• 한국재료학회지
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• 제11권10호
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• pp.869-878
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• 2001

Alumina $(Al_2O_3)$ green bodies were fabricated by gel-casting using three kinds of alumina with different particle size (mean particle size: 4.6 $\mu\textrm{m}$, 0.32 $\mu\textrm{m}$, 10nm). The effects of particle size on gel-casting process and green microstructure were investigated. The optimum dispersion conditions using ammonium salt (D-3019) as dispersant were 0.2 wt% (4.63 $\mu\textrm{m}$), 0.5 wt% (0.32 $\mu\textrm{m}$), and 5.0 wt% (10 nm), in high solid loading. The optimum solid loading of each starting material for gel-casting was obtained as 59 vol% (4.63 $\mu\textrm{m}$), 57 vol% (0.32 $\mu\textrm{m}$), 15 vol% (10 nm), depending on particle size, indicating that nano-size particle (10 nm) represent lower solid loading as high specific surface area than those of other two starting materials. The drying at ambient conditions (humidity; $\thickapprox$90%) was performed more than 48hrs to enable ejection of the part from the mold and then at $120^{\circ}C$ for 2hrs in an air oven, showing no crack and flaw in the dried green bodies. The pore size and distribution of the gelcast green bodies showed the significant decrease with decreasing particle size. Green microstructure was dependent on the pore size and distribution due to the particle size, and on the deairing step. The green density maximum obtained was 58.9% (4.63 $\mu\textrm{m}$), 60% (0.32 $\mu\textrm{m}$), 47% (10 nm) theoretical density (TD), and the deairing step applied before gel-casting did not affect green density.

• 한국재료학회:학술대회논문집
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• 한국재료학회 2012년도 춘계학술발표대회
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• pp.81.1-81.1
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• 2012

나노임프린트 리소그라피(Nano-Imprint Lithography, NIL) 기술은 기판위의 resin을 나노구조물이 각인된 스탬프로 눌러서 나노구조물을 형성하는 기술로, 경제적이고 효과적으로 나노구조물을 제작할 수 있는 기술이다. 그중에서도 UV 기반의 나노임프린트(UV-NIL) 기술은 resin을 투명한 스탬프로 누른뒤 UV로 경화시켜 나노구조물을 형성하는 기술로써 고온, 고압($140{\sim}180^{\circ}C$, 10~30bar)이 필요한 가열식 나노임프린트 기술에 비해 상온, 상압($20^{\circ}C$, 1bar)에서도 구조물 형성이 가능하여 다층구조 형성에 적합하다. 연속적인 임프린팅 공정에 의해 resin이 quarz 스탬프에 잔류하여 패터닝에 결함을 유발하게 되므로 오염물을 제거하기 위한 세정공정이 필요하다. 하지만 UV에 의해 경화된 resin은 cross-linking을 형성하여 화학적인 내성이 증가하게 되므로 제거하기가 어렵다. 현재는 resin 제거를 위한 세정공정으로 SPM($H_2SO_4/H_2O_2$) 세정이 사용되고 있는데 세정시간이 길고 세정 후에 입자 또는 황 잔유물이 남으며 많은 유해용액 사용의 문제점이 있어 효과적으로 resin을 제거할 세정공정이 필요한 상황이다. 본 연구에서는 친환경적인 UV 세정 및 오존수 세정공정을 적용하여 경화된 resin을 제거하는 연구를 진행하였다. 실험샘플은 약 100nm 두께의 resin을 증착한 $1.5cm{\times}1.5cm$ $SiO_2$ 쿠폰 wafer를 사용하였으며, UV 및 오존수의 처리시간을 달리하여 resin 제거효율을 평가하였다. ATR-FTIR 장비를 사용하여 시간에 따른 resin의 두께를 측정한 결과, UV 세정으로 100nm 높이의 resin중에 80nm의 bulk resin이 단시간에 제거가 되었고 나머지 20nm의 resin thin film은 오존수 세정으로 쉽게 제거되는 것을 확인 하였다. 또한 표면에 남은 resin residue와 particle을 제거하기 위해서 SC-1 세정을 진행하였고 contact angle과 optical microscope 장비를 사용하여 resin이 모두 제거된 것을 확인하였다.

• 열처리공학회지
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• 제24권3호
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• pp.127-132
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• 2011

The silicon-containing Diamond-like Carbon (Si-DLC) film as an low friction coefficient coating has especially treated a different silicon content by plasma-enhanced chemical vapor deposition (PECVD) process at $500^{\circ}C$ on nitrided-STD 11 mold steel with (TMS) gas flow rate. The effects of variable silicon content on the Si-DLC films were tested with relative humidity of 5, 30 and 85% using a ball-on-disk tribometer. The wear-tested and original surface of Si-DLC films were analysed for an understanding of physical and chemical characterization, including a changing structure, via Raman spectra and nano hardness test. The results of Raman spectra have inferred a changing intra-structure from dangling bonds. And high silicon containing DLC films have shown increasing carbon peak ratio ($I_D/I_G$) values and G-peak values. In particular, the tribological tested surface of Si-DLC was shown the increasing hardness value in proportional to TMS gas flow rate. Therefore, at same time, the structure of the Si-DLC film was changed to a different intra-structure and increased hardness film with mechanical shear force and chemical reaction.

