• Korean Journal of Materials Research
• /
• v.21 no.5
• /
• pp.243-249
• /
• 2011

To reduce manufacturing costs of crystalline silicon solar cells, silicon wafers have become thinner. In relation to this, the properties of the aluminium-back surface field (Al-BSF) are considered an important factor in solar cell performance. Generally, screen-printing and a rapid thermal process (RTP) are utilized together to form the Al-BSF. This study evaluates Al-BSF formation on a (111) textured back surface compared with a (100) flat back surface with variation of ramp up rates from 18 to $89^{\circ}C$/s for the RTP annealing conditions. To make different back surface morphologies, one side texturing using a silicon nitride film and double side texturing were carried out. After aluminium screen-printing, Al-BSF formed according to the RTP annealing conditions. A metal etching process in hydrochloric acid solution was carried out to assess the quality of Al-BSF. Saturation currents were calculated by using quasi-steady-state photoconductance. The surface morphologies observed by scanning electron microscopy and a non-contacting optical profiler. Also, sheet resistances and bulk carrier concentration were measured by a 4-point probe and hall measurement system. From the results, a faster ramp up during Al-BSF formation yielded better quality than a slower ramp up process due to temperature uniformity of silicon and the aluminium surface. Also, in the Al-BSF formation process, the (111) textured back surface is significantly affected by the ramp up rates compared with the (100) flat back surface.

• Journal of Nuclear Fuel Cycle and Waste Technology(JNFCWT)
• /
• v.4 no.1
• /
• pp.59-64
• /
• 2006

Ion exchange resin particles should not be found in steam generator(S/G) sludge. The suspicious spherical resin particles observed in S/G sludge sample were characterized for particle size distribution under optical microscope using the micro-technique, for element analysis by the electron probe micro analysis (EPMA), and for molecular identification by the IR spectroscopy. The particle sizes are distributed from 1 to $200{\mu}m$ for the sludge, while 40 to $500{\mu}m$ for the spherical resin particles. The results of the elemental analysis showed different major impurities: Si, Al, Mn, Cr, Ni, Zn and Ti for the sludge particles, while Si, Cu, Zn for the spherical resin particles. However, both particles contain Fe as a matrix of magnetite $(Fe_3O_4)$. IR spectrum of the spherical particles was not quite similar to the IR spectrum of ion exchange resins used in S/G system. These results indicate that the spherical particles are not related to ion exchange resin particles and may be formed by the process of the sludge formation.

• Journal of Korean Ophthalmic Optics Society
• /
• v.13 no.1
• /
• pp.71-76
• /
• 2008

Purpose: A simple and efficient method to prepare nanocrystalline ZnO thin film with pure strong UV emission on soda-lime-silica glass substrates by low-temperature annealing was improved. Methods: Crystal structural, surface morphological, and optical characteristics of nanocrystalline ZnO thin films deposited on soda-lime-silica glass substrates by prefiring final annealing process at 300$^{\circ}C$ were investigated by using X-ray diffraction analysis, field emission-scanning electron microscope, scanning probe microscope, ultraviolet-visible-near infrared spectrophotometer, and photoluminescence. Results: Highly c-axis-oriented ZnO films were obtained by prefiring at 300$^{\circ}C$. A high transmittance in the visible spectra range and clear absorption edge in the ultra violet range of the film was observed. The PL spectrum of ZnO thin film with a deep near band edge emission was observed while the defect-related broad green emission was nearly quenched. Conclusions: Our work will be possibly adopted to cheaply and easily fabricate ZnO-based optoelectronic devices at low temperature, below 300$^{\circ}C$, in the future.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2000.02a
• /
• pp.126-126
• /
• 2000

