• 전기학회논문지
• /
• 제65권12호
• /
• pp.2014-2018
• /
• 2016

Transparent, conductive electrode films, showing the particular characteristics of good conductivity and high transparency, are of considerable research interest because of their potential for use in opto-electronic applications, such as smart window, photovoltaic cells and flat panel displays. Multilayer transparent electrodes, having a much lower electrical resistance than widely-used transparent conducting oxide electrodes, were prepared by using RF/DC magnetron sputtering system. The multilayer structure consisted of three layers, [NiInZnO(NIZO)/Ag/NIZO]. The optical and electrical properties of the multilayered NIZO/Ag/NIZO structure were investigated in relation to the thickness of each layer. The optical and electrical characteristics of multilayer structures have been investigated as a function of the Ag and NIZO film thickness. High-quality transparent conductive films have been obtained, with sheet resistance of $9.8{\Omega}/sq$ for Ag film thickness of 8 nm. Also the multilayer films of inserted Ag 8 nm thickness showed a high optical transmittance above 93% in the visible range. The electrical and optical properties of the new multilayer films were mainly dependent on the thickness of Ag insertion layer.

• 한국재료학회지
• /
• 제15권5호
• /
• pp.318-322
• /
• 2005

Ti-capped NiSi contacts were formed on $p^+/n$ junctions to improve the leakage problem and then Cu was deposited without removing the Ti-capping layer in an attempt to utilize as a diffusion barrier. The electrical characteristics of these $p^+/n$ diodes with Cu/Ti/NiSi electrodes were measured as a function of drive-in RTA(rapid-thermal annealing) and silicidation temperature and time. When drive-in annealed at $900^{\circ}C$, 10 sec. and silicided at $500^{\circ}C$, 100 sec., the diodes showed the most excellent I-V characteristics. Especially, the leakage current was $10^{-10}A$, much lower than reported data for diodes with NiSi contacts. However, when the $p^+/n$ diodes with Cu/Ti/NiSi contacts were furnace-annealed at $400^{\circ}C$ for 40 min., the leakage current increased by 4 orders. The FESEM and AES analysis revealed that the Ti-capping layer effectively prohibited the Cu diffusion, but was ineffective against the NiSi dissociation and consequent Ni diffusion.

• 한국세라믹학회지
• /
• 제41권10호
• /
• pp.735-741
• /
• 2004

단순화한 연소법에 의해 합성한 $LiMn_{1.92}Co_{0.08}O_4$와 $LiNi_{0.7}Co_{0.3}O_2$의 혼합물의 전기화학적 성질을 알아보기 위하여, 30분 동안 milling하여 $LiMn_{1.92}Co_{0.08}O_4$-x wt$\%$ $LiNi_{0.7}Co_{0.3}O_2$ (x=9, 23, 33, 41, and 47) 조성의 혼합물을 제조하였다. x=9 조성의 전극이 비교적 큰 초기방전용량(109.9mAh/g at 0.1C)과 좋은 싸이클 성능을 가지고 있었다. 싸이클링에 따른 혼합물 전극의 방전용량 감소는 주로 $LiNi_{0.7}Co_{0.3}O_2$의 퇴화에 기인한다고 생각된다. $LiNi_{0.7}Co_{0.3}O_2$의 퇴화는 $LiMn_{1.92}Co_{0.08}O_4$로부터 용해된 Mn이 $LiNi_{0.7}Co_{0.3}O_2$ 입자를 둘러싸서(coating) 일어나는 것으로 판단된다.

• 대한화학회지
• /
• 제49권1호
• /
• pp.47-55
• /
• 2005

• 환경위생공학
• /
• 제16권2호
• /
• pp.47-55
• /
• 2001

We investigated to find the optimum operation condition of electrolysis which have an influence on removal efficiency of heavy metals. When we experimented the testing wastewaters containing each 250mg/L of Cu and Ni ions, we got the variables like as pH, amount of electrolyte(NaCl), different species of electrode, electrode gap, electric strength, the number of electrodes, after fastening positive electrode plate with Al, Fe, Ti and negative electrode plate with Stainless Steel plate.

• 한국전기화학회:학술대회논문집
• /
• 한국전기화학회 2005년도 춘계총회 및 학술발표회
• /
• pp.15-15
• /
• 2005

• 한국재료학회:학술대회논문집
• /
• 한국재료학회 1996년도 재료학회 추계학술발표회
• /
• pp.14-14
• /
• 1996

• 센서학회지
• /
• 제24권4호
• /
• pp.224-227
• /
• 2015

In this study, 2 wt% Cr-doped Ni thin films were deposited using DC sputtering on a bare Si substrate using a 4 inch target at room temperature. In order to obtain ultrathin films from Cr-doped Ni thin films with high electrical properties and uniform surface, the micro-structure and electrical properties were investigated as a function of deposition time. For all deposition times, the Cr-doped Ni thin films had low average resistivity and small surface roughness. However, the resistivity of the Cr-doped Ni thin films at various ranges showed large differences for deposition times below 90 s. From the results, 120 s is considered as the appropriate deposition time for Cr-doped Ni thin films to obtain the lowest resistivity, a low surface roughness, and a small difference of resistivity. The Cr-doped Ni thin films are prospective materials for microdevices as ultrathin film electrodes.

• 한국세라믹학회지
• /
• 제55권1호
• /
• pp.21-35
• /
• 2018

Spinel $LiNi_{0.5}Mn_{1.5}O_4$ has received great attention as one of the most outstanding cathode materials for Li-ion batteries (LIBs) because of its high energy density resulting from the operating voltage of ~ 4.7 V (vs. $Li^+/Li$) based on the $Ni^{2+}/Ni^{4+}$ redox reaction. However, $LiNi_{0.5}Mn_{1.5}O_4$ is known to suffer from undesirable side reactions with the electrolyte at high voltage as well as Mn dissolution from the structure. These issues prevent the realization of the optimal electrochemical performance of $LiNi_{0.5}Mn_{1.5}O_4$. Extensive research has been conducted to overcome these issues. This review presents an overview of the various surface-modification methods available to improve the electrochemical properties of $LiNi_{0.5}Mn_{1.5}O_4$ and provides perspectives on further research aimed at the application of $LiNi_{0.5}Mn_{1.5}O_4$ as a cathode material in commercialized LIBs.

• 대한화학회지
• /
• 제37권8호
• /
• pp.702-710
• /
• 1993

이핵성 네자리 schiff base Co(II), Ni(II), Cu(II) alc Fe(II) 착물들을 촉매로 사용하여 몰리브데늄 전극과 유리질 탄소 전극에서 SOCl2의 전기화학적 환원반응을 조사하였다. 이들 전이금속(II) 착물들은 먼저 전극 표면에 흡착된 후 촉매로 작용하였으며, 각각의 전이금속(II) 착물들의 촉매 화합물은 SOCl$_2$ 를 환원시킬 수 있는 최적 조건의 농도를 나타냈다. SOCl$_2$의 환원반응에 대한 촉매 효과는 몰리브데늄 전극에서보다 유리질 탄소전극에서 더 크게 나타났고, 환원 전류는 최고 120% 정도 증가하였다. 주사속도 증가에 따른 SOCl$_2$의 환원 전류는 증가하였고 환원 전위는 음전위쪽으로 이동되었으며, SOCl$_2$의 환원과정은 확산지배적인 반응으로 진행되었다.