• Title/Summary/Keyword: Oxide Semiconductor

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Firmware Design and system of stepwise synchronization for CMOS image sensor (Stepwise 동기화 지원을 위한 CMOS 이미지 센서 Firmware 설계 및 개발)

  • Park, Hyun-Moon;Park, Soo-Huyn;Lee, Myung-Soo;Seo, Hae-Moon;Park, Woo-Chool;Jang, Yun-Jung
    • Journal of the Korea Society for Simulation
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    • v.17 no.4
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    • pp.199-208
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    • 2008
  • Lately, since Complementary Metal Oxide Semiconductor(CMOS) image sensor system has low power, low cost and been miniaturized, hardware and applied software studies using these strengths are being carrying on actively. However, the products equipped with CMOS image sensor based polling method yet has several problems in degree of completeness of applied software and firmware, compared with hardware’s. CMOS image sensor system has an ineffective synchronous problem due to superfluous message exchange. Also when a sending of data is delayed continually, overhead of re-sending is large. So because of these, it has a problem in structural stability according to Polling Method. In this study, polling cycle was subdivided in high-speed synchronization method of firmware -based through MCU and synchronization method of Stepwise was proposed. Also, re-connection and data sending were advanced more efficiently by using interrupt way. In conclusion, the proposed method showed more than 20 times better performance in synchronization time and error connection. Also, a board was created by using C328R board of CMOS image sensor-based and ATmega128L which has low power, MCU and camera modules of proposed firmware were compared with provided software and analyzed in synchronization time and error connection.

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The Solubility of Ozone in Deionized Water and its Cleaning Efficiency (초순수내에서의 오존의 용해도와 세정효과)

  • Han, Jeoung-Hoon;Park, Jin-Goo;Kwak, Young-Shin
    • Korean Journal of Materials Research
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    • v.8 no.6
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    • pp.532-537
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    • 1998
  • The purpose of this study was to investigate the behavior of ozone in DI water and the reaction with wafers during the semiconductor wet cleaning process. The solubility of ozone in DI water was not only dependent on the temperature but also directly proportional to the input concentration of ozone. The lower the initial ozone concentration and the temperature, the longer the half-life time of ozone. The reaction order of ozone in DI water was calculated to be around 1.5. The redox potential reached a saturation value in 5min and slightly increased as the input ozone concentrations increased. The completely hydrophilic surface was created in Imin when HF etched silicon wafer was cleaned in ozonized DI water containing higher ozone concentrations than 2ppm. Spectroscopic ellipsometry measurements showed that the chemical oxide formed by ozonized DI water was measured to be thicker than that by piranha solution. The wafers contaminated with a non-ionic surfactant were more effectively cleaned in ozonized DI water than in piranha and ozonized piranha solutions.

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The PMOLED data driver circuit improving the output current deviation problem (출력 전류 불균일 현상을 개선한 PMOLED 데이터 구동 회로)

  • Kim, Jung-Hak;Kim, Seok-Yoon
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.45 no.1
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    • pp.7-13
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    • 2008
  • This paper proposes a newly structured circuit that can compensate current deviation of a data driver circuit for OLED. A conventional data drivel circuit for OLED cannot compensate the current deviation at the data drivel circuit output terminal generated by MOS process change, but the proposed data drivel circuit can authorize uniform value of current to an OLED panel by calibrating the current deviation at the output terminal. The proposed circuit can minimize current deviation of the output current via process change by connecting the circuit for data output current with a common interconnect line through addition of a switching transistor to the existing data output circuit. The circuit proposed in this paper has been designed based on an OLED panel supporting $128{\times}128$ resolution, and the process used for driver circuit development is 0.35um. As a result of the experiment in this study, the output current of the data driver circuit proposed here has 1% range of error, while 9% range of severe changes was demonstrated in the case of the previous data driver circuit. When using the data driver circuit for OLED proposed in this paper, high definition OLED display can be actualized and the circuit can be applied to mobile display devices requiring high quality display features.

