• 제목/요약/키워드: Oxidation process

검색결과 2,160건 처리시간 0.027초

아크젯 플라즈마에서의 메탄개질의 최적화 (PROCESS OPTIMIZATION OF METHANE REFORMING IN ARC JET)

  • 황나경;이대훈;송영훈
    • 한국연소학회:학술대회논문집
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    • 한국연소학회 2006년도 제33회 KOSCO SYMPOSIUM 논문집
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    • pp.266-271
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    • 2006
  • Characteristic of partial oxidation of methane using arc-jet plasma by AC power is investigated. Arc-jet reactor used in this work is slightly modified from typical arc jet reactor so that it can make and sustain stable state of plasma. Methane conversion, selectivity of chemicals such as hydrogen and hydrocarbon materials in the product are analyzed. Parametric approach on the performance of the reactor or detail on the partial oxidation process is carried with $O_2/C$ ratio as parameter. In addition to the results, SED and arc length is changed to understand the effect of current-voltage correlation on the reforming performance and relative role of thermal process.

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Preparation and Impurity Control of the BaTiO3 Coatings by Micro Arc Oxidation Method

  • Ok, Myeong-Ryul;Kim, Ji Hye;Oh, Young-Joo;Hong, Kyung Tae
    • Corrosion Science and Technology
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    • 제5권4호
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    • pp.149-152
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    • 2006
  • $BaTiO_3$ coatings were prepared by micro arc oxidation (MAO) method. Only $Ba(OH)_2$ was dissolved in the electrolyte and process time was less than 30 min. Commercial purity $Ba(OH)_2$ (97%) containing $BaCO_3$ as impurity was used in preparing the electrolyte. XRD showed that the coating was composed of largely $BaTiO_3$, and in some process conditions, small quantity of impurity, $BaCO_3$, was characterized in the coating layer. The quantity of $BaCO_3$ could be controlled to negligible quantity by regulating the applied voltage and duration time of the MAO process.

Optimizing Oily Wastewater Treatment Via Wet Peroxide Oxidation Using Response Surface Methodology

  • Shi, Jianzhong;Wang, Xiuqing;Wang, Xiaoyin
    • 대한화학회지
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    • 제58권1호
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    • pp.80-84
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    • 2014
  • The process of petroleum involves in a large amount of oily wastewater that contains high levels of chemical oxygen demand (COD) and toxic compounds. So they must be treated before their discharge into the receptor medium. In this paper, wet peroxide oxidation (WPO) was adopted to treat the oily wastewater. Central composite design, an experimental design for response surface methodology (RSM), was used to create a set of 31 experimental runs needed for optimizing of the operating conditions. Quadratic regression models with estimated coefficients were developed to describe the COD removals. The experimental results show that WPO could effectively reduce COD by 96.8% at the optimum conditions of temperature $290^{\circ}C$, $H_2O_2$ excess (HE) 0.8, the initial concentration of oily wastewater 3855 mg/L and reaction time 9 min. RSM could be effectively adopted to optimize the operating multifactors in complex WPO process.

Al2O3/SiO2/Si(100) interface properties using wet chemical oxidation for solar cell applications

  • Min, Kwan Hong;Shin, Kyoung Cheol;Kang, Min Gu;Lee, Jeong In;Kim, Donghwan;Song, Hee-eun
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.418.2-418.2
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    • 2016
  • $Al_2O_3$ passivation layer has excellent passivation properties at p-type Si surface. This $Al_2O_3$ layer forms thin $SiO_2$ layer at the interface. There were some studies about inserting thermal oxidation process to replace naturally grown oxide during $Al_2O_3$ deposition. They showed improving passivation properties. However, thermal oxidation process has disadvantage of expensive equipment and difficult control of thin layer formation. Wet chemical oxidation has advantages of low cost and easy thin oxide formation. In this study, $Al_2O_3$/$SiO_2/Si(100)$ interface was formed by wet chemical oxidation and PA-ALD process. $SiO_2$ layer at Si wafer was formed by $HCl/H_2O_2$, $H_2SO_4/H_2O_2$ and $HNO_3$, respectively. 20nm $Al_2O_3$ layer on $SiO_2/Si$ was deposited by PA-ALD. This $Al_2O_3/SiO_2/Si(100)$ interface were characterized by capacitance-voltage characteristics and quasi-steady-state photoconductance decay method.

