• Title/Summary/Keyword: Nitrogen deposition

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Stability enhancement of armorphous znic oxide thin film transistors fabricated by pulsed laser deposition with DBD (PLD-DBD 공정으로 제작된 비정질 Zn 산화물 박막트랜지스터의 안정성 향상)

  • Chun, Yoon-Soo;Chong, Eu-Gene;Jo, Kyoung-Chol;Kim, Seung-Han;Jung, Da-Woon;Lee, Sang-Yeol
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2010.06a
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    • pp.391-391
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    • 2010
  • The stability enhancement of Znic oxide thin film transistor deposited by PLD-DBD has been reported here using the bias temperature stress test. Znic oxide (ZnO) thin films were deposited on $SiO_2$/Si (100) by pulsed laser deposition method with and without dielectric barrier discharge (DBD) method. The DBD is the efficient method to adopt the nitrogen ions into the thin films. The TFT characteristics of ZnO TFTs with and without Nirogen (N) doping show similar results with $I_{on/off}$ of $10^5{\sim}10^6$. However. the bias temperature stress (BTS) test of N-doped ZnO TFT with DBD shows higher stability than that of ZnO TFT.

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Liquid Crystal orientation on the NDLC Thin Film Deposited using physical deposition method (PVD방식을 이용한 NDLC 박막에서의 액정 배향 효과)

  • Lee, Won-Kyu;Oh, Byoung-Yun;Lim, Ji-Hun;Na, Hyun-Jae;Lee, Kang-Min;Park, Hong-Gyu;Seo, Dae-Shik
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.11a
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    • pp.301-301
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    • 2008
  • Ion beam (IB)-induced alignment of inorganic materials has been investigated intensively as it provides controllability in a nonstop process for producing high-resolution displays[1][2]. LC orientation via ion-beam (IB) irradiation on the nitrogen doped diamond like carbon (NDLC) thin film deposited by physical deposition method-sputtering was embodied. The NDLC thin film that was deposited by sputter showed uniform LC alignment at the 1200eV of the ion beam intensity. The pretilt angle of LC on NDLC thin films was measured with various IB exposure time and angle. The maximum pretilt angle were showed with IB irradiation angle of $45^{\circ}$ and exposure time of 62.5 sec, respectively. To show NDLC thin film stability in high temperature, thermal stability test was proceeded. The uppermost of the thermal stability of NDLC thin film was $200^{\circ}C$. In this investigation, the electro-optical (EO) characteristics of LC on NDLC thin film were measured.

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Residence s Exposure to Nitrogen Dioxide and Indoor Air Characteristics (거주지역 실내공기 특성 및 이산화질소 노출에 관한 연구)

  • 양원호;배현주;정문호
    • Journal of Environmental Health Sciences
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    • v.28 no.2
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    • pp.183-192
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    • 2002
  • Indoor air quality is affected by source strength of pollutants, ventilation rate, decay rate, outdoor level and so on. Although technologies exist to measure these factors directly, direct measurements of all factors are impractical in most field studies. The purpose of this study was to develop an alternative methods to estimate these factors by multiple measurements. Daily indoor and outdoor NO$_2$concentrations for 21 days in 20 houses in summer and winter, Seoul. Using a mass balance model and linear regression analysis, penetration factor (ventilation divided by sum of air exchange rate and deposition constant) and source strength factor(emission rate divided by sum of air exchange rate and deposition constant) were calculated. Subsequently, the ventilation and source strength were estimated. During sampling period, geometric mean of natural ventilation was estimated to be 1.10$\pm$1.53 ACH, assuming a residential NO$_2$decay rate of 0.8 hr$^{-1}$ in summer. In winter, natural ventilation was 0.75$\pm$1.31 ACH. And mean source strengths in summer and winter were 14.8ppb/hr and 22.4ppb/hr, respectively. Although the method showed similar finding previous studies, the study did not measure ACH or the source strength of the house directly. As validation of natural ventilations, infiltrations were measured with $CO_2$tracer gas in 18 houses. Relationship between ventilation and infiltration was statistically correlated (Pearson r=0.63, p=0.02).

