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http://dx.doi.org/10.4313/JKEM.2017.30.4.199

Fabrication of High Refractive Index ZrO2 Thin Film by a Layer-by-layer Self-assembly Method  

Choi, Chang-Sik (Optic & Display Materials Center, Korea Institute of Ceramic Engineering and Technology)
Lee, Ji-Sun (Optic & Display Materials Center, Korea Institute of Ceramic Engineering and Technology)
Lee, Mi-Jai (Optic & Display Materials Center, Korea Institute of Ceramic Engineering and Technology)
Lee, Young-Jin (Optic & Display Materials Center, Korea Institute of Ceramic Engineering and Technology)
Jeon, Dae-Woo (Optic & Display Materials Center, Korea Institute of Ceramic Engineering and Technology)
Ahn, Byoung-Jo (HanKyung TEC Co., Ltd.)
Kim, Jin-Ho (Optic & Display Materials Center, Korea Institute of Ceramic Engineering and Technology)
Publication Information
Journal of the Korean Institute of Electrical and Electronic Material Engineers / v.30, no.4, 2017 , pp. 199-203 More about this Journal
Abstract
$ZrO_2/PSS$ thin film with a high refractive index was fabricated on a glass substrate by a layer-by-layer self-assembly method. The surface morphology and thickness of the fabricated $ZrO_2/PSS$ thin films were measured as a function of the number of $(ZrO_2/PSS)n$. As the number of $(ZrO_2/PSS)n$ increased from n = 5 to n = 20, RMS roughness decreased from 29.01 nm to 8.368 nm. The $ZrO_2$ thin films exhibited high transmittance of 85% or more; and the 15-bilayer thin film exhibited the highest transmittance among the samples. The transmittance of the fabricated $(ZrO_2/PSS)_{15}$ thin film was ca. 90.8% in the visible range. The refractive index of the glass substrate coated by a $(ZrO_2/PSS)_{15}$ thin film with a thickness of 160 nm increased from ca. 1.52 to 1.74 at the 632 nm wavelength.
Keywords
Layer-by-layer self-assembly method; High refractive index; Thin film; $ZrO_2$; Transimittance;
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