• 제목/요약/키워드: Nano Device

검색결과 840건 처리시간 0.028초

양자점 레이저 다이오드의 식각 깊이에 따른 접합온도 측정 (Junction Temperature of Quantum Dot Laser Diodes Depending on the Mesa Depth)

  • 정정화;한일기;이정일
    • 한국진공학회지
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    • 제17권6호
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    • pp.555-559
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    • 2008
  • 순방향 전압-온도 (forward voltage-temperature)법을 이용하여 양자점 레이저 다이오드의 접합온도를 측정하였다. 식각 깊이가 깊은 mesa 구조의 경우 입력전류에 대한 접합온도의 증가율은 0.05 K/mA인 반면, 식각 깊이가 낮은 mesa 구조의 경우 0.07 K/mA로서 상대적으로 높게 측정되었다. 깊은 mesa 구조에서의 상대적으로 낮은 접합온도 증가율은 mesa 측면 방향으로의 열확산 효과 때문인 것으로 설명된다.

Fabrication of Photo Sensitive Graphene Transistor Using Quantum Dot Coated Nano-Porous Graphene

  • 장야무진;이재현;최순형;임세윤;이종운;배윤경;황종승;황성우;황동목
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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    • pp.658-658
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    • 2013
  • Graphene is an attractive material for various device applications due to great electrical properties and chemical properties. However, lack of band gap is significant hurdle of graphene for future electrical device applications. In the past few years, several methods have been attempted to open and tune a band gap of graphene. For example, researchers try to fabricate graphene nanoribbon (GNR) using various templates or unzip the carbon nanotubes itself. However, these methods generate small driving currents or transconductances because of the large amount of scattering source at edge of GNRs. At 2009, Bai et al. introduced graphene nanomesh (GNM) structures which can open the band gap of large area graphene at room temperature with high current. However, this method is complex and only small area is possible. For practical applications, it needs more simple and large scale process. Herein, we introduce a photosensitive graphene device fabrication using CdSe QD coated nano-porous graphene (NPG). In our experiment, NPG was fabricated by thin film anodic aluminum oxide (AAO) film as an etching mask. First of all, we transfer the AAO on the graphene. And then, we etch the graphene using O2 reactive ion etching (RIE). Finally, we fabricate graphene device thorough photolithography process. We can control the length of NPG neckwidth from AAO pore widening time and RIE etching time. And we can increase size of NPG as large as 2 $cm^2$. Thin CdSe QD layer was deposited by spin coatingprocess. We carried out NPG structure by using field emission scanning electron microscopy (FE-SEM). And device measurements were done by Keithley 4200 SCS with 532 nm laser beam (5 mW) irradiation.

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생체 모방 로봇 물고기의 설계와 제어에 관한 연구 (Design and Control of a Biomimetic Fish Robot)

  • 김영진;김승재;양경선;이정민;임충혁;김동환
    • 대한기계학회논문집A
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    • 제36권1호
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    • pp.1-7
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    • 2012
  • 이 논문에서는 최소의 배터리를 소비하여 물고기 로봇을 구동하고, 물고기와 같은 유연한 운동을 할 수 있는 생체 모방(biomimetic) 물고기 로봇의 설계, 제작, 제어에 관하여 제안 하였다. 두 개 모터를 적용하여 물고기와 같이 유연하게 움직일 수 있는 방법을 제시 하였다. 중성 부력을 유지하는 방법과 빠르게 잠영하고, 방향을 전환 하기 위한 방법을 제시 하였다. 로봇 물고기의 꼬리는 유연한 움직임을 만들기 위하여 폴리머 재질을 사용하여 만들었다. 꼬리 내부는 관절과 강선으로 구성된다. 로봇 물고기에 척추에 해당하는 우레탄 골격과 관절을 이루는 핀에 연결된 강선을 당겨 꼬리에 정현파 명령을 주어 물고기와 비슷한 유영을 할 수 있도록 하였으며, 부력 조절 장치를 설치하였으며, 이 부력 조절 장치를 이용하여 물고기 로봇이 상승, 하강을 할 수 있도록 하였다.

