• Title/Summary/Keyword: O index

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THE INDEX FOR A TOPOLOGICAL DEGREE THEORY FOR DENSELY DENIED OPERATORS OF TYPE ${S_+}_O,L$ IN BANACH SPACES

  • Kartsatos, Athanassios G.;Skrypnik, Igor V.
    • Journal of the Korean Mathematical Society
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    • v.37 no.6
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    • pp.901-913
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    • 2000
  • This is a summary of results involving the development of a theory of an index of an isolated critical point for densely defined nonlinear operators of type (S(sub)+)(sub)0,L. This index theory is associated with a degree theory, for such operators, whch has been recently developed by the authors.

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Refractive Index Control by Dopant for Thick Silica films Deposited by FHD (FHD법에 의해 증착된 실리카막의 도펀트 첨가에 의한 굴절률 제어)

  • 김용탁;서용곤;윤형도;임영민;윤대호
    • Journal of the Korean Ceramic Society
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    • v.40 no.6
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    • pp.589-593
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    • 2003
  • Silica based Planar Lightwave Circuits (PLC) have been applied to various kinds of wave-guided optical passive devices. SiO$_2$ (buffer) and GeO$_2$-SiO$_2$ (core) thick films have been deposited by Flame Hydrolysis Deposition (FHD). The SiO$_2$ films were produced by the flame hydrolysis reaction of halide materials such as SiCl$_4$, POCl$_3$ and BCl$_3$ into an oxy-hydrogen torch. The P concentration increased from 2.0 to 2.8 at% on increasing the POCl$_3$/BCl$_3$ flow ratio. The refractive index increased from 1.4584 to 1.4605 on increasing the POC1$_3$/BC1$_3$ flow ratio from 0.6 to 2.6. The refractive index of GeO$_2$-SiO$_2$ films was controlled by the GeCl$_4$ flow rate. The refractive index increased from 1.4615 to 1.4809 on increasing the GeCl$_4$ flow rate from 30 to 120 sccm.

Refractive index control of F-doped SiOC : H thin films by addition fluorine (Fluorine 첨가에 의한 F-doped SiOC : H 박막의 저 굴절률 특성)

  • Yoon, S.G.;Kang, S.M.;Jung, W.S.;Park, W.J.;Yoon, D.H.
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.17 no.2
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    • pp.47-51
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    • 2007
  • F-doped SiOC : H thin films with low refractive index were deposited on Si wafer and glass substrate by plasma enhanced chemical vapor deposition (PECVD) as a function of rf powers, substrate temperatures, gas rates and their composition flow ratios ($SiH_4,\;CF_4$ and $N_2O$). The refractive index of the F-doped SiOC : H film continuously decreased with increasing deposition temperature and rf power. As $N_2O$ gas flow rate decreased, the refractive index of the deposited films decreased down to 1.3778, reaching a minimum value at rf power of 180W and $100^{\circ}C$ without $N_2O$ gas. The fluorine content of F-doped SiOC : H film increased from 1.9 at% to 2.4 at% as the rf power was increased from 60 W to 180 W, which results in the decrease of refractive index.

TSSG-pulling of Sillenite $Bi_{12}TiO_{20}$ for EOS Application

  • Miyazawa, Shintaro
    • Proceedings of the Korea Association of Crystal Growth Conference
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    • 1999.06a
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    • pp.227-250
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    • 1999
  • The reproducibility of successive growth of Bi12TiO20(BTO) single crystals using a top-seeded solution growth (TSSG) pulling method was evaluated by measuring the lattice constants and their standard deviations. A substantial phase diagram in the region close to the stoichiometric BTO was established experimentally for this purpose, and the existence of a retrograde solid solution close to a BTO was clarified. It was emphasize that a starting solution, with a 10.0~10.1 mol% TiO2 concentration, results in large single crystals with a highly homogeneous lattice constant of within $\pm$1x10-4$\AA$, when the solidified fraction of the grown crystal is less than about 45%. A wavelength dispersion of refractive index was measured for the first time, an it was verified that the refractive index of BTO is larger than that of BSO(Bi12TiO20), allowing the voltage sensitivity of EOS higher than the case with BSO as a probe head.

