Proceedings of the Korean Society of Precision Engineering Conference (한국정밀공학회:학술대회논문집)
- 2006.05a
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- Pages.489-490
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- 2006
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- 2005-8446(pISSN)
Silicon Nano Patterning Using Focused ion Beam: Simulation and Fabrication
집속이온빔을 이용한 실리콘 나노 패터닝: 시뮬레이션과 가공
Abstract
To establish fabrication techniques for nano structure understanding of focused ion beam (FIB) milling process is required. In this study the mathematical model containing the factors related to FIB milling is developed to acquire the optimal fabrication condition. Then, the model is verified by comparison with various nano pattern fabricated in actual FIB system. Consequently, it is demonstrated that the nano patterns with the smallest pitch can be fabricated using developed FIB milling model.