Enhancement in electrical and optical properties of ITO thin films grown by 2-step process at room temperature (2-step 공정법에 의해 상온 증착된 ITO박막의 전기 광학적 특성 향상)

  • Kim, Jong-Hoon;Ahn, Byung-Du;Jeon, Kyung-Ah;Kang, Hong-Seong;Lee, Sang-Yeol
    • Proceedings of the KIEE Conference
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    • 2005.11a
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    • pp.6-8
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    • 2005
  • The optical and electrical properties of indium tin oxide (ITO) thin films deposited at room temperature can be substantially enhanced by adopting a two-step process. In the first step, the films (50 nm thick) were grown by pulsed laser deposition (PLD) on glass substrate at room temperature and quickly annealed at $400^{\circ}C$ in nitrogen ambient for 1 minute by using rapid thermal annealing method. The process was completed by additional deposition (150 nm thick) on annealed film at room temperature. High quality ITO films grown by two-step process at room temperature could be obtained with the resistivity of $3.02{\times}10^{-4}{\Omega}cm$, the carrier mobility of 32.07 $cm^2/Vs$, and the transparency above 90 % in visible region mainly due to the enhancement of the film crystallinity and the increase of grain size.

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Leakage Current and Threshold Voltage Characteristics of a-Si:H TFT Depending on Process Conditions (a-Si:H TFT의 누설전류 및 문턱전압 특성 연구)

  • Yang, Kee-Jeong;Yoon, Do-Young
    • Korean Chemical Engineering Research
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    • v.48 no.6
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    • pp.737-740
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    • 2010
  • High leakage current and threshold voltage shift(${\Delta}Vth$) are demerits of a-Si:H TFT. These characteristics are influenced by gate insulator and active layer film quality, surface roughness, and process conditions. The purpose of this investigation is to improve off current($I_{off}$) and ${\Delta}V_{th}$ characteristics. Nitrogen-rich deposition condition was applied to gate insulator, and hydrogen-rich deposition condition was applied to active layer to reduce electron trap site and improve film density. $I_{off}$ improved from 1.01 pA to 0.18 pA at $65^{\circ}C$, and ${\Delta}V_{th}$ improved from -1.89 V to 1.22 V.

Effects of Thermal Treatment on Structural Properties of DLC Films Deposited by FCVA Method (FCVA 방법으로 증착된 DLC 박막의 열처리에 따른 구조적 물성 분석)

  • 김영도;장석모;박창균;엄현석;박진석
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.52 no.8
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    • pp.325-329
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    • 2003
  • Effects of thermal treatment on the structural properties of diamond-like carbon (DU) films were examined. The DLC films were deposited by using a modified filtered cathodic vacuum arc (FCVA) deposition system and by varying the negative substrate bias voltage, deposition time, and nitrogen flow rate. Thermal treatment on DLC films was performed using a rapid thermal annealing (RTA) process at $600^{\circ}C$ for 2min. Raman spectroscopy, x-ray photoemission spectroscopy (XPS), atomic force microscope (AFM), and surface profiler were used to characterize the I$_{D}$I$_{G}$ intensity ratio, sp$^3$ hybrid carbon fraction, internal stress, and surface roughness. It was found for all the deposited DLC films that the RTA-treatment results in the release of internal compressive stress, while at the same time it leds to the decrease of sp$^3$ fraction and the increase of I$_{D}$I$_{G}$ intensity ratio. It was also suggested that the thermal treatment effect on the structural property of DLC films strongly depends on the diamond-like nature (i.e., sp$^3$ fraction) of as-deposited film.ed film.

Structural Variation of Diamond-like Carbon Thin Film According to the Annealing Temperature (열처리온도에 따른 다이아몬드상 카본박막의 구조적 특성변화)

  • Choi Won-Seok;Park Mun-Gi;Hong Byung-You
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.19 no.8
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    • pp.701-706
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    • 2006
  • In addition to its similarity to genuine diamond film, diamond-like carbon (DLC) film has many advantages, including its wide band gap and variable refractive index. In this study, DLC films were prepared by the RF PECVD (Plasma Enhanced Chemical Vapor Deposition) method on silicon substrates using methane $(CH_4)$ and hydrogen $(H_2)$ gas. We examined the effects of the post annealing temperature on the structural variation of the DLC films. The films were annealed at temperatures ranging from 300 to $900^{\circ}C$ in steps of $200^{\circ}C$ using RTA equipment in nitrogen ambient. The thickness of the film and interface between film and substrate were observed by surface profiler, field emission scanning electron microscopy (FESEM), high resolution transmission electron microscopy (HRTEM), respectively. Raman and X-ray photoelectron spectroscopy (XPS) analysis showed that DLC films were graphitized ($I_D/I_G$, G-peak position and $sp^2/sp^3$ increased) ratio at higher annealing temperature. The variation of surface as a function of annealing treatment was verified by a AFM and contact angle method.

