• Title/Summary/Keyword: Off-current

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A Study on the Reason of the Changes of MILC Poly-Si TFT's Characteristics by Electrical Stress (전기적 스트레스에 의한 MILC poly-Si TFT 특성변화 원인에 관한 연구)

  • Kim, Gi-Bum;Kim, Tae-Kyung;Lee, Byung-Il;Joo, Seung-Ki
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.37 no.12
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    • pp.29-34
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    • 2000
  • The effects of electrical stress on MILC(Metal Induced Lateral Crystallization) poly-Si TFT were studied. After the electrical stress was applied on the TFT’s which were fabricated by MILC process, off-state(VG<0V) current was reduced by $10^2{\sim}10^4$ times. However, when the device on which electrical stress was applied was annealed in furnace, the off-state current increased as annealing temperature increased. From the dependence of off-state current on the post-annealing temperature, activation energy of the trap states in MILC poly-Si thin films was calculated to be 0.34eV.

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Lift-Off Invariance Transformations for Electromagnetic Eddy Current Nondestructive Evaluation Signals (다양한 센서 측정 거리로부터 획득한 자기적 와전류 신호의 불변 변환 처리 기법)

  • Kim, Dae-Won
    • Journal of the Korean Magnetics Society
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    • v.14 no.6
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    • pp.207-212
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    • 2004
  • Eddy current (EC) testing methods are widely used in a variety of applications including the inspection of steam generator tubes in nuclear power plants, aircraft parts and airframes. A key factor that affects the EC signal is lift-off which means the physical distance between a sensor and a specimen in the testing. In practice, it is difficult to keep track of the actual value of the lift -off during a specific experiment, simulation or testing in the field, which is essential for accurate interpretation of the signal to be used in the following steps. Hence it is necessary to have a scheme to render the EC signal invariant to the effects of lift-off in spite of the changes in the real world. This paper describes a new method for compensating EC signals for variations in lift-off by acquiring an invariance feature using a homomorphic operator and neural network techniques. The signals from various lift-offs are transformed to obtain a zero lift-off equivalent signal that can be subsequently used for defect characterization in the next step.

Leakage Current and Threshold Voltage Characteristics of a-Si:H TFT Depending on Process Conditions (a-Si:H TFT의 누설전류 및 문턱전압 특성 연구)

  • Yang, Kee-Jeong;Yoon, Do-Young
    • Korean Chemical Engineering Research
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    • v.48 no.6
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    • pp.737-740
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    • 2010
  • High leakage current and threshold voltage shift(${\Delta}Vth$) are demerits of a-Si:H TFT. These characteristics are influenced by gate insulator and active layer film quality, surface roughness, and process conditions. The purpose of this investigation is to improve off current($I_{off}$) and ${\Delta}V_{th}$ characteristics. Nitrogen-rich deposition condition was applied to gate insulator, and hydrogen-rich deposition condition was applied to active layer to reduce electron trap site and improve film density. $I_{off}$ improved from 1.01 pA to 0.18 pA at $65^{\circ}C$, and ${\Delta}V_{th}$ improved from -1.89 V to 1.22 V.

Decrease of Gate Leakage Current by Employing Al Sacrificial Layer Deposited on a Tilted and Rotated Substrate in the DLC-coated Si-tip FEA Fabrication (DLC-coated Si-tip FEA 제조에 있어서 기판 상에 경사-회전 증착된 Al 희생층을 이용한 Gate누설 전류의 감소)

  • 주병권;김영조
    • Journal of the Microelectronics and Packaging Society
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    • v.7 no.3
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    • pp.27-29
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    • 2000
  • For the DLC-coaled Si-tip FEA, the modified lift off-process, by which DLC coated on both gate electrode surface and gate insulator in the gate aperture could be removed, was proposed. In the process, the Al sacrificial layer was deposited on a tilted and rotated substrate by an e-beam evaporation, and DLC film was coated on the substrate by PA-CVD method. Afterward the DLC was perfectly removed except the DLC films coated on emitter tips by etch-out of Al sacrificial layer. Current-voltage curves and current fluctuation of the DLC-coated Si-tip FEA showed that the proposed lift-off process played an important role in decreasing gate leakage current and stabilizing omission current.

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Leakage Current of Hydrogenated Amorphous Silicon Thin-Film Transistors (수소화된 비정질규소 박막트랜지스터의 누설전류)

  • Lee, Ho-Nyeon
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.8 no.4
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    • pp.738-742
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    • 2007
  • The variations in the device characteristics of hydrogenated amorphous thin-film transistors (a-Si:H TFTs) were studied according to the processes of pixel electrode fabrication to make active-matrix flat-panel displays. The off-state current was about 1 pA and the switching ratio was over $10^6$ before fabrication of pixel electrodes; however, the off-state current increased over 10 pA after fabrication of pixel electrodes. Surface treatment on SiNx passivation layers using plasma could improve the off-state characteristics after pixel electrode process. $N_2$ plasma treatment gave the best result. Charge accumulation on the SiNx passivation layer during the deposition of transparent conducting layer might cause the increase of off-state current after the fabrication of pixel electrodes.