Radiopacity of contemporary luting cements using conventional and digital radiography

  • An, Seo-Young;An, Chang-Hyeon;Choi, Karp-Sik;Huh, Kyung-Hoe;Yi, Won-Jin;Heo, Min-Suk;Lee, Sam-Sun;Choi, Soon-Chul
    • Imaging Science in Dentistry
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    • v.48 no.2
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    • pp.97-101
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    • 2018
  • Purpose: This study evaluated the radiopacity of contemporary luting cements using conventional and digital radiography. Materials and Methods: Disc specimens (N=24, n=6 per group, ø$7mm{\times}1mm$) were prepared using 4 resin-based luting cements (Duolink, Multilink N, Panavia F 2.0, and U-cem). The specimens were radiographed using films, a complementary metal oxide semiconductor (CMOS) sensor, and a photostimulable phosphor plate (PSP) with a 10-step aluminum step wedge (1 mm incremental steps) and a 1-mm-thick tooth cut. The settings were 70 kVp, 4 mA, and 30 cm, with an exposure time of 0.2 s for the films and 0.1 s for the CMOS sensor and PSP. The films were scanned using a scanner. The radiopacity of the luting cements and tooth was measured using a densitometer for the film and NIH ImageJ software for the images obtained from the CMOS sensor, PSP, and scanned films. The data were analyzed using the Kruskal-Wallis and Mann-Whitney U tests. Results: Multilink (3.44-4.33) showed the highest radiopacity, followed by U-cem (1.81-2.88), Panavia F 2.0 (1.51-2.69), and Duolink (1.48-2.59). The $R^2$ values of the optical density of the aluminum step wedge were 0.9923 for the films, 0.9989 for the PSP, 0.9986 for the scanned films, and 0.9266 for the CMOS sensor in the linear regression models. Conclusion: The radiopacities of the luting materials were greater than those of aluminum or dentin at the same thickness. PSP is recommended as a detector for radiopacity measurements because of its accuracy and convenience.

Dual-Band High-Efficiency Class-F Power Amplifier using Composite Right/Left-Handed Transmission Line (Composite Right/Left-Handed 전송 선로를 이용한 이중 대역 고효율 class-F 전력증폭기)

  • Choi, Jae-Won;Seo, Chul-Hun
    • Journal of the Institute of Electronics Engineers of Korea TC
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    • v.45 no.8
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    • pp.53-59
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    • 2008
  • In this paper, a novel dual-band high-efficiency class-F power amplifier using the composite right/left-handed (CRLH) transmission lines (TLs) has been realized with one RF Si lateral diffusion metal-oxide-semiconductor field effect transistor (LDMOSFET). The CRLH TL can lead to metamaterial transmission line with the dual-band tuning capability. The dual-band operation of the CRLH TL is achieved by the frequency offset and the nonlinear phase slope of the CRLH TL for the matching network of the power amplifier. Because the control of the all harmonic components is very difficult in dual-band, we have managed only the second- and third-harmonics to obtain the high efficiency with the CRLH TL in dual-band. Also, the proposed power amplifier has been realized by using the harmonic control circuit for not only the output matching network, but also the input matching network for better efficiency. Two operating frequencies are chosen at 880 MHz and 1920 MHz in this work. The measured results show that the output power of 39.83 dBm and 35.17 dBm was obtained at 880 MHz and 1920 MHz, respectively. At this point, we have obtained the power-added efficiency (PAE) of 79.536 % and 44.04 % at two operation frequencies, respectively.

Nano-scale Information Materials Using Organic/Inorganic Templates (유기/무기 나노 템플레이트를 이용한 나노 정보소재 합성 연구)

  • Lee, Jeon-Kook;Jeung, Won-Young
    • Journal of the Korean Magnetics Society
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    • v.14 no.4
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    • pp.149-161
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    • 2004
  • The fusion of nano technology and information technology is essential to sustain the present growth rate and to induce new industry in this ever-growing information age. Considering Korean industry whose competitiveness lies heavily on information related technologies, this field will be inevitable for future. Nano materials can be described as novel materials whose size of elemental structure has been engineered at the nanometer scale. Materials in the nanometer size range exhibit fundamentally new behavior, as their size falls below the critical length scale associated with any given property. " Bottom-up' techniques involve manipulating individual atoms and molecules. Bottom-up process usually implies controlled or directed self assembly of atoms and molecules into nano structures. It resembles more closely the processes of biology and chemistry, where atoms and molecules come together to create structures such as crystals or living cells. Nano scale sensors are included in the electronics area since the diverse sensing mechanisms are often housed on a semiconductor substrate and usually give rise to an electronic signal. The application of nano technology to the chemical sensors should allow improvements in functionality such as gas sensing. In this presentation, we will discuss about the nano scale information materials and devices fabricated by using the organic/inorganic nano templates.

