• Proceedings of the Korean Society of Precision Engineering Conference
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• 2001.04a
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• pp.865-868
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• 2001

We designed and fabricated a planner-type thermoelastic microactuator with a latch-up operation for optical switching. Latch-up actuation is prerequisite to implement an optical switch with low power consumption and high reliability. The proposed microactuator consists of four cantilever-shaped thermal actuators, four displacement linkages, two shallow arch-shaped leaf springs, a mobile shuttle mass with a micromirror, and four elastic boundaries. The structural layer of the planar microactuator is phosphorous-doped 12$\mu\textrm{m}$-thick polysilicon, and the sacrificial layer is LTO(Low Temperature Oxide) of 3$\mu\textrm{m}$thickness. The displacement of actuator is as large as 3$\mu\textrm{m}$when the length of actuation bar is 100$\mu\textrm{m}$in length at 5V input voltage. The proposed microactuators have advantages of easy assembly with other optical component by way of fiber alignment in the substrate plane, and its fabrication process features simplicity while retaining batch-fabrication economy.

• Journal of the Korean Society for Precision Engineering
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• v.24 no.8 s.197
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• pp.138-143
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• 2007

Microstereolithography technology is similar to the conventional stereolithography process and enables to fabricate a complex 3D microstructure. This is divided into scanning and projection type according to aiming at precision and fabrication speed. The scanning MSL fabricates each layer using position control of laser spot on the resin surface, whereas the projection MSL fabricates one layer with one exposure using a mask. In the projection MSL, DMD used to generate dynamic pattern consists of $1024{\times}768$ micromirrors which have $13.68{\mu}m$ per side. The fabrication range and resolution are determined by the field of view of the DMD and the magnification of the projection lens. If using the projection lens with high power, very fine microstructures can be fabricated. In this paper, the projection MSL system adapted to a large surface for array-type fabrication is presented. This system covers the meso range, which is defined as the intermediate range between micro and macro, with a resolution of a few ${\mu}m$. The fabrication of array-type microstructures has been demonstrated to verify the performance of implemented system.

• Journal of the Korean Society for Precision Engineering
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• v.30 no.3
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• pp.340-348
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• 2013

In Projection Stereolithography Apparatus (PSLA), Digital Micromirror Device (DMD) and Liquid Crystal Display (LCD) are used as a beam pattern generator. The DMD shows high resolution, but it is mostly applied in micro stereolithography due to high cost and fabricable area. In LCD, the size of pattern beam is freely controlled due to various panel sizes. The LCD, however, has some limitations such as short life time by the high power light source, non-uniform light intensity of pattern beam and low transmittance of UV-light. To solve these problems in LCD-based PSLA, a Scanbeam-SLA with LCD of 19 inches and visible LED-array is developed. In this system, the light module works like a scanner for uniform illumination. The system configuration, working principle and fabrication examples are addressed in this study.

• Proceedings of the Korean Society of Laser Processing Conference
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• 2005.11a
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• pp.37-41
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• 2005

When screen size of the Flat Panel Display (FPD) becomes larger, the traditional photo-lithography using photomasks and UV lamps might not be possible to make patterns on Photo Resist (PR) material due to limitation of the mask size. Though the maskless photo-lithography using UV lasers and scanners had been developed to implement large screen display, it was very slow to apply the process for mass-production systems. The laser exposure system using 405 nm semi-conductor lasers and Digital Micromirror Devices (DMD) has been developed to overcome above-mentioned problems and make more than 100 inches FPD devices. It makes very fine patterns for full HD display and exposes them very fast. The optical engines which contain DMD, Micro Lens Array (MLA) and projection lenses are designed for 10 to 50 ${\mu}m$ bitmap pattern resolutions. The test patterns for LCD and PDP displays are exposed on PR and Dry Film Resists (DFR) which are coated or laminated on some specific substrates and developed. The fabricated edges of the sample patterns are well-defined and the results are satisfied with tight manufacturing requirements.

• Proceedings of the Optical Society of Korea Conference
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• 2006.07a
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• pp.39-40
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• 2006

Digital image-projection and several modifications are the classical applications of Digital Micromirror Devices (DMD), however further applications in the field of optical metrology are also available. Operated with certain patterns, a DMD can function, for instance, as an array of pinholes that may substitute the Galvanic mirror or the stage scanning system presently used for 2 dimensional scanning in confocal microscopes. The various process parameters that influence the result of measurement (e.g. pinhole size, lateral scanning pitch and the number of pinholes used simultaneously, etc.) should be configured precisely for individual measurements by appropriately operating the DMD. This paper presents suitable conditions for the diffraction limited analysis between DMD-optics-CCD to achieve the best performance. Also sampling theorem that is necessary for the image acquisition by scanning system is simulated with OPTISCAN which is the simulator based on the diffraction theory.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.50 no.5
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• pp.243-248
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• 2001

