• 제목/요약/키워드: Nano-scale

검색결과 1,058건 처리시간 0.057초

Genotoxicity of Aluminum Oxide ($Al_2O_3$) Nanoparticle in Mammalian Cell Lines

  • Kim, Youn-Jung;Choi, Han-Saem;Song, Mi-Kyung;Youk, Da-Young;Kim, Ji-Hee;Ryu, Jae-Chun
    • Molecular & Cellular Toxicology
    • /
    • 제5권2호
    • /
    • pp.172-178
    • /
    • 2009
  • Nanoparticles are small-scale substances (<100 nm) with unique properties, complex exposure and health risk implications. Aluminum oxide ($Al_2O_3$) nanoparticles (NP) have been widely used as abrasives, wear-resistant coatings on propeller shafts of ships, to increase the specific impulse per weight of composite propellants used in solid rocket fuel and as drug delivery systems to increase solubility. However, recent studies have shown that nano-sized aluminum (10 nm in diameter) can generate adverse effects, such as pulmonary response. The cytotoxicity and genotoxicity of $Al_2O_3$ NP were investigated using the dye exclusion assay, the comet assay, and the mouse lymphoma thymidine kinase (tk$^{+/-}$) gene mutation assay (MLA). IC$_{20}$ values of $Al_2O_3$ NP in BEAS-2B cells were determined the concentration of 273.44 $\mu$g/mL and 390.63 $\mu$g/mL with and without S-9. However IC$_{20}$ values of $Al_2O_3$ NP were found nontoxic in L5178Y cells both of with and without S-9 fraction. In the comet assay, L5178Y cells and BEAS-2B cells were treated with $Al_2O_3$ NP which significantly increased 2-fold tail moment with and without S-9. Also, the mutant frequencies in the $Al_2O_3$ NP treated L5178Y cells were increased compared to the vehicle controls with S-9. The results of this study indicate that $Al_2O_3$ NP can cause primary DNA damage and cytotoxicity but not mutagenicity in cultured mammalian cells.

Microchips and their Significance in Isolation of Circulating Tumor Cells and Monitoring of Cancers

  • Sahmani, Mehdi;Vatanmakanian, Mousa;Goudarzi, Mehdi;Mobarra, Naser;Azad, Mehdi
    • Asian Pacific Journal of Cancer Prevention
    • /
    • 제17권3호
    • /
    • pp.879-894
    • /
    • 2016
  • In micro-fluid systems, fluids are injected into extremely narrow polymer channels in small amounts such as micro-, nano-, or pico-liter scales. These channels themselves are embedded on tiny chips. Various specialized structures in the chips including pumps, valves, and channels allow the chips to accept different types of fluids to be entered the channel and along with flowing through the channels, exert their effects in the framework of different reactions. The chips are generally crystal, silicon, or elastomer in texture. These highly organized structures are equipped with discharging channels through which products as well as wastes of the reactions are secreted out. A particular advantage regarding the use of fluids in micro-scales over macro-scales lies in the fact that these fluids are much better processed in the chips when they applied as micro-scales. When the laboratory is miniaturized as a microchip and solutions are injected on a micro-scale, this combination makes a specialized construction referred to as "lab-on-chip". Taken together, micro-fluids are among the novel technologies which further than declining the costs; enhancing the test repeatability, sensitivity, accuracy, and speed; are emerged as widespread technology in laboratory diagnosis. They can be utilized for monitoring a wide spectrum of biological disorders including different types of cancers. When these microchips are used for cancer monitoring, circulatory tumor cells play a fundamental role.

물통합형 정삼투 시스템을 이용한 파일럿 스케일 담수 공정 모사 (Pilot-Scale Simulation of Desalination Process Using Water Integrated Forward Osmosis System)

  • 김봉철;홍승관;최준석
    • 한국물환경학회지
    • /
    • 제33권4호
    • /
    • pp.403-408
    • /
    • 2017
  • In these days, wastewater reclamation and seawater desalination play essential role in addressing the challenge of worldwide water scarcity. Particularly, reverse osmosis (RO) for seawater desalination process is commonly used due to less energy consumption than conventional thermodynamic systems. However, membrane fouling and electrical energy consumption during operation of RO system for seawater desalination haver continued to be a obstruction to its application. In this study, therefore, wastewater secondary effluent is used for osmotic dilution of seawater. Firstly, fouling behaviour of RO by simulating wastewater effluent in osmotic dilution process was measured and we calculated energy consumption of overall desalination process by theoretical equations and commercial program. Our results reveal that RO membrane fouling can be efficiently controlled by pre-treatment systems such as nano filtration (NF) or forward osmosis (FO) process. Especially FO system for osmotic dilution process is a non-pressurized membrane system and, therefore, the operating energy consumption of overall desalination system was the lowest. Moreover, fouling layer on FO membrane is comparatively weak and reversible enough to be disrupted by physical cleaning. Thus, RO system with low salinity feed water through FO process is possible as a less energy consuming desalination system with efficient membrane fouling control.