다이아몬드상 카본(DLC) 필름은 경도가 높고, 마찰계수가 낮다는 장점을 가지고 있기 때문에 내마모성 코팅이나 윤활성코팅에 응용을 위한 연구가 활발히 진행중이다. 하지만 마찰계수가 주변환경에 매우 큰 영향을 받는다는 단점이 있다. 이러한 단점은 DLC필름의 응용에 대한 저해 요인이 되며, 이 점을 보완하기 위해서 DLC 필름에 Si을 첨가하는 연구들이 진행되고 있다. 본 실험에서는 r.f-PACVD 법을 이용하여 Si이 첨가된 DLC 필름의 주위 환경 변화에 따른 마찰특성의 변화를 연구하였다. 사용한 반응 가스는 벤젠(C6H)과 희석된 Silane(SiH4 : H2 = 10 : 90)이며, 희석된 Silane과 벤젠의 첨가비율을 조절하여 필름내 Si의 함량을 조절하였고, 증착시 바이아스의 전압은 -400V로 하였다. 마찰테스트는 Ball-on-Disk type의 조건에서 대기, 건조공기, 진공의 세가지 분위기에서 마찰테스트를 실행하였다. 실험결과 마찰계수는 건조공기, 대기, 진공의 순으로 증가하였고, 필름내에 포함되어 있는 Si의 양이 증가할수록 마찰계수는 낮고 안정한 값을 나타내었다. Tribochemiacal 분석과, ball과 track의 전자현미경 사진 분석 결과, 진공에 비해서 건조공기와 대기중에서 마찰계수가 낮은 것은 DLC 필름내에 마모 track 중심부에 Si-C-O 계의 화합물이 형성되어, 이 화합물이 마찰계면에 존재하여 마찰계수를 낮추었음을 확인하였다. 그리고 대기중에서 실험한 경우, 습기의 존재로 인해 마모입자가 볼의 표면에서 엉김으로써 건조공기의 상태에서 보다 높은 마찰저항을 갖게 됨으로 인하여 마찰계수가 높아짐을 알 수 있었다.a)는 as-deposit 상태이며, 그림 1(b)는 45$0^{\circ}C$, 60min 열처리한 plan-view TEM 사진이다.dical의 영향을 조사하였으며 oxygen radical의 rf power에 따른 변화는 OES(Optical emission spectroscopy)를 사용하였다. 너무 적은 oxygen ion beam flux나 oxygen radical은 film의 전도도 및 투과도를 저하시켰고 반면 너무 과도한 flux의 증가 시는 전도도는 감소하였고 투과도는 증가하는 경향을 보였다. 기판에 도달하는 oxygen ion flux는 faraday cup을 이용하여 측정하였으며 증착된 ITO film은 XPS, UV-spectrometer, 4-point probe를 이용하여 분석하였다. 때문으로 생각되어진다. 또한, 성장 온도가 낮아짐에 따라 AlGaN의 성장을 저해하기 때문으로 판단된다. 성장 온도 변화에 따라 성장된 V의 구조적 특성 및 표면 거칠기 변화를 관찰하여 AlGaN의 성장 거동을 논의하겠다.034, 0.005 정도로 다시 감소하였다. 박막의 유전율은 약 35 정도의 값을 나타내었으며 X-선 회절 data로부터 분석한 박막의 변형은 증온도에 따라 7.2%에서 0.04%로 감소하였고 이 이경향은 유전손실은 감소경향과 일치하였다.는 현저하게 향상되었다. 그 원인은 SB power의 인가에 의해 활성화된 precursor 분자들이 큰 에너지를 가지고 기판에 유입되어 치밀한 박막이 형성되었기 때문으로 사료된다.을수 있었다.보았다.다.다양한 기능을 가진 신소재 제조에 있다. 또한 경제적인 측면에서도 고부가 가치의 제품

• Journal of the Korean Society for Nondestructive Testing
• /
• v.30 no.1
• /
• pp.6-12
• /
• 2010

Fiber optic sensor using fiber Bragg grating(FBG) probes is used for monitoring strain and temperature distributed on the wide surfaces of large structures. In this paper, in order to use many FBG probes in one optical fiber line, we propose a complex multiplexing technology which is composed of two techniques, one is time division multiplexing and another is wavelength division multiplexing. However, we only investigate the characteristics of time division multiplexing because FBG sensors basically can be operated by wavelength division multiplexing. We calculate the optimal reflectivities and the lengthwise location of five FBG probes in serial connection in order to obtain the unique reflected intensities from the FBG probes. We fabricate five FBG probes with the reflectivities of 13%, 16%, 25%, 40% and 80%, which are determined by the theoretical calculation, and observe the signal reflected from each FBG in the time domain from the experiment. There are differences between experimental and theoretical results caused by the signal noise and the differences of reflectivities of FBG probes. But the experimental results shows the reflected signals of five FBG probes which prove the availability of complex multiplexing.

