• Title/Summary/Keyword: Nitrogen oxide

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Properties of the oxynitride films formed by thermal oxidation in $N_2O$ ($N_2O$ 가스에서 열산화에 의해 형성된 oxynitride막의 특성)

  • Bae, Sung-Sig;Lee, Cheol-In;Choi, Hyun-Sik;Seo, Yong-Jin;Kim, Tae-Hyung;Kim, Chang-Il;Chang, Eui-Goo
    • Proceedings of the KIEE Conference
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    • 1993.07b
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    • pp.1295-1297
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    • 1993
  • Properties of oxynitride films oxidized by $N_2O$ gas after thermal oxidation and $N_2O$ oxide films directly oxidized using $N_2O$ gas on the bare silicon wafer have been studied. Through the AES analysis, Nitrogen pile-up at the interface of Si/oxynitride and Si/$N_2O$ oxide has observed. Also, it could be presumed that there are differences in the mechanism of the growth of film by observing film growth. $N_2O$ oxide and oxynitride films have the self-limited characteristics. Therefore, it will be possible to obtain ultra-thin films. Nitrogen pile-up at the interfaces Si/oxynitride and Si/$N_2O$ oxide strengthens film structure and improves dielectric reliability. Although fixed charge densities and interface trap densities of $N_2O$ oxide and oxynitride films has somewhat higher than those of thermal $SiO_2,\;N_2O$ oxide and oxynitride films showed improved I-V characteristics and constant current stress.

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Interface Traps Analysis as Bonding of The Silicon/Nitrogen/Hydrogen in MONOS Capacitors (실리콘/수소/질소의 결합에 따른 MONOS 커패시터의 계면 특성 연구)

  • Kim, Hee-Dong;An, Ho-Myoung;Seo, Yu-Jeong;Zhang, Yong-Jie;Nam, Ki-Hyun;Chung, Hong-Bay;Kim, Tae-Geun
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.46 no.12
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    • pp.18-23
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    • 2009
  • The effect of hydrogen-nitrogen annealing on the interface trap properties of Metal-Oxide-Nitride-Oxide-Silicon (MONOS) capacitors is investigated by analyzing the capacitors' gate leakage current and the interface trap density between the Si and $SiO_2$ layer. MONOS samples annealed at $850^{\circ}C$ for 30 s by rapid thermal annealing (RTA) are treated by additional annealing in a furnace, using annealing eases $N_2$ and 2% hydrogen and 98% nitrogen gas mixture $(N_2-H_2)$ at $450^{\circ}C$ for 30 mins. Among the three samples as-deposited, annealed in $N_2$ and $N_2-H_2$, MONOS sample annealed in an $N_2-H_2$ environment is found to have the lowest increase of interface-trap density from the capacitance-voltage experiments. The leakage current of sample annealed in $N_2-H_2$ is also lower than that of sample annealed in $N_2$.

R&D Status of NOx and Flue-gas Treatment Technologies in KIER (KIER의 NOx 및 연소배가스 처리기술 개발현황)

  • Min, Byoung-Moo;Choi, Sang-Il
    • 한국연소학회:학술대회논문집
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    • 2003.05a
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    • pp.295-300
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    • 2003
  • In Korea, the emission standards for air pollutants will be more tighten from Jan. 2005. Especially, the new emission standards is focused on the nitrogen oxide. From this trend of standards, nitrogen oxide emission is hot issue in energy fields. Also, we have a new environmental problem, the carbon dioxide emission, which are related to the global warming. To solve the environmental problems, we must define the situation of clean-up technologies level in Korea and decide the direction of R&D for flue gas cleaning technologies. Now, this paper discus briefly on the De-NOx R&D activities and the large scale testing facility for flue gas clean-up technologies in Korea Institute of Energy Research. These discussions are contribute to the increasing of the R&D activities for flue gas clean-up technologies in Korea.

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Study of Characteristics of Hot Dip Galvanized Steel Strip by Oxygen-free Finishing (비산화성 분위기에 의한 용융아연도금의 특성 연구)

  • 진영구;김흥윤
    • Journal of the Korean institute of surface engineering
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    • v.28 no.5
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    • pp.300-308
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    • 1995
  • The effect of nitrogen finishing for the control of coating weight in a nitrogen sealing box on the coating surface property in hot dip galvanizing process has been studied. The coated surface is free of oxide marks and edge overcoated. The coating uniformity is excellent ; the standard deviation of the coating thickness along width of the specimen was $1~1.2\mu\textrm{m}$ in the box whereas $2.5~3\mu\textrm{m}$ in the air. Considering surface quality of the coating such as oxide mark, edge overcoated and zinc dust, the oxygen content between 40 and 200 ppm was suggested in the box in addition the oxygen content of at least 40 ppm or the minimum dew point of $-27^{\circ}C$ is required to prevent a zinc vaporization.

