• Transactions on Electrical and Electronic Materials
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• 제3권4호
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• pp.5-9
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• 2002

Chemical mechanical polishing (CMP) has become the preferred planarization method for multilevel interconnect technology due to its ability to achieve a high degree of feature level planarity. Especially, to achieve the higher density and greater performance, shallow trench isolation (STI)-CMP process has been attracted attention for multilevel interconnection as an essential isolation technology. Also, it was possible to apply the direct STI-CMP process without reverse moat etch step using high selectivity slurry (HSS). In this work, we determined the process margin with optimized process conditions to apply HSS STI-CMP process. Then, we evaluated the reliability and reproducibility of STI-CMP process through the optimal process conditions. The wafer-to-wafer thickness variation and day-by-day reproducibility of STI-CMP process after repeatable tests were investigated. Our experimental results show, quite acceptable and reproducible CMP results with a wafer-to-wafer thickness variation within 400$\AA$.

• Bulletin of the Korean Chemical Society
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• 제35권2호
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• pp.521-524
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• 2014

Pyronaridine tetraphosphate (1) is a well-known antimalarial drug. However, it required a carefully optimized production process for the manufacture of pyronaridine tetraphosphate. Each step of its manufacturing process was reinvestigated. For the cyclization of 4-chloro-2-(6-methoxy-pyridin-3-yl-amino)-benzoic acid 6 to 7,10-dichloro-2-methoxybenzo[b]-1,5-naphthyridine 5, an improved process was developed to eliminated critical process impurity (BIA). By the redesign of the formation of triphosphate salt, the purity as API grade was increased. Thus, a robust manufacturing process with an acceptable process performance has been developed to produce high quality pyronaridine tetraphosphate.

• 한국지반환경공학회 논문집
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• 제8권4호
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• pp.19-25
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• 2007

하폐수의 생물학적 고도처리 공정의 설계와 운전 최적화에 필요한 자료를 제공하기 위하여 ASM3를 이용하여 부상여재반응기(ABF)에 대한 해석을 수행하였다. 대상 반응기로서는 수중의 부유물질 제거와 질산화 반응을 위해 이용되는 호기적 부상여재반응기로 하였다. 본 연구에서는 하폐수 고도처리공정 중 활성슬러지의 생흡착반응을 이용한 전체 시스템 중에 흡착조를 거친 유출수를 부상여재를 이용하여 질산화시키는 공정에 대한 해석을 목적으로 하였다. 민감도 분석과 영향평가를 위해서 상용 수처리 공정해석 프로그램인 GPS-X(V 5.0)을 이용하였다. 민감도 분석을 통해 공정거동에 영향이 큰 매개변수($Y_A$, $k_{sto}$, ${\mu}_A$, $K_{A,HN}$)가 결정되었고, 70일간의 pilot plant 운전자료를 이용한 동적 시뮬레이션을 통해 최적화하였다. 최적화된 매개변수 값들은 $Y_A$가 0.14, $k_{sto}$는 3.5/d, ${\mu}_A$는 2.7/d, $K_{A,HN}$는 1.1mg/L로 결정되었다. 최적화된 매개변수 값들을 이용하여 시뮬레이션을 수행하였고, 부상여재반응기의 수리학적 체류시간(HRT)을 10분에서 4시간으로 변화시키면서 TN, $NH_4{^+}-N$, $NO_3{^-}-N$의 변화를 예측하여 실측값과 비교한 결과 HRT가 10분 정도로 매우 짧은 운전조건에서도 60%에 가까운 질산화율을 보여주고 있었다. 짧은 HRT에서 우수한 질산화 능력을 보인 부상여재의 특성을 이용하여 유량변동이 매우 큰 현장에 부상여재반응기가 효과적으로 적용될 수 있다고 판단되었다.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2008년도 International Meeting on Information Display
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• pp.851-854
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• 2008

In order to reduce the manufacturing cost of TFT LCDs and cut down an amount facilities invested, there are many LCD panel makers contributes to convert the current Five-mask manufacturing process into the noble Four-mask fabrication process. We optimized the slit mask to improve the poor process reliability.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2003년도 하계학술대회 논문집 Vol.4 No.1
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• pp.252-255
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• 2003

The pulsed laser deposition process modeling is investigated using neural networks based on radial basis function networks and multi-layer perceptron. Two input factors are examined with respect to the PL intensity. In order to minimize the joint confidence region of fabrication process with varying the conditions, D-optimal experimental design technique is performed and photoluminescence intensity is characterized by neural networks. The statistical results were then used to verify the fitness of the nonlinear process model. Based on the results, this modeling methodology can be optimized process conditions for pulsed laser deposition process.

