• 제목/요약/키워드: Nano Metrology

검색결과 47건 처리시간 0.021초

Determination of Layer Thickness of A/B Type Multilayer Films in SIMS Depth Profiling Analysis

  • Hwang, Hyun-Hye;Jang, Jong-Shik;Kang, Hee-Jae;Kim, Kyung-Joong
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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    • pp.231-231
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    • 2012
  • Correct determination of the interface locations is critical for the calibration of the depth scale and measurement of layer thickness in SIMS depth profiling analysis of multilayer films. However, the interface locations are difficult to determine due to the unwanted distortion from the real ones by the several effects due to sputtering with energetic ions. In this study, the layer thicknesses of Si/Ge and Si/Ti multilayer films were measured by SIMS depth profiling analysis using the oxygen and cesium primary ion beam. The interface locations in the multilayer films could be determined by two methods. The interfaces can be determined by the 50 at% definition where the atomic fractions of the constituent layer elements drop or rise to 50 at% at the interfaces. In this method, the raw depth profiles were converted to compositional depth profiles through the two-step conversion process using the alloy reference relative sensitivity factors (AR-RSF) determined by the alloy reference films with well-known compositions determined by Rutherford backscattering spectroscopy (RBS). The interface locations of the Si/Ge and Si/Ti multilayer films were also determined from the intensities of the interfacial composited ions (SiGe+, SiTi+). The determination of the interface locations from the composited ions was found to be difficult to apply due to the small intensity and the unclear variation at the interfaces.

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Facile Synthesis of Hydroxyapatite by Hydrothermal and Solvent Combustion Methods

  • Bramhe, Sachin N;Lee, Hyun Chul;Chu, Min Cheol;Ryu, Jae-Kyung;Balakrishnan, Avinash;Kim, Taik Nam
    • 한국재료학회지
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    • 제25권9호
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    • pp.492-496
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    • 2015
  • Hydroxyapatite (HA), which is an important calcium phosphate mineral, has been applied in orthopedics, dentistry, and many other fields depending upon its morphology. HA can be synthesized with different morphologies through controlling the synthesis method and several parameters. Here, we synthesize various morphologies of HA using two simple methods: hydrothermal combustion and solution combustion. The phase purity of the synthesized HA is confirmed using X-ray diffractometry. It demonstrates that pure phased hydroxyapatite can be synthesized using both methods. The morphology of the synthesized powder is examined using scanning electron microscopy. The effects of pH and temperature on the final powder are also investigated. At $140^{\circ}C$, using the hydrothermal method, nano-micro HA rods with a hexagonal crystal structure can be synthesized, whereas using solution combustion method at $600^{\circ}C$, a dense cubic morphology can be synthesized, which exhibits monoclinic crystal structures.

Assessment of Wear Resistance in Tooth-Colored Materials for Primary Molar Crown Restoration in Pediatric Dentistry

  • Hyun Seok Kang;Yooseok Shin;Chung-Min Kang;Je Seon Song
    • 대한소아치과학회지
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    • 제51권1호
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    • pp.22-31
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    • 2024
  • The objective of this study was to assess the wear resistance of tooth-colored materials used in crown restoration for primary molars with a chewing simulator. In this study, four groups-three experimental groups and one control group-were included. They consisted of three-dimensional (3D) printed resin crowns (NextDent and Graphy), milled nano-hybrid ceramic crowns (MAZIC Duro), and prefabricated zirconia crowns (NuSmile). Twelve mandibular second molar specimens were prepared from each group. In the wear experiment, 6.0 × 105 cycles were conducted with a force of 50 N, and a 6 mm-diameter steatite ball was used as an antagonist. The amount of wear was calculated by comparing the scan files before and after the chewing simulation using 3D metrology software, and the worn cross-section was confirmed by scanning electron microscopy (SEM). The resin and ceramic groups did not exhibit any statistically significant differences. However, compared to other crown groups, the zirconia crown group demonstrated notably reduced levels of wear (p < 0.05). In SEM images, layers and cracks were observed in the 3D-printed resin crown groups, which differed from those in the other groups.

길이 표준 소급성을 갖는 원자간력 현미경을 이용한 2차원 격자 시편 측정과 불확도 평가 (Measurements of Two-dimensional Gratings Using a Metrological Atomic Force Microscope and Uncertainty Evaluation)

  • 김종안;김재완;강주식;엄태봉
    • 한국정밀공학회지
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    • 제24권9호
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    • pp.68-75
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    • 2007
  • The pitch and orthogonality of two-dimensional (2D) gratings have been measured by using a metrological atomic force microscope (MAFM) and measurement uncertainty has been analyzed. Gratings are typical standard artifacts for the calibration of precision microscopes. Since the magnification and orthogonality in two perpendicular axes of microscopes can be calibrated simultaneously using 2D gratings, it is important to certify the pitch and orthogonality of 2D gratings accurately for nano-metrology using precision microscopes. In the measurement of 2D gratings, the MAFM can be used effectively for its nanometric resolution and uncertainty, but a new measurement scheme was required to overcome some limitations of current MAFM such as nonnegligible thermal drift and slow scan speed. Two kinds of 2D gratings, each with the nominal pitch of 300 nm and 1000 nm, were measured using line scans for the pitch measurement of each direction. The expanded uncertainties (k = 2) of measured pitch values were less than 0.2 nm and 0.4 nm for each specimen, and those of measured orthogonality were less than 0.09 degree and 0.05 degree respectively. The experimental results measured using the MAFM and optical diffractometer were coincident with each other within the expanded uncertainty of the MAFM. As a future work, we also proposed another scheme for the measurements of 2D gratings to increase the accuracy of calculated peak positions.

