• 제목/요약/키워드: Optical and structural properties

검색결과 931건 처리시간 0.028초

이종기판에 형성된 Cu(InGa)$Se_2$ 박막의 전기.광학적 특성 (Electrical and Optical Properties of Cu(InGa)$Se_2$ Thin Films Prepared on Difference Substrates)

  • 김석기;이정철;강기환;윤경훈;박이준;송진수
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2000년도 하계학술대회 논문집 C
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    • pp.1625-1627
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    • 2000
  • Cu(InGa)$Se_2$(CIGS) thin film absorbers with various Cu/(In+Ga) atomic ratios were prepared by a three-stage process using a co-evaporation appartus. The effect of Na on the structural and electrical properties of CIGS films were studied and their effects on the CIGS/Mo thin film solar cells were investigated. Soda-lime glass and Corning glass were used as substrates to compare the effect of Na diffusion into CIGS film. The resistivity of CIGS films was not changed in the Cu-poor lesion due to diffusion of Na from soda-lime glass but was mainly determined by the surface resistivity controlled by excess Na.

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전자빔 증착으로 제조한 $CuInS_2$ 박막의 구조적 및 광학적 특성 (Structural and optical properties of $CuInS_2$ thin films fabricated by electron-beam evaporation)

  • 박계춘;정운조
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2001년도 추계학술대회 논문집 Vol.14 No.1
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    • pp.193-196
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    • 2001
  • Single phase $CuInS_2$ thin film with the highest diffraction peak (112) at diffraction angle $(2\theta)$ of $27.7^{\circ}$ and the second highest diffraction peak (220) at diffraction angle $(2\theta)$ of $46.25^{\circ}$ was well made with chalcopyrite structure at substrate temperature of $70^{\circ}C$, annealing temperature of $250^{\circ}C$, annealing time of 60 min. The $CuInS_2$ thin film had the greatest grain size of $1.2{\mu}m$ and Cu/In composition ratio of 1.03. Lattice constant of a and c of that $CuInS_2$ thin film was 5.60 A and 11.12 A respectively. Single phase $CuInS_2$ thin films were accepted from Cu/In composition ratio of 0.84 to 1.3. P-type $CuInS_2$ thin films were appeared at over Cu/In composition ratio of 0.99. Under Cu/In composition ratio of 0.96, conduction types of $CuInS_2$ thin films were n-type. Also, fundamental absorption wavelength, the absorption coefficient and optical energy band gap of p-type $CuInS_2$ thin film with Cu/In composition ratio of 1.3 was 837 nm, $3.0{\times}104cm^{-1}$ and 1.48 eV respectively. When Cu/In composition ratio was 0.84, fundamental absorption wavelength, the absorption coefficient and optical energy band gap of n-type $CuInS_2$ thin film was 821 nm, $6.0{\times}10^4cm^{-1}$ and 1.51 eV respectively.

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Structural and Optical Properties of CuInS2 Thin Films Fabricated by Electron-beam Evaporation

  • Jeong, Woon-Jo;Park, Gye-Choon;Chung, Hae-Duck
    • Transactions on Electrical and Electronic Materials
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    • 제4권1호
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    • pp.7-10
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    • 2003
  • Single phase CuInS$_2$ thin film with the strongest diffraction peak (112) at diffraction angle (2$\theta$) of 27.7$^{\circ}$ and the second strongest diffraction peak (220) at diffraction angle (2$\theta$) of 46.25$^{\circ}$was well made with chalcopyrite structure at substrate temperature of 70$^{\circ}C$. annealing temperature of 250$^{\circ}C$, annealing time of 60 min. The CuInS$_2$ thin film had the greatest grain size of 1.2 Um when the Cu/In composition ratio of 1.03, where the lattice constant of a and c were 5.60${\AA}$ and 11.12${\AA}$, respectively. The Cu/In stoichiometry of the single-phase CuInS$_2$thin films was from 0.84 to 1.3. The film was p-type when tile Cu/In ratio was above 0.99 and was n-type when the Cu/In was below 0.95. The fundamental absorption wavelength, absorption coefficient and optical band gap of p-type CuInS$_2$ thin film with Cu/In=1.3 were 837nm, 3.OH 104 cm-1 and 1.48 eV, respectively. The fundamental absorption wavelength absorption coefficient and optical energy band gap of n-type CuInS$_2$ thin film with Cu/In=0.84 were 821 nm, 6.0${\times}$10$^4$cm$\^$-1/ and 1.51 eV, respectively.

전자빔 층착으로 제조한 $CuInS_2$ 박막의 구조적 및 광학적 특성 (Structural and optical properties of $CuInS_2$ thin films fabricated by electron-beam evaporation)

  • 박계춘;정운조
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2001년도 추계학술대회 논문집
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    • pp.193-196
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    • 2001
  • Single phase CuInS$_2$ thin film with the highest diffraction peak (112) at diffraction angle (2$\theta$) of 27.7$^{\circ}$ and the second highest diffraction peak (220) at diffraction angle (2$\theta$) of 46.25$^{\circ}$ was well made with chalcopyrite structure at substrate temperature of 70 $^{\circ}C$, annealing temperature of 25$0^{\circ}C$, annealing time of 60 min. The CuInS$_2$ thin film had the greatest grain size of 1.2 ${\mu}{\textrm}{m}$ and Cu/In composition ratio of 1.03. Lattice constant of a and c of that CuInS$_2$ thin film was 5.60 $\AA$ and 11.12 $\AA$ respectively. Single phase CuInS$_2$ thin films were accepted from Cu/In composition ratio of 0.84 to 1.3. P-type CuInS$_2$ thin films were appeared at over Cu/In composition ratio of 0.99. Under Cu/In composition ratio of 0.96, conduction types of CuInS$_2$ thin films were n-type. Also, fundamental absorption wavelength, the absorption coefficient and optical energy band gap of p-type CuInS$_2$ thin film with Cu/In composition ratio of 1.3 was 837 nm, 3.0x10 $^4$ $cm^{-1}$ / and 1.48 eV respectively. When CuAn composition ratio was 0.84, fundamental absorption wavelength, the absorption coefficient and optical energy band gap of n-type CuInS$_2$ thin film was 821 nm, 6.0x10$^4$ $cm^{-1}$ / and 1.51 eV respectively.

