• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.27 no.12
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• pp.871-876
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• 2014

Efficiency of crystalline Si solar cell can be maximized as minimizing optical loss through antireflection texturing with inverted pyramids. Even if cost-competitive, soft lithography can be employed instead of photolithography for the purpose, some limitations still remain to apply the soft lithography directly to as-received solar grade wafer with a bunch of micro trenches on surface. Therefore, it is needed to develop a low-cost, effective planarization process and evaluate its output to be applicable to patterning process with PDMS stamp. In this study new surface planarization process is proposed and the change of micro scale trenches on the surface as a function of etching time is observed. Also, the effect of trenches on pattern quality by soft lithography is investigated using FEM structural analysis. In conclusion it is clear that the geometry and shape of trenches would be basic considerations for soft lithography application to low quality wafer.

• Korean Chemical Engineering Research
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• v.46 no.6
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• pp.1100-1106
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• 2008

In this study, we presented rapid and simple fabrication method of functionalized surface on various substrates as a universal platform for the selective immobilization of cells. The functionalized surface was achieved by using deposition of polyelectrolyte such as poly(allyamine hydrochloride) (PAH), poly(diallyldimethyl ammonium chloride) (PDAC), poly(4-ammonium styrene sulfonic acid) (PSS), poly(acrylic acid) (PAA) and fabrication of poly(ethylene glycol) (PEG) microstructure through micro-molding in capillaries (MIMIC) technique on each glass, poly(methyl methacrylate) (PMMA), polystyrene (PS) and poly(dimethyl siloxane) (PDMS) substrate. The polyelectrolyte multilayer provides adhesion force via strong electrostatic attraction between cell and surface. On the other hand, PEG microstructures also lead to prevent non-specific binding of cells because of physical and biological barrier. The characteristic of each modified surface was examined by using static contact angle measurement. The modified surface onto several substrates provides appropriate environment for cellular adhesion, which is essential technology for cell patterning with high yield and viability in the micropatterning technology. The proposed method is reproducible, convenient and rapid. In addition, the fabrication process is environmentally friendly process due to the no use of harsh solvent. It can be applied to the fabrication of biological sensor, biomolecules patterning, microelectronics devices, screening system, and study of cell-surface interaction.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.18 no.5
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• pp.674-680
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• 2017

Touch Screen Panel (TSP) is a widely used personal handheld device and as a large display apparatus. This study examines micro bump fabrication technology for TSP test process. In the testing process, as TSP is changed, should make a new micro bump for probing and modify the testing program. In this paper we use a maskless lithography system to confirm the potential to fabricatemicro bump to reducecost and manufacturing time. The requiredmaskless lithography system does not use a mask so it can reduce the cost of fabrication and it flexible to cope with changes of micro bump probing. We conducted electro field simulation by pitches of micro bump and designed the lithography pattern image for the maskless lithography process. Then we conducted Photo Resist (PR) patterning process and electro-plating process that are involved in MEMS technology to fabricate micro bump.

• Journal of the Microelectronics and Packaging Society
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• v.30 no.2
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• pp.65-70
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• 2023

Nanoimprint lithography (NIL) has attracted much attention due to its process simplicity, excellent patternability, process scalability, high productivity, and low processing cost for pattern formation. However, the pattern size that can be implemented on metal materials through conventional NIL technologies is generally limited to the micro level. Here, we introduce a novel hard imprint lithography method, extreme-pressure imprint lithography (EPIL), for the direct nano-to-microscale pattern formation on the surfaces of metal substrates with various thicknesses. The EPIL process allows reliable nanoscopic patterning on diverse surfaces, such as polymers, metals, and ceramics, without the use of ultraviolet (UV) light, laser, imprint resist, or electrical pulse. Micro/nano molds fabricated by laser micromachining and conventional photolithography are utilized for the nanopatterning of Al substrates through precise plastic deformation by applying high load or pressure at room temperature. We demonstrate micro/nanoscale pattern formation on the Al substrates with various thicknesses from 20 ㎛ to 100 mm. Moreover, we also show how to obtain controllable pattern structures on the surface of metallic materials via the versatile EPIL technique. We expect that this imprint lithography-based new approach will be applied to other emerging nanofabrication methods for various device applications with complex geometries on the surface of metallic materials.

• Journal of the Korean Ceramic Society
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• v.41 no.10 s.269
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• pp.788-791
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• 2004

We have studied the fabrication of silver micro lines using the silver nano sol on ITO substrate by an ink-jet method. The average particles size of $10wt\%$ silver nano sol synthesized with polyelectrolytes was smaller than 10 nm. The pattern formation of silver nano sol on the substrate closely related with the contact angle of the silver nano sol. The dot shaped of silver nano sol on bare ITO substrate was formed due to the high contact angle of silver nano sol. When ITO substrates was treated with 100 ppm polyethylenimine for silver nano sol patterning, fine silver micro lines of $60{\sim}100{\mu}m$ width was fabricated by ink-jet method.

