• The Journal of Natural Sciences
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• v.1
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• pp.7-14
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• 1987

The birefringence measurement of liquid crystal ZLI-1253 dependent upon the spectral response and the applied voltage have been studied using He-Ne laser and Ar-ion laser.

• Journal of the Korean Ceramic Society
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• v.39 no.10
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• pp.935-942
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• 2002

Gallium-doped ZnO (GZO) films were deposited on soda-lime glass substrate without heating using Ne, Ar, or Kr gas. Electrical properties of GZO films deposited at various total gas pressures were investigated for the film positions corresponding to the erosion region (region B) and outside the erosion region (region A) of the target. Region B showed high resistivity, which was attributed to the decrease in carrier density and Hall mobility, compared to region A. GZO films deposited using Ne gas showed the degradation in resistivity and crystallinity, whereas, GZO films deposited using Kr gas showed the improvement in resistivity and crystallinity. This degradation in film properties could be attributed to the film damage caused by the bombardment of high-energy particles. Especially, the energies of recoiled neutral atoms ($Ne^0,\;Ar^0,\;Kr^0$) calculated by Monte Carlo simulation corresponded to experimental results.

• Journal of Surface Science and Engineering
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• v.36 no.5
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• pp.418-422
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• 2003

평판형 유도결합 플라즈마 식각장비(inductively coupled plasma etcher)를 이용하여 각종 공정조건들에 따른 GaAs의 식각특성을 연구하였다. 공정변수들은 ICP 소스파워(0-500 W), RIE 척파워(0-150 W), 가스 종류($BCl_3$, $BCl_3$/Ar, $BCl_3$/Ne) 및 가스혼합비였다. $BCl_3$ 가스만을 이용하여 GaAs를 식각한 경우보다 25%의 Ar이나 Ne같은 불활성 기체를 혼합한 $15BCl_3$/5Ar, $15BCl_3$/5Ne 가스를 이용한 경우의 식각률이 더 우수한 것을 확인하였다. 그리고 50% 이하의 Ar이 혼합된 $BCl_3$/Ar의 경우는 높은 식각률 (＞4,000 $\AA$/min)과 평탄한 표면(RMS roughness : ＜2 nm)을 얻을 수 있었지만 지나친 양(＞50%)의 Ar의 혼합은 오히려 표면을 거칠게 하거나 식각률을 떨어뜨리는 결과를 가져왔다. 그리고 20 sccm $BCl_3$, 100 W RIE 척파워, 300 W ICP 소스파워, 공정압력이 7.5 mTorr인 조건에서의 GaAs의 식각결과는 아주 우수한 특성(식각률: ∼ 4,000, $\AA$/min, 우수한 수직측벽도: ＞$87^{\circ}$, 평탄한 표면: RMS roughness : ∼0.6 nm)을 나타내었다.

• Proceedings of the KIEE Conference
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• 2004.11a
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• pp.306-309
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• 2004

Recently, the environmental problem has received considerable attention. so, many lamps have been developing for environmental requirement and energy efficiency. also, at glow discharge lamp researchers try to reduce energy spending that is power saving lamp. this kind requirement agree with strong points of electrodeless fluorescent lamp has received to now lighting sauce. At low pressure as mTorr I.C.P make high density plasma easily, is good to maintain discharge, has high ionization and does not have failing lighting and losing ability of electron radiation by oxidation and volatilization of electrodes, because this tape does not have electrodes. This point of I.C.P can use at electrodeless fluorescent lamp in this study ICP display elements and Ar, Ne, Kr are researched for optical characteristic. each gas is looked into optical characteristic, also mixed gases is experiment for optical characteristic.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2006.05a
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• pp.91-95
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• 2006

In whole world consciousness of environment maintenance have increased very quickly for the end of the 20th century. To use and disuse toxic substances have been controled at the field of industry. Also the field of lighting source belong to environmental control. And in the future the control will be strong. In radiational mechanism of fluorescence lamp mechanism is the worst environmental problem. In radiational mechanism of fluorescence lamp mercury is the worst environmental problem root. In the mercury free lighting source system the Xe gas lamp is one type. And the Ne:Xe mixing gas lamp improvements firing voltage of Xe gas lamp. Purpose and subject of this study are understand, efficiency, ideal of Ne:Xe plasma which mercury free lamp. Before ICP was designed, basic parameters of plasma, which are electron temperature and electron density, were measured and calculated by Langmuir probe data. Property of electron temperature and electron density were confirmed by changing ratio of Ne:Xe.