이중 크기분포를 가지는 자발형성 InAs 양자점의 광특성 평가 (Optical Properties of Self-assembled InAs Quantum Dots with Bimodal Site Distribution)

  • 정순일;여현영;윤일구;한일기;이주인
    • 한국진공학회지
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    • 제15권3호
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    • pp.308-313
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    • 2006
  • 서로 다른 성장조건 하에서 자발형성 InAs 양자점 (quantum dot, QD)을 제작하고. 그 특성을 photoluminescence (PL) 로 분석하였다. 비교적 높은 기판온도에서 성장된 QD 시료들의 PL 스펙트럼에서 분명한 차이를 나타내는 double-peak이 관측되었다. 온도 및 여기광 출력의존성 (temperature- and excitation power dependence) PL을 이용하여 그 double-peak이 서로 다른 크기분포를 가지는 두개의 InAs QD집단에서의 기저발광 (Eo) 에 의한 peak 임을 알 수 있었다. 게다가 이중크기분포에서 InAs 두께변화는 서로 대립되는 두 QD집단에서 QD 수의 변화를 초래한다는 것 또한 증명하였다.

측정 프로세스의 변동 요인 조사 방법 개발 (Development of an Investigation Method for Variation Factors of Measurement Processes)

  • 최인수;강창욱
    • 산업경영시스템학회지
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    • 제39권2호
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    • pp.72-81
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    • 2016
  • There can be included a variety of uncertainties in all measurement results whether we can perceive or not on the causes. These uncertainties may end up in lowering the reliability of measurement results and also deteriorate the level of quality. For the purpose, we tried to combine the strengths of measurement uncertainty and measurement system analysis together to present a practical flowchart so as to verify those potential variation factors in general measurement processes. As a case study, we did an experiment and gathered data on the length between two holes of an engine cylinder head which is a core part for vehicles with a coordinate measuring machine and estimated nine uncertainty factors of it. Consequently, it was identified that the four primary factors among the nine which were related to the measurement standard, random errors or spread of the repeat measurements, differences between the coefficients of thermal expansion and the environment especially had been the influence around the laboratory. Since it is impossible to analyze the equipment and appraisal variations respectively through the only measurement uncertainty, we have used the measurement system analysis following the flowchart. Showing the result of being just about 0.5% lower for the appraisal variation, and the equipment variation occupied about 7% for the total Gage R&R. Through this research, we have come to a conclusion that much more detail analysis on variation factors can be possible to be identified in measurement processes by using the developed flowchart which is composed of measurement uncertainty and measurement system analysis. Therefore, we expect engineers who are involved in quality and measurements to utilize this developed method.

광 회절계를 이용한 격자 피치 표준 시편의 측정 및 불확도 해석 (Measurement of Grating Pitch Standards using Optical Diffractometry and Uncertainty Analysis)

  • 김종안;김재완;박병천;강주식;엄태봉
    • 한국정밀공학회지
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    • 제23권8호
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    • pp.72-79
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    • 2006
  • We measured grating pitch standards using optical diffractometry and analyzed measurement uncertainty. Grating pitch standards have been used widely as a magnification standard for a scanning electron microscope (SEM) and a scanning probe microscope (SPM). Thus, to establish the meter-traceability in nano-metrology using SPM and SEM, it is important to certify grating pitch standards accurately. The optical diffractometer consists of two laser sources, argon ion laser (488 nm) and He-Cd laser (325 nm), optics to make an incident beam, a precision rotary table and a quadrant photo-diode to detect the position of diffraction beam. The precision rotary table incorporates a calibrated angle encoder, enabling the precise and accurate measurement of diffraction angle. Applying the measured diffraction angle to the grating equation, the mean pitch of grating specimen can be obtained very accurately. The pitch and orthogonality of two-dimensional grating pitch standards were measured, and the measurement uncertainty was analyzed according to the Guide to the Expression of Uncertainty in Measurement. The expanded uncertainties (k = 2) in pitch measurement were less than 0.015 nm and 0.03 nm for the specimen with the nominal pitch of 300 nm and 1000 nm. In the case of orthogonality measurement, the expanded uncertainties were less than $0.006^{\circ}$. In the pitch measurement, the main uncertainty source was the variation of measured pitch values according to the diffraction order. The measurement results show that the optical diffractometry can be used as an effective calibration tool for grating pitch standards.