• Korean Journal of Materials Research
• /
• v.13 no.6
• /
• pp.347-351
• /
• 2003

II-Ⅵ ZnO compound semiconductor thin films were grown on $\alpha$-Al$_2$O$_3$(0001) single crystal substrate by radical beam assisted molecular beam epitaxy and the optical properties were investigated. Zn(6N) was evaporated using Knudsen cell and O radical was assisted at the partial pressure of 1$\times$10$^{4}$ Torr and radical beam source of 250-450 W RF power. In $\theta$-2$\theta$ x-ray diffraction analysis, ZnO thin film with 500 nm thickness showed only ZnO(0002)and ZnO(0004) peaks is believed to be well grown along c-axis orientation. Photoluminescence (PL) measurement using He-Cd ($\lambda$=325 nm) laser is obtained in the temperature range of 9 K-300 K. At 9 K and 300 K, only near band edge (NBE) is observed and the FWHM's of PL peak of the ZnO deposited at 450 RF power are 45 meV and 145 meV respectively. From no observation of any weak deep level peak even at room temperature PL, the ZnO grains are regarded to contain very low defect density and impurity to cause the deep-level defects. The peak position of free exciton showed slightly red-shift as temperature was increased, and from this result the binding energy of free exciton can be experimentally determined as much as $58\pm$0.5 meV, which is very closed to that of ZnO bulk. By van der Pauw 4-point probe measurement, the grown ZnO is proved to be n-type with the electron concentration($n_{e}$ ) $1.69$\times$10^{18}$$cm^3$, mobility($\mu$) $-12.3\textrm{cm}^2$/Vㆍs, and resistivity($\rho$) 0.30 $\Omega$$\cdot$cm.

• Proceedings of the Korean Radioactive Waste Society Conference
• /
• 2005.06a
• /
• pp.129-136
• /
• 2005

There should not be ion exchange resin particles in S/G sludge. The suspicious spherical resin particles observed in S/G sludge sample were characterized for particle size distribution under optical microscope using the micro-technique, for element analysis by the electron probe micro analysis (EPMA), and for molecular identification by the IR spectroscopy The particle sizes are distributed from 1 to 200 ${\mu}m$ for the sludge, while 40 to 500 ${\mu}m$ for the spherical resin particles. The results of the elemental analysis showed different major impurities: Si, Al, Mn, Cr, Ni, Zn and Ti for the sludge particles, while Si, Cu, Zn for the spherical resin particles. However, both particles contain Fe as a matrix of hematite ($Fe_{3}O_4$). IR spectrum of the spherical particles was quite different from that of ion exchange resins used in S/G system. These results indicate that the spherical particles are not related to ion exchange resin particles and formed by the process of the sludge formation.

• Journal of Biomedical Engineering Research
• /
• v.24 no.3
• /
• pp.203-208
• /
• 2003

The effect of indium on the microstructure and hardness of a Au-Pt-Cu ternary alloy was investigated using optical microscopy, differential scanning calorimeter, scanning electron microscopy x-ray diffractometry, electron probe microanalizer and vickers hardness tester. A hardness of the solution floated Au-Pt-Cu-0.5In quarternary alloy with 0.5 wt.% was reached a maximum value (162 Hv) in 30 min at 550$^{\circ}C$ in the range of 150 to 950$^{\circ}C$ but that of the alloy was rapidly increased until 30 min with increasing aging time at 550$^{\circ}C$ and after that was remained almost constant value. Also, the microhardness of the matrix Au-Pt-Cu ternary alloy aged at 550$^{\circ}C$ for 30 min was continuously increased with indium contents and the grain size of Au-Pt-Cu ternary alloy decreased as increased indium contents. Analyses of EPMA and XRD revealed that the matrix Au-Pt-Cu-In quarternary alloy is composed of fcc structure and intermetallic InPt$_3$ precipitate with Ll$_2$ structure. Based on this investigation, it can be concluded that an increase in microhardness of Au-Pt-Cu-In quarternary alloy is due to precipitation hardening InPt$_3$ and grain size refinement.

