• The Transactions of the Korean Institute of Electrical Engineers P
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• v.51 no.3
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• pp.132-136
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• 2002

In this study, we analyzed the luminous efficiencies of Ne-Xe-Ar and He-Ne-Xe-Ar mixing gas in compared with those of Ne-Xe and He-Ne-Xe mixing gas to improve luminous efficiency by adding a small amount of Ar gas. At the Xe 4%, the brightness of Ne-Xe and He-Ne-Xe mixing gas is higher than others. As the Xe % increases, power consumption decreases. Thus, in the Ne-Xe and He-Ne-Xe mixing gas of Xe 4%, we obtained maxium luminous efficiency. The Ar concentration is varied from 0.1% to 0.7% in this study. The luminous efficiency of the Ne-Xe(4%) mixing gas is improved to 1.16 and 1.13 lm/W by adding an Ar concentration of 0.4% and 0.5%, respectively. The luminous efficiency of the He-Ne-Xe(4%) (He : Ne = 7 : 3) mixing gas is considerably improved by adding an Ar concentration of above 0.3%. The maximum luminous efficiency of this mixing gas is 1.38 lm/W at the condition of adding an Ar concentration of 0.5%.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.55 no.3
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• pp.156-160
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• 2006

In whole world consciousness of environment maintenance have increased very quickly for the end of the 20th century. To use and disuse toxic substances have been controled at the field of industry. Also the field of lighting source belong to environmental control. And in the future the control will be strong. In radiational mechanism of fluorescence lamp mercury is the worst environmental problem and root. In the mercury free lighting source system the Xe gas lamp is one type. And the Ne:Xe and Ne:Ar mixed gas lamp improve firing voltage of Xe gas lamp. Purpose of this study is to understand ideal mixing-ratio of Ne:Xe and Ne:Ar gas by electron temperature and electron density for mercury free lamp. Before ICP was designed, basic parameters of plasma, which are electron temperature and electron density, were measured and calculated by single-Langmuir probe. Property of electron temperature and electron density were confirmed by changing ratio of Ne:Xe and Ne:Ar.

• Proceedings of the KIEE Conference
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• 2005.07c
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• pp.2424-2426
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• 2005

In whole world consciousness of environment maintenance have increased very quickly for he end of the 20th century. To use and disuse toxic substances have been controled at the field of industry. Also the field of lighting source belong to environmental control. And in the future the control will be strong. In radiational mechanism of fluorescence lamp mercury is the worst environmental problem. In radiational mechanism of fluorescence lamp mercury is the worst environmental problem root. In the mercury free lighting source system the Xe gas lamp is one type. And the Ne:Xe and Ne:Ar mixing gas lamp improvements firing voltage of Xe gas lamp. Purpose and subject of this study are understand, efficiency, ideal of Ne:Xe and Ne:Ar plasma which mercury free lamp. Before ICP was designed, basic parameters of plasma, which are electron temperature and electron density, were measured and calculated by langmuir probe data. Property of electron temperature and electron density were confirmed by changing ratio of Ne:Xe and Ne:Ar.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.48 no.6
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• pp.483-488
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• 1999

The optimal mixing condition of four components gas(Ne,Xe,He,Ar) in PDPs was caculated by a numerical simulation method. The dominated reactions in which $Xe^*(^3P_1)$ is produced and decays were investigated in three components gas (Ne,Xe,He) and our new components gas (Ne,Xe,He,Ar). A peak point of $Xe^*$ density appears in the range of 0.1% to 2% of Ar mixture ratio. The results of simulation show that the direct exitation of Xe by electrons has the greatest influence on the inceasing $Xe^*$ density in both gas mixtures.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.431-431
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• 2010