• 한국초전도ㆍ저온공학회논문지
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• 제8권1호
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• pp.23-25
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• 2006

Optimization of process variables, including oxygen and water partial pressure and also an nesting temperature, was performed in batch-type process to fabricate YBCO films on LaAlO3 single crystal. In this work, YBCO oxide powder was used as a starting precursor for metal-organic deposition(MOD)method. The precursor films were fabricated in batch furnace and they were converted to the epitaxial YBCO films at the same furnace with varying the process variables. The oxygen partial pressure was varied from 100ppm to 2000ppm and the water partial pressure from 1.2% to 12.2%. The window for optimal P(O2) was narrow about 700ppm for batch-type process. YBCO films in bathc-thype MOD process were optimized at 740-770oC and P(H2O) of 2.3%-7.3%.

• Journal of Microbiology and Biotechnology
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• 제18권7호
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• pp.1317-1325
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• 2008

Viral safety is an important prerequisite for clinical preparations of plasma-derived pharmaceuticals. One potential way to increase the safety of therapeutic biological products is the use of a virus-retentive filter. In order to increase the viral safety of human antihemophilic factor IX, particularly in regard to non-enveloped viruses, a virus removal process using a polyvinylidene fluoride membrane filter (Viresolve NFP) has been optimized. The most critical factor affecting the filtration efficiency was operating pH and the optimum pH was 6 or 7. Flow rate increased with increasing operating pressure and temperature. Recovery yield in the optimized production-scale process was 96%. No substantial changes were observed in the physical and biochemical characteristics of the filtered factor IX in comparison with those before filtration. A 47-mm disk membrane filter was used to simulate the process performance of the production-scale cartridges and to test if it could remove several experimental model viruses for human pathogenic viruses, including human hepatitis A virus (HAV), porcine parvovirus (PPV), murine encephalomyocarditis virus (EMCV), human immunodeficiency virus type 1 (HIV), bovine viral diarrhea virus (BVDV), and bovine herpes virus (BHV). Non-enveloped viruses (HAV, PPV, and EMCV) as well as enveloped viruses (HIV, BVDV, and BHV) were completely removed during filtration. The log reduction factors achieved were $\geq$6.12 for HAV, $\geq$4.28 for PPV, $\geq$5.33 for EMCV, $\geq$5.51 for HIV, $\geq$5.17 for BVDV, and $\geq$5.75 for BHV. These results indicate that the virus filtration process successfully improved the viral safety of factor IX.

• 정보보호학회논문지
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• 제31권3호
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• pp.463-471
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• 2021

NIST(National Institute of Standards and Technology)에서는 2016년부터 양자컴퓨팅 환경을 대비하여 양자내성암호 표준화 사업을 진행하고 있다. 현재 3라운드가 진행 중이며, 대부분 후보자(5/7)는 격자기반 암호이다. 격자기반 암호는 효율적인 연산 처리와 적절한 키 길이를 제공하여 다른 기반의 양자내성 암호보다 리소스가 제한적인 임베디드 환경에서도 적용이 가능하다는 평가를 받고 있다. 그중 SABER KEM은 효율적인 모듈러스와 연산 부하가 큰 다항식 곱셈을 처리하기 위해 Toom-Cook 알고리즘을 제공한다. 본 논문에서는 ARMv8-A 환경에서 ARM/NEON을 활용하여 SABER의 Toom-Cook 알고리즘에서 평가와 보간 과정에 대한 최적화 구현 방법을 소개한다. 평가과정에서는 ARM/NEON의 효율적인 인터리빙 방법을 제안하며, 보간 과정에 서는 다양한 임베디드 환경에서 적용 가능한 최적화된 구현 방법론을 소개한다. 결과적으로 제안하는 구현은 이전 레퍼런스 구현보다 평가과정에서는 약 3.5배 보간과정에서는 약 5배 빠른 성능을 달성하였다.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2004년도 Asia Display / IMID 04
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• pp.405-407
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• 2004

We have optimized the low temperature growth of microcrystalline silicon at 80$^{\circ}C$. This material has been used to fabricate bottom gate ${\mu}c$-Si:H TFTs by using a layer-by-layer nitrogenation process. By using this process the amorphous incubation layer can be converted into silicon nitride and leads to an increase in field effect mobility of the TFT

• 대한전자공학회:학술대회논문집
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• 대한전자공학회 1998년도 하계종합학술대회논문집
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• pp.507-510
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• 1998

Performance of AMLCD pixels depends on the electrical characteristics of thin film transistor switches. The high quality of LCD can be obtained by minimizing the process and device variations of TFT. The effect of process and device factors on poly-Si TFT characteristics are calculated by ATHENA and ATLAS, and the optimized design windows based on statistical design of experiment are suggested for high performance 20 inch LCD are suggested for high performance 20 inch LCD monitors.