Analysis of Chemical and Morphological Changes of Phenol Formaldehyde-based Photoresist Surface caused by O2 Plasma |
Shutov, D.A.
(Department of Electronic Devices & Materials Technology, Ivanovo State University of Chemistry & Technology)
Kang, Seung-Youl (IT Convergence & Components Laboratory, ETRI) Baek, Kyu-Ha (IT Convergence & Components Laboratory, ETRI) Suh, Kyung-Soo (IT Convergence & Components Laboratory, ETRI) Min, Nam-Ki (Department of Control and Instrumentation Engineering, Korea University) Kwon, Kwang-Ho (Department of Control and Instrumentation Engineering, Korea University) |
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