• 제목/요약/키워드: Oxide Films

검색결과 2,388건 처리시간 0.027초

RF-Sputtering 법을 이용한 ZnO:Al 박막의 후 열처리에 따른 특성 변화 (Effects of Post Annealing on the Properties of ZnO:Al Films Deposited by RF-Sputtering)

  • 이재형;이동진
    • 한국전기전자재료학회논문지
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    • 제21권9호
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    • pp.789-794
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    • 2008
  • Zinc oxide (ZnO) has been widely studied for its practical applications such as transparent conduction electrodes for flat panel displays and solar cells. Especially, ZnO films show good chemical stability against hydrogen plasma, absence of toxicity, abundance in nature, and then suitable for photovoltaic applications. However, the fabrication process of thin film solar cells require a high substrate temperature and/or post heat treatment. Therefore, the layers have to withstand high temperatures, requiring an excellent stability without degrading their electronic and optical properties. In this paper, we investigated the stability of zinc oxide (ZnO) films doped with aluminum and hydrogen. Doped ZnO films were prepared by r.f. magnetron sputter and followed by heat treatment at different temperatures and for various times.

Polarization behavior of polyvinylidene fluoride films with the addition of reduced graphene oxide

  • Lee, Junwoo;Lim, Sangwoo
    • Journal of Industrial and Engineering Chemistry
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    • 제67권
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    • pp.478-485
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    • 2018
  • The effect of reduced graphene oxide (RGO) addition on the dielectric and piezoelectric behavior of the polyvinylidene fluoride (PVDF) films was studied. Dielectric constant increased by four times and piezoelectric coefficient also increased twice by the addition of RGO in the PVDF films. Based on capacitance-voltage and ellipsometry measurements and the Kramers-Kronig transformation, it is concluded that the enhanced dielectric and piezoelectric properties of the PVDF/RGO films resulted from the increased orientational polarization due to a phase transition from nonpolar crystalline ${\alpha}$ phase to polar crystalline ${\beta}$ phase in the PVDF structure.

전계효과트랜지스터 기반 반도체 소자 응용을 위한 스프레이 공정을 이용한 nc-ZnO/ZnO 박막 제작 및 특성 분석 (Morphological and Electrical Characteristics of nc-ZnO/ZnO Thin Films Fabricated by Spray-pyrolysis for Field-effect Transistor Application)

  • 조준희
    • 반도체디스플레이기술학회지
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    • 제20권4호
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    • pp.1-5
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    • 2021
  • Field-effect transistors based on solution-processed metal oxide semiconductors has attracted huge attention due to their intrinsic characteristics of optical and electrical characteristics with benefits of simple and low-cost process. Especially, spray-pyrolysis has shown excellent device performance which compatible to vacuum-processed Field-effect transistors. However, the high annealing temperature for crystallization of MOS and narrow range of precursors has impeded the progress of the technology. Here, we demonstrated the nc-ZnO/ZnO films performed by spray-pyrolysis with incorporating ZnO nanoparticles into typical ZnO precursor. The films exhibit preserving morphological properties of poly-crystalline ZnO and enhanced electrical characteristics with potential for low-temperature processability. The influence of nanoparticles within the film was also researched for realizing ZnO films providing good quality of performance.

알카리 수용액에서 Mg-Al 합금의 양극산화시 전류밀도와 양극산화 시간의 효과 (Effects of Time and Current Density in Anodizing of Mg-Al Alloy in Alkaline Solution)

  • 장석기;김성종;김정일
    • Journal of Advanced Marine Engineering and Technology
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    • 제29권1호
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    • pp.107-115
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    • 2005
  • The effects on the formation of anodic oxide films on Mg-Al alloy (AZ91) in 1M-NaOH solution was investigated using parameters of current density and time during anodizing The general tendency has been confirmed that the increase of anodizing time improves the corrosion resistance. It is considered that the formation of anodic oxide film was increased by increasing the applied current and the anodizing time to generate active dissolution reaction In anodizing at constant current density. passivity potentials shifted to noble direction with increasing current densities. It was confirmed that oxygen quantify in anodic oxide films increased with anodizing time. The compact films above 4 $mA/cm^2$ were formed with the shape of an island in grooves at early stage and then grew with combination of the islands

금속산화물 코팅을 통한 박막 $LiCoO_2$양극의 전기화학적 특성 향상 (The Effect of Metal-Oxide Coating on the Electrochemical Properties in Thin-Film $LiCoO_2$ Cathodes)

  • 김혜민;김병수;김용정;조재필;박병우
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2003년도 추계학술발표강연 및 논문개요집
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    • pp.124-124
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    • 2003
  • To improve the electrochemical properties of thin-film LiCoO$_2$ cathodes, metal oxides were coated on the LiCoO$_2$ thin films using f sputtering. Galvanostatic charge-discharge experiments showed the enhanced cycling behaviors in the metal-oxide coated LiCoO$_2$ thin films than the uncoated ones. These results are because the metal-oxide coating layer suppresses the degradation of Li-diffusion kinetics during cycling, which is related to the protection of cathode surface from the electrolytes [l-3]. The variation in the metal-oxide coating thickness ranging from 10 to 300 nm did not affect the electrochemical properties. Changes of lattice constants in the coated and bare LiCoO$_2$ thin films at different charged states will also be discussed.

