• 제목/요약/키워드: Metal oxide semiconductor

검색결과 720건 처리시간 0.03초

산업 파워 모듈용 900 V MOSFET 개발 (Development of 900 V Class MOSFET for Industrial Power Modules)

  • 정헌석
    • 한국전기전자재료학회논문지
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    • 제33권2호
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    • pp.109-113
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    • 2020
  • A power device is a component used as a switch or rectifier in power electronics to control high voltages. Consequently, power devices are used to improve the efficiency of electric-vehicle (EV) chargers, new energy generators, welders, and switched-mode power supplies (SMPS). Power device designs, which require high voltage, high efficiency, and high reliability, are typically based on MOSFET (metal-oxide-semiconductor field-effect transistor) and IGBT (insulated-gate bipolar transistor) structures. As a unipolar device, a MOSFET has the advantage of relatively fast switching and low tail current at turn-off compared to IGBT-based devices, which are built on bipolar structures. A superjunction structure adds a p-base region to allow a higher yield voltage due to lower RDS (on) and field dispersion than previous p-base components, significantly reducing the total gate charge. To verify the basic characteristics of the superjunction, we worked with a planar type MOSFET and Synopsys' process simulation T-CAD tool. A basic structure of the superjunction MOSFET was produced and its changing electrical characteristics, tested under a number of environmental variables, were analyzed.

CMOS 공정을 이용한 온도 센서 회로의 설계 (A Design of Temperature Sensor Circuit Using CMOS Process)

  • 최진호
    • 한국정보통신학회논문지
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    • 제13권6호
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    • pp.1117-1122
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    • 2009
  • 본 논문에서는 온도 센서 및 온도 측정을 위한 제어회로를 설계하였다. 설계된 회로는 기존의 방법들과는 달리 일반적인 CMOS(Complementary Metal Oxide Semiconductor) 공정에서 추가 공정없이 제작 가능하도록 설계하였으며, 온도는 디지털 값으로 출력 되도록 구성하였다. 설계되어진 회로는 5volts 공급전압을 사용하였으며, 0.5${\mu}m$ CMOS 공정을 사용하였다. 온도 측정을 위한 회로는 PWM(Pulse Width Modulation) 제어회로, VCO(Voltage controlled oscillator), 카운터 그리고 레지스터로 구성되어 있다. PWM 제어회로의 동작 주파수는 23kHz 이며, VCO의 동작 주파수는 416kHz, 1MHz, 2MHz를 사용하였다. 회로의 동작은 SPICE(Simulation Program with Integrated Circuit Emphasis)를 사용하여 확인 하였다.

SONOS 구조를 갖는 멀티 비트 소자의 프로그래밍 특성 (Programming Characteristics of the multi-bit devices based on SONOS structure)

  • 안호명;김주연;서광열
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 하계학술대회 논문집 Vol.4 No.1
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    • pp.80-83
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    • 2003
  • In this paper, the programming characteristics of the multi-bit devices based on SONOS structure are investigated. Our devices have been fabricated by $0.35\;{\mu}m$ complementary metal-oxide-semiconductor (CMOS) process with LOCOS isolation. In order to achieve the two-bits per cell operation, charges must be locally trapped in the nitride layer above the channel near the junction. Channel hot electron (CHE) injection for programming can operate in multi-bit using localized trap in nitride film. CHE injection in our devices is achieved with the single power supply of 5 V. To demonstrate CHE injection, substrate current (Isub) and one-shot programming curve were investigated. The multi-bit operation which stores two-bit per cell is investigated with a reverse read scheme. Also, hot hole injection for fast erasing is used. Due to the ultra-thin gate dielectrics, our results show many advantages which are simpler process, better scalability and lower programming voltage compared to any other two-bit storage flash memory. This fabricated structure and programming characteristics are shown to be the most promising for the multi-bit flash memory.