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플라즈마 표면 처리를 이용한 TiO2 MOS 커패시터의 특성 개선 (Improvement in Capacitor Characteristics of Titanium Dioxide Film with Surface Plasma Treatment)

  • 신동혁;조혜림;박세란;오훈정;고대홍
    • 반도체디스플레이기술학회지
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    • 제18권1호
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    • pp.32-37
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    • 2019
  • Titanium dioxide ($TiO_2$) is a promising dielectric material in the semiconductor industry for its high dielectric constant. However, for utilization on Si substrate, $TiO_2$ film meets with a difficulty due to the large leakage currents caused by its small conduction band energy offset from Si substrate. In this study, we propose an in-situ plasma oxidation process in plasma-enhanced atomic layer deposition (PE-ALD) system to form an oxide barrier layer which can reduce the leakage currents from Si substrate to $TiO_2$ film. $TiO_2$ film depositions were followed by the plasma oxidation process using tetrakis(dimethylamino)titanium (TDMAT) as a Ti precursor. In our result, $SiO_2$ layer was successfully introduced by the plasma oxidation process and was used as a barrier layer between the Si substrate and $TiO_2$ film. Metal-oxide-semiconductor ($TiN/TiO_2/P-type$ Si substrate) capacitor with plasma oxidation barrier layer showed improved C-V and I-V characteristics compared to that without the plasma oxidation barrier layer.

UV/ozone 산화처리 및 화학적 식각공정을 적용한 그래핀 Grain Boundary 평가 방법 (Evaluation Method for Graphene Grain Boundary by UV/ozone-oxidation Chemical-etching Process)

  • 강재운;박홍식
    • 센서학회지
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    • 제25권4호
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    • pp.275-279
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    • 2016
  • Chemical vapor deposited (CVD) polycrystalline graphene is widely used for various sensor application because of its extremely large surface-to-volume ratio. The electrical properties of CVD-graphene is significantly affected by the grain size and boundaries (GGBs), but evaluation of GGB of continuous monolayer graphene is difficult. Although several evaluation methods such as tunneling electron microscopy, confocal Raman, UV/ozone-oxidation are typically used, they still have issues in evaluation efficiency and accuracy. In this paper, we suggest an improved evaluation method for precise and simple GGB evaluation which is based on UV/ozone-oxidation and chemical etching process. Using this method, we could observe clear GGBs of CVD-graphene layers grown by different process conditions and statistically evaluate average grain sizes varying from $1.69{\sim}4.43{\mu}m$. This evaluation method can be used for analyzing the correlation between the electrical properties and grain size of CVD-graphene, which is essential for the development of graphene-based sensor devices.

펜톤산화에 따른 복합폐수의 처리효율연구 (Treatment Efficiency of Complex Wastewater by Fenton's Oxidation Condition)

  • 성일화
    • 한국환경보건학회지
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    • 제32권5호
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    • pp.446-450
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    • 2006
  • In order to treat the wastewater containing organic compound, pre-treatment system connected with MSP(molecular separation process) was investigated. With the aim of selecting an optimum process of Fenton's oxidation, removal efficiency of each process in the optimum reaction condition was recommended. The $Fe/H_{2}O_{2}$(ferric sulfate to hydrogen peroxide)reagent is referred to as the Fenton's regent, which produces hydroxyl radicals by the interaction of Fe with $H_{2}O_{2}$. The powerful oxidizing ability and extreme kinetic reactively of the hydroxyl radical was well established. Increasing dosage of $Fe/H_{2}O_{2}$ increased removal efficiency as molar ratio of $Fe/H_{2}O_{2}$ between 0.2 and 2.5. Optimum dosage of molar ratio was 1. The removal efficiency for reaction condition was increased as pH decreased when the molar ratio of $Fe/H_{2}O_{2}$ was 1.7. Fenton's oxidation was most efficient in the reaction time 35 min for complex wastewater. Also, coagulation aid experiments using kaolin resulted in 3% of kaolin dosage.