• 폴리머
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• 제30권5호
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• pp.407-411
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• 2006

액상의 고분자 전구체 polyvinylsilazane (PVS) 혹은 allylhydridopolycarbosilane(AHPCS)를 실리콘 기판 위에 스핀 코팅한 다음, DVD 마스터로부터 제조된 polydimethylsiloxane(PDMS) 몰드를 이용한 자외선 나노임프린트법으로 나노 크기의 고분자 패턴을 제조하였다. 나아가 질소 분위기하에서 $800^{\circ}C$ 열처리함으로써 각각 SiCN, SiC 세라믹 패턴도 제조하였다. 가교된 고분자와 세라믹 패턴의 폭과 넓이를 원자힘현미경(AFM)과 주사전자현미경(SEM)으로 관측한 결과 PVS와 AHPCS의 패턴 높이는 각각 38.5%와 24.1%, 패턴 폭은 18.8%와 16.7%의 수축률을 나타내었다. 즉 전구체의 세라믹 수율이 높을수록 세라믹 패턴 수축률은 낮아졌고, 패턴과 기판과의 접착에 의한 수축억제로 이방성 수축현상도 관찰되었다. 본 연구결과는 새로운 세라믹 MEMS 소자제작공정으로서 나노임프린트법의 가능성과 수축률 제어 연구가 필요함을 제시하고 있다.

• 한국전기전자재료학회논문지
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• 제31권4호
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• pp.267-271
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• 2018

A high directivity TIR (total internal reflection) lens in the UV-A region was designed using a silicone resin, and a UV light source module with a maximum irradiation density of $150mW/cm^2$ was fabricated. The beam angle of the TIR lens was designed to be $8.04^{\circ}$ and the maximum diameter of the TIR lens was Ø13.5. A silicone resin having a UV transmittance of 93% and a refractive index of 1.4 at a wavelength of 365 nm was used, and the lens was manufactured using an aluminum mold, from which silicone could be easily released. The module was fabricated in a metal printed circuit board of COB (chip on board) type using a $0.75{\times}0.75mm^2$ UV chip. A jig was used to adjust the focal length between lens and chip and to fix the position of the lens. The optical characteristics such as illumination distributions of the lens and module were designed using 'LightTools' optical simulation software. The heat dissipation system was designed to use a forced-air cooling method using a heat-sink and fan.

• 한국표면공학회지
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• 제38권3호
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• pp.126-135
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• 2005

SKD 11 steel has been widely used for tools, metallic mold and die for press working because of its favorable mechanical properties such as high toughness and creep strength as well as excellent oxidation resistance. The ion nitrided tool steel containing Mo results in improvement of corrosion resistance, strength at high temperature and pitting resistance, especially in $Cl^-$ contained environment. But the Mo addition causes a disadvantage such as lower oxidation resistance at elevated temperature. In this study, several effects of ion-disadvantage on the oxidation characteristics for SKD 11 steel with various oxidation temperature were investigated. SKD 11 steels were manufactured by using vacuum furnace and solutionized for 1 hr at $1,050^{\circ}C$. Steel surface was ion nitrided at $500^{\circ}C$ for 1 hr and 5 hr by ion nitriding equipment. ion nitrided specimen were investigated by SEM, OM and hardness tester. Oxidation was carried out by using muffle furnace in air at $500^{\circ}C,\;700^{\circ}C\;and\;900^{\circ}C$ for 1hr, respectively. Oxidation behavior of the ion nitrided specimen was investigated by SEM, EDX and surface roughness tester. The conclusions of this study are as follows: It was found that plasma nitriding for 5 hr at $500^{\circ}C$, compared with ion nitriding for 1 hr at $500^{\circ}C$, had a thick nitrided layer and produced a layer with good wear, corrosion resistance and hardness as nitriding time increased. Nitrided SKD 11 alloy for 1hr showed that wear resistance and hardness decreased, whereas surface roughness increased, compared with nitrided SKD 11 alloy for 5 hr. The oxidation surface at $900^{\circ}C$ showed a good corrosion resistance.

