• 제목/요약/키워드: Nitrogen deposition

검색결과 385건 처리시간 0.024초

고내식성의 신 마그네슘 코팅막 제작 (Preparation of New Corrosive Resistive Magnesium Coating Films)

  • 이명훈
    • Journal of Advanced Marine Engineering and Technology
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    • 제20권5호
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    • pp.103-113
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    • 1996
  • The properties of the deposited film depend on the deposition condition and these, in turn depend critically on the morphology and crystal orientation of the films. Therefore, it is important to clarify the nucleation occurrence and growth stage of the morphology and orientation of the film affected by deposition parameters, e.g. the gas pressure and bias voltage etc. In this work, magnesium thin flims were prepared on cold-rolled steel substrates by a thermo-eletron activation ion plating technique. The influence of nitrogen gas pressure and substrate bias voltage on their crystal orientation and morphology of the coated films were investigated by scanning electron microscopy (SEM) and X-ray diffraction, respectively. The diffraction peaks of magnesium film became less sharp and broadened with the increase of nitrogen gas pressure. With an increase in nitrogen gas pressure, flim morphology changed from colum nar to granular structure, and surface crystal grain-size decreased. The morphology of films depended not only on gas pressure but also on bias voltage, i.e., the effect of increasing bias voltage was similar to that of decreasing gas pressure. The effect of crystal orientation and morphology of magnesium films on corrosion behaviors was estimated by measuring anodic polarization curves in deaerated 3%NaCl solution. Magnesium, in general, has not a good corrosion resistance in all environments. However, these magnesium films prepared by changing nitrogen gas pressure showed good corrosion resistance. Among the films, magnesium films which exhibited granular structure had the highest corrosion resistance. The above phenomena can be explained by applying the effects of adsorption, occlusion and ion sputter of nitrogen gas.

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미세공 조절에 의한 탄소제립물의 분자체 효과 (Effect of Molecular Sieve of Carbon Granules by Controlling Micropores)

  • 김태환;이재훈;김권일;김종휘;성재석
    • 공업화학
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    • 제9권6호
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    • pp.798-802
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    • 1998
  • 탄소제립물은 야자각 분말을 coal tar 용액과 혼합시켜 성형한 후, 이를 여러 가지 온도에서 탄화시켜 제조하였다. 탄소제립물의 미세공 조절을 위하여 질소분위기에서 벤젠 증착시간을 변화시켰다. 여러 가지 시료에 대해서 SEM을 이용하여 얻은 Morphology와 진밀도를 비교하였고 Cahn D-200장치를 이용한 산소 및 질소의 흡착속도를 측정하여 가스의 확산계수, 분리계수 및 흡착평형량을 얻었다. 흡착특성 결과의 분석을 통해 분자체 제조에 적합한 탄화온도와 변형시간은 각각 $800^{\circ}C$와 10분이며, 이때 산소와 질소의 분리계수는 26.4임을 알 수 있었다.

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이온빔 보조 증착법을 이용한 STS 316L 박막 합성에 관한 연구 (A Study on the Fabrication of STS 316L Films by Ion Beam Deposition with Ion Source)

  • 이준희;송요승;이건환;이구현;이득용;윤종구
    • 한국재료학회지
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    • 제13권9호
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    • pp.587-592
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    • 2003
  • The thin films of 316L stainless steel were made on glass and S45C substrate by Ion beam assisted deposition with reactive atmosphere of argon and nitrogen. The films were deposited at the various conditions of ion beam power and the ratios of Ar/$N_2$gas. Properties of these films were analyzed by glancing x-ray diffraction method(GXRD), AES, potentiodynamic test, and salt spray test. The results of GXRD showed that austenite phase could be appeared by $N_2$ion beam treatment and the amount of austenite phase increased with the amount of nitrogen gas. The films without plasma ion source treatment had the weak diffraction peak of ferrite phase. But under the Ar plasma ion beam treatment, the strong diffraction peaks of ferrite phase were appeared and the grain size was increased from 12 to 16 nm. Potentiodynamic polarization test and salt spray test indicated that the corrosion properties of the STS 316L films with nitrogen ion source treatment were better than bulk STS 316L steel and STS 316L films with Ar ion source treatment.

