• Communications of the Korean Mathematical Society
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• v.21 no.4
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• pp.739-747
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• 2006

By using O(m+n, 1)/$O(m){\times}O(n,1)-system$, we give an analytic version of Ribaucour transformation for flat m-dimensional submanifolds in $\mathbb{H}^{m+n}$ with flat, non-degenerate normal bundle and free of weak umbilics, where $n{\geq}m-1$.

• Journal of Animal Science and Technology
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• v.55 no.1
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• pp.67-74
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• 2013

To know the emission amount of greenhouse gases from bedding materials of cowshed floor, the emission rates of methane ($CH_4$) and nitrous oxide ($N_2O$) gases from a simulated cowshed floor (SCF) with sawdust that manure loading rate into the bedding material could be accurately controlled were assessed in this study. The manure loading rates of Korean beef and Holstein dairy cattle into the SCF of $0.258m^2$ surface area with 10 to 15 cm height sawdust were $1.586kg/m^2/d$ and $3.588kg/m^2/d$, respectively, and those were calculated on the basis of "Standard model for sustainable livestock" and "Data for excretion amount of manure from livestock". All experiments were done in triplicates in three different seasons (May to July, Sep. to Nov., and Feb. to Apr.) using 12 SCFs. The effects of bedding material thickness on $CH_4$ and $N_2O$ emission from SCFs for both Korean beef cattle and Holstein dairy cattle were not statistically significant (p<0.05). Emission amount of $CH_4$ and $N_2O$ per square meter of SCF for Holstein dairy cattle was 7.5 and 1.2 times higher than that of Korean beef cattle, respectively. The yearly $CH_4$ amount per head was 17.7 times higher in Holstein dairy cattle, obtaining 130.4 g/head/year from SCF for Holstein dairy cattle and 7.4 g/head/year from SCF for Korean beef cattle, and $N_2O$ was also 3.8 times higher in Holstein dairy cattle (3,267 g/head/year in Korean beef cattle and 14,719 g/head/year in Holstein dairy cattle). However, the $N_2O$-N per loaded nitrogen into SCF was higher in Korean beef cattle, having 0.2148 and 0.1632 kg $N_2O$-N/kg N in Korean beef cattle and Holstein dairy cattle, respectively, and those values were 3.07 and 2.33 times higher than that of Intergovernmental Panel on Climate Change (IPCC) 2006 guideline (GL) (0.07 kg $N_2O$-N/kg N).

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.22 no.1
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• pp.22-28
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• 2009

We investigated the sintering and electric properties of ZnO-1.0 at% $TeO_2$ (ZT1) and 1.0 at% Mn-doped ZT1(ZT1M1) system. $TeO_2$ itself melts at $732^{\circ}C$ in air but forms the $ZnTeO_3$ or $Zn_2Te_3O_8$ phase with ZnO as increasing temperature and therefore retards the densification of ZnO to $1000^{\circ}C$. In ZT1M1 system, also, the densification of ZnO was retarded up to $1000^{\circ}C$ and then reached > 90% of theoretical density above $1100^{\circ}C$. It was found that a good varistor characteristics(nonlinear coefficient $a{\sim}60$) were developed in ZT1M1 system sintered at $1100^{\circ}C$ due to Mn which known as improving the nonlinearity of ZnO varistors. The results of C-V characteristics such as barrier height (${\Phi}_b$), donor density ($N_D$), depletion layer (W), and interface state density ($N_t$) in ZT1M1 ceramics were $1.8{\times}10^{17}cm^{-3}$, 1.6 V, 93 nm, and $1.7{\times}10^{12}cm^{-2}$, respectively. Also we measured the resistance and capacitance of grain boundaries with temperature using impedance and electric modulus spectroscopy. It will be discussed about the stability and homogeneity of grain boundaries using distribution parameter ($\alpha$) simulated with the Z(T)"-logf plots.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.16 no.7
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• pp.604-610
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• 2003

