• 제목/요약/키워드: Nd:$YVO_4$ 레이저

검색결과 38건 처리시간 0.02초

스퍼터링된 산화 아연 박막의 레이저 직접 식각 시 기판에 의한 영향 (Effects of Various Substrates on the Laser Direct Etching of the Sputtered ZnO Films)

  • 오기택;권상직;조의식
    • 한국전기전자재료학회논문지
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    • 제26권12호
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    • pp.894-898
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    • 2013
  • Zinc oxide(ZnO) was sputtered on various glass and flexible substrates such as polyethylene terephthalate(PET) and polycarbonate(PC). A Q-switched $Nd:YVO_4$ laser with a wavelength of 1,064 nm was used for the direct etching of ZnO films. It was possible to obtain laser etched line patterns on the ZnO films on PC substrate at some specific laser beam conditions. In the flexible substrates, more thermal energy of laser beam is expected to be spreaded for the etching process.

PC 기판상에 스퍼터링된 투명전도 산화막의 레이저 식각 특성 (Laser Direct Etching on Transparent Conductive Oxide Films Sputtered on Polycarbonate Substrates)

  • 이정민;권상직;조의식
    • 한국전기전자재료학회논문지
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    • 제27권3호
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    • pp.146-150
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    • 2014
  • As a method of simple patterning of transparent conductive oxide (TCO) films deposited on flexible substrates, laser direct etching was carried out on TCO films sputtered on polycarbonate (PC) substrates. As a result of different binding energies in TCO films, indium tin oxide (ITO) and indium gallium zinc oxide (IGZO) were more easily etched than zinc oxide with different $Nd:YVO_4$ laser beam conditions.

이층 박막 구조에서 ITO 전극의 레이저 직접 패터닝 시레이저 식각 패턴 중첩 비율의 변화 (Overlapping Rates of Laser Spots on the Laser Direct Patterning of ITO Electrode in the Double-layer Structure of Thin Film)

  • 왕건훈;박정철;권상직;조의식
    • 한국전기전자재료학회논문지
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    • 제25권5호
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    • pp.377-380
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    • 2012
  • Laser direct patterning of indium tin oxide(ITO) is one of new methods of direct etching process to replace the conventional photolithography. A diode pumped Q-switched Nd:$YVO_4$ (${\lambda}$= 1,064 nm) laser was used to produce ITO electrode on various transparent oxide semiconductor films such as zinc oxide(ZnO). The laser direct etched ITO patterns on ZnO were compared with those on glass substrate and were considered in terms of the overlapping rate of laser beam. In case of the laser etching on double-layer, it was possible to obtain the higher overlapping rate of laser beam.

연속발진 레이저로 제작한 다결정 실리콘 박막의 특성연구 (The properties of CW laser crystallized poly-Si film)

  • 김기형;김은현;박성진;구유미;김채옥;장진
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2005년도 춘계학술대회 논문집 디스플레이 광소자 분야
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    • pp.80-83
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    • 2005
  • $Nd:YVO_4$ 연속발진 레이저 (CW laser)를 이용하여 다결정실리콘 (CLC poly-Si)을 제작하였다. CLC 다결정 실리콘의 결정화 영역은 결정립 크기에 따라 SLC(Sequential Lateral Crystallization) 영역, SLG(Super Lateral Grain) 영역 및 Small Grain 영역으로 구분된다. 레이저를 중첩스캔 하여 제작한 CLC 다결정실리콘의 경우, 레이저 스캔 경계에서 단결정립이 형성됨을 SEM으로 확인하고, CLC 다결정실리콘의 결정성을 XRD와 라만 스펙트럼(Raman spectrum)을 이용하여 조사하였다.

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355nm 펄스 레이저를 이용한 구리 박막의 레이저 어블레이션에 대한 연구 (A study on the laser ablation of the copper metal foil by 355nm pulse laser)

  • 오재용;신보성
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2006년도 춘계학술대회 논문집
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    • pp.667-668
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    • 2006
  • Usually nanosecond pulsing laser ablation of metal is under thermal effect. Many studies of the theoretical analysis and modeling to predict a result of laser ablation of metal are suggested on the basis of the photothermal mechanism. In this paper, we investigate the etching depth and laser fluence of laser ablation of copper films. We proposed the simplified SSB Model(Srinivasan-Smrtic-Babudp model) to study the photothermal effect of nanosecond pulsing laser ablation of copper thin metal. The experimental results were obtained by using the 355nm DPSS $Nd:YVO_4$ laser.