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GaN FET 기반 동기정류기를 적용한 저전압-대전류 DC-DC Converter 효율예측 (A Study on the Efficiency Prediction of Low-Voltage and High-Current dc-dc Converters Using GaN FET-based Synchronous Rectifier)

  • 정재웅;김현빈;김종수;김남준
    • 전력전자학회논문지
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    • 제22권4호
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    • pp.297-304
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    • 2017
  • The purpose of this paper is to analyze losses because of switching devices and the secondary side circuit diodes of 500 W full bridge dc-dc converter by applying gallium nitride (GaN) field-effect transistor (FET), which is one of the wide band gap devices. For the detailed device analysis, we translate the specific resistance relation caused by the GaN FET material property into algebraic expression, and investigate the influence of the GaN FET structure and characteristic on efficiency and system specifications. In addition, we mathematically compare the diode rectifier circuit loss, which is a full bridge dc-dc converter secondary side circuit, with the synchronous rectifier circuit loss using silicon metal-oxide semiconductor (Si MOSFET) or GaN FET, which produce the full bridge dc-dc converter analytical value validity to derive the final efficiency and loss. We also design the heat sink based on the mathematically derived loss value, and suggest the heat sink size by purpose and the heat divergence degree through simulation.

$V_3$Si 나노 구조체를 이용한 메모리 소자의 전기적 특성연구

  • 김동욱;이동욱;이효준;김은규
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제40회 동계학술대회 초록집
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    • pp.133-133
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    • 2011
  • 최근 나노입자를 이용한 비휘발성 메모리 소자의 제작에 대한 연구가 진행되고 있다. 특히, 실리사이드 계열의 나노입자를 적용한 소자는 일함수가 크지만 실리콘 내의확산 문제를 가지고 있는 금속 나노입자와 달리 현 실리콘 기반의 반도체 공정 적용이 용이한 잇 점을 가지고 있다. 따라서 본 연구에서는 실리사이드 계열의 화합물 중에서 4.63 eV인 Vanadium Silicide ($V_3$Si) 박막을 열처리 과정을 통하여 수 nm 크기의 나노입자로 제작하였다. 소자의 제작은 p-Si기판에 5 nm 두께의 $SiO_2$ 터널층을 dry oxidation 방법으로 성장시킨 후 $V_3$Si 금속박막을 RF magnetron sputtering system을 이용하여 3~5 nm 두께로 tunnel barrier위에 증착시켰다. Rapid thermal annealing법으로 질소 분위기에서 $1000^{\circ}C$의 온도로 30초 동안 열처리하여 $V_3$Si 나노 입자를 형성 하였으며. 20 nm 두께의 $SiO_2$ 컨트롤 산화막층을 ultra-high vacuum magnetron sputtering을 이용하여 증착하였다. 마지막으로 thermal evaporation system을 통하여 Al 전극을 직경 200, 두께 200nm로 증착하였다. 제작된 구조는 metal-oxide-semiconductor구조를 가지는 나노 부유 게이트 커패시터 이며, 제작된 시편은 transmission electron microscopy을 이용하여 $V_3$Si 나노입자의 크기와 균일성을 확인했다. 소자의 전기적인 측정은 E4980A capacitor parameter analyzer와 Agilent 81104A apulse pattern generator system을 이용한 전기용량-전압 측정을 통해 전하저장 효과를 분석하였다.

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Performance of Capacitorless 1T-DRAM Using Strained-Si Channel Effect