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초음파 방법을 이용한 CdTe 양자점의 합성 및 특성에 관한 연구 (Study on Sonochemical Synthesis and Characterization of CdTe Quatum Dot)

  • 유정열;김우석;박선아;김종규
    • 공업화학
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    • 제28권5호
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    • pp.571-575
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    • 2017
  • 본 연구에서는 초음파 조사법을 사용하여 cadmium telluride (CdTe) 양자점을 합성하였다. 전구체의 비율과 합성 시간을 주 변수로 하여 그에 따른 CdTe 양자점의 광학적 특성과 구조적 특성을 분석하였다. 모든 cadmium (Cd)과 tellurium(Te) 함량비율의 실험에서 합성 시간이 증가함에 따라 CdTe 양자점의 성장에 의해 밴드갭 감소현상이 관찰되었고, 발광 특성을 확인한 결과 510~610 nm 파장 범위에서 장파장으로 이동함을 보였다. 또한 Te의 비율이 증가함에 따라 장파장이동이 빠르게 일어나는 것을 확인하였다. Photoluminescence (PL) 피크 강도를 확인하였을 때 합성시간이 180 min~240 min 사이에서 가장 높은 강도를 보였다. X-ray diffraction (XRD)와 transmission electron microscopy (TEM)으로 구조적 특성을 확인한 결과 zinc blend 구조의 CdTe 양자점을 나타내었으며, 합성시간이 210 min일 때 양자점의 크기는 약 2.5 nm로 균일하게 분산되어 있었으며 fast fourier transform (FFT) 이미지를 확인한 결과 뚜렷한 결정성을 확인하였다.

CBD 방법에 의한 ZnS 버퍼층 형성의 착화제 농도에 따른 영향 (Effect of the Concentration of Complexing Agent on the Formation of ZnS Buffer Layer by CBD Method)

  • 권상직;유인상
    • 한국전기전자재료학회논문지
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    • 제30권10호
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    • pp.625-630
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    • 2017
  • ZnS was chemically deposited as a buffer layer alternative to CdS, for use as a Cd-free buffer layer in $Cu(In_{1-x}Ga_x)Se_2$ (CIGS) solar cells. The deposition of a thin film of ZnS was carried out by chemical bath deposition, following which the structural and optical properties of the ZnS layer were studied. For the experiments, zinc sulfate hepta-hydrate ($ZnSO_4{\cdot}7H_2O$), thiourea ($SC(NH_2)_2$), and ammonia ($NH_4OH$) were used as the reacting agents. The mole concentrations of $ZnSO_4$ and $SC(NH_2)_2$ were fixed at 0.03 M and 0.8 M, respectively, while that of ammonia, which acts as a complexing agent, was varied from 0.3 M to 3.5 M. By varying the mole concentration of ammonia, optimal values for parameters like optical transmission, deposition rate, and surface morphology were determined. For the fixed mole concentrations of $0.03M\;ZnSO_4{\cdot}7H_2O$ and $0.8M\;SC(NH_2)_2$, it was established that 3.0 M of ammonia could provide optimal values of the deposition rate (5.5 nm/min), average optical transmittance (81%), and energy band gap (3.81 eV), rendering the chemically deposited ZnS suitable for use as a Cd-free buffer layer in CIGS solar cells.

Ga doped ZnO 박막의 질소분위기 열처리에 따른 특성 변화 (Effect of Annealing in Nitrogen Atmosphere on the Characteristics of Ga Doped ZnO Films)

  • 허성보;이영진;이학민;김선광;김유성;공영민;김대일
    • 열처리공학회지
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    • 제24권6호
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    • pp.338-342
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    • 2011
  • Ga doped ZnO (GZO) thin films were deposited with RF magnetron sputtering on glass substrate and then the effect of post deposition annealing at nitrogen atmosphere on the structural, optical and electrical properties of the films was investigated. The post deposition annealing process was conducted for 30 minutes at different temperature of 150, 300 and $450^{\circ}C$, respectively. As increase annealing temperature, GZO films show the increment of the prefer orientation of ZnO (002) diffraction peak in the XRD pattern and the optical transmittance in a visible wave region was also increased, while the electrical sheet resistance was decreased. The figure of merit obtained in this study means that GZO films which vacuum annealed at $450^{\circ}C$ have the highest optoelectrical performance in this study.

Annealing effects of initial amorphous ZnO layer on structural and the optical properties of ZnO thin films grown by plasma-assisted molecular beam epitaxy

  • Kim, Do-Yeob;Kim, Min-Su;Kim, Ghun-Sik;Jeon, Su-Min;Cho, Min-Young;Choi, Hyun-Young;Yim, Kwang-Gug;Choi, Byeong-Guck;Lee, Dong-Yul;Lee, Joo-In;Park, Sung-Dong;Jung, Myong-Hyo;Kim, Eun-Do;Hwang, Do-Weon;Leem, Jae-Young
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2009년도 제37회 하계학술대회 초록집
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    • pp.189-189
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    • 2009
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