• Proceedings of the Korean Society of Tribologists and Lubrication Engineers Conference
• /
• 2002.10b
• /
• pp.67-68
• /
• 2002

The properties and mechanism of silicon protuberance and groove processing by diamond tip sliding using atomic force microscope (AFM) in atmosphere were studied. To control the height of protuberance and the depth of groove, the processed height and depth depended on load and diamond tip radius were evaluated. Nanoprotuberances and grooves were fabricated on a silicon surface by approximately 100-nm-radius diamond tip sliding using an atomic force microscope in atmosphere. To clarify the mechanical and chemical properties of these parts processed, changes in the protuberance and groove profiles due to additional diamond tip sliding and potassium hydroxide (KOH) solution etching were evaluated. Processed protuberances were negligibly removed, and processed grooves were easily removed by additional diamond tip sliding. The KOH solution selectively etched the unprocessed silicon area. while the protuberances, grooves and flat surfaces processed by diamond tip sliding were negligibly etched. Three-dimensional nanofabrication is performed in this study by utilizing these mechanic-chemically processed parts as protective etching mask for KOH solution etching.

• Journal of the Society of Cosmetic Scientists of Korea
• /
• v.28 no.2
• /
• pp.55-57
• /
• 2002

The fabrication, characterization and manipulation of nanosystems brings together physics, chemistry, materials science and biology in an unprecedented way, Phenomena occurring in such systems are fundamental to the workings of electronic devices, but also to living organisms. The ability to fabricate nanostructures is essential in the further development of functional devices that incorporate nanoscale features. Even more essential is the ability to introduce a wide range of chemical and materials flexibility into these structures to build up more complex nanostructures that can ultimately rival biological nanosystems. In this respect, polymers are potentially ideal nanoscale building blocks because of their length scale, well-defined architecture, controlled synthesis, ease of processing and wide range of chemical functionality that can be incorporated. In this presentation, we will look at a number of promising polymer-based nanofabrication strategies that have been developed recently, with an emphasis on those techniques that incorporate nanostructured polymers into devices and that exploit intrinsic polymer properties.

• Journal of Institute of Control, Robotics and Systems
• /
• v.10 no.7
• /
• pp.604-610
• /
• 2004

Ultraviolet-nanoimprint lithography (UV-NIL) is a promising method for cost-effectively defining nanoscale structures at room temperature and low pressure. Since the resolution of transferred nanostructures depends strongly upon that of nanostamps, the nanostamp fabrication technology is a key technology to UV-NIL. In this paper, a $5\times5\times0.09$ in. quartz stamp whose critical dimension is 377 nm was fabricated using the etching process in which a Cr film was employed as a hard mask for transferring nanostructures onto the quartz plate. To effectively apply the fabricated 5-in. stamp to UV-NIL on a 4-in. Si wafer, we have proposed a new UV-NIL process using a multi-dispensing method as a way to supply resist on a wafer. Experiments have shown that the multi-dispensing method can enable UV-NIL using a large-area stamp.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2016.02a
• /
• pp.105.2-105.2
• /
• 2016

For the rational design and facile fabrication of novel nanostructures, we present a new approach to generating arrays of three-dimensionally tunable nanostructures by exploiting light-matter interaction. To create controlled three-dimensional (3D) nanostructures, we utilize the 3D spatial distribution of light, induced by the light-matter interaction, within the matter to be patterned. As a systematic approach, we establish 3D modeling that integrates the physical and chemical effects of the photolithographic process. Based on a comprehensive analysis of structural formation process and nanoscale features through this modeling, we are able to realize three-dimensionally tunable nanostructures using facile photolithographic process. Here we first demonstrate the arrays of three-dimensionally controlled, stacked nanostructures with nanoscale, tunable layers. We expect that the promising strategy would open new opportunities to produce the arrays of tunable 3D nanostructures using more accessible and facile fabrication process for various biomedical applications ranging from biosensors to drug delivery devices.

• Applied Chemistry for Engineering
• /
• v.29 no.3
• /
• pp.253-257
• /
• 2018

DNA metallization has been emerged as a candidate for fabricating nanocircuits because of its simple process over a large area on a surface. With unique properties, DNA can be an excellent template to achieve molecular electronics. Thus, we introduced the preparation and properties of DNA metallization, and also suggested future directions in this review.

• Proceedings of the Korean Society of Precision Engineering Conference
• /
• 2005.06a
• /
• pp.1539-1542
• /
• 2005

Self-assembled monolayers (SAMs) formed by the adsorption of alkanethiols, $HS(CH_2)_nX$, where X is an organic functional group, onto gold surfaces have attracted widespread interest as templates for the fabrication of molecular and biomolecular microstructures. Previously photopatterning has been thought of as being restricted to the micron scale, because of the wellknown diffraction limit. So, we have explored a novel approach to nanofabrication by utilizing a femtosecond laser coupled to a near-field scanning optical microscope (NSOM).

• Proceedings of the Korean Society of Precision Engineering Conference
• /
• 2004.10a
• /
• pp.1315-1318
• /
• 2004

Nano-scale fabrication of silicon substrate in an aqueous solution based on the use of atomic force microscopy was demonstrated. A specially designed cantilever with diamond tip, allowing the formation of damaged layer on silicon substrate easily by a simple scratching process (Tribo-Nanolithography, TNL), has been applied instead of conventional silicon cantilever for scanning. A slant nanostructure can be fabricated by a process in which a thin damaged layer rapidly forms in the substrate at the diamond tip-sample junction along scanning path of the tip and simultaneously the area uncovered with the damaged layer is being etched. This study demonstrates how the TNL parameters can affect the formation of damaged layer and the shape of 3-D structure, hence introducing a new process of proximal nanolithography in aqueous solution.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
• /
• v.33 no.5
• /
• pp.360-366
• /
• 2020

Focused electron beams with high energy acceleration are versatile probes. Focused electron beams can be used for high-resolution imaging and multi-mode nanofabrication, in combination with, molecular precursor delivery, in an electron microscopy environment. A high degree of control with atomic-to-microscale resolution, a focused electron beam allows for precise engineering of a graphene-based field-effect transistor (FET). In this study, the effect of electron irradiation on a graphene FET was systematically investigated. A separate evaluation of the electron beam induced transport properties at the graphene channel and the graphene-metal contacts was conducted. This provided on-demand strategies for tuning transfer characteristics of graphene FETs by focused electron beam irradiation.

• Proceedings of the KIEE Conference
• /
• 2009.07a
• /
• pp.1517_1518
• /
• 2009

Interest has grown recently in the concept of "unconventional nanofabrication", the creation of nanoscale features by methods that avoid the technical hurdles and high cost of nano-lithographic processes. One of the challenges has been to reliably and inexpensively produce channels of nanometer dimension, as small as 60 nm, in the materials commonly used for soft lithography. In this manuscript, we present new approaches based on simple concepts of wrinkle and buckling patterns.

• Proceedings of the KSME Conference
• /
• 2007.05a
• /
• pp.426-428
• /
• 2007

A simple method is presented for fabricating micro/nanoscale combined hierarchical structures using a two-step UV-assisted capillary molding technique. This lithographic method consists of two steps: (i) fabrication of partially cured polymer microstructures using a PDMS mold and (ii) subsequent nanofabrication using a high-resolution polyurethane acrylate (PUA) mold on top of the pre-formed microstructures. Using this technique, various micro/nano hierarchical structures were fabricated with minimum resolution down to 70 nm over a large area with very good reproducibility.