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Relationship of Oral Health Management Behavior to Plaque Index Systems (구강건강관리행위에 따른 치면세균막지수와의 관련성)

  • Lim, Soon-Hwan;Hwang, Ji-Min
    • Journal of dental hygiene science
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    • v.15 no.2
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    • pp.159-165
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    • 2015
  • A self-administered survey was conducted on the dental hygiene students at three different colleges located in Gyeonggi Province and South Chungcheong Province respectively from October, 2013, to the same month of 2014 to grasp their oral health management behavior, differences in plaque index according to plaque index systems and the correlation of the two. And their plaque index was measured. The findings of the study were as follows: 62.8% of the respondents replied they got a dental checkup over the past year, and 84.1% answered they received preventive dental treatment once at least or more. 80.5% replied they used a fluorine-containing dentifrice. 90.9% answered they used the rolling method to brush their teeth, and 50.0% replied it took three minutes to brush their teeth. They got a mean of 27.88 when O'leary index was used among plaque index systems. Their PHP index and PHP-M index were respectively a mean of 1.30 and a mean of 12.12. Their plaque index became lower when they spent more time brushing their teeth, and the toothbrushing time made a statistically significant difference to that (p<0.05). The factor that exerted the largest influence on plaque index was whether to brush teeth for the sake of oral health (B=-9.747, t=-3.752, p<0.001) or not. That made a statistically significant difference to it. The above-mentioned findings illustrated that more patients visited dental clinics than before to receive preventive dental treatment or to get dental checkups, and that toothbrushing time and whether to brush teeth for the sake of oral health or not were identified as the oral health management behaviors to affect plaque index.

A STUDY OF ORAL STATUS OF MENTAL RETARDED CHILDREN (정신(精神) 박약아(薄弱兒)의 구강(口腔) 상태(狀態)에 관(關)한 고찰(考察))

  • Jhee, In-Ae
    • Journal of the korean academy of Pediatric Dentistry
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    • v.8 no.1
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    • pp.77-88
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    • 1981
  • The purpose of this study was to make a comprehensive study & evaluation of the oral status of mental retarded children. The auther examined intraorally 486 (male; 311, female;175) mental retarded children. The result was as follows; (General mental retarded children means the children who live in their parent's home, & orphan mental retarded children means the children who live in orphanage.) 1. The dft rate was 31.6% in general mental retarded children (G.m.r.c.) & 20.7% in orphan mental retarded children (O. m. r. c.). The dft index was 3.73 in G.m.r.c. & 2.15 in O.m.r.c. 2. The DMFT rate was 24.6% in female G.m.r.c., 16.7% in male G.m.r.c., 12.7% in female O.m.r.c., 8.4% in male O.m.r.c. The DMFT index was 4.94 in female G.m.r.c., 4.01 in male G.m.r.c., 1.40 in male O.m.r.c., 2.75 in female O.m.r.c. 3. The malocclusion prevalence was 57.3%. the class I malocclusion was 14.2% Class II malocclusion 19.3%, Class III malocclusion 23.5%. The children with Down's syndrome had 60.0% of class III malocclusion prevalence. 4. The dental calculus index was 1.97 in male O.m.r.c., 1.81 in female O.m.r.c., 1.30 in male G.m.r.e., 1.13 in female G.m.r.c. 5. The dental plaque index was 3.06 in female G.m.r.c., 3.00 in male Gm.r.e. 2.70 in male O.m.r,c., 2.32 in female O.m.r.c.