펄스레이저 증착법의 레이저 파장변환에 의한 실리콘 나노결정의 발광 특성 연구 (Study on the Luminescence of Si Nanocrystallites on Si Substrate fabricated by Changing the Wavelength of Pulsed Laser Deposition)

  • 김종훈;전경아;최진백;이상렬
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제52권4호
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    • pp.169-172
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    • 2003
  • Silicon nanocrystalline thin films on p-type (100) silicon substrate have been fabricated by pulsed laser deposition technique using a Nd:YAG laser with the wavelength of 355, 532, and 1064 nm. The base vacuum in the chamber was down to $10^-6$ Torr and the laser energy densities were 1.0~3.0 J/$\textrm{cm}^2$ After deposition, silicon nanocrystalline thin films have been annealed at nitrogen gas. Strong Blue and green luminescence from silicon nanocrystalline thin films have been observed at room temperature by photoluminescence and its peak energies shift to green when the wavelength is increased from 355 to 1064 nm.

펄스 레이저 증착법을 이용한 실리콘 박막의 어닐링 온도 변화에 따른 발광 특성연구 (Effect of Annealing Temperature on the Luminescence of Si Nanocrystallites Thin Flms Fabricated by Pulsed Laser Deposilion)

  • 김종훈;전경아;이상렬
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2001년도 하계학술대회 논문집
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    • pp.127-130
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    • 2001
  • Si thin films on p-type (100) Si substrate have been fabricated by pulsed laser deposition technique using a Nd:YAG laser. The pressure of the environmental gas during deposition was 1 Torr. After deposition, Si thin film has been annealed again at 400-840$^{\circ}C$ in nitrogen ambient. Strong blue photoluminescence (PL) have been observed at room temperature. We report the PL properties of Si thin films depending on the variation of the annealing temperature.

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스퍼터링 증착변수에 따른 SKD 61강 기판상 TiN 박막의 증착거동 변화 (Effects of sputtering conditions on the growth behavior of TiN thin films on SKD 61 steel substrates)

  • 김상섭;임태홍;박용범
    • 한국진공학회지
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    • 제7권4호
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    • pp.314-319
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    • 1998
  • 반응성 스퍼터링 방법을 사용해서 SKD 61강 기판상에 TiN박막을 제조하였으며, 다 양한 증착조건의 변수에 따른 박막의 증착거동 및 제조된 박막의 물성을 평가하였다. 챔버 내의 가스압력 및 RF인가전압이 높을수록 증착속도는 급격하게 증가하였다. 반면에 혼합가 스의 질소함량이 높을수록 증착속도는 감소하였으며, 박막의 표면에 hillock이 발생하였다. 대표적인 증착조건으로 제조된 TiN박막의 경우(111) 우선배향성을 보였으며, 비교적 순수한 TiN의 화학양론비를 충족하는 박막임을 알 수 있었다.

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Pulsed Laser Deposition 방법으로 증착된 ZnSnO3 압전 박막의 성장과 특성 평가 (Fabrication and Properties of ZnSnO3 Piezoelectric Films Deposited by a Pulsed Laser Deposition)

  • 박병주;윤순길
    • 한국전기전자재료학회논문지
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    • 제27권1호
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    • pp.18-21
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    • 2014
  • Because the Pb-based piezoelectric materials showed problems such as an environmental pollution. lead-free $O_3$ materials were studied in the present study. The $O_3$ thin films were deposited at $640^{\circ}C$ on $Pt/Ti/SiO_2$ substrate by pulsed laser deposition (PLD) and were annealed for 5 min at $750^{\circ}C$ using rapid thermal annealing (RTA) in nitrogen atmosphere. Samples annealed at $750^{\circ}C$ showed a smooth morphology and an improvement of the dielectric and leakage properties, as compared with as-grown samples. However, electrical properties of the $O_3$ thin films obtained in the present study should be improved for piezoelectric applications.

펄스레이저 증착법의 레이저 파장변환에 의한 실리콘 나노결정의 발광특성 연구 (Study on the Luminescence of Si Nanocrystallites on Si Substrate Fabricated by Changing the Wavelength of Pulsed laser deposition)

  • 김종훈;배상혁;이상렬
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2000년도 추계학술대회 논문집 학회본부 C
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    • pp.411-412
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    • 2000
  • Si nanocrstallites on p-tyre (100) Si substrate have been fabricated by pulsed laser deposition technique using a Nd:YAG laser with the wavelength of 355, 532 and 1064 nm. The base vacuum in the chamber was down to $10^{-5}$ Torr and the pressure of the gas during deposition was varied from 1 to 3 Torr. After deposition, Si nanocrystallites have been annealed at $N_2$ gas. Nitrogen have been used as ambient gases. Strong blue and green luminescence from Si nanocrystallites has been observed in room temperature by photoluminescence and its peak energies shift to green when the wavelength is increased from 355-1064 nm

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