• Title/Summary/Keyword: Non-volatile

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Non volatile memory device using mobile proton in gate insulator by hydrogen neutral beam treatment

  • Yun, Jang-Won;Jang, Jin-Nyeong;Hong, Mun-Pyo
    • Proceedings of the Korean Vacuum Society Conference
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    • 2015.08a
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    • pp.192.1-192.1
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    • 2015
  • We demonstrated the nonvolatile memory functionality of nano-crystalline silicon (nc-Si) and InGaZnOxide (IGZO) thin film transistors (TFTs) using mobile protons that are generated by very short time hydrogen neutral beam (H-NB) treatment in gate insulator (SiO2). The whole memory fabrication process kept under $50^{\circ}C$ (except SiO2 deposition process; $300^{\circ}C$). These devices exhibited reproducible hysteresis, reversible switching, and nonvolatile memory behaviors in comparison with those of the conventional FET devices. We also executed hydrogen treatment in order to figure out the difference of mobile proton generation between PECVD and H-NB CVD that we modified. Our study will further provide a vision of creating memory functionality and incorporating proton-based storage elements onto a probability of next generation flexible memorable electronics such as low power consumption flexible display panel.

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A Status Report on the Implementation of a Flash File System that Exploits Non-Volatile RAM (차세대 비휘발성 메모리를 활용한 플래시 파일 시스템 연구)

  • Park Se Eun;Choi Jongmoo;Lee Donghee;Noh Sam H.
    • Proceedings of the Korean Information Science Society Conference
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    • 2005.07a
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    • pp.844-846
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    • 2005
  • 차세대 비휘발성 메모리(Non-Volatile RAM, 이후 NVRAM)의 사용이 현실화 되면서 이를 활용한 저장 장치의 성능 개선 연구가 활발히 진행되고 있다. 본 논문에서는 NVRAM을 이용한 플래시 파일 시스템의 성능 향상 방법을 제안한다. 우선 자주 갱신 되는 정보를 NVRAM에 유지시켜 플래시 메모리의 덮어쓰기(overwrite)로 인한 성능 저하 문제를 개선한다. 또한 NVRAM에 파일시스템의 메타 정보 위치를 유지하여 파일 시스템을 마운트할 때 요구되는 플래시 메모리의 탐색 공간을 줄인다. 실험 결과 마운팅 시간이 줄고 플래시 메모리의 접근 횟수가 감소함을 확인하였다.

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Effect of channel size on characteristics of Non-volatile SNOSFET Memories (채널크기가 비휘발성 SNOSFET 기억소자의 동작특성에 미치는 효과)

  • 이홍철;조성두;이상배;서광열
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1991.10a
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    • pp.29-32
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    • 1991
  • Non-volatile SNOSFET memory devices using CMOS 1Mbit design rule(1.2$\mu\textrm{m}$), whose channel width and length are 15${\times}$1.5$\mu\textrm{m}$, 15${\times}$1.5$\mu\textrm{m}$, 2.0${\times}$15$\mu\textrm{m}$ and length are 15${\times}$1.7$\mu\textrm{m}$, respectivley, were fabricated. And the transfer, Id-Vd and switching characteristics of the devices were investigated. As a result, the 15${\times}$1.5$\mu\textrm{m}$ device was good in the transfer characteristics and the switching characteristics were favourable, which had $\Delta$V$\sub$TH/=6.3V by appling pulse voltage of V$\sub$w/=+34V, Tw=50msec.

The Electrical and Thermal Properties of Phase Change Memory Cell with Bottom Electrode (하부전극에 따른 상변화 메모리 셀의 전기 및 발열 특성)

  • Jang, Nak-Won;Kim, Hong-Seung;Lee, June-Key;Kim, Do-Heyoung;Mah, Suk-Bum
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.11a
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    • pp.103-104
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    • 2006
  • PRAM (Phase change Random Access Memory) is one of the most promising candidates for next generation Non-volatile Memories. The Phase change material has been researched in the field of optical data storage media. However, the characteristics required in solid state memory are quite different from optical ones. In this study, the reset current and temperature profile of PRAM cells with bottom electrode were calculated by the numerical method.

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Electrical Characteristics of Staggered Capacitor ($Si_3N_4$ / HfAlO) for High Performance of Non-volatile Memory

  • Lee, Se-Won;Cho, Won-Ju
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2010.06a
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    • pp.358-358
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    • 2010
  • To improve the programming/erasing speed and leakage current of multiple dielectric stack tunnel barrier engineering (TBE) Non-volatile memory, We propose a new concept called staggered structure of TBE memory. In this study, We fabricated staggered structure capacitor on $Si_3N_4$ stacked HfAlO and measured C-V curve that can observe tunneling characteristic of this device as various annealing temperature compared with that of single layer $SiO_2$ capacitor.

