• Nuclear Engineering and Technology
• /
• v.50 no.3
• /
• pp.432-438
• /
• 2018

The occurrence of saturation in the CR-39 detector reduces and limits its detection dynamic range; nevertheless, this range could be extended using spectroscopic techniques and by measuring the net bulk rate of the saturated CR-39 detector surface. CR-39 detectors were irradiated by 1.5 MeV high alpha-particle fluence varying from $0.06{\times}10^8$ to $7.36{\times}10^8\;alphas/cm^2$ from Am-241 source; thereafter, they were etched in a 6.25N NaOH solution at a temperature of $70^{\circ}C$ for different durations. Net bulk etch rate measurement of the 1.5 MeV alpha-irradiated CR-39 detector surface revealed that rate increases with increasing etching time and reaches its maximum value at the end of the alpha-particle range. It is also correlated with the alpha-particle fluence. The measurements of UV-Visible (UV-Vis) absorbance at 500 and 600 nm reveal that the absorbance is linearly correlated with the fluence of alpha particles at the etching times of 2 and 4 hour. For extended etching times of 6, 10, and 14.5 hour, the absorbance is saturated for fluence values of $4.05{\times}10^8$, $5.30{\times}10^8$, and $7.36{\times}10^8\;alphas/cm^2$. These new methods pave the way to extend the dynamic range of polymer-based solid state nuclear track detectors (SSNTDs) in measurement of high fluence of heavy ions as well as in radiation dosimetry.

• Journal of the Korean Electrochemical Society
• /
• v.14 no.3
• /
• pp.184-190
• /
• 2011

$LiMn_2O_4$ with mesoporous hollow sphere shape was synthesized by precipitation method with silica template. The synthesized $LiMn_2O_4$ has nanosized first particle and mesoporous hollow sphere shape. Silica template was removed by chemical etching method using NaOH solution. When the concentration of NaOH solution was increased, first particle size of manganese oxide was decrease and confirmed mesoporous hollow shpere shape. X-ray diffraction(XRD) patterns revealed that the synthesized samples has spinel structure with Fd3m space group. In case the ratio of silica and maganese salt increased, the size of first particles was decreased. The tetragoanal $LiMn_2O_4$ with micron size was synthesized at ratio of silica and manganese salt over 1 : 9. The prepared samples were assembled as cathode materials of Li-ion battery with 2032 type coin cell and their electrochemical properties are examined by charge-discharge and cyclic performance. Electrochemical measurements show that the nano-size particles had lower capacity than micron-size particles. But, cyclic performance of nano-size particles had better than that of micron-size particles.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2009.11a
• /
• pp.274-274
• /
• 2009

고효율 결정질 실리콘 태양전지 구조를 갖기 위해서는 기본적으로 광포획 기능이 고려된 기판이 고려되어야 한다. 본 실험에서는 2-step 습식공정을 이용하여 기판의 반사율을 기존 대비 절반 이하로까지 줄일 수 있는 저반사율을 갖는 표면구조를 얻을 수 있었다. 일반적인 텍스처링 공정을 NaOH와 TMAH등을 이용하여 10um이하의 피라미드 구조를 통해 평균반사율을 10~13%수준을 얻었고, metal assist etching을 이용하여 추가적인 나노 텍스처링을 적용하였다. 전체적인 2-step에칭을 적용하여 평균 반사율을 5%이하까지 줄일 수 있었다. 이는 전반적으로 나노구조 형성으로 인하여 단파장쪽의 반사율이 적게 나오고 IR 파장쪽의 반사율도 같이 낮아짐으로써 저반사율이 달성되었다. 2-step을 이용한 나노 텍스처링 공정 최적화와 반사방지막을 증착하여 이에 대한 효과를 연구하였다.

• Proceedings of the Korean Nuclear Society Conference
• /
• 1998.05b
• /
• pp.84-89
• /
• 1998

Alloy 600 및 alloy 690과 Ni-8Cr-lOFe 합금 등의 응력부식(stress corrosion cracking, SCC) 거동을 고온의 염기성 분위기에서 C-ring 시편을 사용하여 연구하였다. Alloy 600과 alloy 690을 여러 조건에서 열처리하여 etching한 후 탄화물의 분포와 입계 주변의 Cr고갈 정도 등의 미세조직을 광학현미경과 주사 전자현미경(SEM)으로 관찰하였다. 이들 재료에 대한 SCC 시험을 315$^{\circ}C$의 40% NaOH 수용액에서 일정한 부하전위(부식전위 + 200㎷)를 가하면서 수행하였으며, 동일 조건에서의 분극거동도 측정하였다. Alloy 600 MA(mill anneal) 및 TT(thermal treatment)의 SCC 저항성은 alloy 690 TT와 Ni-8Cr-10Fe SA(solution anneal)보다 낮았다. Alloy 600 TT 재료는 alloy 600 MA 및 SA 재료에 비해 SCC 저항성이 더 컸다. 고용 탄소농도는 alloy 600의 SCC 저항성에 큰 영향을 주지 못했다. 대부분의 Alloy 600은 균열전파 입계균열을 보였으나, 일부에서는 입계 및 입내 혼합양상(mixed mode cracking)을 보였다. 염기성 분위기에서 Ni기 합금의 SCC 거동을 미세조직, 분극거동의 관점에서 고찰하였다.