양축 정렬된 니켈기판의 표면 산화반응 연구 (A Study on the Surface Oxidation Behavior of Cube-textured Nickel Substrate)

  • 안지현;김병주;김재근;김호진;홍계원;이희균;유재무
    • Progress in Superconductivity
    • /
    • 제7권1호
    • /
    • pp.58-63
    • /
    • 2005
  • We investigated the surface oxidation behavior of cube-textured polycrystalline nickel at various oxidation conditions. Cube-textured NiO film was formed on a cube-textured polycrystalline nickel regardless of oxidation conditions but different growth behavior of NiO crystals was observed depending on the oxidation conditions. The introduction of water vapor into $O_2$ did not affect the texture evolution, but rough and porous microstructure was developed. Microstructure of NiO film tends to be denser as the oxygen partial pressure increases. It is interesting that (111) peak of theta - two theta diffraction pattern started to get stronger in air atmosphere and (111) plane became the major texture in the substrate oxidized in high purity argon gas. Small amount of high index crystallographic plane NiO peak crystal was observed when $N_{2}O$ was used as an oxidant while only (200) plane crystal was formed in dry $O_2$ atmosphere. Flat and smooth surface was changed into rough faceted one when ramping rate to oxidation temperature was faster. The grain size of NiO was decreased when the oxygen partial pressure was low. It was also observed that the modification of nickel surface suppressed the development of (200) texture.

  • PDF

MOD-TFA 공정에 의한 YBCO박막제조시 과잉 yttrium첨가 효과에 관한 연구 (Effects of Excess Yttrium Addition on YBCO Thin Films Prepared by TFA-MOD Process)

  • 이승이;송슬아;김병주;박진아;김호진;이희균;홍계원;장석헌;주진호;유재무
    • Progress in Superconductivity
    • /
    • 제7권1호
    • /
    • pp.87-91
    • /
    • 2005
  • [ $YBa_{2}Cu_{3}O_{7-x}$ ] thin films were fabricated on $LaAlO_3$(100) substrate by TFA-MOD process. Yttrium-excess (0, 2.5, 5, 10, 15, 20 $at\%$) coating solution was prepared by adding extra amount of yttrium into a stoichiometric(Y:Ba:Cu=1:2:3) TFA precursor solution. Results are presented concerning the influence of excess yttrium additions on the microstructure development and superconducting properties of $YBa_{2}Cu_{3}O_{7-x}$ film. Large sized CuO particles was observed by SEM EDS investigation. The addition of excess yttrium affected little on $T_c$ of $YBa_{2}Cu_{3}O_{7-x}$ film. $J_c$ of YBCO film was enhanced with excess yttrium addition. Jc maximum of $2.21\;MA/cm^2$ (77 K, self field) appeared with the $15\;at\%$ addition of excess yttrium. With further yttrium addition up to $20\;at\%$, Jc decreased down to $0.9\;MA/cm^2$.

  • PDF

CHE 주입방법과 기판 순바이어스를 이용한 새로운 고온 전자 주입방법의 프로그램 효율성 비교에 관한 연구 (A Study on The Comparison of The Program Efficiency in The Conventional CHE Injection Method and a novel Hot Electron Injection Method Using A Substrate forward Bias)

  • 장영걸;안호명;김희동;김태근
    • 대한전자공학회논문지SD
    • /
    • 제47권1호
    • /
    • pp.1-5
    • /
    • 2010
  • 본 논문에서는, SONOS 소자에서의 일반적인 CHE(Channel Hot Electron) 주입 방법과 기판 순바이어스를 이용한 새로운 전자 주입 방법의 프로그램 효율성에 대해 직접 비교하였다. 기존의 CHE 주입 방법과 비교해서, 새로운 전자 주입 방법은 낮은 구동전압, 빠른 프로그램 속도 등의 특성을 포함하여 높은 프로그램효율을 보였으며, 또한 드레인 영역에서의 순방향 읽기와 역방향 읽기의 문턱전압 차이가 1 V 가량 발생한다는 점에서 국소 주입 동작이 가능함을 확인하였다. 이렇게 제안된 전자주입 방법은 차세대 나노 크기 멀티-비트 SONOS 소자의 동작에 매우 유용하게 사용될 것으로 기대된다.

