• 제목/요약/키워드: Micro deposition

검색결과 465건 처리시간 0.028초

기계적 가공과 무전해 선택적 증착기술을 이용한 나노/마이크로 금속패턴 제작에 관한 연구 (A Study on Nano/micro Pattern Fabrication of Metals by Using Mechanical Machining and Selective Deposition Technique)

  • 조상현;윤성원;강충길
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2005년도 춘계학술대회 논문집
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    • pp.1507-1510
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    • 2005
  • This study was carried out as a part of the research on the development of a maskless and electroless process for fabricating metal micro/nanostructures by using a nanoindenter and an electroless deposition technique. $2-\mu{m}-deep$ indentation tests on Ni and Cu samples were performed. The elastic recovery of the Ni and Cu was 9.30% and 9.53% of the maximum penetration depth, respectively. The hardness and the elastic modulus were 1.56 GPa and 120 GPa for Ni and 1.49 GPa and 100 GPa for Cu. The effect of single-point diamond machining conditions such as the Berkovich tip orientation (0, 45, and $90^{\circ}$) and the normal load (0.1, 0.3, 0.5, 1, 3, and 5 mN), on both the deformation behavior and the morphology of cutting traces (such as width and depth) was investigated by constant-load scratch tests. The tip orientation had a significant influence on the coefficient of friction, which varied from 0.52-0.66 for Ni and from 0.46-0.61 for Cu. The crisscross-pattern sample showed that the tip orientation strongly affects the surface quality of the machined area during scratching. A selective deposition of Cu at the pit-like defect on a p-type Si(111) surface was also investigated. Preferential deposition of the Cu occurred at the surface defect sites of silicon wafers, indicating that those defect sites act as active sites for the deposition reaction. The shape of the Cu-deposited area was almost the same as that of the residual stress field.

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기계적 가공과 무전해 선택적 증착기술을 이용한 나노/마이크로 금속패턴 제작에 관한 연구 (A Study on Nano/Micro Pattern Fabrication of Metals by Using Mechanical Machining and Selective Deposition Technique)

  • 조상현;윤성원;강충길
    • 한국정밀공학회지
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    • 제23권8호
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    • pp.171-177
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    • 2006
  • This study was performed as a part of the research on the development of a maskless and electroless process for fabricating metal micro/nanostructures by using a nanoindenter and an electroless deposition technique. $2-{\mu}m$-deep indentation tests on Ni and Cu samples were performed. The elastic recovery of the Ni and Cu was 9.30% and 9.53% of the maximum penetration depth, respectively. The hardness and the elastic modulus were 1.56 GPa and 120 GPa for Ni and 1.51 GPa and 104 GPa for Cu. The effect of single-point diamond machining conditions such as the Berkovich tip orientation (0, 45, and $90^{\circ}$ ) and the normal load (0.1, 0.3, 0.5, 1, 3, and 5 mN), on both the deformation behavior and the morphology of cutting traces (such as width and depth) was investigated by constant-load scratch tests. The tip orientation had a significant influence on the coefficient of friction, which varied from 0.52-0.66 for Ni and from 0.46- 0.61 for Cu. The crisscross-pattern sample showed that the tip orientation strongly affects the surface quality of the machined are a during scratching. A selective deposition of Cu at the pit-like defect on a p-type Si(111) surface was also investigated. Preferential deposition of the Cu occurred at the surface defect sites of silicon wafers, indicating that those defect sites act as active sites for the deposition reaction. The shape of the Cu-deposited area was almost the same as that of the residual stress field.

PECVD를 이용한 금속 스탬프용 점착방지막 형성과 특성 평가 (Fabrication and Characterization of an Antistiction Layer by PECVD (plasma enhanced chemical vapor deposition) for Metal Stamps)

