• Korean Journal of Optics and Photonics
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• v.16 no.4
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• pp.366-375
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• 2005

A fabrication process of periodic electric field assisted poling of Ti-diffused channel waveguides in LiNbO3 (Ti:PPLN) has been developed and improved using a periodic 180o phase inversion along the z-axis. The zig for poling inversion and the Labview program of charge control have been devised. Pulse high voltage and duty cycle were adjusted based on the estimated charge required for poling inversion. Monitoring the change of leakage current under applied voltage less than the coercive voltage also minimized a breakdown.

• Korean Journal of Optics and Photonics
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• v.14 no.3
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• pp.327-330
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• 2003

We present the fabrication and measured performance of a wavelength tunable Butt coupled DBR-LD. An average coupling efficiency between active layer and passive waveguide layer was measured over 85％per facet, and the average threshold current was 21 ㎃ for the waveguide integrated DBR laser. High output power of Butt coupled DBR-LD was obtained over 25 ㎽. As high as 25 ㎽ of output power was achieved by the butt coupled method. The maximum wavelength tuning range is about 7.4 nm, and the side mode suppression ratio was more than 40 ㏈ using 1.3 ${\mu}{\textrm}{m}$ InGaAsP waveguide layer.

• Current Optics and Photonics
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• v.7 no.2
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• pp.157-165
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• 2023

We propose a highly directional waveguide grating antenna for an optical phased array, achieving high directionality of more than 97% by interleaving the trenches with different etching depths in the silicon nitride layer, and adopting a multilayered structure. Meanwhile, the multilayered structure reduces the perturbation strength, which enables a centimeter-scale radiation length. The beam-steering range is 13.2°, with a wavelength bandwidth of 100 nm. The 1-dB bandwidth of the grating is 305 nm. The multilayered grating structure has a large tolerance to the fabrication variation and is compatible with CMOS fabrication techniques.

• Current Optics and Photonics
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• v.7 no.2
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• pp.207-212
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• 2023

In this paper, we introduce our system for manufacturing a Rb vapor cell and describe its fabrication process in a sequence of removing impurities, cold trapping, and sealing off. Saturated absorption spectroscopy was performed to verify the quality of our cell by comparing it to that of a commercial one. By using the lab-fabricated Rb vapor cell, we observed electromagnetically induced transparency in a ladder-type system corresponding to the 5S_1/2-5P_3/2-28D_5/2 transition of the ⁸⁵Rb atom. A highly excited Rydberg atomic system was prepared using two counter-propagating external cavity diode lasers with wavelengths of 780 nm and 480 nm. We also observed the Autler-Townes splitting signal while a radio-frequency source around 100 GHz incidents into the Rydberg atomic medium.

• Korean Journal of Optics and Photonics
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• v.10 no.4
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• pp.342-347
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• 1999

As the waveguide width and the radius of curvature get smaller for the effort of monolithic fabrication of integrated photonic devices, the waveguide characteristics change significantly according to the change of the waveguide width or the radius of curvature. Especially, variation of the waveguide width due to fabrication process errors induces a phase error for each waveguide from the change of the propagation constant. Therefore, it is important to quantify these variation effects on the device characteristics for the design and fabrication of highly integrated photonic devices. Here, we analyze four different types of waveguides to get general characteristics in propagation constant change by utilizing the effective index method and the analytic solution method. Futhermore, the output characteristics of two AWG(Arrayed Waveguide Grating) devices are simulated by a highly-functional computer code. The simulated results have been found to be similar to the realistic device characteristics. The required fabrication error limit for the ridge-type InP-AWG device should be smaller than 0.02 ${\mu}{\textrm}{m}$ to get better channel crosstalk than-25 dB, while the required fabrication error limit for rib-type silica-AWG devices may be allowed up to 0.1 ${\mu}{\textrm}{m}$ to obtain better crosstalk than -30 dB.