• Journal of the Korean Vacuum Society
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• v.15 no.1
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• pp.73-80
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• 2006

Thermally-driven effusion of inert gases out from Si(100), into which energetic $\~l keV\;He^+,\;Ne^+,\;A^r+,\;and\;Kr^+ ions$ had been implanted at a moderate substrate temperatures of $\~400 K$, was investigated by means of temperature-programmed desorption (TPD) mass spectrometry. While He effused out broadly over $500\~1,100 K$, Ne, Ar, and Kr effusion occurred sharply at 810, 860, and 875 K, respectively. Hydrogen adsorption/desorption analysis for the ion-treated Si(100) surfaces indicated minimal to severe damage by ions with increasing mass from He to Kr. Implications of these results in light of literature reports are discussed.

• The Korean Journal of Ceramics
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• v.5 no.4
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• pp.404-408
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• 1999

Gallium doped zinc oxide(GZO) films were deposited on soda-lime glass substrates without substrate heating $(T_s<50^{\circ}C$) by dc planar magnetron sputtering using GZO ceramic oxide targe with different inert gas (Ar, or Ne). For the GZO films deposited under different total gas pressure $(P_{tot})$, structural and electrical properties were investigated by XRD and Hall effect measurements. Crystallinity of GZO films deposited using Ar was degraded with increase in $(P_{tot})$, suggesting that it was heavily affected by kinetic energy of sputtered Zn particles$(PA_{zn})$ arriving at substrate surface. Whereas, crystallinity of GZO films deposited at lower Ptot than 3.0 Pa using Ne gas was degraded with decrease in $(P_{tot})$. This degradation was considered to be result of film damage caused by the bombardment of high-energy neutrals ($Ne^{\circ}$). On the basis of a hard sphere collision processes, the average final energy of particles (sputtered Zn, $Ar^{\circ}$and $Ne^{\circ}$)arriving at substrate surface were estimated.

• Journal of the Korean Vacuum Society
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• v.17 no.6
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• pp.495-500
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• 2008

The amount of vapor mercury for the generation of glow discharge plasma has been calculated in a fine tube fluorescent lamp having a mixed gas of Ne+Ar including a mercury. When the ionization of atom is considered by the collision between neutral atoms (Ne, Ar, Hg) and electrons of energy $kT_e{\sim}1\;eV$, the density of vapor mercury atom has been obtained as $n(Hg){\sim}3.43{\times}10^{22}m^{-3}$ for the plasma density $n_o{\sim}10^{17}m^{-3}$. In the fluorescent lamps of out diameter 4 mm used for $32{\sim}42$-inch LCD-TVs having a mixture gas of Ne(95%)+Ar(5%) with the pressure of 50 Torr, the quantity of vapor mercury for the glow discharge has been caculated as 0.02{\sim}0.08\;mg$.

• Journal of the Korean Society of Groundwater Environment
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• v.1 no.1
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• pp.6-9
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• 1994

Previously reported Ar/N$_2$ratios in groundwater have been measured by single ion monitoring (Barnes et al., 1975; Vogel et al., 1981; Mariotti et al., 1988). The detector geometry and flared flight tube in VG Optima isotopic ratio mass spectrometer appeared to be fortuitously aligned for the simultaneous measurement of Ar/N$_2$ratios. Method development included mechanical adjustments to optimize the mass spectrometer for Ar/N$_2$ratio measurements followed by development of a preparation system for the extraction of air-saturated water samples. Samples containing known Ar/N$_2$ratios were used to assess accuracy and precision, and to test the applicability of methods for measurements of aqueous Ar/N$_2$ratios. The results indicated that the prepared air-saturated water samples were almost identical to the predicted Ar/N$_2$ratios (p ＜0.001). Groundwater samples were collected from on-going research sites, Shelton and Grand Island, Nebraska. Samples from the Grand Island sludge injection site form a lower boundary for worldwide reported Ar/N$_2$ratios. These lower Ar/N$_2$ratios can be explained by the production of nitrogen gas from this site, where denitrification was reported previously.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.504-504
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• 2012

Gas 종류에 따른 플라즈마 제트 장치의 방전 특성을 조사하였다. 고전압 전극으로 내경 0.26 mm, 외경 0.52 mm인 의료용 바늘을 사용하였으며 바늘을 유리관 내부에 삽입하여 4가지 gas를 주입시킨다. Gas의 종류는 Ar, He, Ne, 그리고 $N_2$이다. Ar과 He의 방전 개시 전압은 각 1.2 kV, 1.0 kV이고 보라색 플라즈마가 방출된다. Ne 방전은 방전 개시 전압 시작 시점인 0.3 kV부터 유리관 밖으로 길게 방출 되며 주황색 플라즈마가 방출된다. 특히, Ne gas는 전기적 쇼크가 전혀 없다. $N_2$ gas는 방전개시전압이 2.0 kV로 가장 어려우며 유리관 밖으로 플라즈마 방출되지 않는다. 각 gas 별 스펙트럼의 특성도 파악하여 어떤 gas가 인체 및 생체에 적합한지 파악한다.