STUDIES ON THE HIGH TEMPERATURE PROPERTIES OF DUPLEX-TREATED AISI H13 STEEL

  • Chung, J.W.;Lee, S.Y.;Kim, C.W.;Kim, S.S.;Han, J.G.;Lee, S.Y.
    • 한국표면공학회지
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    • 제29권6호
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    • pp.634-639
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    • 1996
  • In oder to improve the wear resistance as well as oxidation resistance at high temperature a AISI H13 steel was treated by a duplex process of calorizing followed by plasma nitriding. The surface properties of the duplex-treated AISI H13 steel was characterized and compared with those treated by single surface process of calorizing and plasma nitriding, in terms of microstruture, microhardness, wear resistance at $500^{\circ}C$, and the oxidation behaviours at $700^{\circ}C$, Duplex process on H13 steel had created duplex layer of approximately $190\mu\textrm{m}$ on the surface, and surface microhardness was measured to be above 1450Hv(0.1Kgf). There was considerable improvement of the high temperature wear resistance at $500^{\circ}C$ in the duplex-treated steel when both wear volume and weight change due to oxidation were considered. In addition the duplex-treated steel showed an improved high temperature oxidation resistance than the plasma nitrided steel at $700^{\circ}C$.

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Simulation of oxygen mass transfer in fuel assemblies under flowing lead-bismuth eutectic

  • Feng, Wenpei;Zhang, Xue;Chen, Hongli
    • Nuclear Engineering and Technology
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    • 제52권5호
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    • pp.908-917
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    • 2020
  • Corrosion of structural materials presents a critical challenge in the use of lead-bismuth eutectic (LBE) as a nuclear coolant in an accelerator-driven system. By forming a protective layer on the steel surfaces, corrosion of steels in LBE cooled reactors can be mitigated. The amount of oxygen concentration required to create a continuous and stable oxide layer on steel surfaces is related to the oxidation process. So far, there is no oxidation experiment in fuel assemblies (FA), let alone specific oxidation detail information. This information can be, however, obtained by numerical simulation. In the present study, a new coupling method is developed to implement a coupling between the oxygen mass transfer model and the commercial computational fluid dynamics (CFD) software ANSYS-CFX. The coupling approach is verified. Using the coupling tool, we study the oxidation process of the FA and investigate the effects of different inlet parameters, such as temperature, flow rate on the mass transfer process.

반도체공정에서 구리기둥주석범프의 전해도금 형성과 특성 (Formation and Properties of Electroplating Copper Pillar Tin Bump on Semiconductor Process)

  • 왕리;정원철;조일환;홍상진;황재룡;소대화
    • 한국정보통신학회:학술대회논문집
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    • 한국해양정보통신학회 2010년도 추계학술대회
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    • pp.726-729
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    • 2010
  • 고밀도집적을 위하여 전기도금과 무전해도금법을 적용하여 구리기둥주석범프(CPTB)를 제작하고, 그 특성을 분석하였다. CPTB는 ${\sim}100{\mu}m$의 피치를 갖도록 KM-1250 건식감광필름(DFR)을 사용하여 먼저 구리 기둥범프(CPB)를 도금 전착시킨 다음, 구리의 산화억제를 위하여 그 위에 주석을 무전해 도금하였다. 열-압력에 따른 산화효과와 접합특성을 위하여 전기저항계수와 기계적 층밀림전단강도를 측정하였다. 전기저항계수는 산화두께의 증가에 따라서 증가하였고, 전단강도는 $330^{\circ}C$에서 500 N의 열-압력일 때 최고치를 나타냈다. 시뮬레이션 결과에 따르면, CPTB는 크기 감소의 결과를 나타냈으며, 그것은 구리의 산화에 의해 크게 영향을 받는 것으로 확인되었다.

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