• 제목/요약/키워드: Nano-patterning process

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AFM 부착형 초미세 다이아몬드 팁 켄틸레버의 제작 및 응용 (Fabrication of Micro Diamond Tip Cantilever for AFM and its Applications)

  • 박정우;이득우
    • 한국공작기계학회:학술대회논문집
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    • 한국공작기계학회 2005년도 춘계학술대회 논문집
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    • pp.395-400
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    • 2005
  • Nano-scale fabrication of silicon substrate based on the use of atomic force microscopy (AFM) was demonstrated. A specially designed cantilever with diamond tip, allowing the formation of damaged layer on silicon substrate by a simple scratching process, has been applied instead of conventional silicon cantilever for scanning. A thin damaged layer forms in the substrate at the diamond tip-sample junction along scanning path of the tip. The damaged layer withstands against wet chemical etching in aqueous KOH solution. Diamond tip acts as a patterning tool like mask film for lithography process. Hence these sequential processes, called tribo-nanolithography, TNL, can fabricate 2D or 3D micro structures in nanometer range. This study demonstrates the novel fabrication processes of the micro cantilever and diamond tip as a tool for TNL using micro-patterning, wet chemical etching and CVD. The developed TNL tools show outstanding machinability against single crystal silicon wafer. Hence, they are expected to have a possibility for industrial applications as a micro-to-nano machining tool.

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AFM 기반 Tribo-Nanolithography 를 위한 초미세 다이아몬드 팁 켄틸레버의 제작 (Fabrication of Micro Diamond Tip Cantilever for AFM-based Tribo-Nanolithography)

  • 박정우;이득우
    • 한국정밀공학회지
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    • 제23권8호
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    • pp.39-46
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    • 2006
  • Nano-scale fabrication of silicon substrate based on the use of atomic force microscopy (AFM) was demonstrated. A specially designed cantilever with diamond tip, allowing the formation of damaged layer on silicon substrate by a simple scratching process, has been applied instead of conventional silicon cantilever for scanning. A thin mask layer forms in the substrate at the diamond tip-sample junction along scanning path of the tip. The mask layer withstands against wet chemical etching in aqueous KOH solution. Diamond tip acts as a patterning tool like mask film for lithography process. Hence these sequential processes, called tribo-nanolithography, TNL, can fabricate 2D or 3D micro structures in nanometer range. This study demonstrates the novel fabrication processes of the micro cantilever and diamond tip as a tool for TNL using micro-patterning, wet chemical etching and CVD. The developed TNL tools show outstanding machinability against single crystal silicon wafer. Hence, they are expected to have a possibility for industrial applications as a micro-to-nano machining tool.

핫엠보싱 공정에서의 미세 패턴 성형에 관한 연구 (Study of nano patterning rheology in hot embossing process)

  • 김호;김광순;김헌영;김병희
    • 한국소성가공학회:학술대회논문집
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    • 한국소성가공학회 2003년도 추계학술대회논문집
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    • pp.371-376
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    • 2003
  • The hot embossing process has been mentioned as one of major nanoreplication techniques. This is due to its simple process, low cost, high replication fidelity and relatively high throughput. As the initial step of quantitating the embossing process, simple parametric study about embossing time have been carried out using high-resolution masters which patterned by the DRIE process and laser machining. Under the various embossing time, the viscous flow of thin PMMA films into microcavities during Compression force has been investigated. Also, a study about simulating the viscous flow during embossing process has planned and continuum scale FDM analysis was applied on this simulation. With currently available test data and condition, simple FDM analysis using FLOW3D was made attempt to match simulation and experiment.

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롤압연, 압출, 단조 등 전통 기계가공법의 모사 응용을 통한 다양한 나노패턴의 대면적 연속생산 기술 구현 (Development of Continuous and Scalable Nanomanufacturing Technologies Inspired by Traditional Machining Protocols Such as Rolling, Pullout, and Forging)

  • 옥종걸;곽문규
    • 한국생산제조학회지
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    • 제24권2호
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    • pp.198-202
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    • 2015
  • We present a series of simple but novel nanopatterning methodologies inspired by traditional mechanical machining processes involving rolling, pullout, and forging. First, we introduce roll-to-roll nanopatterning, which adapts conventional rolling for continuous nanopatterning. Then, nano-inscribing and nano-channel lithography are demonstrated, whereby seamless nanogratings can be continuously pulled out, as in a pullout process. Finally, we discuss vibrational indentation micro- and nanopatterning. Similarly to the forging/indentation process, this technique employs high-frequency vertical vibration to indent periodic micro/nanogratings onto a horizontally fed substrate. We discuss the basic principles of each process, along with its advantages, disadvantages, and potential applications. Adopting mature and reliable traditional technologies for small-scale machining may allow continuous nanopatterning techniques to cope with scalable and low-cost nanomanufacturing in a more productive and trustworthy way.

