• Journal of the Korean Society of Radiology
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• v.12 no.1
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• pp.101-106
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• 2018

Multilayer mirrors have widely been used for monochromatization of X-ray with high reflection efficiency. The reflected X-ray energy or wavelength is determined by the d-spacing of a multilayer mirror and the incidence angle. The reflectivity critically depends on the number of bilayers and surface roughness on each interface. The multilayer mirror has a structure of alternative deposition of high and low Z-elements on the substrate. Each interface should be considered in the calculation of reflectivity. In this paper, we examine the degradation of reflectivity by the inter-diffusion combined with surface roughness on each interface for a W/Si multilayer mirror. In the depth-graded W/Si multilayer mirror, the FWHMs for angle and energy were larger than them of the uniform multilayer mirror. Inter-diffusion considerable gave rise to the degradation of reflectivity. To obtain measured reflectivity closed to the expected reflectivity, the inter-diffusion on W-Si and Si-W interfaces should be considered.

• Proceedings of the Optical Society of Korea Conference
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• 2007.07a
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• pp.21-22
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• 2007

The periodic multilayer is considered as the X-ray reflection mirror. High X-ray reflectivity from the incident angle greater than the grazing critical angle can be obtained by the periodic multilayer structure. The Optical constants are investigated in order to determine the material for X-ray reflection mirror. The X-ray reflection mirror is designed for W, Si using computer simulation. The reflectivity is calculated for various incident angles and ratio of thickness.

• Journal of the Korean Society of Radiology
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• v.12 no.1
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• pp.17-22
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• 2018

Multilayer mirrors are optical elements that can replace single crystal optical elements such as silicon or germanium, and they have artificial diffraction plane of a thickness of several nanometers. We examined the first Bragg angle and the reduction of reflectivity by variation of layer thickness in a W/Si multilayer mirror of small d-spacing. A W/Si multilayer mirror for an incidence angle of $0.55^{\circ}$ and an energy of 17.5 keV was designed and showed a maximum reflectivity of 72.67%. When the thickness of tungsten or silicon layer was simultaneously changed, the first Bragg angle was shifted and the reflectivity was reduced. When there was a change in thickness for one layer of W/Si multilayer, no change in the reflectivity was showed but the unevenness of the envelope was observed. Reduction of reflectivity was also observed at random Gaussian thickness variations. It is possible to predict the tolerance of multilayer mirror by examining the reflectivity degradation according to the thickness change in the W/Si multilayer mirror of small d-spacing.

• Journal of radiological science and technology
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• v.33 no.3
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• pp.179-184
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• 2010

A hard X-ray microscope system for obtaining images of nano-spatial resolution has been widely studied and requires monochromatic X-ray. A multilayer mirror of 84% reflectivity was designed to acquire tungsten characteristic X-ray of 8.4 keV from the white beam generated from an X-ray tube, and the C/W multilayer mirror of $50{\times}50\;mm$ size and 5.65 nm d-spacing was fabricated by the ion-beam sputtering system. The C/W multilayer had a uniformity of 99.5%, and the structure of the multilayer mirror was verified by a TEM image. The obtainable x-ray reflectivity for the C/W multilayer mirror at 8.4 keV was estimated from measuring the X-ray reflectivity using the copper characteristic X-ray of 8.05 keV. Monochromatic X-ray of 8.4 keV was generated by combining a X-ray tube, and the reflectivity and monochromaticity were 77.1% and 0.21 keV, respectively. Monochromatic X-ray generated from the combination of an X-ray tube and an C/W multilayer mirror has enough potential to use X-ray source for hard X-ray microscope system of laboratory size. If the C/W multilayer mirror of d-spacing of a few nanometers can be fabricated, monochromatic X-ray corresponded to 17.5 keV, molybdenum characteristic X-ray, can be obtained and applied to mammography in the medical application.