The effects of sintering additives such as B $i_2$ $O_3$ and $V_2$ $O_{5}$ on the microwave dielectric and sintering properties of (Z $n_1$$_{-xM}$ $g_{x}$)Ti $O_3$ system were investigated. Highly dense samples were obtained for (Z $n_{0.8}$M $g_{0.2}$)Ti $O_3$ at the sintering temperature range of 870~90$0^{\circ}C$ with B $i_2$ $O_3$ and $V_2$ $O_{5}$ additions of 〈1 wt.%, respectively. The microwave dielectric properties of (Z $n_{0.8}$M $g_{0.2}$)Ti $O_3$ with 0.45 wt.%B $i_2$ $O_3$ and 0.55 wt.% $V_2$ $O_{5}$ sintered at 90$0^{\circ}C$ were as follows : Q$\times$ $f_{o}$ = 50,800 GHz, $\varepsilon$$_{r}$ = 22, and $\tau$$_{f}$ = -53 ppm/$^{\circ}C$. In order to improve temperature coefficient of resonant frequency, Ti $O_2$ was added to the above system. The optimum amount of Ti $O_2$ was 15 moi.% when sintered at 87$0^{\circ}C$, at which we could obtain following results: Q$\times$ $f_{o}$ = 32,800 GHz, $\varepsilon$$_{r}$ = 26, and$\tau$$_{f}$ = 0 ppm/$^{\circ}C$.EX>.EX>.EX>.EX>.EX>.EX>.EX>.

• Journal of the Korean Applied Science and Technology
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• v.32 no.4
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• pp.789-794
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• 2015

In this study, we investigated the stability with respect to the Langmuir-Blodgett(LB) monolayer films of stearic acid and phospholipid(L-${\alpha}$-dimyristoylphosphatidyl choline, DMPC) mixture. LB films of stearic acid and DMPC monolayer were deposited by the LB method on the indium tin oxide(ITO) glass. The electrochemical properties measured by cyclic voltammetry with three-electrode system in $0.05N\;NaClO_4$ solution, -0.3 V initial, 1650 mV switching potential and -1350 mV final potential. As a result, monolayer LB films of stearic acid and phospholipid mixture was appeared on irreversible process caused by the oxidation current from the cyclic voltammogram. Diffusion coefficient (D) of stearic acid and DMPC mixture(molar ratio 1:1, 1:2, 1:3) was calculated $1.4{\times}10^{-3}$, $1.7{\times}10^{-3}$ and $1.6{\times}10^{-3}(cm^2/s)$ in $0.05N\;NaClO_4$ solution, respectively.

• Journal of the Korean Applied Science and Technology
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• v.30 no.1
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• pp.64-70
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• 2013

We investigated an electrochemical properties for Langmuir-Blodgett (LB) monolayer films of sphingomyelin and polyamic acid(1:1 molar ratio) mixture. LB monolayer films of mixture was deposited by the LB method on the indium tin oxide(ITO) glass. The electrochemical properties measured by cyclic voltammetry with three-electrode system in $KClO_4$ solution. The current of reduction and oxidation range was measured from 1650 mV to -1350 mV, continuously. The scan rates were 50, 100, 150, 200 and 250 mV/s, respectively. As a result, LB monolayer films of sphingomyelin and polyamic acid mixture was appeared on irreversible process caused by the reduction current from the cyclic voltammogram. Diffusion coefficient (D) in the sphingomyelin and polyamic acid mixture was calculated $2.67cm^2s^{-1}{\times}10^5$, $5.23cm^2s^{-1}{\times}10^6$ at 0.1 N and 0.2 N $KClO_4$ solutions, respectively.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.13 no.3
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• pp.214-219
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• 2000