The Change of $NO_{2}$ Sensing Characteristics for Carbon Nanotubes with Growth and Post Treatment Conditions (탄소 나노튜브의 성장 및 후처리 조건에 따른 이산화질소 감지특성의 변화)

  • Lee, R.Y.
    • Journal of the Microelectronics and Packaging Society
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    • v.13 no.4
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    • pp.65-70
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    • 2006
  • Carbon nanotubes (CNT) grown by chemical vapor deposition (CVD) and plasma enhanced chemical vapor deposition (PECVD), and followed by annealing at $400{\sim}500^{\circ}C$ were investigated for gas sensing under 1.5ppm $NO_{2}$ concentration at an operating temperature of $200^{\circ}C$. The electrical resistance of CNT sensor decreased with temperature, indicating a semiconductor type. The resistance of CNT sensor decreased with $NO_{2}$ adsorption. It was found that the sensitivity of sensor was affected by humidity and decreased under microwave irradiation for 3 minutes. The CNT sensor grown by PECVD had a higher sensitivity than that of CVD.

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Mechanical Properties of High-Hardness TiNX Thin Films Deposited by Pure Nitrogen Plasma Using Magnetron Sputtering Deposition (마그네트론 스퍼터링 증착법을 사용하여 순수한 질소 플라즈마에 의해 성막된 고경도 TiNX 박막의 역학적 특성)

  • Lee, Chang-Hyun;Rhee, Byung-Roh;Bae, Kang;Park, Chang-Hwan;Kim, Hwa-Min
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.30 no.8
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    • pp.514-519
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    • 2017
  • TiN (titanium nitride) films were prepared using the RF magnetron sputtering technique. The films were deposited by pure $N_2$ plasma sputtering. Their mechanical properties, such as nano-indentation hardness, friction coefficient, and surface wettability, have been investigated. X-ray diffraction (XRD) studies revealed that the orientation of $TiN_X$ films changed towards the (111) orientation with decreasing working pressure due to a strong compressive stress during deposition. The strongest TiN (111) orientation was found when the film was deposited at a working pressure of 1 Pa. This film showed the largest hardness (16 GPa) and smallest friction coefficient (0.17) among the studied samples. Moreover, this film was found to be accompanied by a water-repellent surface with water contact angle more than $100^{\circ}$.

Evaluation of cryogenic tensile properties of composite materials fabricated by fused deposition modeling 3D printer

  • Kang, Singil;Cha, Hojun;Ryu, Seungcheol;Kim, Kiwhan;Jeon, Seungmin;Lee, Jaesun;Kim, Seokho
    • Progress in Superconductivity and Cryogenics
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    • v.24 no.1
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    • pp.8-12
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    • 2022
  • Recently, research on applying composite materials to various industrial fields is being actively conducted. In particular, composite materials fabricated by Fused Deposition Modeling 3D printers have more advantages than existing materials as they have fewer restrictions on manufacturing shape, reduce the time required, weight. With these advantages, it is possible to consider utilizing composite materials in cryogenic environments such as the application of liquid oxygen and liquid hydrogen, which are mainly used in an aerospace and mobility. However, FDM composite materials are not verified in cryogenic environments less than 150K. This study evaluates the characteristics of composite materials such as tensile strength and strain using a UTM (Universal Testing Machine). The specimen is immersed in liquid nitrogen (77 K) to cool down during the test. The specimen is fabricated using 3D print, and can be manufactured by stacking reinforced fibers such as carbon fiber, fiber glass, and aramid fiber (Kevlar) with base material (Onyx). For the experimental method and specimen shape, international standards ASTM D638 and ASTM D3039 for tensile testing of composite materials were referenced.