Mechanical analysis of cutout piezoelectric nonlocal nanobeam including surface energy effects

  • Eltaher, Mohamed A.;Omar, Fatema-Alzahraa;Abdalla, Waleed S.;Kabeel, Abdallah M.;Alshorbagy, Amal E.
    • Structural Engineering and Mechanics
    • /
    • 제76권1호
    • /
    • pp.141-151
    • /
    • 2020
  • This manuscript tends to investigate influences of nanoscale and surface energy on a static bending and free vibration of piezoelectric perforated nanobeam structural element, for the first time. Nonlocal differential elasticity theory of Eringen is manipulated to depict the long-range atoms interactions, by imposing length scale parameter. Surface energy dominated in nanoscale structure, is included in the proposed model by using Gurtin-Murdoch model. The coupling effect between nonlocal elasticity and surface energy is included in the proposed model. Constitutive and governing equations of nonlocal-surface perforated Euler-Bernoulli nanobeam are derived by Hamilton's principle. The distribution of electric potential for the piezoelectric nanobeam model is assumed to vary as a combination of a cosine and linear variation, which satisfies the Maxwell's equation. The proposed model is solved numerically by using the finite-element method (FEM). The present model is validated by comparing the obtained results with previously published works. The detailed parametric study is presented to examine effects of the number of holes, perforation size, nonlocal parameter, surface energy, boundary conditions, and external electric voltage on the electro-mechanical behaviors of piezoelectric perforated nanobeams. It is found that the effect of surface stresses becomes more significant as the thickness decreases in the range of nanometers. The effect of number of holes becomes significant in the region 0.2 ≤ α ≤ 0.8. The current model can be used in design of perforated nano-electro-mechanical systems (PNEMS).

한국 남자 군인 현 방한복의 치수, 동작적합성 만족도에 관한 연구 (Satisfaction on Fitness and Motion Suitability of Korean male Military Winter Jacket)

  • 한현숙;한현정;조자영;고준석
    • 한국의류산업학회지
    • /
    • 제18권5호
    • /
    • pp.685-694
    • /
    • 2016
  • This study investigates the problems of fitness and motion suitability for Korean male military winter jackets (inner and outer) and provides data for new pattern development. We analyzed fitness and motion suitability by a questionnaire survey with 140 Korean male soldiers and a wearing evaluation with 7 subjects of central army male size. A survey of male soldiers indicated that the fitness and motion suitability satisfaction was over 3.0 (Likert scale) for both inner and outer jackets. There were opinions that the sleeve length was short for the inner jacket and the waist girth and hem girth was slightly large for the outer jacket. In the wearing evaluation results with subjects of central army male size, fitness of total length, sleeve length and collar height showed a score lower than 3.0 for the inner jacket and collar height on the outer jacket. The motion suitability result showed a low score (1.0-2.0) in an arm raising motion for the inner jacket and 2.0-3.0 at neck motion in the outer jacket. In conclusion, there is more dissatisfaction in inner jackets than outer jackets. For the inner jacket, sleeve is short, sleeve hem is narrow, collar height is a little high and the sleeve creeps up during arm motion. The waist girth and hem girth was slightly large and collar height was a little high for the outer jacket.

Growth and characterization of periodically polarity-inverted ZnO structures grown on Cr-compound buffer layers

  • Park, J.S.;Goto, T.;Hong, S.K.;Chang, J.H.;Yoon, E.;Yao, T.
    • 한국진공학회:학술대회논문집
    • /
    • 한국진공학회 2010년도 제39회 하계학술대회 초록집
    • /
    • pp.259-259
    • /
    • 2010
  • Periodically polarity inverted (PPI) ZnO structures on (0001) Al2O3 substrates are demonstrated by plasmas assisted molecular beam epitaxy. The patterning and re-growth methods are used to realize the PPI ZnO by employing the polarity controlling method. For the in-situ polarity controlling of ZnO films, Cr-compound buffer layers are used.[1, 2] The region with the CrN intermediate layer and the region with the Cr2O3 and Al2O3 substrate were used to grow the Zn- and O-polar ZnO films, respectively. The growth behaviors with anisotropic properties of PPI ZnO heterostructures are investigated. The periodical polarity inversion is evaluated by contrast images of piezo-response microscopy. Structural and optical interface properties of PPI ZnO are investigated by the transmission electron microcopy (TEM) and micro photoluminescence ($\mu$-PL). The inversion domain boundaries (IDBs) between the Zn and the O-polar ZnO regions were clearly observed by TEM. Moreover, the investigation of spatially resolved local photoluminescence characteristics of PPI ZnO revealed stronger excitonic emission at the interfacial region with the IDBs compared to the Zn-polar or the O-polar ZnO region. The possible mechanisms will be discussed with the consideration of the atomic configuration, carrier life time, and geometrical effects. The successful realization of PPI structures with nanometer scale period indicates the possibility for the application to the photonic band-gap structures or waveguide fabrication. The details of application and results will be discussed.

