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http://dx.doi.org/10.4191/KCERS.2003.40.6.589

Refractive Index Control by Dopant for Thick Silica films Deposited by FHD  

김용탁 (성균관대학교 신소재공학과)
서용곤 (전자부품연구원 광부품연구센터)
윤형도 (전자부품연구원 광부품연구센터)
임영민 (전자부품연구원 광부품연구센터)
윤대호 (성균관대학교 신소재공학과)
Publication Information
Abstract
Silica based Planar Lightwave Circuits (PLC) have been applied to various kinds of wave-guided optical passive devices. SiO$_2$ (buffer) and GeO$_2$-SiO$_2$ (core) thick films have been deposited by Flame Hydrolysis Deposition (FHD). The SiO$_2$ films were produced by the flame hydrolysis reaction of halide materials such as SiCl$_4$, POCl$_3$ and BCl$_3$ into an oxy-hydrogen torch. The P concentration increased from 2.0 to 2.8 at% on increasing the POCl$_3$/BCl$_3$ flow ratio. The refractive index increased from 1.4584 to 1.4605 on increasing the POC1$_3$/BC1$_3$ flow ratio from 0.6 to 2.6. The refractive index of GeO$_2$-SiO$_2$ films was controlled by the GeCl$_4$ flow rate. The refractive index increased from 1.4615 to 1.4809 on increasing the GeCl$_4$ flow rate from 30 to 120 sccm.
Keywords
Flame hydrolysis deposition; Consolidation; Silica; PLC;
Citations & Related Records
Times Cited By KSCI : 5  (Citation Analysis)
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