In this paper the structural dielectric and piezoelectric properties of Pb［(M $g_{1}$2// $W_{1}$2/)$_{x}$-(N $i_{1}$3//N $b_{2}$3/)$_{0.15-x-(Zr_{0.5})}$ $Ti_{0.5}$)$_{0.85}$］ $O_3$ (x=0.0~0.10) ceramic were investigated with the substitution of Pb(M $g_{1}$2// $W_{1}$2/) $O_3$. According to the substitution of Pb(M $g_{1}$2//W/1/2/) $O_3$ curie temperatures were slightly decrease due to the decrease of the tetrag-onality of crystal structure and coercive fields were decreased. Up to the substitution of Pb(M $g_{1}$2// $W_{1}$2/) $O_3$ 3mol%,remnant polarization dielectric constant piezoelectric constant were increased. Dielectric constant and electro-mechanical coupling factor( $k_{p}$, $k_{31}$ ) were appeared the highest value of 2230, 0.64, and 0.38 and piezoelectric constant( $d_{33}$ , $d_{31}$ ) was the largest value of 418, 202($\times$10$^{-12}$ /C/N), respectively, when the substitution amount of Pb(M $g_{1}$2// $W_{1}$2/N) respectively, when the substitution amount of Pb(M $g_{1}$2// $W_{1}$2/) $O_3$ was 3mol%.s 3mol%.%.

• Journal of the Korean Applied Science and Technology
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• v.31 no.1
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• pp.44-49
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• 2014

We were investigated by cyclic voltammetry to the stability through the electrochemical characteristics of phospholipid(L-${\alpha}$-phosphatidylethanolamine, LAPE) monolayer LB films. LAPE monolayer LB films was deposited by the LB method on the indium tin oxide(ITO) glass. The electrochemical properties was measured by cyclic voltammetry with a three-electrode system in 0.5 N, 1.0 N, 1.5 N and 2.0 N $KClO_4$ solution. The measuring range is continuously oxidized to 1650 mV, with an initial potential of -1350 mV was reduced. Scanning rates of 50, 100, 150, 200, and 250 mV/s was set. As a result, LB monolayer films of LAPE was appeared on irreversible processes by the oxidation current from the cyclic voltammogram. Diffusion coefficient (D) of LAPE was calculated 195, 15.9, 5.75, 1.38 and $0.754cm^2s^{-1}{\times}10^{-9}$ at 0.01 N, 0.05 N, 0.10 N, 0.15 N and 0.20 N $KClO_4$ solutions, respectively.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.22 no.12
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• pp.1028-1032
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• 2009

In this study, the influences of silicon-based gas barrier films fabricated by using a facing target sputtering(FTS) system on the gas permeability for flexible displays have been investigated. Under these optimum conditions on the $SiO_x$ film with oxygen concentration($O_2/Ar+O_2$) of 3.3% and the $SiO_xN_y$ film with nitrogen concentration($N_2/Ar+O_2+N_2$) of 30% deposited by the FTS system, it was found that the films were grown about 4 times higher deposition rate than that of the conventional sputtering system and showed high transmittance about 85% in the visible light range. Particularly, the polyethylene naphthalate(PEN) substrates with the $SiO_x$ and/or $SiO_xN_y$ films showed the enhanced properties of decreased water vapor transmission rate (WVTR) over $10^{-1}\;g/m^2{\cdot}day$ compared with the PEN substrate without any gas barrier films, which was due to high packing density in the Si-based films with high plasma density by FTS process and/or the denser chemical structure of Si-N bond in the $SiO_xN_y$ film.

• Journal of the Korean Vacuum Society
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• v.20 no.5
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• pp.339-344
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• 2011

The Ohmic contact of Ti/Au metals on n-type ZnO thin film deposited on c-plane sapphire substrates by pulsed laser deposition was investigated by TLM (transfer length method) patterns. The Ti/Au metal films with thickness of 35 nm and 90 nm were deposited by electron-beam evaporator and thermal evaporator, respectively. By using the photo-lithography method, the $100{\times}100{\mu}m^2$ TLM patterns with $6{\sim}61{\mu}m$ gaps were formed. To improve the electrical properties as well as to decrease an interface states and stress between metal and semiconductor, the post-annelaing process was done in oxygen ambient by rapid thermal annealing system at temperature of $100{\sim}500^{\circ}C$ for 1 min. In this study, it appeared that the minimum specific contact resistivity shows about $1.1{\times}10^{-4}{\Omega}{\cdot}cm^2$ in $300^{\circ}C$ annealed sample, which may be originated from formation of oxygen vacancies of ZnO during an oxidation of Ti metal at the interface of Ohmic contacts.