  • PDF

리모트 플라즈마 원자층 증착 기술 및 high-k 응용

  • Jeon, Hyeong-Tag;Kim, Hyung-Chul
    • 한국재료학회:학술대회논문집
    • /
    • 한국재료학회 2010년도 춘계학술발표대회
    • /
    • pp.6.1-6.1
    • /
    • 2010
  • 원자층 증착 기술 (Atomic Layer Deposition)은 기판 표면에서 한 원자층의 화학적 흡착 및 탈착을 이용한 nano-scale 박막 증착 기술이기 때문에, 표면 반응제어가 우수하며 박막의 물리적 성질의 재현성이 우수하고, 대면적에서도 균일한 두께의 박막 형성이 가능하며 우수한 계단 도포성을 확보 할 수 있다. 최근 ALD에 의한 박막증착 방법 중 플라즈마를 이용한 ALD 증착 방법에 대한 다양한 연구가 진행되고 있다. 플라즈마는 반응성이 좋은 이온과 라디컬을 생성하여 소스간 반응성을 좋게 하여, 소스 선택의 폭을 넓어지게 하고, 박막의 성질을 좋게 하며, 생산성을 높일 수 있는 장점이 있다. 그러나 플라즈마를 사용함으로써 플라즈마 내에 이온들이 가속되서 박막 증착 중에 기판 및 박막에 손상을 입혀 박막 특성을 열화 시킬 가능성이 있다. 따라서 플라즈마 발생 영역을 기판으로부터 멀리 떨어뜨린 원거리 플라즈마 원자층 공정이 개발 되었다. 이 기술은 플라즈마에서 생성된 ion이 기판이나 박막에 닫기 전에 전자와 재결합 되거나 공정 chamber에서 소멸하여 그 영향을 최소하고 반응성이 좋은 라디칼과의 반응만을 유도하여 향상된 막질을 얻을 수 있도록 하였다. 따라서 이 원거리 플라즈마 원자층 증착기술은 나노 테크놀러지 소자 개발하기 위한 나노 박막 기술에 있어서 그 활용이 점점 확대될 것이다. 그 적용으로써 리모트 플라즈마 원자층 증착 방법을 이용한 고유전 물질 개발이 있다. 반도체 소자의 고집적화 및 고속화가 요구됨에 따라 집적회로의 크기를 혁신적으로 축소하여 스위칭 속도(switching speed)를 증가시키고, 전력손실 (power dissipation)을 줄이려는 시도가 이루어지고 있다. 그 중 하나로 고유전율 절연막은 트렌지스터 소자의 스케일링 과정에 수반하여 커지는 게이트 누설 전류를 억제하기 위한 목적으로 도입되었다. 유전율이 크면 동일한 capacitance를 내는데 필요한 물리적인 두께를 늘릴 수 있어 전자의 tunneling을 억제할 수 있고 전력손실을 줄일 수 있기 때문이다. 이와 같은 고유전율 물질이 게이트 산화막으로 사용되기 위해서 높은 유전상수 열역학적 안정성, 낮은 계면 전하밀도, 낮은 EOT, 전극 물질과의 양립성 등의 특성이 요구되는데, 이에 따라 많은 유전물질에 대한 연구가 진행되었다. 기존 gata oxide를 대체하기 위한 가장 유력한 후보 재료로 주목 받고 있는 high-k 물질들로는 Al2O3, HfO2, ZrO2, La2O3 등이 있다. 본 발표에서는 ALD의 종류에 따른 기술을 소개하고 그 응용으로 고유전율 물질 개발 연구 (고유전율 산화물 박막의 증착, 고유전율 산화물의 열적 안정성 평가, Flatband 매카니즘 규명, 전기적 물리적 특성 분석)에 대해서 발표 하고자 한다.

  • PDF