• Journal of the Korean Society for Precision Engineering
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• v.27 no.7
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• pp.117-122
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• 2010

Recently, aspheric glass lens molding core is fabricated with tungsten carbide(WC). If molding core is fabricated with silicon carbide(SiC), SiC coating process, which must be carried out before the Diamond-Like Carbon(DLC) coating can be eliminated and thus, manufacturing time and cost can be reduced. Diamond Like Carbon(DLC) is being researched in various fields because of its high hardness, high elasticity, high durability, and chemical stability and is used extensively in several industrial fields. Especially, the DLC coating of the molding core surface used in the fabrication of a glass lens is an important technical field, which affects the improvement of the demolding performance between the lens and molding core during the molding process and the molding core lifetime. Because SiC is a material of high hardness and high brittleness, it can crack or chip during grinding. It is, however, widely used in many fields because of its superior mechanical properties. In this paper, the grinding condition for silicon carbide(SiC) was developed under the grinding condition of tungsten carbide. A silicon carbide molding core was fabricated under this grinding condition. The measurement results of the SiC molding core were as follows: PV of 0.155 ${\mu}m$(apheric surface) and 0.094 ${\mu}m$(plane surface), Ra of 5.3 nm(aspheric surface) and 5.5 nm(plane surface).

• Korean Journal of Optics and Photonics
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• v.17 no.5
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• pp.437-446
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• 2006

A fabrication method fur high-aspect-ratio microchannels in stainless steel using laser-assisted thermochemical wet etching is reported in this paper. The fabrication of deep microchannels with an aspect ratio over ten is realized by applying a multiple etching process with an optimization of process conditions. The cross-sectional profile of the microchannels can be adjusted between rectangular and triangular shapes by properly controlling laser power and etchant concentration. Excellent dimensional uniformity is achieved among the channels with little heat-affected area. Microchannels with a width ranging from 15 to $50{\mu}m$ can be fabricated with an aspect ratio of ten and a pitch of 150 m or smaller. The effects of process variables such as laser power, scan speed, and etchant concentration on the fabrication results, including etch width, depth, and cross-sectional profile are closely examined.

• Korean Journal of Optics and Photonics
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• v.19 no.4
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• pp.249-254
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• 2008

We developed a new x-ray image sensor utilizing a reflection-mode liquid crystal panel as its sensitive element, and tested its functionality by using it to obtain an x-ray image of a printed circuit board. In the liquid crystal x-ray image sensors hitherto reported, the liquid crystal layer is in direct contact with the photoconductive film which is deposited on a glass substrate. In the fabrication of the new x-ray image sensor, a liquid crystal panel is fabricated in the first step by using a pair of glass plates of a few centimeters thicknrss. Then one of the glass substrates is ground until its thickness is reduced to about $60\;{\mu}m$. After polishing the glass plate, dielectric films for high reflectance at 630 nm, a film of amorphous selenium for photoconduction, and a transparent conductive film for electrode are deposited in sequence. The new x-ray image sensor has several merits: primarily, fabrication of a large area sensor is more easily compared with the old fashioned x-ray image sensors. Since the reflection type liquid crystal panel has a very steep response curve, the new x-ray sensor has much more sensitivity to x-rays compared with the conventional x-ray area sensor, and the radiation dosage can be reduced down to less then 20%. By combining the new x-ray sensor with CCD camera technology, real-time x-ray images can be easily captured. We report the structure, fabrication process and characteristics of the new x-ray image sensor.

• Korean Journal of Optics and Photonics
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• v.29 no.6
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• pp.233-240
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• 2018

In this paper, a design method to reduce fabrication errors in reflector shape of a test lamp for a flame detector is carried out. Although the test lamp should be operated in parallel with a high-intensity light, it is difficult to fix the small reflector that controls the central light during fabrication. To solve these problems, a small spherical reflector is designed to minimize the performance degradation for a light loss factor of less than 5%, even during tilt and decenter, and a spherical shape is proposed for a small reflector with little effect on the error when designing the optical system.

• Transactions on Electrical and Electronic Materials
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• v.9 no.6
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• pp.237-242
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• 2008

The effects of the process parameters in the molding of aspheric glass lenses for camera phone modules have been investigated experimentally. The molding conditions were optimized with respect to the form accuracy (PV) (the response variable) of the molded lens. The experimental conditions were obtained by employing a factorial design method. From the analysis of variance (ANOVA) and P-value (significance level), the slow cooling rate was found to affect the response variable most significantly. The lens molded under the optimum molding condition showed a transcription ratio of 93.4%.