• 한국재료학회지
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• 제15권9호
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• pp.589-593
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• 2005

Nanoimprinting lithography (NIL) is known as a suitable technique for fabricating nano and micro structures of high definition. Hot embossing is one of NIL techniques and can imprint on thin films and bulk polymers. Key issues of hot embossing are time and expense needed to produce a stamp withstanding a high temperature and pressure. Fabrication of a metal stamp such as an electroplated nickel is cost intensive and time consuming. A ceramic stamp made by silicon is easy to break when the pressure is applied. In this paper, a plastic stamp using a high temperature epoxy was fabricated and tested. The plastic stamp was relatively inexpensive, rapid to produce and durable enough to withstanding multiple hot embossing cycles. The merits of low viscosity epoxy solutions were a fast degassing and a rapid filling the microstructures. The hot embossing process with plastic stamp was performed on PMMA substrates. The hot embossing was conducted at 12.6 bar, $120^{\circ}C$ and 10 minutes. An imprinted PMMA wafer was almost same value of the plastic stamp after 10 times embossing. Entire fabrication process from silicon master to plastic stamp was completed within 12 hours.

• 한국해양공학회지
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• 제32권6호
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• pp.502-510
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• 2018

In order to accumulate data to lower the friction coefficient of a press mold, tribological tests were performed before and after coating SM45C with a PVC/PO film and plasma coating (CrN, concept). The ultrasonic nanocrystal surface modification (UNSM)-treated material had a nano-size surface texture, high surface hardness, and large and deep compressive residual stress formation. Even when the load was doubled, the small amount of abrasion, small weight of the abrasion, and width and depth of the abrasion did not increase as much as those of untreated materials. A comparison of the weight change before and after the tribological test with the CrN and the concept coating material and that of the untreated material showed that the wear loss of the concept coating material and P-UNSM treated material (that is, the UNSM treated material treated with the concept coating) showed a tendency to decrease by approximately 55-75%. Concept 100N had a lower friction coefficient of about 0.6, and P-UNSM-30-100N showed almost the same curve as concept 100N and had a low coefficient of friction of about 0.6. The concept multilayer coating had a thickness of $5.32{\mu}m$. In the beginning, the coefficient of friction decreased because of the plasma coating, but it started to increase from about 250-300 s. After about 350 s, the coefficient of friction tended to approach the friction coefficient of the SM45C base metal. The SGV-280F film-attached test specimen was slightly pushed back and forth, but the SM45C base material was not exposed due to abrasion. The friction coefficient was 0.22, which was the lowest, and the tribological property was the best in this study.

• 한국초전도ㆍ저온공학회논문지
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• 제21권2호
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• pp.40-44
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• 2019

In this study, the effects of the compaction method for (Mg+2B) powders on the apparent density and superconducting properties of $MgB_2$ bulk superconductor were investigated. The raw powders used in this study were nano-sized boron (B) and spherical magnesium (Mg). A batch of a powder mixture of (Mg+2B) was put in a steel mold and uniaxially pressed at 1 ton or 3 tons into pellets. Another batch of the powder mixture was uniaxially pressed at 1 ton and then pressed isostatically at $1800kg/cm^2$ in the water chamber. All pellets were heat-treated at $650^{\circ}C$ for 1 h in flowing argon gas for the formation of $MgB_2$. The apparent density of powder compacts pressed at 3 ton was higher than that at 1 ton. The cold isostatic pressing (CIP) in a water chamber allowed further increase of the apparent density of powder compacts, which influenced the pellet density of the final products ($MgB_2$). The compaction methods (uniaxial pressing and CIP) did not affect the formation of $MgB_2$ and superconducting critical temperature ($T_c$) of $MgB_2$, but affected the critical current density ($J_c$) of $MgB_2$ significantly. The sample with the high apparent density showed high $J_c$ at 5 K and 20 K at applied magnetic fields (0-5 T).

• Advances in nano research
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• 제13권2호
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• pp.199-206
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• 2022

We present the high-brightness large-area 10.1" in-cell polarizer display panel integrated with a wire grid polarizer (WGP) and metal reflector, from the initial design to final system development in a commercially feasible level. We have modeled and developed the WGP architecture integrated with the metal reflector in a single in-cell layer, to achieve excellent polarization efficiency as well as brightness enhancement through the light recycling effect. After the optimization of key experimental parameters via Taguchi method, the roll nanoimprint lithography employing a flexible large-area tiled mold has been utilized to create the 90 nm-pitch polymer resist pattern with the 54.1 nm linewidth and 5.1 nm residual layer thickness. The 90 nm-pitch Al gratings with the 51.4 nm linewidth and 2150 Å height have been successfully fabricated after subsequent etch process, providing the in-cell WGPs with high optical performance in the entire visible light regime. Finally we have integrated the WGP in a commercial 10.1" display device and demonstrated its actual operation, exhibiting 1.24 times enhancement of brightness compared to a conventional film polarizer-based one, with the contrast ratio of 1,004:1. Polarization efficiency and transmittance of the developed WGPs in an in-cell polarizer panel achieve 99.995 % and 42.3 %, respectively.