• Title/Summary/Keyword: Nano-transfer printing

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Graphene Based Nano-electronic and Nano-electromechanical Devices

  • Lee, Sang-Wook
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.13-13
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    • 2011
  • Graphene based nano-electronic and nano-electromechanical devices will be introduced in this presentation. The first part of the presentation will be covered by our recent results on the fabrication and physical properties of artificially twisted bilayer graphene. Thanks to the recently developed contact transfer printing method, a single layer graphene sheet is stacked on various substrates/nano-structures in a controlled manner for fabricating e.g. a suspended graphene device, and single-bilayer hybrid junction. The Raman and electrical transport results of the artificially twisted bilayer indicates the decoupling of the two graphene sheets. The graphene based electromechanical devices will be presented in the second part of the presentation. Carbon nanotube based nanorelay and A new concept of non-volatile memory based on the carbon nanotube field effect transistor together with microelectromechanical switch will be briefly introduced at first. Recent progress on the graphene based nano structures of our group will be presented. The array of graphene resonators was fabricated and their mechanical resonance properties are discussed. A novel device structures using carbon nanotube field effect transistor combined with suspended graphene gate will be introduced in the end of this presentation.

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Novel 3D nanofabrication technique and its applications

  • Jeon, Seok-U
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2009.05a
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    • pp.15.1-15.1
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    • 2009
  • Nano transfer printing and micro contact printing is well known printing method based on soft lithography which uses conformal soft elastomer with designed surface relief structures. Here I introduce another class of novel 3D nanofabrication technique by using the same elastomer but in a different manner. The approach, which we refer to as proximity field nanopatterning, uses the surface-reliefed elastomers as phase masks to pattern thick layers of transparent, photosensitive materials. Aspects of the optics, the materials, and the physical chemistry associated with this method are outlined. A range of 3D structures illustrate its capabilities, and several application examples demonstrate possible areas of use in technologies ranging from microfluidics to photonic materials to density gradient structures for chemical release and high-energy density science.

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A Study on Polymer Replica Materials for Nanotransfer Printing (패턴전사프린팅용 고분자 복제 소재 연구)

  • Kang, Young Lim;Park, Woon Ik
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.34 no.4
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    • pp.262-268
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    • 2021
  • For the past several decades, various next-generation patterning methods have been developed to obtain well-designed nano-to-micro structures, such as imprint lithography, nanotransfer printing (nTP), directed self-assembly (DSA), E-beam lithography, and so on. Especially, nTP process has much attention due to its low processing cost, short processing time, and good compatibility with other patterning techniques in achieving the formation of high-resolution functional patterns. To transfer functional patterns onto desirable substrates, the use of soft materials is required for precise replication of master mold. Here, we introduce a simple and practical nTP method to create highly ordered structures using various polymeric replica materials. We found that polymethyl methacrylate (PMMA), polystyrene (PS), and polyvinylpyridine (PVP) are possible candidates for replica materials for reliable duplication of Si master mold based on systematic analysis of pattern visualization. Furthermore, we successfully obtained well-defined metal and oxide nanostructures with functionality on target substrates by using replica patterns, through deposition and transfer process. We expect that the several candidates of replica materials can be exploited for effective nanofabrication of complex electronic devices.

Evaluation for Adhesion Characteristics of UV-curable Bump Shape Stamp for Transfer Process (전사공정을 위한 UV 경화성 범프형 스탬프의 점착특성 평가)

  • Jeong, Yeon-Woo;Kim, Kyung-Shik;Lee, Chung-Woo;Lee, Jae-Hak;Kim, Jae-Hyun;Kim, Kwang-Seop
    • Tribology and Lubricants
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    • v.32 no.3
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    • pp.75-81
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    • 2016
  • Future electronics such as electronic paper and foldable cellphone are required to be flexible and transparent and should have a high performance. In order to fabricate the flexible electronics using flexibility transfer process, techniques for transferring various devices from rigid substrate onto flexible substrate by elastomeric stamp, have been developed. Adhesion between the elastomeric stamp and various devices is crucial for successful transfer process. The adhesion can be controlled by the thickness of the stamp, separation velocity, contact load, and stamp surface treatment. In this study, we fabricated the bump shape stamp consisting of a UV-curable polymer and investigated the effects of curing condition, separation velocity, and contact load on the adhesion characteristics of bumps. The bumps with hemispherical shape were fabricated using a dispensing process, which is one of the ink-jet printing techniques. Curing conditions of the bumps were controlled by the amount of UV irradiation energy. The adhesion characteristics of bumps are evaluated by adhesion test. The results show that the pull-off forces of bumps were increased and decreased as UV irradiation energy increased. For UV irradiation energies of 300 and 500 mJ/cm2, the pull-off forces were increased as the separation velocity increased. The pull-off forces also increased with the increase of contact load. In the case of UV irradiation energy above 600 mJ/cm2, however, the pull-off forces were not changed. Therefore, we believe that the bump shape stamp can be applied to roll-based transfer process and selective transfer process as an elastomeric stamp.

