. The variations in the electrical resistivity, optical transmittance and bandgap energy, and crystal quality of ZnO thin films were characterized in terms of the methods and conditions used in hydrogen injection. The resistivity was significantly decreased by injection of hydrogen; approximately $10^6\;{\Omega}cm$ for as-grown, $1.2\;{\times}\;10^2\;{\Omega}cm$ for in-situ with $O_2/H_2\;=\;2/3$ addition, and $0.1\;{\Omega}cm$ after Ar + H plasma treatment of 90 min. The average transmittance of ZnO films measured at a wavelength of 400-700 nm was gradually increased by increasing the post-treatment time in Ar + H plasma. The optical bandgap energy of ZnO films was almost monotonically increased by decreasing the $O_2/H_2$ ratio in in-situ gas addition or by increasing the post-treatment time in Ar + H plasma, while the post-treatment using Ar plasma hardly affected the bandgap energy. The role of hydrogen in ZnO was discussed by considering the creation and annihilation of oxygen vacancies as well as the formation of shallow donors by hydrogen.

• Textile Coloration and Finishing
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• v.6 no.3
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• pp.44-51
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• 1994

Wool and silk fabrics dyed with C.l. Acid Black 155 were subjected to sputter etching and exposed to a low temperature argon plasma. Color depth of shade of the fabrics increased considerably, but sputter etching was more effectively than argon low temperature plasma treatment. And measured for any significant chemical modification by ESCA (XPS). Sputter etching and argon low temperature plasma treatments incorporated oxygen atoms into the surface.

• Proceedings of the Korean Fiber Society Conference
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• 2003.10b
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• pp.307-308
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• 2003

Improved wettability and dyeability of Polypropylene(PP) fabrics were obtained using glow discharge plasma by grafting nitrogen-containing active groups on the surface. Few studies of glow discharge plasma on PP fabrics exist. The objective of this study was to give a fabric a good affinity for water. (omitted)

• Proceedings of the Korean Vacuum Society Conference
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• 2013.02a
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• pp.522-522
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• 2013

Plasma can be used to various applications such as sterilization, inactivation/removal of microorganisms, wound healing, tooth bleaching, cancer treatment, surface modification and plasma polymerization. In this research, we studied the effect of plasma irradiation on the structural, optical, and biological properties of the polymer films. Several polymers were synthesized and then deposited on the glass substrates. The polymer films were treated by oxygen and nitrogen plasmas. Plasma-treated films were investigated by contact angle, infrared absorption spectroscopy, cathodoluminescence spectroscopy, and scanning electron microscopy. Functional materials were prepared on plasma-treated surface, and their performances were investigated using various techniques. Next, we discuss relationship between the performance of functional materials and the structural properties of plasma-treated polymer films.

• Polymer(Korea)
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• v.33 no.3
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• pp.263-267
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• 2009

In order to improve the hydrophilic property on the surface of d-PMMA(deuterated poly-(methyl methacrylate)) film, it was exposed to oxygen plasma, All experimental conditions were same except to plasma exposure time that was varied from 0 to 180 s, The effects according to the exposure time were identified using contact angles, X-ray reflectometer(XRR), neutron reflectometer(NR), and X-ray photoelectron spectroscopy(XPS). By confirming that as the exposure time increases, water contact angle decreases while the composition of oxygen increases, it was confirmed that the composition of oxygen has a huge influence on improving the hydrophilic property. The physical characters as a function of the exposure time were investigated by the XRR. By analyzing complementally the results of the XRR, NR, and XPS, more detailed chemical bonding conditions were studied by obtaining not only composition of the carbon and oxygen but that of the hydrogen.