• Proceedings of the Korean Vacuum Society Conference
• /
• 1998.02a
• /
• pp.105-106
• /
• 1998

Evaluation of def3ects by etch-ppit formation was studied. A NaOH(30 mol%) etchant was found useful for etch-ppit developpment on ZnSe-based eppilayers grown on (001) gaAs. And a H3ppO4(85 mol%) was used in order to developp etch-ppits on GaN-base eppilayers grown on (0001) Al2O3 After etch-ppit formation on the surfsce. Transmission Electron Microscoppy(TEM) was cppmdicted. By etch-ppit developpment and TEM observation we could determine the defect typpes by etch-ppit configurfations and found origin of etch-ppit in the cse of ZnSe-based materials. Based uppon these results we can do defect identification by etch-ppit test simpply. In the case of GaN-based materials we could evaluate nanoppippe density. however high density of threading dislocations in GaN eppilayers were not revealed by etch-ppit developpment. Based uppon these results we can evaluate the nanoppippe density which difficult to evaluate using TEM beacause of its small size(diameter). And at ppresent status direct matching of etch-ppit density to dislocation density would make severe mistake.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
• /
• v.25 no.1
• /
• pp.58-61
• /
• 2012

In our report a relatively simple process for fast nano-texturing of p-type(100) CZ- silicon surface using silver catalyzed wet chemical etching in aqueous hydrofluoric acid (HF) and hydrogen peroxide solution($H_2O_2$) at room temperature. The wafers were saw-damaged by NaOH(6 wt%) at $60^{\circ}C$ for 150s. To obtain a nano-structured black surface, a thin layer of silver with thickness of 1 - 10 nm was deposited on the surfaces by evaporation system. After this process the samples were etched in HF : $H_2O_2$ : $H_2O$ = 1:5:10 at room temperature for 80s - 220s. Due to the local catalytic of the Ag clusters, this treatment results in the nano-scale texturing on the surface. This resulted in average reflectance values less than 9% after the silver on the surface of the wafers were removed.

• Korean Journal of Metals and Materials
• /
• v.49 no.5
• /
• pp.400-405
• /
• 2011

ZnO nanotube arrays were synthesized by a two-step process: electrodeposition and selective dissolution. In the first step, ZnO nanorod arrays were grown on an Au/Si substrate by using a homemade electrodeposition system. ZnO nanorod arrays were then selectively dissolved in an etching solution composed of 0.125 M NaOH, resulting in hollow ZnO nanotube arrays. It is suggested that the formation mechanism of the ZnO nanotube arrays might be attributed to the preferred surface adsorption of hydroxide ion ($OH^{-1}$) on a positive polar surface followed by selective dissolution of the metastable Zn-terminated ZnO (0001) polar surface caused by the difference in the surface energy per unit area between the ZnO nanorod and nanotube.

• Journal of Radiation Protection and Research
• /
• v.9 no.2
• /
• pp.55-60
• /
• 1984

The optimum etching condition of allyl diglycol carbonate (CR-39) for detecting the 60 MeV N-ions was determined as $70^{\circ}C$, 20% NaOH for 130min, by considering the variations of track density and diameter. Under these conditions, the maximum detectable track density was $1.7{\times}10^7tr/cm^2$. Track densities were linearly increased with increase of the total charge of the incident 60 MeV N-ions. By considering the scattring of N-ions as the Rutherford elastic scattering of point source, the measured relative probability was well consistent with the calculated value. The detection efficiency of CR-39 was in the range of 54-41% for 60 MeV N-ions of 12 nC-100 nC.

• Journal of the Korean Society of Safety
• /
• v.35 no.6
• /
• pp.85-92
• /
• 2020

Wet Scrubber reacts the incoming pollutant gas with cleaning water (water + absorbent) to absorb pollutants and release the clean air to the atmosphere. Wet scrubbers and packed tower scrubbers using this principle are widely used in businesses that emit acid gases. In particular, in the etching process using hydrochloric acid (HCl), alkaline washing water (NaOH) having a pH of about 8 to 11 is used to absorb a large amount of acid gas. However, These salts are attached to the injection nozzle (nozzle), filling material (packing), and the demister (Demister), causing air pollution, human damage, and inoperability due to clogging and acid gas discharge. Therefore, In this study, an improvement plan was proposed to manage the washing water with pH 3~4 acidic washing water. The test method takes samples from the Wet Scrubber flue measurement laboratory twice a month for 1 year. Hydrogen chloride (HCl) concentration (ppm) was measured, and nozzle clogging and scale conditions were measured, compared, and analyzed through a differential pressure gauge and a pressure gauge. As a result of the check, it was visually confirmed that the scale was reduced to 50% or less in the spray nozzle, filler, and demister. In addition, the emission limit of hydrogen chloride in accordance with the Enforcement Regulation of the Air Quality Conservation Act [Annex 8] met 3 ppm or less. Therefore, even if the washing water is operated in an acidic pH range of 3 to 4, it is expected to reduce air pollution and human damage due to clogging of internal parts, and it is expected to reduce maintenance costs such as regular cleaning or replacement of parts.

• Applied Microscopy
• /
• v.47 no.1
• /
• pp.36-42
• /
• 2017

Field electron emission measurements were performed on dielectric-coated tungsten emitters, with apex radii in the nanometer and micrometer range, which were prepared by electrochemical etching in NaOH solution. Measurements were performed in a field electron microscopy (FEM) with a base pressure <$10^{-6}$ Pascal ($10^{-8}$ mbar). Four different types of dielectric were used, namely: (1) Clark Electromedical Instruments epoxylite resin, (2) Epidian 6 produced by Ciech Sarzyna S. A., (3) a Radionox solution of colloidal graphite; and (4) Molyslip 2001 E compound ($MoS_2$ and MoS). Current-voltage measurements and FEM images were used to investigate the characteristics of these composite emitters, and to assess how the different types of dielectric coating affect the suitability of the composite emitter as a potential electron source.