• Journal of the Korean Magnetics Society
• /
• v.16 no.3
• /
• pp.157-162
• /
• 2006

In this study, a high sensitive giant magnetoresistance-spin valve (GMR-SV) bio-sensing device with high linearity and very low hysteresis was fabricated by photolithography and ion beam deposition sputtering system. Detection of the Fe-hemoglobin inside in a red blood and magnetic nanoparticles using the GMR-SV bio-sensing device was investigated. Here a human's red blood includes hemoglobin, and the nanoparticles are the Co-ferrite magnetic particles coated with a shell of amorphous silica which the average size of the water-soluble bare cobalt nanoparticles was about 9 nm with total size of about 50 nm. When 1 mA sensing current was applied to the current electrode in the patterned active GMR-SV devices with areas of $5x10{\mu}m^2 $ and $2x6{\mu}m^2 $, the output signals of the GMRSV sensor were about 100 mV and 14 mV, respectively. In addition, the maximum sensitivity of the fabricated GMR-SV sensor was about $0.1{\sim}0.8%/Oe$. The magnitude of output voltage signals was obtained from four-probe magnetoresistive measured system, and the picture of real-time motion images was monitored by an optical microscope. Even one drop of human blood and nanopartices in distilled water were found to be enough for detecting and analyzing their signals clearly.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2000.02a
• /
• pp.186-186
• /
• 2000

After LeComber et al. reported the first amorphous hydrogenated silicon (a-Si: H) TFT, many laboratories started the development of an active matrix LCDs using a-Si:H TFTs formed on glass substrate. With increasing the display area and pixel density of TFT-LCD, however, high mobility TFTs are required for pixel driver of TF-LCD in order to shorten the charging time of the pixel electrodes. The most important of these drawbacks is a-Si's electron mobiliy, which is the speed at which electrons can move through each transistor. The problem of low carier mobility for the a-Si:H TFTs can be overcome by introducing polycrystalline silicon (poly-Si) thin film instead of a-Si:H as a semiconductor layer of TFTs. Therefore, poly-Si has gained increasing interest and has been investigated by many researchers. Recnetly, fabrication of such poly-Si TFT-LCD panels with VGA pixel size and monolithic drivers has been reported, . Especially, fabricating poly-Si TFTs at a temperature mach lower than the strain point of glass is needed in order to have high mobility TFTs on large-size glass substrate, and the monolithic drivers will reduce the cost of TFT-LCDs. The conventional methods to fabricate poly-Si films are low pressure chemical vapor deposition (LPCVD0 as well as solid phase crystallization (SPC), pulsed rapid thermal annealing(PRTA), and eximer laser annealing (ELA). However, these methods have some disadvantages such as high deposition temperature over $600^{\circ}C$, small grain size (<50nm), poor crystallinity, and high grain boundary states. Therefore the low temperature and large area processes using a cheap glass substrate are impossible because of high temperature process. In this study, therefore, we have deposited poly-Si thin films on si(100) and glass substrates at growth temperature of below 40$0^{\circ}C$ using newly developed high rate magnetron sputtering method. To improve the sputtering yield and the growth rate, a high power (10~30 W/cm2) sputtering source with unbalanced magnetron and Si ion extraction grid was designed and constructed based on the results of computer simulation. The maximum deposition rate could be reached to be 0.35$\mu$m/min due to a high ion bombardment. This is 5 times higher than that of conventional sputtering method, and the sputtering yield was also increased up to 80%. The best film was obtained on Si(100) using Si ion extraction grid under 9.0$\times$10-3Torr of working pressure and 11 W/cm2 of the target power density. The electron mobility of the poly-si film grown on Si(100) at 40$0^{\circ}C$ with ion extraction grid shows 96 cm2/V sec. During sputtering, moreover, the characteristics of si source were also analyzed with in situ Langmuir probe method and optical emission spectroscopy.