Sol-gel Derived Nano-glass for Silicon Solar Cell Metallization (솔-젤법에 의해 제조된 실리콘 태양전지 전극형성용 나노 글래스)

  • Kang, Seong Gu;Lee, Chang Wan;Chung, Yoon Jang;Kim, Chang-Gyoun;Kim, Seongtak;Kim, Donghwan;Lee, Young Kuk
    • Current Photovoltaic Research
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    • v.2 no.4
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    • pp.173-176
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    • 2014
  • We have investigated the seed layer formation of front side contact using the inkjet printing process. Conductive silver ink was printed on textured Si wafers with 80 nm thick $SiN_x$ anti reflection coating (ARC) layers and thickened by light induced plating (LIP). The inkjet printable sliver inks were specifically formulated for inkjet printing on these substrates. Also, a novel method to prepare nano-sized glass frits by the sol-gel process with particle sizes around 5 nm is presented. Furthermore, dispersion stability of the formulated ink was measured using a Turbiscan. By implementing these glass frits, it was found that a continuous and uniform seed layer with a line width of $40{\mu}m$ could be formed by a inkjet printing process. We also investigated the contact resistance between the front contact and emitter using the transfer length model (TLM). On an emitter with the sheet resistance of $60{\Omega}/sq$, a specific contact resistance (${\rho}_c$) below $10m{\Omega}{\cdot}cm^2$ could be achieved at a peak firing temperature around $700^{\circ}C$. In addition, the correlation between the contact resistance and interface microstructures were studied using scanning electron microscopy (SEM). We found that the added glass particles act as a very effective fire through agent, and Ag crystallites are formed along the interface glass layer.

Organic thin-film transistors and transistor diodes with transfer-printed Au electrodes

  • Cho, Hyun-Duck;Lee, Min-Jung;Yoon, Hyun-Sik;Char, Kook-Heon;Kim, Yeon-Sang;Lee, Chang-Hee
    • 한국정보디스플레이학회:학술대회논문집
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    • 2009.10a
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    • pp.1122-1124
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    • 2009
  • Organic thin-film transistors (OTFTs) were fabricated by using the transfer patterning method. In order to remove Au pattern easily, UV-curable polymer mold was surface treated. Au source/drain (S/D) pattern was transferred to insulator-coated substrate surface. Fabricated OTFTs were compared to OTFTs using vacuum-deposited Au S/D. Additionally, transistor diodes were characterized.

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Facile Fabrication Process for Graphene Nanoribbon Using Nano-Imprint Lithography(NIL) and Application of Graphene Pattern on Flexible Substrate by Transfer Printing of Silicon Membrane (나노임프린트 리소그래피 기술을 이용한 그래핀 나노리본 트랜지스터 제조 및 그래핀 전극을 활용한 실리콘 트랜지스터 응용)

  • Eom, Seong Un;Kang, Seok Hee;Hong, Suck Won
    • Korean Journal of Materials Research
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    • v.26 no.11
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    • pp.635-643
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    • 2016
  • Graphene has shown exceptional properties for high performance devices due to its high carrier mobility. Of particular interest is the potential use of graphene nanoribbons as field-effect transistors. Herein, we introduce a facile approach to the fabrication of graphene nanoribbon (GNR) arrays with ~200 nm width using nanoimprint lithography (NIL), which is a simple and robust method for patterning with high fidelity over a large area. To realize a 2D material-based device, we integrated the graphene nanoribbon arrays in field effect transistors (GNR-FETs) using conventional lithography and metallization on highly-doped $Si/SiO_2$ substrate. Consequently, we observed an enhancement of the performance of the GNR-transistors compared to that of the micro-ribbon graphene transistors. Besides this, using a transfer printing process on a flexible polymeric substrate, we demonstrated graphene-silicon junction structures that use CVD grown graphene as flexible electrodes for Si based transistors.