  • 차남구;박창화;조민수;김규채;박진구;정준호;이응숙
    • 한국재료학회지
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    • 제16권4호
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    • pp.225-230
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    • 2006
  • Nanoimprint lithography (NIL) is a novel method of fabricating nanometer scale patterns. It is a simple process with low cost, high throughput and resolution. NIL creates patterns by mechanical deformation of an imprint resist and physical contact process. The imprint resist is typically a monomer or polymer formulation that is cured by heat or UV light during the imprinting process. Stiction between the resist and the stamp is resulted from this physical contact process. Stiction issue is more important in the stamps including narrow pattern size and wide area. Therefore, the antistiction layer coating is very effective to prevent this problem and ensure successful NIL. In this paper, an antistiction layer was deposited and characterized by PECVD (plasma enhanced chemical vapor deposition) method for metal stamps. Deposition rates of an antistiction layer on Si and Ni substrates were in proportion to deposited time and 3.4 nm/min and 2.5 nm/min, respectively. A 50 nm thick antistiction layer showed 90% relative transmittance at 365 nm wavelength. Contact angle result showed good hydrophobicity over 105 degree. $CF_2$ and $CF_3$ peaks were founded in ATR-FTIR analysis. The thicknesses and the contact angle of a 50 nm thick antistiction film were slightly changed during chemical resistance test using acetone and sulfuric acid. To evaluate the deposited antistiction layer, a 50 nm thick film was coated on a stainless steel stamp made by wet etching process. A PMMA substrate was successfully imprinting without pattern degradations by the stainless steel stamp with an antistiction layer. The test result shows that antistiction layer coating is very effective for NIL.

Micro-porous Nickel Produced by Powder Metallurgy

  • Yamada, Y.;Li, Y.C.;Banno, T.;Xie, Z.K.;Wen, C.E.
    • 한국분말야금학회:학술대회논문집
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    • 한국분말야금학회 2006년도 Extended Abstracts of 2006 POWDER METALLURGY World Congress Part 1
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    • pp.602-603
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    • 2006
  • Micro-porous nickel (Ni) with an open cell structure was fabricated by powder metallurgy. The pore size of the micro-porous Ni approximated $30{\mu}m$ and $150{\mu}m$. For comparison, porous Ni with a macro-porous structure were also prepared by both powder metallurgy (pore size $800{\mu}m$) and the traditional chemical vapour deposition method (pore size $1300{\mu}m$). The mechanical properties of the micro-and macro-porous Ni samples were evaluated using compressive tests. Results indicate that the micro-porous Ni samples exhibited significantly enhanced mechanical properties, compared to those of the macro-porous Ni samples.

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ZnO 박막의 RF 마그네트론 스퍼터 증착 중 미리 가열된 기판의 자연냉각 효과 (The Natural Cooling Effects of Pre-heated Substrate during RF Magnetron Sputter Deposition of ZnO)

  • 박성현;이능헌
    • 전기학회논문지
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    • 제56권5호
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    • pp.905-909
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    • 2007
  • Crystalline and micro-structural characteristics of ZnO thin films which were deposited on p-Si(100) with cooling naturally down of pre-heated substrate during RF magnetron sputter deposition, were investigated by XRD and SEM in this paper. The film which was prepared on the substrate which was pre-heated to $400^{\circ}C$ before deposition and then cooled naturally down during deposition, showed the most outstanding c-axis preferred orientation. The ZnO thin film having the best crystalline result were applied to SMR type FBAR device and resonance properties of the device were investigated by network analyzer. It showed that resonance frequency was 2.05 GHz, return loss was -30.64 dB, quality factor was 3169 and electromechanical coupling factor was 0.4 %. This deposition method would be very useful for application of surface acoustic wave filter or film bulk acoustic wave resonator.

RF 스퍼터를 이용하여 ZnO 증착 시 기판의 냉각율이 박막의 c-축 배향성에 미치는 영향 (Effects of Cooling Rate of Pre-heated Substrate on C-Axis Orientation of ZnO Prepared by RF Sputter Deposition)

  • 박성현;이능헌
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제55권12호
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    • pp.560-564
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    • 2006
  • ZnO thin films were prepared by RF magnetron sputter deposition on p-Si(100) wafer with various cooling rates of substrate temperature such as the substrates were pre-heated to $400^{\circ}C$ before the deposition and then cooled down naturally or slowly to $300^{\circ}C,\;200^{\circ}C,\;100^{\circ}C$, and R.T. by the temperature controller during the deposition. Crystalline and micro-structural characteristics of the films were investigated by XRD and SEM. ZnO films which cooled down naturally or slowly by the temperature controller during the deposition, especially the film were deposited with cooling down from $400^{\circ}C\;to\;200^{\circ}C$ slowly. showed the most outstanding c-axis preferred orientation.

