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Fluid Flow in Plasma Deposition Reactor and Characteristics of Titanium Oxide Films Deposited at Room Temperature  

Jung, Ilhyun (Department of Chemical Engineering, University of Dankook)
Publication Information
Applied Chemistry for Engineering / v.18, no.5, 2007 , pp. 438-443 More about this Journal
Abstract
Titanium oxide films were deposited by the HCP (hollow cathode plasma) reactor at room temperature. With results of simulation about HCP reactor, the temperature profile is uniform on substrate regardless of the heat generation at cathode. The velocity profile on the surface of substrate is more uniform with increasing the gap between cathode and substrate, and surface roughness was decreased with increasing the gap between cathode and substrate. We could confirm that the composition of oxide increased with RF-power, and the ratio of O to Ti in the films was about 2 : 1 at RF-power of 240 watt and distance between cathode and substrate of 3 cm.
Keywords
titanium oxide; room temperature; hollow cathode;
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Times Cited By KSCI : 1  (Citation Analysis)
Times Cited By SCOPUS : 0
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