Theoretical and Experimental Analysis of Back-Gated SOI MOSFETs and Back-Floating NVRAMs

  • Avci, Uygar;Kumar, Arvind;Tiwari, Sandip
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제4권1호
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    • pp.18-26
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    • 2004
  • Back-gated silicon-on-insulator MOSFET -a threshold-voltage adjustable device-employs a constant back-gate potential to terminate source-drain electric fields and to provide carrier confinement in the channel. This suppresses shortchannel effects of nano-scale and of high drain biases, while allowing a means to threshold voltage control. We report here a theoretical analysis of this geometry to identify its natural length scales, and correlate the theoretical results with experimental device measurements. We also analyze experimental electrical characteristics for misaligned back-gate geometries to evaluate the influence on transport behavior from the device electrostatics due to the structure and position of the back-gate. The backgate structure also operates as a floating-gate nonvolatile memory (NVRAM) when the back-gate is floating. We summarize experimental and theoretical results that show the nano-scale scaling advantages of this structure over the traditional front floating-gate NVRAM.

액정 매질내의 풀러린 입자의 Dielectrophoretic force를 이용한 전자종이 디스플레이의 연구 (Research on electricnic paper-like displays using dielectrophoretic force of fullerene particles immersed in liquid crystal medium)

  • 김미경;김미영;김성민;;이명훈;이승희
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2009년도 춘계학술대회 논문집
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    • pp.57-58
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    • 2009
  • The dynamics of nano or micro sized-particles in liquid crystal (LC) medium under an external electric field is of theoretical and technological interest. A fullerene of 10 wt% was doped into the LC medium and its electric field induced motion was controlled by both in-plane and vertical electric fields. In the proposed device, pixel electrode I and pixel electrode II were designed consecutively on the bottom substrate and common electrode on the top of the substrate. When the electric field was applied, the fullerenes start to move in direction of applied electric field. The dark, grey and white states in the proposed device can be obtained by suitable combination of the polarity of applied electric field at pixel electrode I, pixel electrode II and common electrode. The dynamical motions of fullerene particles in LC medium suggest that fullerene can be designed for electronic-paper like displays.

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Electrical transport characteristics of deoxyribonucleic acid conjugated graphene field-effect transistors

  • Hwang, J.S.;Kim, H.T.;Lee, J.H.;Whang, D.;Hwang, S.W.
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제40회 동계학술대회 초록집
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    • pp.482-483
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    • 2011
  • Graphene is a good candidate for the future nano-electronic materials because it has excellent conductivity, mobility, transparency, flexibility and others. Until now, most graphene researches are focused on the nano electronic device applications, however, biological application of graphene has been relatively less reported. We have fabricated a deoxyribonucleic acid (DNA) conjugated graphene field-effect transistor (FET) and measured the electrical transport characteristics. We have used graphene sheets grown on Ni substrates by chemical vapour deposition. The Raman spectra of graphene sheets indicate high quality and only a few number of layers. The synthesized graphene is transferred on top of the substrate with pre-patterned electrodes by the floating-and-scooping method [1]. Then we applied adhesive tapes on the surface of the graphene to define graphene flakes of a few micron sizes near the electrodes. The current-voltage characteristic of the graphene layer before stripping shows linear zero gate bias conductance and no gate operation. After stripping, the zero gate bias conductance of the device is reduced and clear gate operation is observed. The change of FET characteristics before and after stripping is due to the formation of a micron size graphene flake. After combined with 30 base pairs single-stranded poly(dT) DNA molecules, the conductance and gate operation of the graphene flake FETs become slightly smaller than that of the pristine ones. It is considered that DNA is to be stably binding to the graphene layer due to the ${\pi}-{\pi}$ stacking interaction between nucleic bases and the surface of graphene. And this binding can modulate the electrical transport properties of graphene FETs. We also calculate the field-effect mobility of pristine and DNA conjugated graphene FET devices.

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나노 부유 게이트 메모리 소자 응용을 위한 실리콘 나노-바늘 구조에 관한 연구 (Study on the Silicon Nano-needle Structure for Nano floating Gate Memory Application)

  • 정성욱;유진수;김영국;김경해;이준신
    • 한국전기전자재료학회논문지
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    • 제18권12호
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    • pp.1069-1074
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    • 2005
  • In this work, nano-needle structures ate formed to solve problem, related to low density of quantum dots for nano floating gate memory. Such structures ate fabricated and electrical properties' of MIS devices fabricated on the nano-structures are studied. Nano floating gate memory based on quantum dot technologies Is a promising candidate for future non-volatile memory devices. Nano-structure is fabricated by reactive ion etching using $SF_6$ and $O_2$ gases in parallel RF plasma reactor. Surface morphology was investigated after etching using scanning electron microscopy Uniform and packed deep nano-needle structure is established under optimized condition. Photoluminescence and capacitance-voltage characteristics were measured in $Al/SiO_2/Si$ with nano-needle structure of silicon. we have demonstrated that the nano-needle structure can be applicable to non-volatile memory device with increased charge storage capacity over planar structures.