Pattern Formation of Highly Ordered Sub-20 nm Pt Cross-Bar on Ni Thin Film (Ni 박막 위 20 nm급 고정렬 Pt 크로스-바 구조물의 형성 방법)

  • Park, Tae Wan;Jung, Hyunsung;Cho, Young-Rae;Lee, Jung Woo;Park, Woon Ik
    • Korean Journal of Metals and Materials
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    • v.56 no.12
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    • pp.910-914
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    • 2018
  • Since catalyst technology is one of the promising technologies to improve the working performance of next generation energy and electronic devices, many efforts have been made to develop various catalysts with high efficiency at a low cost. However, there are remaining challenges to be resolved in order to use the suggested catalytic materials, such as platinum (Pt), gold (Au), and palladium (Pd), due to their poor cost-effectiveness for device applications. In this study, to overcome these challenges, we suggest a useful method to increase the surface area of a noble metal catalyst material, resulting in a reduction of the total amount of catalyst usage. By employing block copolymer (BCP) self-assembly and nano-transfer printing (n-TP) processes, we successfully fabricated sub-20 nm Pt line and cross-bar patterns. Furthermore, we obtained a highly ordered Pt cross-bar pattern on a Ni thin film and a Pt-embedded Ni thin film, which can be used as hetero hybrid alloy catalyst structure. For a detailed analysis of the hybrid catalytic material, we used scanning electron microscope (SEM), transmission electron microscope (TEM) and energy-dispersive X-ray spectroscopy (EDS), which revealed a well-defined nanoporous Pt nanostructure on the Ni thin film. Based on these results, we expect that the successful hybridization of various catalytic nanostructures can be extended to other material systems and devices in the near future.

The Development of High Performance Nano-composites with Carbon Nanotube (카본나노튜브를 이용한 고성능 나노복합재료의 개발 동향)

  • Lee, Min-Kyung;Bae, Soo Bin;Park, Jong Kyoo;Lee, Seung Geol
    • Textile Coloration and Finishing
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    • v.26 no.2
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    • pp.71-78
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    • 2014
  • This review paper is a state of the art report of the development of high performance nano-composites with carbon nanotube. We investigate the research and development (R&D) trends of high performance nano-composites with carbon nanotube by analyzing technical trends in research institutes and industry. We report the R&D and technology trends for the properties and applications of fabrication of hybrid composites with aligned carbon nanotubes, multifunctional fiber/carbon nanotube composites. We discuss the specific topics including unidirectional carbon nanotube, carbon nanotube forests, transfer-printing carbon nanotube technology, deposition of carbon nanotube by electrophoresis, vapor grown carbon fiber (VGCF), cup-stacked carbon nanotube, bucky paper and carbon nanotube yarns in this review paper.

Durability of Nano-/micro- Pt Line Patterns Formed on Flexible Substrate (유연기판 위 형성된 나노-마이크로 Pt 금속선 패턴의 내구성 연구)

  • Park, Tae Wan;Choi, Young Joong;Park, Woon Ik
    • Journal of the Microelectronics and Packaging Society
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    • v.25 no.3
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    • pp.49-53
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    • 2018
  • Since various methods to form well-aligned nano-/micro- patterns are underlying technologies to fabricate next generation wearable electronic devices, many efforts have been made to realize finer patterns in recent years. Among lots of patterning methods, the present invention includes a nano-transfer printing (n-TP) process which is advantageous in that a processing cost is low and high-resolution patterns can be formed within a short processing time. We successfully achieved pattern formation of highly ordered Pt lines with line-width of 250 nm, 500 nm, and $1{\mu}m$ on transparent and flexible substrates. In addition, we analyzed the durability of the patterns, showing excellent stability of line-shape even after a physical and repeated bending test of 500 times using a bending machine. As a result, it is expected that a n-TP process is very useful for forming various metal patterns, and it is also expected to be applied to wiring and interconnection technology of next generation flexible electronic devices.