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A Study on Low-Current-Operation of 850nm Oxide VCSELs Using a Large-Signal Circuit Model (대신호 등가회로 모델을 이용한 850nm Oxide VCSEL의 저전류 동작 특성 연구)

  • Jang, Min-Woo;Kim, Sang-Bae
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.43 no.10 s.352
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    • pp.10-21
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    • 2006
  • We have studied the characteristics of oxide VCSELS when their off-current and on-current are kept small in order to find out the possibility of low current operation. A large signal equivalent circuit model has been used. By comparing measured data and simulation results, the parameters of the large signal models are obtained including the capacitances. Using the large signal model, we have investigated the effects of capacitance and on/off currents upon the turn-on/turn-off characteristics and eye diagram. According to the experiment and simulation, the depletion capacitance, which has been neglected, is found to have significant influence on the him-on delay and eye-diagram. Therefore, for high speed and low current operation, the reduction of the depletion capacitance is essential.

Effects of Vth adjustment ion implantation on Switching Characteristics of MCT(MOS Controlled Thyristor) (문턱전압 조절 이온주입에 따른 MCT (MOS Controlled Thyristor)의 스위칭 특성 연구)

  • Park, Kun-Sik;Cho, Doohyung;Won, Jong-Il;Kwak, Changsub
    • Journal of the Institute of Electronics and Information Engineers
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    • v.53 no.5
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    • pp.69-76
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    • 2016
  • Current driving capability of MCT (MOS Controlled Thyristor) is determined by turn-off capability of conducting current, that is off-FET performance of MCT. On the other hand, having a good turn-on characteristics, including high peak anode current ($I_{peak}$) and rate of change of current (di/dt), is essential for pulsed power system which is one of major application field of MCTs. To satisfy above two requirements, careful control of on/off-FET performance is required. However, triple diffusion and several oxidation processes change surface doping profile and make it hard to control threshold voltage ($V_{th}$) of on/off-FET. In this paper, we have demonstrated the effect of $V_{th}$ adjustment ion implantation on the performance of MCT. The fabricated MCTs (active area = $0.465mm^2$) show forward voltage drop ($V_F$) of 1.25 V at $100A/cm^2$ and Ipeak of 290 A and di/dt of $5.8kA/{\mu}s$ at $V_A=800V$. While these characteristics are unaltered by $V_{th}$ adjustment ion implantation, the turn-off gate voltage is reduced from -3.5 V to -1.6 V for conducting current of $100A/cm^2$ when the $V_{th}$ adjustment ion implantation is carried out. This demonstrates that the current driving capability is enhanced without degradation of forward conduction and turn-on switching characteristics.

A New High Power Factor ZVT-ZCT AC-DC Boost Converter

  • Ting, Naim Suleyman
    • Journal of Electrical Engineering and Technology
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    • v.13 no.4
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    • pp.1539-1548
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    • 2018
  • This paper introduces a new soft switched AC-DC boost converter with power factor correction (PFC). In the introduced converter, all devices are turned on and off under soft switching (SS). The main switch is turned on under zero voltage transition (ZVT) and turned off under zero current transition (ZCT). The main diode is turned on under zero voltage switching (ZVS) and turned off under zero current switching (ZCS). Meanwhile, there is not any current or voltage stress on the main devices. Besides, the auxiliary switch is turned on under ZCS and turned off under ZVS. The detailed theoretical analysis of the converter is presented, and also theoretical analysis is verified by a prototype with 100 kHz and 500 W. Also, the proposed converter has 99.8% power factor and 97.5% total efficiency at soft switching operation.

Reduction of Leakage current Generated by Degradation in Organic Thin Film Transistors using Pattern on Pentacene Surface by Atomic Force Microscope

  • Hwang, Hyun-Doo;Kim, Hyun-Suck;Kim, Chang-Ho;Kim, Jae-Hoon
    • 한국정보디스플레이학회:학술대회논문집
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    • 2009.10a
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    • pp.560-562
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    • 2009
  • In this paper, we proposed a simple method of decreasing the off current generated by degradation for improve the electrical characteristics such as mobility and on/off current ratio by making the line patterns on the pentacene surface between the electrodes using atomic force microscope (AFM) lithography.

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A Novel Scheme for Seamless Hand-off in WMNs

  • Vo, Hung Quoc;Kim, Dae-Sun;Hong, Choong-Seon;Lee, Sung-Won;Huh, Eui-Nam
    • KSII Transactions on Internet and Information Systems (TIIS)
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    • v.3 no.4
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    • pp.399-422
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    • 2009
  • Although current wireless mesh network (WMN) applications experience a perceptually uninterrupted hand-off, their throughput after the hand-off event may be significantly degraded due to the low available bandwidth of the mobile client's new master. In this paper, we propose a novel mobility management scheme for 802.11-based WMNs that enables both seamless hand-off for transparent communications, and bandwidth awareness for stable application performance after the hand-off process. To facilitate this, we (i) present a new buffer moment in support of the fast Layer-2 hand-off mechanism to cut the packet loss incurred in the hand-off process to zero and (ii) design a dynamic admission control to grant joining accepts to mesh clients. We evaluate the benefits and drawbacks of the proposal for both UDP and TCP traffic, as well as the fairness of the proposal. Our results show that the new scheme can not only minimize hand-off latency, but also maintain the current application rates of roaming users by choosing an appropriate new master for joining.