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플라즈마 증착 반응기에서 유체흐름과 상온에서 증착된 티타늄 산화막 특성 (Fluid Flow in Plasma Deposition Reactor and Characteristics of Titanium Oxide Films Deposited at Room Temperature)

  • 정일현
    • 공업화학
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    • 제18권5호
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    • pp.438-443
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    • 2007
  • 본 연구에서는 티타늄 산화막을 상온에서 HCP (hollow cathode plasma) 반응기에 의하여 증착하였다. HCP 반응기에 대한 시뮬레이션 결과, 전극에서의 열 발생에 관계없이 기판 표면에서의 온도분포는 일정하였다. 그리고 전극과의 거리가 증가하면서 기판 표면에서의 유체는 일정한 것으로 나타났으며, 표면 조도는 거리에 따라 감소하였다. 출력이 증가할수록 산소의 조성은 증가하는 것으로 나타났으며, 출력이 240 watt와 반응 거리가 3 cm에서 Ti와 O의 비율이 1 : 2에 가깝게 결합이 이루어졌다.

Preparation and Characterization of Sol-Gel Derived High-k $SrTa_2O_6$ Thin Films

  • Park, Kwang-Hun;Jeon, Ho-Seung;Kim, Zee-Won;Park, Byung-Eun;Kim, Chul-Ju
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2006년도 하계학술대회 논문집 Vol.7
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    • pp.198-199
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    • 2006
  • $SrTa_2O_6$(STA) thin films were fabricated by sol-gel method. The films annealed below $700^{\circ}C$, showed amorphous phase and crystallization phase was observed after annealing over $800^{\circ}C$. From high frequency capacitance-voltage measurements, 24nm thick STA thin film annealed at $900^{\circ}C$, has an EOT of 5.7nm and a dielectric constant of 16. Leakage current characteristics were improved by the insertion of chemical oxide between STA and Si. Leakage current densities are around $3.5{\times}10^{-7}A/cm^2$ at 5V for the structure inserted chemical oxide but $1.4{\times}10^{-6}A/cm^2$ at 5V without chemical oxide.

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반응성 r.f. 스퍼터링에 의한 마이크로 박막 전지용 산화바나듐 박막의 제작 및 전기화학적 특성 평가 (Fabrication and electrochemical characterization of amorphous vanadium oxide thin films for thin film micro-battery by reactive r.f. sputtering)

  • 전은정;신영화;남상철;윤영수;조원일
    • 한국진공학회지
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    • 제9권1호
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    • pp.42-47
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    • 2000
  • The amorphous vanadium oxide thin films for thin-film rechargeable lithium batteries were fabricated by r.f. reactive sputtering at room temperature. As the experimental parameter, oxygen partial pressure was varied during sputtering. At high oxygen partial pressures(>30%), the as-deposited films, constant current charge/discharge characteristics were carried out in 1M $LiPF_6$, EC:DMC+1:1 liquid electrolyte using lithium metal as anode. The specific capacity of amorphous $V_2O_5$ after 200cycles of operation at room temperature was higher compared to crystalline $V_2O_5$. The amorphous vanadium oxide thin film and crystalline film showed about 60$\mu$Ah/$\textrm{cm}^2\mu\textrm{m}$ and about 38$\mu$Ah/$\textrm{cm}^2\mu\textrm{m}$, respectively. These results suggest that the battery capacity of the thin film vanadium oxide cathode strongly depends on the crystallinity.

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스퍼터링 조건에 따른 바나듐 산화막의 감습 특성 (Humidity-Sensitive Properties of Vanadium Oxide Thin Films on Sputtering Conditions)

  • 이승철;최복길;최창규;권광호
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 추계학술대회 논문집 Vol.17
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    • pp.448-451
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    • 2004
  • Vanadium oxides have been widely used in a variety of technological applications such electrochromic devices as infrared detectors and are expected as a material suitable for gas sensing applications. Thin films of Vanadium oxide (VOx) have been deposited by r.f magnetron sputtering under different oxygen partial pressure ratios and substrate temperatures. Humidity-sensitive properties of resistive sensors having interdigitated electrode structure are characterized. Our sensors show good response to humidity over 20%RH to 80%RH. Vanadium oxide films deposited with 0% $O_2$ partial pressure at foot exhibit greater sensitivity to humidity change than others.

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A study of the NF3 plasma etching reaction with cobalt oxide films grown on an inorganic compounds

  • Jae-Yong Lee;Kyung-Min Kim;Min-Seung Ko;Yong-Soo Kim
    • Nuclear Engineering and Technology
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    • 제54권12호
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    • pp.4449-4459
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    • 2022
  • In this study, an NF3 plasma etching reaction with a cobalt oxide (Co3O4) films grown on the surface of inorganic compounds using granite was investigated. Experimental results showed that the etching rate can be up to 1.604 mm/min at 380 ℃ under 150 W of RF power. EDS and XPS analysis showed that main reaction product is CoF2, which is generated by fluorination in NF3 plasma. The etching rate of cobalt oxide films grown on inorganic compounds in this study was affected by surface roughness and etch selectivity. This study demonstrates that the plasma surface decontamination can effectively and efficiently remove contaminated nuclides such as cobalt attached to aggregate in concrete generated when decommissioning of nuclear power plants.