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Charge trap characteristics with $Si_3N_4$ tmp layer thickness ($Si_3N_4$ trap layer의 두께에 따른 charge trap 특성)

  • Jung, Myung-Ho;Kim, Kwan-Su;Park, Goon-Ho;Kim, Min-Soo;Jung, Jong-Wan;Jung, Hong-Bae;Cho, Won-Ju
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.11a
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    • pp.124-125
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    • 2008
  • The charge trapping and tunnelling characteristics with various thickness of $Si_3N_4$ layer were investigated for application of TBE (Tunnel Barrier Engineered) non-volatile memory. We confirmed that the critical thickness of no charge trapping was existed with decreasing $Si_3N_4$ thickness. Also, the charge trap centroid x and charge trap density were extracted by using CCS (Constant Current Stress) method. Through the optimized thickness of $Si_3N_4$ layer, it can be improve the performance of non-volatile memory.

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Hepatic Drug Metabolism Modifier from Arils of Myristica fragrans

  • Shin, Kuk-Hyun;Woo, Won-Sick
    • Korean Journal of Pharmacognosy
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    • v.17 no.1
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    • pp.91-99
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    • 1986
  • The single treatment of mice with steam distillate, non-volatile ether extract and methanol extract from mace (Arils of Myristica fragrans) caused a significant prolongation of hexobarbital-induced narcosis and increase in strychnine toxicity as well as a significant decrease in hepatic microsomal drug metabolizing enzyme activities. On 7 consecutive daily administrations, however, the duration of hypnosis was markedly shortened and significant increases in the hepatic enzyme activities were shown. With systematic fractionation by $SiO_2$ column chromatography of non-volatile ether fraction monitoring by animal tests a new lignan (mp $70{\sim}72^{\circ}$, MW 328, $[{\alpha}]^{20}_D+5.28$) was isolated as an active principle and its structure was elucidated as (2R, 3S)-1-(3,4-methylendioxyphenyl)-2,3 dimethyl-4-(4-hydroxy-3-methoxyphenyl) butane.

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Chemical Changes during the Storage of Sweet potatoes Crushed and Sealed up with Polyethylene Film (파쇄(破碎)고구마의 밀봉저장중(密封貯藏中) 화학성분(化學成分)의 변화(變化))

  • Kim, Seung Kyeom;Kim, Seong Yeol
    • Korean Journal of Agricultural Science
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    • v.11 no.1
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    • pp.45-52
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    • 1984
  • Changes of chemical componts and populations of total bacteria and lactic acid bacteria were examined during a month-long storage of sweet potatoes crushed and sealed up with polyethylene film at $7-8^{\circ}C$. 1. Changes of starch, total protein, volatile acid and ammonia-nitrogen contents were li 2. In a three days, pH down and increase of non-volatile acid content were notable, populations of total bacteria and lactic acid bacteria were maximum. 3. Vitamic C and soluble sugar contents tended to be reduced during the storage and the leftover were 75-85% and 41-45% respectively. 4. ${\beta}$-Amylase activity decreased gradually and vanished 15-30days. 5. Variations of chemical compontents of the samples inoculated lactic acid bacteria were larger than non- treated to some extent. 6. As above results, mainly homo lactic acid fermentation was done in this storage condition.

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?Color STN (CSTN) LCD Driver Integrated Circuit with Sense Amplifier of Non-Volatile Memory

  • Shin, Chang-Hee;Cho, Ki-Seok;Lee, Yong-Sup;Lee, Jae-Hoon;Sohn, Ki-Sung;Kwon, Oh-Kyong
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.6 no.2
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    • pp.87-89
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    • 2006
  • This paper proposes a sense amplifier with non-volatile memory in order to improve the image quality of LCD by enhancing the matching of the driving voltages between the panel and driver. The sense amplifier having a wide sensing margin and fast response adjusts LCD driver voltage of display driver. The CSTN-LCD with the sense amplifier results improved image quality than that with conventional 6 bit column driver without it.

Formation of Nano-crystal using Si-rich thin film for Non Volatile Memory Device Application (비휘발성 메모리 소자 응용을 위한 Si-rich 박막을 사용한 Nano-crystal 형성)

  • Jang, Kyung-Soo;Jung, Sung-Wook;Kim, Hyun-Min;Hwang, Hyung-Sun;Choi, Seok-Ho;Yi, Jun-Sin
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.11a
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    • pp.128-129
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    • 2005
  • In this research, non-volatile memory effects and nano-crystal creation have been investigated in SiNx containing Si nano-crystals (Si-nc) produced by ICP-CVD and rapid thermal annealing. The quantum dots were created during rapid thermal annealing of Si-rich SiNx thin films. The quantum dot creation was analyzed with photoluminescence spectra, and in case of Si-rich SiNx, it is conformed that the quantum dots are formed easily at 750$\sim$800nm wavelength.

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