본 논문은 기존의 수은 형광 램프와 LED를 대체할 수 있는 무 수은 면광원의 방전 가스 조성 변화(He, Ne, Ar, Xe)에 따른 전기 광학 특성에 관한 연구이다.[1]~[4] 무 수은 면광원의 기본 구조는 그림 1과 같이 방전 공간 내에 유전체에 의해 방전 공간과 분리된 한 쌍의 평행한 전극으로 이루어져 있다. 그리고 방전 공간 내면에는 일정한 두께와 형상을 가지는 형광체가 도포되어 있고 주 전극의 반대 평판유리 외벽에 보조전극을 형성하였다. 방전을 발생시키기 위한 기본적인 구동 방법은 5~25kHz의 주파수와 $0.7{\sim}1.5{\mu}s$의 폭을 가지는 사각 펄스를 사용한다.[4] 그림 2는 Ne-Xe 가스를 기본으로 하여 He 첨가에 따른 전기 광학 특성을 보여준다. He 첨가량이 증가할수록 동작 전압이 높아지면서 방전 개시와 동시에 수축 방전으로 전이되는 형태를 보이며, 효율 또한 감소함을 보였다. 이것은 무 수은 면광원에서는 높은 He의 이차전자 방출 계수보다 He의 높은 이온화 에너지가 더 크게 작용하기 때문이라 생각된다. 그림 3은 Ne-Xe 가스를 기본으로 하여 Ar 첨가에 따른 특성을 보여준다. He과는 다르게 Ar 첨가량이 증가할수록 동작 전압 마진이 넓어진다. 그러나 동작 전압이 상승하고, 효율 역시 감소하는 단점이 있다. 이것은 Ar은 Ne에 비해 이온화 에너지가 낮지만 Ar-Xe 조합은 Penning 효과를 얻을 수 있는 혼합 가스가 아니며, Ar의 2차전자 방출 계수 역시 Ne에 비해 낮기 때문에 결과적으로 방전 전압은 상승하고 효율이 감소하는 결과를 보여준다. 그러므로 무 수은 면광원에서 낮은 구동 전압과 높은 휘도 효율을 얻기 위해서는 Ne-Xe 가스조건이 가장 적합한 가스 조건이다. 효율 개선을 위해서는 Ne-Xe 가스 조건에서 압력을 높이거나 높은 Xe 함량의 가스 조성비를 사용하여 자외선 발광원인 Xe 가스량을 높이는 방법이 가장 유리하다. 그림 4는 Ne-Xe 가스 조건에서 Xe 가스량을 높이면 효율이 증가하는 경향성을 보여준다. 가스 최적화 연구와 더불어 형광체 최적화 연구[5]를 통해서 Ne-Xe25% 100Torr 가스 조건에서 그림 5와 같은 19,000nit의 높은 휘도와 75lm/W의 고 효율 특성을 얻을 수 있었다.

• The Sea:JOURNAL OF THE KOREAN SOCIETY OF OCEANOGRAPHY
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• v.27 no.3
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• pp.144-157
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• 2022

Noble gases, which are chemically inert and behave conservatively in marine environments, have been used as tracers of physical processes such as air-sea gas exchange, mixing of water masses, and distribution of glacial meltwater in the ocean. For precise measurements of Ne, Ar, and Kr, we developed a mass spectrometric system consisting of a quadrupole mass spectrometer (QMS), a high vacuum preparation line, an activated charcoal cryogenic trap (ACC), and a set of isotope standard gases. The high vacuum line consists of three sections: (1) a sample extraction section that extracts the dissolved gases in the sample and mixes them with the standard gases, (2) a gas preparation section that removes reactive gases using getters and separates the noble gases according to their evaporation points with the ACC, and (3) a gas analysis section that measures concentrations of each noble gas. The ACC attached to the gas preparation section markedly lowered the partial pressures of Ar and CO₂ in the QMS, which resulted in a reduced uncertainty of Ne isotope analysis. The isotope standard gases were prepared by mixing ²²Ne, ³⁶Ar, and ⁸⁶Kr. The amounts of each element in the mixed standard gases were determined by the reverse isotope dilution method with repeated measurements of the atmosphere. The analytical system achieved precisions for Ne, Ar, and Kr concentrations of 0.7%, 0.7%, and 0.4%, respectively. The accuracies confirmed by the analyses of air-equilibrated water were 0.5%, 1.0%, and 1.7% for Ne, Ar, and Kr, respectively.