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An Experimental Study on Scaling of Nitrogen Oxide emissions of H2/CO Non-premixed Turbulent Jet Flame with Coaxial Air (동축공기가 있는 H2/CO 비예혼합 난류 제트화염의 질소산화물 배출 상사식에 대한 실험적 연구)

  • Sohn, Kitae;Hwang, Jeongjae;Bouvet, Nicolas;Yoon, Youngbin
    • 한국연소학회:학술대회논문집
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    • 2012.04a
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    • pp.259-261
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    • 2012
  • The effect of fuel composition and coaxial air on the nitrogen oxide emission index was studied in a non-premixed turbulent jet flame. Validity of experimental setup and methodology is checked. The NOx emission trend is similar with previous works in hydrogen flame, but it's not well in $H_2/CO$ flame. Normalized EINOx scaling with modified $S_G$ applying near-field concept was conducted. Experimental data don't collapse single correlation curve, but partially same trend is observed in all cases.

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The Effect of Stabilizer(DPA, $CaCO_3$) Addition on the Shelf Life of the Single Base Propellant (단기추진제 저장수명에 미치는 안정제(DPA, $CaCO_3$) 첨가의 효과)

  • 윤근식;고석일;유승곤
    • Journal of the Korea Institute of Military Science and Technology
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    • v.6 no.2
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    • pp.9-19
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    • 2003
  • Nitrogen oxide gases which were produced by spontaneous reaction of nitrocellulose(NC) in the single base propellant accelerate the decomposition of propellant, and result in the reduction of shelf life. The amount of nitrogen oxide was reduced by the addition of 0.3wt% $CaCO_3$ to conventional stabilizer(DPA) and down of the solvent leaching temperature from $64^{\circ}C$ to $56^{\circ}C$, which extended the shelf life of the single base propellant as much as twice compare with commercial propellant. The perforation diameter increase of propellant from 0.64mm to 0.77mm could compensate for the drop of burning rate which was caused the addition of $CaCO_3$.

Removal Effect of Nitrogen Oxide Using Magnetic Field (자계를 이용한 질소산화물의 제거 효과)

  • Lee, H.S.;Park, J.Y.;Park, S.H.;Lee, D.H.
    • Proceedings of the KIEE Conference
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    • 2002.06a
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    • pp.64-66
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    • 2002
  • This study is to develop electromagnetic plasma reactors for indoor air purification, Removal effect of nitrogen oxide using magnetic field are investigated. And AC or DC high voltage is applied for corona discharge, flow rates are 150${\sim}$1500${\ell}$/min and NO initial concentration is about 10 ppm. In the results, NOx removal rate by AC power is about 10 % higher than that by DC power under the experimental condition of 700 ${\ell}$/min, 5 magnets. When magnet is applied to the reactor, NOx removal rate increased.

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Effect of Ultra-high Injection Pressure on Combustion and Emission Characteristics in a Single-cylinder Diesel Engine (초고압 분사 압력 적용에 따른 단기통 디젤 엔진에서의 연소 및 배기 특성에 관한 연구)

  • Cho, Wonkyu;Kang, Seungwoo;Bae, Choongsik;Kim, Youngho
    • 한국연소학회:학술대회논문집
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    • 2015.12a
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    • pp.41-44
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    • 2015
  • Experimental study was conducted to investigate the effect of ultra-high injection pressure on combustion and emission characteristics in a single-cylinder diesel engine. Electronically controlled ultra-high pressure fuel injection system consistently supplied the fuel of ultra-high pressure up to 250 MPa. Various injection pressures, 40 to 250 MPa, were applied and compared. A injector with eight identical nozzle holes which have diameter of $105{\mu}m$ was used. The results showed high potential to improve the nitrogen oxide (NOx) and particulate matter (PM) trade-off relationship with an ultra-high injection pressure and the exhaust gas recirculation (EGR).

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Effects of Oxide Layer Formed on TiN Coated Silicon Wafer on the Friction and Wear Characteristics in Sliding (미끄럼운동 시 TiN 코팅에 형성되는 산화막이 마찰 및 마멸 특성에 미치는 영향)

  • 조정우;이영제
    • Tribology and Lubricants
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    • v.18 no.4
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    • pp.260-266
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    • 2002
  • In this study, the effects of oxide layer farmed on the wear tracks of TiN coated silicon wafer on friction and wear characteristics were investigated. Silicon wafer was used for the substrate of coated disk specimens, which were prepared by depositing TiN coating with 1 ${\mu}{\textrm}{m}$ in coating thickness. AISI 52100 steel ball was used fur the counterpart. The tests were performed both in air for forming oxide layer on the wear track and in nitrogen to avoid oxidation. This paper reports characterization of the oxide layer effects on friction and wear characteristics using X-ray diffraction(XRD), Auger electron spectroscopy(AES), scanning electron microscopy (SEM) and multi-mode atomic force microscope(AFM).

Effects of oxide layer formed on TiN coated silicon wafer on the friction characteristics

  • Cho, C.W.;Lee, Y.Z.
    • Proceedings of the Korean Society of Tribologists and Lubrication Engineers Conference
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    • 2002.10b
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    • pp.167-168
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    • 2002
  • In this study, the effects of oxide layer formed on the wear tracks of TiN coated silicon wafer on friction characteristics were investigated. Silicon wafer was used for the substrate of coated disk specimens, which were prepared by depositing TiN coating with $1\;{\mu}m$ in coating thickness. AISI 52100 steel balls were used for the counterpart. The tests were performed both in air for forming oxide layer on the wear track and in nitrogen to avoid oxidation. This paper reports characterization of the oxide layer effects on friction characteristics using X-ray diffraction (XRD). scanning electron microscopy (SEM) and friction force microscope (FFM).

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