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Effects of Thermal Treatment on Structural Properties of DLC Films Deposited by FCVA Method  

김영도 (한양대 전자전기제어계측공학과)
장석모 (한양대 전자전기제어계측공학과)
박창균 (한양대 전자전기제어계측공학과)
엄현석 (한양대 전자전기제어계측공학과)
박진석 (한양대 전자컴퓨터공학부)
Publication Information
The Transactions of the Korean Institute of Electrical Engineers C / v.52, no.8, 2003 , pp. 325-329 More about this Journal
Abstract
Effects of thermal treatment on the structural properties of diamond-like carbon (DU) films were examined. The DLC films were deposited by using a modified filtered cathodic vacuum arc (FCVA) deposition system and by varying the negative substrate bias voltage, deposition time, and nitrogen flow rate. Thermal treatment on DLC films was performed using a rapid thermal annealing (RTA) process at $600^{\circ}C$ for 2min. Raman spectroscopy, x-ray photoemission spectroscopy (XPS), atomic force microscope (AFM), and surface profiler were used to characterize the I$_{D}$I$_{G}$ intensity ratio, sp$^3$ hybrid carbon fraction, internal stress, and surface roughness. It was found for all the deposited DLC films that the RTA-treatment results in the release of internal compressive stress, while at the same time it leds to the decrease of sp$^3$ fraction and the increase of I$_{D}$I$_{G}$ intensity ratio. It was also suggested that the thermal treatment effect on the structural property of DLC films strongly depends on the diamond-like nature (i.e., sp$^3$ fraction) of as-deposited film.ed film.
Keywords
DLC; FCVA; XPS;
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