• Proceedings of the KIEE Conference
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• 1998.11c
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• pp.919-921
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• 1998

In Color AC Plasma Display Panel(PDP). Low luminous efficiency is a major problem. We measured luminous efficiency of PDP as a function of the Ar mixing ratio. Our results show that efficiency has improved by $5{\sim}10%$ at the condition of 0.5% Ar mixing ratio, compared with Ne-Xe(4%) or He-Ne-Xe(4%) (He:Ne = 7:3) gas.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.07a
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• pp.361-365
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• 2003

Planar Inductively Coupled Plasma (PICP) etching of InGaP was performed in $BCl_3,\;BCl_3/Ar\;and\;BCl_3/Ne$ plasmas as a function of ICP source power ($0\;{\sim}\;500\;W$), RIE chuck power ($0\;{\sim}\;150\;W$), chamber pressure ($5\;{\sim}\;15\;mTorr$) and gas composition of $BCl_3/Ar\;and\;BCl_3/Ne$. Total gas flow was fixed at 20 sccm (standard cubic centimeter per minute). Increase of ICP source power and RIE chuck power raised etch rate of InGaP, while that of chamber pressure reduced etch rate. We also found that some addition of Ar and Ne in $BCl_3$ plasma improved etch rate of InGaP. InGaP etch rate was varied from $1580\;{\AA}/min$ with pure $BC_3\;to\;2800\;{\AA}/min$ and $4700\;{\AA}/min$ with 25 % Ar and Ne addition, respectively. Other process conditions were fixed at 300 W ICP source power, 100 W RIE chuck power and 7.5 mTorr chamber pressure. SEM (scanning electron microscopy) and AFM (atomic force microscopy) data showed vertical side wall and smooth surface of InGaP at the same condition. Proper addition of noble gases Ar and Ne (less than about 50 %) in $BCl_3$ inductively coupled plasma have resulted in not only increase of etch rate but also minimum preferential loss and smooth surface morphology by ion-assisted effect.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.07b
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• pp.1074-1077
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• 2003

우리는 AC-PDP에서 휘도와 효율을 향상시키기 위하여 Ne-Xe(4%)와 He(7)-Ne(3)-Xe(3%)에 소량의 Ar 또는 Kr를 첨가하여 최적의 페닝 방전가스 혼합비를 연구하였다. 우리는 이것을 증명하기 위해 효율과 Q-V 방법을 이용하여 벽전하를 계산하였으며, 2차원 시뮬레이션에서의 결과값과 비교하였다. 200 Torr 압력에서 He-Ne-Xe 또는 Ne-Xe에 소량의 Ar(0.01-0.1%) 또는 Kr(0.01-0.1%)을 첨가시켰을 때, 우리는 20% 이상의 휘도의 증가와 25% 이상의 효율 증가를 발견하였고, 또한 벽전하도 25% 이상의 증가를 보였다. 400 Torr 압력에서 He-Ne-Xe-Kr(0.005%)에 소량의 Ar(0.005-0.1%)를 첨가시켰을 때는 8% 이상의 휘도의 증가와 18% 이상의 효율 증가, 12% 이상의 벽전하 증가를 확인하였다. 결론적으로 이 결과는 He, Ne, Ar, Kr 사이에 추가적인 페닝효과가 휘도와 효율을 향상시켰다는 것을 보여준다.

• Journal of the Korean Vacuum Society
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• v.11 no.2
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• pp.127-134
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• 2002

Recently, Plasma display panel(PDP) has been in the spotlight as one of the next generation flat-panel-display device. The luminance and luminous efficiency improvement is the hot issues for making a plasma display into a large flat panel device. In this paper, We suggest a new penning gas mixture, in order to find the optimum mixture gas in plasma display panel. The optimum gas composition has been found by the partial pressure of inert gases(such as Af and Kr added to matrix of He(70%)-Ne(27%)Xe(3%) and Ne(96%)-Xe(4%)). The influences of Ar or Kr addition to Ne(96%)-Xe(4%) and He(70%)-Ne(27%)-Xe(3%) mixture gases are experimentally investigated for AC Plasma Display Panel. When rare As(0.01%-0.03%) or Kr(0.01%-0.03%) is added Ne-Xe and He-Ne-Xe mixture gases, the luminance increases over 10%-20% and luminous efficiency increases over 10%-20% at 200 Torr. It is sure that luminance and efficiency are improved by Penning effect. Also, This influence of Penning effect is shown by increased wall charge(10%-25%). In addition to the result, firing voltage and minimum sustain voltage was approximately decreased by 2V-3V.