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Fabrication of High Refractive Index ZrO2 Thin Film by a Layer-by-layer Self-assembly Method (LBL-SA법을 이용한 고굴절률 ZrO2 박막 제조)

  • Choi, Chang-Sik;Lee, Ji-Sun;Lee, Mi-Jai;Lee, Young-Jin;Jeon, Dae-Woo;Ahn, Byoung-Jo;Kim, Jin-Ho
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.30 no.4
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    • pp.199-203
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    • 2017
  • $ZrO_2/PSS$ thin film with a high refractive index was fabricated on a glass substrate by a layer-by-layer self-assembly method. The surface morphology and thickness of the fabricated $ZrO_2/PSS$ thin films were measured as a function of the number of $(ZrO_2/PSS)n$. As the number of $(ZrO_2/PSS)n$ increased from n = 5 to n = 20, RMS roughness decreased from 29.01 nm to 8.368 nm. The $ZrO_2$ thin films exhibited high transmittance of 85% or more; and the 15-bilayer thin film exhibited the highest transmittance among the samples. The transmittance of the fabricated $(ZrO_2/PSS)_{15}$ thin film was ca. 90.8% in the visible range. The refractive index of the glass substrate coated by a $(ZrO_2/PSS)_{15}$ thin film with a thickness of 160 nm increased from ca. 1.52 to 1.74 at the 632 nm wavelength.

Fabrication of Er-doped Sodium Borosilicate Glass Films Using Aerosol Flame Deposition Method (Aerosol Flame Deposition법을 이용한 Er-doped Sodium Borosilicate 유리박막 제작에 관한 연구)

  • 문종하;정형곤;이정우;박강희;박현수;김병훈
    • Journal of the Korean Ceramic Society
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    • v.37 no.2
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    • pp.117-121
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    • 2000
  • Er-doped sodiumborosilicate glass films for waveguides amplifier were fabricated by Aerosol Flame Deposition(AFD) method. Al2O3 was added to sodium borosilicate glass films to suppress the formation of crystalline phase and control the refractive index. the formation of crystalline phase was suppressed above Al2O3 of 6 wt%. As the amount of Al2O3 increased from 2 to 12 wt% the refractive index of glass films increased lineary from 1.4595 up to 1.4710. After the core of 77SiO2-15B2O3-8Na2O+6 wt%Al2O3+8wt%Er2O3 was coated on the buffer layer of 77SiO2-15B2O3-8Na2O+6 wt%Al2O3, the core was etched by reactive ion etching. The absorption spectrum of 3 cm waveguide amplifier showed two peaks of 1530 and 1550 nm.

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Derivation of Approximate Equations for $LiNbO_3$ Electroiptic Effects and Its Error Evaluation ($LiNbO_3$ 전기광학효과의 근사식 도출 및 오차 검토)

  • 김영문;김창민
    • Journal of the Korean Institute of Telematics and Electronics D
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    • v.34D no.10
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    • pp.77-84
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    • 1997
  • The refractive index changes due to the electroptic effect are discussed when external electric fields $E_x, E_y, E_2$ are applied on $LiNbO_3$, a typical anisotropic material. Derived are approximate equations for principal axis' rotations and index changes, results of which are compared with exact results by te computer simulations. In each useful application of $LiNbO_3$substrate, the results of the approximate equations are confirmed to agree with exact solutions.

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A Study on MgF$_2$/CeO$_2$ AR Coating of Mono-Crystalline Silicon Solar Cell (단결정 실리콘 태양전지의 MgF$_2$/CeO$_2$ 반사 방지막에 환한 연구)

  • 유진수;이재형;이준신
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.52 no.10
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    • pp.447-450
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    • 2003
  • This paper presents a process optimization of antireflection (AR) coating on crystalline Si solar cells. Theoretical and experimental investigations were performed on a double-layer AR (DLAR) coating of MgF$_2$/CeO$_2$. We investigated CeO$_2$ films as an AR layer because they have a proper refractive index of 2.46 and demonstrate the same lattice constant as Si substrate. RF sputter grown CeO$_2$ film showed strong dependence on a deposition temperature. The CeO$_2$ deposited at 40$0^{\circ}C$ exhibited a strong (111) preferred orientation and the lowest surface roughness of 6.87 $\AA$. Refractive index of MgF$_2$ film was measured as 1.386 for the most of growth temperature. An optimized DLAR coating showed a reflectance as low as 2.04% in the wavelengths ranged from 0.4${\mu}{\textrm}{m}$ to 1.1${\mu}{\textrm}{m}$. We achieved the efficiencies of solar cells greater than 15% with 3.12% improvement with DLAR coatings. Further details on MgF$_2$, CeO$_2$ films, and cell fabrication parameters are presented in this paper.