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피코초 레이저를 이용한 회절 격자 금형 개발 (Practical application of picosecond laser micro-machining to the direct fabrication of a diffraction grating mold)

  • 노지환;이제훈;손현기;서정;신동식
    • 한국레이저가공학회:학술대회논문집
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    • 한국레이저가공학회 2006년도 춘계학술발표대회 논문집
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    • pp.97-100
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    • 2006
  • Picosecond (ps) laser micro-machining has emerged as an attractive method of fabricating high-precision microstructures, especially in metals. In this paper, a metallic mold for diffraction gratings is fabricated with a mode-locked 12 ps $Nd:YVO_4$ laser. Laser pulses with a wavelength of 355nm are irradiated on the surface of NOK 80, a mold material, to generate line patterns. In order to minimize the line width, laser power is set just above the ablation threshold of NOK 80. Results show that the spectrum from the fabricated mold is good enough for some industrial application.

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355nm UV 레이저 가공에 의한 폴리이미드의 광화학적 및 광열적 어블레이션에 관한 연구 (Photothermal and Photochemical Investigation on Laser Ablation of the Polyimide by 355nm UV Laser Processing)

  • 오재용;신보성
    • 한국정밀공학회지
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    • 제24권4호
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    • pp.147-152
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    • 2007
  • UV laser ablation of polyimide is a combination of photochemical and photothermal mechanism. Photochemical mechanism is that molecular bonds are broken by photon energy and photothermal is evaporation and melt expulsion. When the laser processing, the etching depth needs to be calculated for prediction of processing result. In this paper, in order to predict the laser etching depth of polyimide by UV laser with the wavelength of 355nm, the theoretical model which includes both the photothermal and the photochemical effect was introduced. The model parameters were obtained by comparing with experimental results. The 3rd harmonic $Nd:YVO_4$ laser system was used in the experiment. From these experimental and theoretical results, the laser ablation of a polyimide was verified to achieve the highest quality microstructure.

355nm UV 레이저를 이용한 구리 박판 가공 시 어블레이션에 관한 연구 (A Study on Laser Ablation of Copper Thin Foil by 355nm UV Laser Processing)

  • 오재용;신보성
    • 한국정밀공학회지
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    • 제24권2호
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    • pp.134-139
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    • 2007
  • Usually nanosecond pulsed laser processing of metal is mainly affected by the thermal ablation. Many studies of the theoretical analysis and modeling to predict the laser ablation of metal are suggested on the basis of the photothermal mechanism at higher laser fluence. In this paper, we investigate the etching depth and laser fluence of laser ablation of copper foils and propose the simplified SSB Model(Srinivasan-Smrtic-Babu model) to study the photothermal effect of nanosecond pulsed laser ablation. The experimental results show that the photothermal ablation of the 355nm DPSS $NdYVO_{4}$ laser is useful to process the copper thin foils.

고정 마스크에 의한 레이저 미세패터닝 쾌속 제작 (Rapid Manufacturing of Laser Micro-Patterning Using Fixed Masks)

  • 신보성;오재용
    • 한국레이저가공학회지
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    • 제9권1호
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    • pp.17-23
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    • 2006
  • The technologies of laser micromachining are changed toward more complex-micropatterning, from the micro circle-shaped hole drilling to the micro arbitrary-shaped hole drilling. In this paper, the fundamental experiments by using DPSS 3rd harmonic $Nd:YVO_4\;laser({\lambda}=355nm)$ were carried out in order to obtain the feasibility of flexible micropatterning by various fixed masks. Fixed masks and Galvano scanners were investigatde to make micro patterns. from these experimental results, micropatterns on PEN film were rapidly manufactured in large area.

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광펄스 파라미터 가변 LD를 이용한 복합형 DPSSL 개발 (Development of a Hybrid DPSSL with a Pulse Parameter Variable LD Seed)

  • 노영철;신우진;유봉안;이영락;정창수
    • 한국정밀공학회지
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    • 제27권10호
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    • pp.7-13
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    • 2010
  • We report a hybrid DPSSL with a pulse parameter variable LD seed, all-fiberized polarization-maintained pulsed Yb-doped fiber preamplifier chains, and a bulk Nd:$YVO_4$ power amplifier. Pulse parameter of LD seed was controlled by direct current modulation. The hybrid DPSSL generates 1064 nm laser pulses with an average power of 40W, a pulse duration of 20-40ns, and a repetition rate of 100-500kHz.