Rapid Prototyping and Testing of 3D Micro Rockets Using Mechanical Micro Machining

  • Chu Won-Shik;Beak Chang-Il;Ahn Sung-Hoon;Cho Tae-Hwan
    • Journal of Mechanical Science and Technology
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    • 제20권1호
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    • pp.85-93
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    • 2006
  • The trend of miniaturization has been applied to the research of rockets to develop prototypes of micro rockets. In this paper, the development of a web-integrated prototyping system for three-dimensional micro rockets, and the results of combustion tests are discussed. The body of rocket was made of 6061 aluminum cylinder by lathe process. The three-dimensional micro nozzles were fabricated on the same aluminum by using micro endmills with ${\phi}100{\mu}m{sim}{\phi}500{\mu}m$ diameter. Two types of micro nozzle were fabricated and compared for performance. The total mass of the rockets was 7.32 g and that of propellant (gun powder) was 0.65 g. The thrust-to-weight ratio was between 1.58 and 1.74, and the flight test with 45 degree launch angle from the ground resulted in $46\;m{\sim}53\;m$ of horizontal flight distance. In addition, ABS housing for the micro machined rocket was fabricated using Fused Deposition Modeling (FDM). A web-based design, fabrication, and test system for micro nozzles was proposed to integrate the distributed hardware resources. Test data was sent to the designer via the same web server for the faster feedback to the rocket designer.

빔 위치 관련 제어인자가 집속이온빔 패턴 증착공정에 미치는 영향 (The Influence of Parameters Controlling Beam Position On-Sample During Deposition Patterning Process with Focused Ion Beam)

  • 김준현;송춘삼;김윤제
    • 대한기계학회논문집A
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    • 제32권3호
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    • pp.209-216
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    • 2008
  • The application of focused ion beam (FIB) depends on the optimal interaction of the operation parameters between operating parameters which control beam and samples on the stage during the FIB deposition process. This deposition process was investigated systematically in C precursor gas. Under the fine beam conditions (30kV, 40nm beam size, etc), the effect of considered process parameters - dwell time, beam overlap, incident beam angle to tilted surface, minimum frame time and pattern size were investigated from deposition results by the design of experiment. For the process analysis, influence of the parameters on FIB-CVD process was examined with respect to dimensions and constructed shapes of single and multi- patterns. Throughout the single patterning process, optimal conditions were selected. Multi-patterning deposition were presented to show the effect of on-stage parameters. The analysis have provided the sequent beam scan method and the aspect-ratio had the most significant influence for the multi-patterning deposition in the FIB processing. The bitmapped scan method was more efficient than the one-by-one scan type method for obtaining high aspect-ratio (Width/Height > 1) patterns.

미세 팁 기판 위에 전기영동법으로 성장시킨 탄소 나노튜브의 전계방출 특성 (Field emission properties of carbon nanotubes grown on micro-tip substrates using an electrophoretic deposition method)

  • 장한빛;노영록;김종필;박진석
    • 반도체디스플레이기술학회지
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    • 제9권4호
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    • pp.7-12
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    • 2010
  • Field-emission characteristics of carbon nanotubes(CNTs), which were grown on conical-type tungsten micro-tips by using an electrophoretic deposition(EPD) method, were examined. The EPD method proved to be convenient to manipulate and arrange CNTs from well dispersed suspensions onto such tip-type substrates. The growth rate of CNTs was proportional to the applied d.c. bias voltage and the process time. It was observed from the Raman study that the EPDproduced CNTs showed better crystal qualities with the Raman intensity ratio( $I_D$/$I_G$) of 0.41-0.42 than the CVD-produced CNTs and their crystal qualities could be further improved by thermal annealing. The electron emitters based on the EPDCNTs showed excellent field emission properties, such as the threshold voltage for electron emission of about 620 V and the maximum emission current of about 345 ${\mu}A$. In addition, the EPD-CNTs exhibited the stable long-term(up to 40 h) emission capability and the emission stability was enhanced by thermal annealing.

MEMS 부품을 위한 다결정 박막의 탄성 물성치 추출 시스템과 적용 (Elastic Property Extraction System of Polycrystalline Thin-Films for Micro-Electro-Mechanical System Device and Its Applications)

  • 정향남;최재환;정회택;이준기
    • 한국정밀공학회지
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    • 제22권12호
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    • pp.170-174
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    • 2005
  • A numerical system to extract effective elastic properties of polycrystalline thin-films for MEMS devices is developed. In this system, the statistical model based on lattice system is used for modeling the microstructure evolution simulation and the key kinetics parameters of given micrograph, grain distributions and deposition process can be extracted by inverse method proposed in the system. In this work, effects of kinetics parameters on the extraction of effective elastic properties of polycrystalline thin-films are studied by using statistical method. Effects of the fraction of the potential site($f_p$) among the parameters for deposition process of microstructure on the extraction of effective elastic properties of polycrystalline thin-films are investigated. For this research, polysilicon is applied to this system as the polycrystalline thin-films.