• International Journal of Advanced Culture Technology
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• v.6 no.2
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• pp.123-128
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• 2018

Learning data is composed of 100 characters with 10 different fonts, and test data is composed of 10 characters with a new font that is not used for the learning data. In order to consider the variety of learning data with several different fonts, 10 learning masks are constructed by accumulating pixel values of same characters with 10 different fonts. This process eliminates minute difference of characters with different fonts. After finding maximum values of learning masks, test data is expanded by multiplying these maximum values to the test data. The algorithm calculates sum of differences of two corresponding pixel values of the expanded test data and the learning masks. The learning mask with the smallest value among these 10 calculated sums is selected as the result of the recognition process for the test data. The proposed algorithm can recognize various types of fonts, and the learning data can be modified easily by adding a new font. Also, the recognition process is easy to understand, and the algorithm makes satisfactory results for character recognition.

• Journal of the Korean Society of Radiology
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• v.15 no.1
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• pp.21-28
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• 2021

Computed tomography (CT) has the problem of having more radiation exposure compared to other radiographic apparatus. There is a low-dose imaging technique for reducing exposure, but it has a disadvantage of increasing noise in the image. To compensate for this, various noise reduction algorithms have been developed that improve image quality while reducing the exposure dose of patients, of which the median modified Wiener filter (MMWF) algorithm that can be effectively applied to CT devices with excellent time resolution has been presented. The purpose of this study is to optimize the mask size of MMWF algorithm and to see the excellence of noise reduction of MMWF algorithm for existing algorithms. After applying the MMWF algorithm with each mask sizes set from the MASH phantom abdominal images acquired using the MATLAB program, which includes Gaussian noise added, and compared the values of root mean square error (RMSE), peak signal-to-noise ratio (PSNR), coefficient correlation (CC), and universal image quality index (UQI). The results showed that RMSE value was the lowest and PSNR, CC and UQI values were the highest in the 5 x 5 mask size. In addition, comparing Gaussian filter, median filter, Wiener filter, and MMWF with RMSE, PSNR, CC, and UQI by applying the optimized mask size. As a result, the most improved RMSE, PSNR, CC, and UQI values were showed in MMWF algorithms.

• Journal of the Semiconductor & Display Technology
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• v.15 no.1
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• pp.22-26
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• 2016

Extreme ultraviolet (EUV) pellicle is one of the most concerned research in the field of EUV lithography (EUVL). Imaging performance of EUV mask with pellicle should be investigated prior to high volume manufacturing (HVM) of EUVL. In this paper, we analyzed the relationship between standoff distance and imaging performance of EUV mask to verify the influences of relative standoff distance on imaging performance. As a result, standoff distance of EUV pellicle has no effect on imaging performance of EUV mask such as critical dimension (CD), normalized image log slope (NILS) and image contrast. Therefore, pellicle support structure can be flexibly designed and modified in diverse ways to complement the thermal limitation of EUV pellicle membrane.

• Journal of the Korea Institute of Information and Communication Engineering
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• v.18 no.3
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• pp.735-741
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• 2014

Edge in images appears when a great difference shows up in light and shade between pixels and includes data of the subject's size, location direction and etc. The edge is generally detected by the methods such as Sobel, Roberts, Laplacian, LoG(Laplacian of Gaussian) and etc. However, in AWGN(additive white Gaussian noise) added images, quality of the edge becomes slightly uncertain. Therefore, this paper proposed edge detection algorithm using modified mask of weighting to improve the quality of the existing methods. And in order to verify the performance efficiency of the proposed method, processed image and PFOM(Pratt's figure of merit) has been used as valuation standard for a comparison with the existing methods.

• Journal of the Korea Institute of Information and Communication Engineering
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• v.18 no.11
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• pp.2779-2785
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• 2014

Edge Detection is a technique that obtains the particular information of the image using the brightness variation of pixel values and utilized for preprocessing in various image processing sectors. The conventional edge detection methods such as Sobel, Prewitt and Roberts are processed by applying the same weighted value to the entire pixels regardless of pixel distrbution and provides somewhat insufficient edge detection results. therefore, this paper has proposed an edge detection method considering the direction and magnitute of pixels by applying a modified directional mask.