• Journal of the Korean Society of Radiology
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• v.4 no.4
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• pp.33-36
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• 2010

Multilayer mirrors are very useful for applications of high energy X-ray. X-rays of high energy require very small thickness, a few nanometers, in the d-spacing of a multilayer mirror. Each layer is composed of a multilayr mirror influences to interfacial roughness or interdiffusion which gives rise to degrade specular reflection. Carbon layer of 1 nm thick in a C/W multilayer mirror of 3.25 nm d-spacing was examined. Carbon as well as tungsten layers were very uniform, and there was no micro-structure in carbon layers. However, interdiffusion between carbon and tungste layers was observed by a transmission electron microscope.

• Journal of the Korean Society of Radiology
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• v.3 no.4
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• pp.23-28
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• 2009

Monochromatic X-ray can make a medical image of high contrast under a low radiation dose and can be easily generated by combining an X-ray tube and a multilayer mirror. A W/C multilayer mirror was optimally designed for a characteristic X-ray generated from a X-ray tube with Mo target. The d-spacing and the thickness ratio in design parameters were determined under the maximum-reflectivity condition. Tolerances for deposition and alignment of the W/C multilayer mirror were calculated. Within a deposition tolerance of 0.2nm and a alignment tolerance of ${\pm}0.01^{\circ}$, 85% of the theoretical peak reflectivity could be achieved. A multilayer mirror can be widely used for making medical images because of generating high fluence monochromatic X-ray.

• Journal of the Korean Society of Radiology
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• v.14 no.1
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• pp.69-75
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• 2020

Multilayer mirrors have widely been used not only in the industry but also in the medical field. X-ray reflectivity was measured by X-ray diffractometer to evaluate the performance of W/C multilayer mirror with 40 layers. Genetic algorithm are used to obtain thickness, density, and interfacial roughness for each of the 40 layers. The existing uniform random selection causes a problem that the solution does not converge or the error increases even if it convergence. To reduce the time to calculate the fitness of the genetic algorithm, the genetic algorithm was written in C/C++ parallel programming. The genetic algorithm showed excellent scalability of linear time increase with increasing number of generation and population. The genetic algorithm was selected with uniform and Gaussian randomness of 1:1 to improve the convergence of solution. The improved genetic algorithm can be applied to characterize each layer of a sample with more than a few tens of layers, such as a multilayer mirror.

• Korean Journal of Optics and Photonics
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• v.26 no.3
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• pp.139-146
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• 2015

The effects of a dielectric multilayer mirror on the efficiency of organic light-emitting diodes (OLEDs) were investigated by using optical simulation. Adoption of a dielectric mirror consisting of alternating SiN and $SiO_2$ layers narrowed the emission spectrum due to the microcavity effect, and increased the outcoupling efficiency by a few percent. The layer thicknesses of the dielectric mirror were adjusted to change the wavelength of the resonance mode, which may be used to increase the color purity.

• Korean Journal of Optics and Photonics
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• v.8 no.4
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• pp.283-290
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• 1997

Scattering measurement on high reflection dielectric multilayer mirrors deposited on quartz substrate in a vacuum chamber were performed using a total integrated scattering method. Scattering of (Ta$_2$$O_5$/SiO$_2$) multilayer mirrors deposited at 250-30$0^{\circ}C$ was 0.048-0.050% and did not change with an annealing at 30$0^{\circ}C$ for 4 hours. On the other hand, scattering of (TiO$_2$/SiO$_2$) multilayer mirror at 25$0^{\circ}C$ was 0.029% and it showed the heavy tensile stress after an annealing. The rms roughness of (Ta$_2$$O_5$/SiO$_2$) multilayer mirror was almost the same as that of (TiO$_2$/SiO$_2$)multilayer mirror. The column size of Ta$_2$$O_5$ film was smaller than that of TiO$_2$film and the packing density of (Ta$_2$$O_5$/SiO$_2$) multilayer mirrors was higher than that of (TiO$_2$/SiO$_2$) multilayer mirror. It seems that the higher packing density and smaller column size of Ta$_2$$O_5$ films lead to more scattering.

• Proceedings of the Optical Society of Korea Conference
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• 1996.09a
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• pp.64-64
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• 1996