• Journal of the Korean Society of Manufacturing Technology Engineers
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• v.24 no.2
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• pp.198-202
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• 2015

We present a series of simple but novel nanopatterning methodologies inspired by traditional mechanical machining processes involving rolling, pullout, and forging. First, we introduce roll-to-roll nanopatterning, which adapts conventional rolling for continuous nanopatterning. Then, nano-inscribing and nano-channel lithography are demonstrated, whereby seamless nanogratings can be continuously pulled out, as in a pullout process. Finally, we discuss vibrational indentation micro- and nanopatterning. Similarly to the forging/indentation process, this technique employs high-frequency vertical vibration to indent periodic micro/nanogratings onto a horizontally fed substrate. We discuss the basic principles of each process, along with its advantages, disadvantages, and potential applications. Adopting mature and reliable traditional technologies for small-scale machining may allow continuous nanopatterning techniques to cope with scalable and low-cost nanomanufacturing in a more productive and trustworthy way.

• Proceedings of the KIEE Conference
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• 2015.07a
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• pp.1219-1220
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• 2015

마이크로, 나노유체 (micro-, nanofluidics)을 이용한 종이 기반 분석 소자 (paper-based analytical devices, micro-PADs)에 대한 관심이 증가하고 있다. 종이 기반의 분석 소자는 초저가의 비용과 간단한 공정 방법으로 인하여 상용화 컨셉의 바이오센서로 각광받고 있다. 하지만, 종이 기반의 분석 소자는 낮은 검출 한계 (limit of detection, LOD)와 민감도 (sensitivity)의 제한이 있다. 그로 인해 우리는 이온 선택적 투과층 (ion permselective membrane, i.e. Nafion)을 종이 기반의 분석 소자와 결합하여 이온 농도 분극 (ion concentration polarization, ICP) 현상을 구현하여 낮은 검출한계와 민감도를 개선할 수 있었다. 접착력이 있는 테이프 표면에 이온 선택적 투과층을 패터닝 (patterning)하여 종이 기반 분석 소자와 결합하여 매우 간단하게 소자를 제작할 수 있었다. 따라서 종이 기반의 채널 양단에 직류 전압을 인가했을 때 발생하는 ICP 현상으로 인하여 형광 물질 (fluorescence dye)이 농축(preconcentration)되는 것을 확인할 수 있었다. 구체적으로, 초기 농도가 1.55 nM인 형광 물질을 이용하여 200 V의 외부전압을 인가했을 때, 500 초 이내에 1000 배 이상의 농축비를 얻을 수 있었다. 따라서, 외부 전압을 상용화된 건전지 출력값으로 낮출 수 있다면 다양한 종이 기반 분석 소자와 간단한 결합 방법을 통해 상용화 컨셉의 바이오센서로도 구현이 가능할 것이다.

• Proceedings of the KSME Conference
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• 2008.11a
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• pp.1917-1921
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• 2008

Ultraviolet-nanoimprint lithography (UV-NIL) is promising technology for cost effectively defining micro/nano scale structure at room temperature and low pressure. In addition, this technology is fascinating because of it's possibility for high-throughput patterning without complex processes. However, to acquire good micro/nano patterns using this technology, there are some challenges such as uniformity and fidelity of patterns, etc. In this paper, we have focused on uniform contact mechanism and performed contact mechanics analysis. The dimension of the flexible sheet to get adequate uniform contact area has been obtained from contact mechanics simulation. Based on this analysis, we have made a uniform pressurizing device and confirmed its uniform pressurized zone using a pressure sensing paper.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2006.05a
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• pp.173-174
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• 2006

Understanding chondrocyte behavior inside complex, three-dimensional environments with controlled patterning of geometrical factors would provide significant insights into the basic biology of tissue regenerations. One of the fundamental limitations in studying such behavior has been the inability to fabricate controlled 3D structures. To overcome this problem, we have developed a three-dimensional microfabrication system. This system allows fabrication of predesigned internal architectures and pore size by stacking up the photopolymerized materials. Photopolymer SL5180 was used as the material for 3D scaffolds. The results demonstrate that controllable and reproducible inner-architecture can be fabricated. Chondrocytes harvested from human nasal septum were cultured in two kinds of 3D scaffolds to observe cell adhesion behavior. Such 3D scaffolds might provide effective key factors to study cell behavior in complex environments and could eventually lead to optimum design of scaffolds in various tissue regenerations such as cartilage, bone, etc. in a near future.

• Transactions of the Korean Society of Mechanical Engineers B
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• v.30 no.8 s.251
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• pp.722-730
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• 2006

In this study, the flow characteristics of a FPN (Fountain Pen Nano-Lithography) using active membrane pumping are investigated. The FPN has integrated chamber, micro channel, and high capacity reservoir for continuous ink feed. The most important aspect in this probe provided control of fluid injection using active membrane pumping in chamber. The flow rates in channel by capillary force are theoretically analyzed, including the control of the mass flow rates by the deflection of the membrane. The above results are compared with the numerical simulations that calculated by commercial code, FLUENT. The velocity of the fluid in micro channel shows linear behaviors. And the mass flows are proportional to the second order function of the pumping pressure that is imposed to the membrane.