• Journal of the Institute of Electronics Engineers of Korea SP
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• v.40 no.4
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• pp.227-236
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• 2003

This paper proposes a modified jointly-blue noise mask (MJBNM) method using the S-CIELAB color measure as digital color halftoning method. Based on an investigation of the relation between the pattern visibility and the chromatic error, of a blue noise pattern, a halftoning method is proposed that reduces the chromatic error, while preserving a high quality blue noise pattern. Accordingly, to reduce the chrominance error, the low-pass filtered error and S-CIELAB chrominance error are both considered during the mask generation procedure and calculated for single and combined patterns. Using the calculated low-pass filtered error, the patterns are then updated by either adding or removing dots from the multiple binary patterns. Finally, the pattern exhibiting the lower S-CIELAB chrominance error is selected. Experimental results demonstrated that the proposed algorithm can produce a visually pleasing half toned image with a lower chrominance error than the JBNM method.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.5 no.3
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• pp.197-203
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• 2004

New lithography techniques are employed for the patterning of arbitrary shapes in nanometer scale. When, in the photolithography, the electromagnetic waves such as UV and X-ray are incident on the mask patterned in nanometer scale, the diffraction effect is unavoidable and degrades images of the mask imprinted on wafer. Only a convex lens is well-known Fourier transformer. It is possible to make the mask Fourier-transformed with the convex lens, even though the size of pattern on the mask is very large compared to the wavelength of electromagnetic wave. If the mask, modified according to new technique described in this paper, was placed at the front of the lens and was illuminated with laser beam, the nanometer-size patterns are only formed on the plane called Fourier transform plane. The new method presented here is quite simple setup and comparable with present and next generation lithographies such as UV/EUV photolithograpy and electron projection lithography when compared in attainable minimum linewidth. In this paper, we showed our theoretical research work in the field of Fourier optics, . In the near future, we are going to verify this theoretical work by experiments.

• Journal of the Institute of Convergence Signal Processing
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• v.15 no.4
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• pp.135-140
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• 2014

As the digital image devices are widely used, interests in the software- and the hardware-related image processing become higher and the image processing techniques are applied in various fields such as object recognition, object detection, fingerprint recognition, and etc. For the edge detections Sobel, Prewitt, Laplacian, Roberts and Canny detectors are used and these existing methods can excellently detect the edges of the images without noise. However, in the images corrupted by the impulse noise, these methods are insufficent in noise elimination characteristics, showing unsatisfactory edge detection. Therefore in this paper, in order to obtain excellent edge detection characteristics in the corrupted image by the impulse noise, an detection algorithm is porposed, which uses the central pixel of mask divided by four regions along the axis, calculates the estimated mask according to the representing pixel values in each regions, and detects the final edges by applying the estimates mask and the new directional one.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.9 no.1
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• pp.14-19
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• 1999

Using a single precursor of hexamethyldisilane $(Si_{2}(CH_{3})_{6})$, $\beta$-SiC film was successfully deposited on a Si substrate at $1100^{\circ}C$ by a chemical vapor deposition method. Selectivity of SiC deposition on a Si substrate partially covered with a masking material was investigated by introducing HCl gas into hexamethyldisilane/$H_{2}$ gas system during the deposition. The schedule of the precursor and HCl gas flows was modified so that the selectivity of SiC deposition between a Si substrate and a mask material should be improved. It was confirmed that the selectivity of SiC deposition was improved by introducing HCl gas. Also, the pulse gas flow technique was effective to enhance the selectivity.

• Journal of the Korean Ceramic Society
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• v.36 no.1
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• pp.55-60
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• 1999

${\beta}$-SiC thin film was deposited on a Si substrate without buffer layer using a single precursor of Hexamethyldisilane (Si2(CH3)6) by chemical vapor deposition method. HCI gas was introduced into hexamethyldisilane /H2 gas mixture, and the feeding schedule of HCI and precursor gases was modified in order to enhance the selectivity of SiC deposition between a Si substrate and a SiO2 mask. The effect of HCI gas on the surface roughness of the SiC film was investigated and typical electrical properties of the SiC film were also investigated by Hall measurement.