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Effects of Various Substrates on the Laser Direct Etching of the Sputtered ZnO Films

스퍼터링된 산화 아연 박막의 레이저 직접 식각 시 기판에 의한 영향

  • Oh, Gi Taek (Department of Electronics Engineering, Gachon University) ;
  • Kwon, Sang Jik (Department of Electronics Engineering, Gachon University) ;
  • Cho, Eou Sik (Department of Electronics Engineering, Gachon University)
  • Received : 2013.10.18
  • Accepted : 2013.11.18
  • Published : 2013.12.01

Abstract

Zinc oxide(ZnO) was sputtered on various glass and flexible substrates such as polyethylene terephthalate(PET) and polycarbonate(PC). A Q-switched $Nd:YVO_4$ laser with a wavelength of 1,064 nm was used for the direct etching of ZnO films. It was possible to obtain laser etched line patterns on the ZnO films on PC substrate at some specific laser beam conditions. In the flexible substrates, more thermal energy of laser beam is expected to be spreaded for the etching process.

Keywords

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