In this paper, we present theoretical and experimental study on the viscous damping of the on-substrate torsional micromirrors, oscillating near the silicon substrates. In this theoretical study, we develop theoretical models and test structures for the viscous damping of the on-substrate torsional micromirrors. From a finite element analysis, we estimate the theoretical damping coefficients of the torsional micromirrors. From a finite element analysis, we estimate the theoretical damping coefficients of the torsional micromirrors, fabricated by the surface-micromaching process. From the electrostatic test of the fabricated devices, frequency-dependent rotationalvelocity of the micromirrors has been measured at the atmospheric pressure using devices, frequency-dependent rotational velocity of the micromirrors has been measured at the atmospheric pressure using the Mach-Zehnder interferometer system. Experimental damping coefficients have been extracted from the least square fit of the measured rotational velocity within the filter bandwidth of 150 kHz. We have compared the theoretical values and the experimental results on the dynamic performance of the micromirrors. The theoretical analysis overstimates the resonant frequency in the amount of 15%, while underestimating the viscous damping in the factors of 10%.

• Proceedings of the KIEE Conference
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• 2003.07c
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• pp.1923-1925
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• 2003

본 논문은 유리 기판과 실리콘 기판의 양극접합과 CMP공정을 통하여 정전기력으로 구동되는 마이크로 비틀림 액추에이터를 제작하고 이 제작된 액추에이터의 성능을 개선하는 방법과 실험에 관한 것이다. 이 비틀림 액추에이터는 미소 거울로 사용하기 위해 제작하였다. 미소 거울은 영상을 정확히 반사하거나 회절 시키는 것이 목적이지만 MEMS 공정의 특성 문제로 인해 일관적인 성능을 나타내는 것이 비교적 힘들다. 따라서 이를 개선하기 위해선 구조적인 접근 보다 실제 구동될 때의 현상을 보상하는 것이 필요하다. 일정한 입력전압에 비례하는 미소 거울의 변위를 알고 이를 기준으로 하여 시스템을 구동하여야 한다. 여기서 인가되는 전압에 비례하는 변위가 정확한지 측정을 해야 하고 만약 오차가 있다면 이를 개선하여야 한다. 또한 구동 시 발생하는 overshoot 현상과 작은 떨림 현상을 줄이고 빠른 시간 내에 응답하도록 시스템을 보상하여야 한다. 본 논문에선 PID 제어기법을 사용하여 $0.5^{\circ}$의 각도로 구동할 때를 기준으로 이 때의 구동전압 200V를 인가하고 오차를 측정하여 시스템을 보상하였다.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2005.06a
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• pp.1214-1218
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• 2005

As demands for precision parts are increased, existing methods to fabricate them such as MEMS, LIGA technology have the technical limitations like high precision, high functionality and ultra miniaturization. A micro-stereolithography technology based on $DMD^{TM}$(Digital Micromirror Device) can meet these demands. In this technology, STL file is the standard format as the same of conventional rapid prototyping system, and 3D part is fabricated by stacking layers that are sliced as 2D section from STL file. Whereas in conventional method, the resin surface is cured as scanning laser beam spot according to the section shape, but in this research, we use integral process which enables to cure the resin surface at one time. In this paper, we deal with the dynamic pattern generation and $DMD^{TM}$ operation to fabricate micro structures. Firstly, we address effective slicing method of STL file, conversion to bitmap, and dynamic pattern generation. Secondly, we suggest $DMD^{TM}$ operation and optimal support manufacturing for $DMD^{TM}$ mounting. Thirdly, we examine the problems on continuous stacking layers, and their improvements in software aspects.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.12 no.6
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• pp.2457-2462
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• 2011

The need for rapid and accurate measurement of 3-dimensional objects is increasing due to the paradigmatic shift in manufacturing from mass production to small batch production. A three dimensional measurement technique which can provide the dimensional information of the object manufactured or to be manufactured has been developed. This method is based on phase shifting moire topology. Digital-Micromirror-Device (DMD) has been used in generating phase shifting moire fringes. And the mechanically moving optical components used for phase shifting, which might result in measurement errors, have been replaced by the DMD. Inherent $2\pi$-ambiguity problem, occurring in the calculation of phase from the light intensity distribution due to the nature of arctangent function, has been overcome by adapting the phase unwrapping method. The advantage of this technique is the easy change of the range and the resolution of the measurement by simply changing the computer generated grid pattern with the appropriate combination of projection lens of various focal length.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.18 no.5
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• pp.120-124
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• 2017

The temporal super resolution is a method for increasing the frame rate. Electro-optical sensors are used in various surveillance and reconnaissance weapons systems, and the spatial resolution and temporal resolution of the required electro-optical sensors vary according to the performance requirement of each weapon system. Because most image sensors capture images at 30~60 frames/second, it is necessary to increase the frame rate when the target moves and changes rapidly. This paper proposes a method to increase the frame rate using color channel extrapolation. Using a DMD, one frame of a general camera was adjusted to have different consecutive exposure times for each channel, and the captured image was converted to a single channel image with an increased frame rate. Using the optical flow method, a virtual channel image was generated for each channel, and a single channel image with an increased frame rate was converted to a color channel image. The performance of the proposed temporal super resolution method was confirmed by the simulation.