Mechanical Properties of High-Hardness TiNX Thin Films Deposited by Pure Nitrogen Plasma Using Magnetron Sputtering Deposition |
Lee, Chang-Hyun
(Department of Electronic & Electricity Engineering, Daegu Catholic University)
Rhee, Byung-Roh (Department of Applied Physics & Electronics, Sangji University) Bae, Kang (Mijutech) Park, Chang-Hwan (Department of Materials & Chemistries Engineering, Daegu Catholic University) Kim, Hwa-Min (Department of Materials & Chemistries Engineering, Daegu Catholic University) |
1 | U. Beck, G. Reiners, U. Kopacz, and H. A. Jehn, Surf. Coat. Technol., 60, 389 (1993). [DOI: https://doi.org/10.1016/0257-8972(93)90119-9] DOI |
2 | J. E. Sundgren, Thin Solid Films, 128, 21 (1985). [DOI: https://doi.org/10.1016/0040-6090(85)90333-5] DOI |
3 | M. Wittmer and H. Melchior, Thin Solid Films, 93, 397 (1982). [DOI: https://doi.org/10.1016/0040-6090(82)90145-6] DOI |
4 | M. Stoiber, J. Wagner, C. Mitterer, K. Gammer, H. Hutter, C. Lugmair, and R. Kullmer, Surf. Coat. Technol., 174, 687 (2003). [DOI: https://doi.org/10.1016/S0257-8972(03)00353-0] |
5 | F. Vaz, P. Machado, L. Rebouta, P. Cerqueira, Ph. Goudeau, J. P. Riviere, E. Alves, K. Pischow, and J. de Rijk, Surf. Coat. Technol., 174, 375 (2003). [DOI: https://doi.org/10.1016/S0257-8972(03)00711-4] |
6 | S. J. Bull, D. S Rickerby, and A. Jain, Surf. Coat. Technol., 41, 269 (1990). [DOI: https://doi.org/10.1016/0257-8972(90)90138-3] DOI |
7 | M.Stoiber, E. Badisch, C. Lugmair, and C. Mitterer, Surf, Coat, Technol., 163, 451 (2003). [DOI: https://doi.org/10.1016/S0257-8972(02)00642-4] |
8 | J. Pelleg, L. Z. Zevin, S. Lungo, and N. Croitoru, Thin Solid Films, 197, 117 (1991). [DOI: https://doi.org/10.1016/0040-6090(91)90225-M] DOI |
9 | S. Y. Chun, J. Korean Phys. Soc., 52, 1227 (2008). DOI |
10 | M. GoTo, A. Kasahara, M. Tosa, J. Hobely, M. Kishimoto, K. Yoshihara, and H. Fukumura, J. Vac. Sci. Technol., A, 20, 1458 (2002). [DOI: http://dx.doi.org/10.1116/1.1487873] DOI |
11 | I. Petrov, L. Hultman, U. Helmersson, J. E. Sundgren, and J. E Greene, Thin Solid Films, 169, 299 (1989). [DOI: https://doi.org/10.1016/0040-6090(89)90713-X] DOI |
12 | H. Ljungcrantz, L. Hultman, and J. E. Sundgren, and L. Karlsson, J. Appl. Phys., 78, 832 (1995). [DOI: http://dx.doi. org/10.1063/1.360272] DOI |
13 | L. Hultman, U. Helmersson, S. A. Barnett, J. E. Sundgren, and J. E. Greene, J. Appl. Phys., 61, 552 (1987). [DOI: http://dx.doi.org/10.1063/1.338257] DOI |