마모 및 나노 압입 시험을 이용한 PUA계 레진의 내구성 비교 (Comparison of Durability for PUA Type Resin using Wear and Nano-indentation Test)

  • 최현민;권신;정윤교;조영태
    • 한국기계가공학회지
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    • 제17권5호
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    • pp.8-15
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    • 2018
  • Films with special properties (e.g., water-repellent films, optical films, anti-reflection films, and flexible films) are referred to as functional films. Recently, there has been interest in fine patterning methods for film fabrication. In particular there have been many studies that use a UV nanoimprint process involving a UV curing method. In this paper, a polymer film was fabricated by the UV nanoimprint process with a micro-pattern, and its durability was evaluated by a wear test and a nano-indentation test. The film mechanical properties (such as coefficient of friction, hardness, and modulus of elasticity) were measured. Moreover, the choice of PUA type resin used in the UV nanoimprint process was confirmed to impact the durability of the thin film. Despite making the polymer film samples using the same method and PUA type resin, different coefficient of friction, hardness, and modulus of elasticity values were obtained. PUA 4 resin had the most favorable coefficient of friction, hardness, and modulus of elasticity. This material is predicted to produce a high durability functional film.

FTS시스템을 이용한 룰외 미세 패턴 가공 (Micro Patterning of Roll using Fast Tool Servo System)

  • 여굉;최수창;이상민;박천홍;이득우
    • 한국기계가공학회지
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    • 제10권6호
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    • pp.22-26
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    • 2011
  • The application of fast tool servo (FTS) for diamond turning has been investigated extensively. This paper focuses on the fabrication of the sinusoidal microstructure on a roller, which generated by a piezoelectric-assisted FTS. The influence of the machining parameters on the microstructure configuration was investigated. The experiment results point out that the configuration of the machined microstructure depends mainly on the spindle speed, the diameter of roller and the driving frequency of FTS. The calculation method of the microstructure dimension was reported. The turning test results show that the diamond tool can be moved up to 1kHz without any reinjected vibration in the machining and the peak-to-valley amplitude of the machined sinusoidal microstructure is about 12<${\mu}m$

잉크젯 프린팅에 의한 단일벽 탄소나노튜브의 패터닝 (Patterning of Single-wall Carbon Nanotube using Ink-jet Printing)

  • 송진원;윤여환;한창수
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2007년도 제38회 하계학술대회
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    • pp.236-237
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    • 2007
  • A single-wall carbon nanotube (SWNT) transparent conductive film (TCF) was fabricated using a simple inkjet printing method. The TCF could be selectively patterned by controlling the dot size to diameters as small as 34${\mu}m$. In thisrepeatable and scalable process, we achieved 71% film transmittance and a resistance of 900 ohm/sq sheet with an excellent uniformity, about $\pm$5% deviation overall. Inkjet printing of SWNT is substrate friendly and the TCF is printed on a flexible substrate. This method of fabrication using direct printing permits mass production of TCF in a large area process, reducing processing steps and yielding low-cost TCF fabrications on a designated area using simple printing.

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집속이온빔을 이용한 실리콘 나노 패터닝: 시뮬레이션과 가공 (Silicon Nano Patterning Using Focused ion Beam: Simulation and Fabrication)

  • 한진;민병권;이상조
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2006년도 춘계학술대회 논문집
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    • pp.489-490
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    • 2006
  • To establish fabrication techniques for nano structure understanding of focused ion beam (FIB) milling process is required. In this study the mathematical model containing the factors related to FIB milling is developed to acquire the optimal fabrication condition. Then, the model is verified by comparison with various nano pattern fabricated in actual FIB system. Consequently, it is demonstrated that the nano patterns with the smallest pitch can be fabricated using developed FIB milling model.

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DVD/Blu-ray 스템퍼를 이용한 핫엠보싱 특성 (Characteristics of Hot Embossing using DVD/Blu-ray Stamper)

  • 김병희;반준호;신재구;김헌영
    • 한국소성가공학회:학술대회논문집
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    • 한국소성가공학회 2004년도 추계학술대회논문집
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    • pp.305-310
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    • 2004
  • The Hot Embossing Lithography(HEL) as a method for the fabrication of nanostructure with polymer is becoming increasingly important because of its simple process, low cost, high replication fidelity and relatively high throughput. In this study, we investigated the characteristics of hot embossing lithography as a nanoreplication technique. To grasp characteristics of nano patterning rheology by process parameters(embossing temperature, pressure and time), we have carried out various experiments by using the DVD(400nm pattern width) and Blu-ray nickel stamps(150nm pattern width). During the hot embossing process, we have observed the characteristics of the size effect. The quality of products made by hot embossing is affected by its cooling shrinkage. The demolding process at the glass transition temperature results in low quality because of the shrinkage of the polymer. Therefore, the quantification of the temperature condition is essential for the replication of high quality.

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롤 기반 나노임프린트 리소그래피 시스템 기술 (Technology for Roll-based Nanoimprint Lithography Systems)

  • 임형준;이재종;최기봉;김기홍;이성휘
    • 한국기계가공학회지
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    • 제12권5호
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    • pp.1-8
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    • 2013
  • Roll-based, nanoimprint lithography (Roll-NIL) is one effective method to produce large-area nanopatterns continuously. Systems and processes for Roll-NIL have been developed and studied for more than 15 years. Since the shapes of the stamp and the substrate for Roll-NIL can be plates, films, and rolls, there exist many concepts to design and implement roll-NIL systems. Combinations and variations of contact-methods for variously shaped stamps and substrates are analyzed in this paper. The contact-area can be changed by using soft materials such as polydimethylsiloxane (PDMS) or silicone rubber. Ultraviolet (UV) sources appropriate for the roll-to-plate or roll-to-roll process are introduced. Finally, two roll-to-plate nanoimprint lithography systems are illustrated.