Effects of Pd Addition Amount and Method on the Characteristics of SnO2 Semiconductor Thick Films for Alcohol Gas Sensors (Pd 첨가량 및 첨가방법이 알코올 센서용 SnO2 반도체 후막 특성에 미치는 영향 연구)

  • Kim, Jun-Hyung;Kim, Hyeong-Gwan;Lee, Ho-Nyun;Kim, Hyun-Jong;Lee, Hee-Chul
    • Journal of the Korean institute of surface engineering
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    • v.50 no.5
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    • pp.411-420
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    • 2017
  • In this paper, two methods of making the Pd-added $SnO_2$ ($Pd-SnO_2$) powder with pure tetragonal phase by the hydrazine method were suggested and compared in terms of crystal structure, surface morphology, and alcohol gas response. One of the addition methods is to use $PdCl_2$ as a Pd source, the other is to use Pd-based organic with oleylamine (OAM). When Pd concentration was increased from 0 to 5 wt%, the average grain size of $Pd-SnO_2$ made with Pd-OAM were decreased from 32 to 12 nm. In the case of using with $PdCl_2$, grain size of the $PdCl_2$ fell to less than 10 nm. However, agglomerated and extruded surface morphology was observed for the films with Pd addition over 4 wt%. The crack-free $Pd-SnO_2$ thick films were able to successfully fill the $30{\mu}m$ gap of patterned Pt electrodes by optimized ink dropping method. Also, the 2 wt% $Pd-SnO_2$ thick film made with PdCl2 showed gas responses ($R_{air}/R_{gas}$) of 3.7, 5.7 and 9.0 at alcohol concentrations of 10, 50 and 100 ppm, respectively. On the other hand, the prepared 3 wt% $Pd-SnO_2$ thick film with Pd-OAM exhibited very excellent responses of 3.4, 6.8 and 12.2 at the equivalent measurement conditions, respectively. The 3 wt% $Pd-SnO_2$ thick film with Pd-OAM has a specific surface area of $31.39m^2/g$.

$SiO_2/Si_3N_4/SiO_2$$Si_3N_4/SiO_2/Si_3N_4$ 터널 장벽을 사용한 금속 실리사이드 나노입자 비휘발성 메모리소자의 열적 안정성에 관한 연구

  • Lee, Dong-Uk;Kim, Seon-Pil;Han, Dong-Seok;Lee, Hyo-Jun;Kim, Eun-Gyu;Yu, Hui-Uk;Jo, Won-Ju
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.139-139
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    • 2010
  • 금속 실리사이드 나노입자는 열적 및 화학적 안정성이 뛰어나고, 절연막내에 일함수 차이에 따라 깊은 양자 우물구조가 형성되어 비휘발성 메모리 소자를 제작할 수 있다. 그러나 단일 $SiO_2$ 절연막을 사용하였을 경우 저장된 전하의 정보 저장능력 및 쓰기/지우기 시간을 향상시키는 데 물리적 두께에 따른 제한이 따른다. 본 연구에서는 터널장벽 엔지니어링을 통하여 물리적인 두께는 단일 $SiO_2$ 보다는 두꺼우나 쓰기/지우기 동작을 위하여 인가되는 전기장에 의하여 상대적으로 전자가 느끼는 상대적인 터널 절연막 두께를 감소시키는 방법으로 동작속도를 향상 시킨 $SiO_2/Si_3N_4/SiO_2$$Si_3N_4/SiO_2/Si_3N_4$ 터널 절연막을 사용한 금속 실리사이드 나노입자 비휘발성 메모리를 제조하였다. 제조방법은 우선 p-type 실리콘 웨이퍼 위에 100 nm 두께로 증착된 Poly-Si 층을 형성 한 이후 소스와 드레인 영역을 리소그래피 방법으로 형성시켜 트랜지스터의 채널을 형성한 이후 그 상부에 $SiO_2/Si_3N_4/SiO_2$ (2 nm/ 2 nm/ 3 nm) 및 $Si_3N_4/SiO_2/Si_3N_4$ (2 nm/ 3 nm/ 3 nm)를 화학적 증기 증착(chemical vapor deposition)방법으로 형성 시킨 이후, direct current magnetron sputtering 방법을 이용하여 2~5 nm 두께의 $WSi_2$$TiSi_2$ 박막을 증착하였으며, 나노입자 형성을 위하여 rapid thermal annealing(RTA) system을 이용하여 $800{\sim}1000^{\circ}C$에서 질소($N_2$) 분위기로 1~5분 동안 열처리를 하였다. 이후 radio frequency magnetron sputtering을 이용하여 $SiO_2$ control oxide layer를 30 nm로 증착한 후, RTA system을 이용하여 $900^{\circ}C$에서 30초 동안 $N_2$ 분위기에서 후 열처리를 하였다. 마지막으로 thermal evaporator system을 이용하여 Al 전극을 200 nm 증착한 이후 리소그래피와 식각 공정을 통하여 채널 폭/길이 $2{\sim}5{\mu}m$인 비휘발성 메모리 소자를 제작하였다. 제작된 비휘발성 메모리 소자는 HP 4156A semiconductor parameter analyzer와 Agilent 81101A pulse generator를 이용하여 전기적 특성을 확인 하였으며, 측정 온도를 $25^{\circ}C$, $85^{\circ}C$, $125^{\circ}C$로 변화시켜가며 제작된 비휘발성 메모리 소자의 열적 안정성에 관하여 연구하였다.

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Fabrication and Electrical Property Analysis of [(Ni0.3Mn0.7)1-xCux]3O4 Thin Films for Microbolometer Applications (마이크로볼로미터용 [(Ni0.3Mn0.7)1-xCux]3O4 박막의 제작 및 전기적 특성 분석)

  • Choi, Yong Ho;Jeong, Young Hun;Yun, Ji Sun;Paik, Jong Hoo;Hong, Youn Woo;Cho, Jeong Ho
    • Journal of Sensor Science and Technology
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    • v.28 no.1
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    • pp.41-46
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    • 2019
  • In order to develop novel thermal imaging materials for microbolometer applications, $[(Ni_{0.3}Mn_{0.7})_{1-x}Cu_x]_3O_4$ ($0.18{\leq}x{\leq}0.26$) thin films were fabricated using metal-organic decomposition. Effects of Cu content on the electrical properties of the annealed films were investigated. Spinel thin films with a thickness of approximately 100 nm were obtained from the $[(Ni_{0.3}Mn_{0.7})_{1-x}Cu_x]_3O_4$ films annealed at $380^{\circ}C$ for five hours. The resistivity (${\rho}$) of the annealed films was analyzed with respect to the small polaron hopping model. Based on the $Mn^{3+}/Mn^{4+}$ ratio values obtained through x-ray photoelectron spectroscopy analysis, the hopping mechanism between $Mn^{3+}$ and $Mn^{4+}$ cations discussed in the proposed study. The effects of $Cu^+$ and $Cu^{2+}$ cations on the hopping mechanism is also discussed. Obtained results indicate that $[(Ni_{0.3}Mn_{0.7})_{1-x}Cu_x]_3O_4$ thin films with low temperature annealing and superior electrical properties (${\rho}{\leq}54.83{\Omega}{\cdot}cm$, temperature coefficient of resistance > -2.62%/K) can be effectively employed in applications involving complementary metal-oxide semiconductor (CMOS) integrated microbolometer devices.

High-Efficiency CMOS Power Amplifier using Low-Loss PCB Balun with Second Harmonic Impedance Matching (2차 고조파 정합 네트워크를 포함하는 저손실 PCB 발룬을 이용한 고효율 CMOS 전력증폭기)

  • Kim, Hyungyu;Lim, Wonseob;Kang, Hyunuk;Lee, Wooseok;Oh, Sungjae;Oh, Hansik;Yang, Youngoo
    • The Journal of Korean Institute of Electromagnetic Engineering and Science
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    • v.30 no.2
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    • pp.104-110
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    • 2019
  • In this paper, a complementary metal oxide semiconductor(CMOS) power amplifier(PA) integrated circuit operating in the 900 MHz band for long-term evolution(LTE) communication systems is presented. The output matching network based on a transformer was implemented on a printed circuit board for low loss. Simultaneously, to achieve high efficiency of the PA, the second harmonic impedances are controlled. The CMOS PA was fabricated using a $0.18{\mu}m$ CMOS process and measured using an LTE uplink signal with a bandwidth of 10 MHz and peak to average power ratio of 7.2 dB for verification. The implemented CMOS PA module exhibits a power gain of 24.4 dB, power-added efficiency of 34.2%, and an adjacent channel leakage ratio of -30.1 dBc at an average output power level of 24.3 dBm.