  • 정승민;오준석;김민수;정홍배;이영희;조원주
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제40회 동계학술대회 초록집
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    • pp.130-130
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    • 2011
  • 최근 반도체 메모리 산업의 발전과 동시에 발생되는 문제들을 극복하기 위한 새로운 기술들이 요구되고 있다. DRAM (dynamic random access memory) 의 경우, 소자의 크기가 수십 나노미터 영역으로 줄어들면서, 단채널 효과에 의한 누설전류와 소비전력의 증가 등이 문제가 되고 있다. 하나의 캐패시터와 하나의 트랜지스터로 구성된 기존의 DRAM은, 소자의 집적화가 진행 되어 가면서 정보저장 능력이 감소하는 것을 개선하기 위해, 복잡한 구조의 캐패시터 영역을 요구한다. 이에 반해 하나의 트랜지스터로 구성되어 있는 1T-DRAM의 경우, 캐패시터 영역이 없는 구조적인 이점과, SOI (silicon-on-insulator) 구조의 기판을 사용함으로써 뛰어난 전기적 절연 특성과 기생 정전용량의 감소, 그리고 기존 CMOS (complementary metal oxide semiconductor) 공정과의 호환성이 장점이다. 또한 새로운 물질 혹은 구조를 적용하여, 개선된 전기적 특성을 통해 1T-DRAM의 메모리 특성을 향상 시킬 수 있다. 본 연구에서는, SOI와 SGOI (silicon-germanium-on-insulator) 및 sSOI (strained-si-on-insulator) 기판을 사용한 MOSFET을 통해, strain 효과에 의한 전기적 특성 및 메모리 특성을 평가 하였다. 그 결과 strained-Si층과 relaxed-SiGe층간의 tensile strain에 의한 캐리어 이동도의 증가를 통해, 개선된 전기적 특성 및 메모리 특성을 확인하였다. 또한 채널층의 결함이 적은 sSOI 기판을 사용한 1T-DRAM에서 가장 뛰어난 특성을 보였다.

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출력옵셋의 제거기능을 가지는 윤곽 및 움직임 검출용 시각칩 (Vision Chip for Edge and Motion Detection with a Function of Output Offset Cancellation)

  • 박종호;김정환;서성호;신장규;이민호
    • 센서학회지
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    • 제13권3호
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    • pp.188-194
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    • 2004
  • With a remarkable advance in CMOS (complimentary metal-oxide-semiconductor) process technology, a variety of vision sensors with signal processing circuits for complicated functions are actively being developed. Especially, as the principles of signal processing in human retina have been revealed, a series of vision chips imitating human retina have been reported. Human retina is able to detect the edge and motion of an object effectively. The edge detection among the several functions of the retina is accomplished by the cells called photoreceptor, horizontal cell and bipolar cell. We designed a CMOS vision chip by modeling cells of the retina as hardwares involved in edge and motion detection. The designed vision chip was fabricated using $0.6{\mu}m$ CMOS process and the characteristics were measured. Having reliable output characteristics, this chip can be used at the input stage for many applications, like targe tracking system, fingerprint recognition system, human-friendly robot system and etc.

Block-Based Low-Power CMOS Image Sensor with a Simple Pixel Structure

  • Kim, Ju-Yeong;Kim, Jeongyeob;Bae, Myunghan;Jo, Sung-Hyun;Lee, Minho;Choi, Byoung-Soo;Choi, Pyung;Shin, Jang-Kyoo
    • 센서학회지
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    • 제23권2호
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    • pp.87-93
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    • 2014
  • In this paper, we propose a block-based low-power complementary metal oxide semiconductor (CMOS) image sensor (CIS) with a simple pixel structure for power efficiency. This method, which uses an additional computation circuit, makes it possible to reduce the power consumption of the pixel array. In addition, the computation circuit for a block-based CIS is very flexible for various types of pixel structures. The proposed CIS was designed and fabricated using a standard CMOS 0.18 ${\mu}m$ process, and the performance of the fabricated chip was evaluated. From a resultant image, the proposed block-based CIS can calculate a differing contrast in the block and control the operating voltage of the unit blocks. Finally, we confirmed that the power consumption in the proposed CIS with a simple pixel structure can be reduced.

열처리조건에 따른 VO2 후막 급변온도센서의 특성연구 (Characterization of VO2 thick-film critical temperature sensors by heat treatment conditions)

  • 송건화;유광수
    • 센서학회지
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    • 제16권6호
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    • pp.407-412
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    • 2007
  • For $VO_{2}$ sensors applicable to temperature measurement by using the nature of semiconductor to metal transition, the crystallinity, microstructure, and temperature vs. resistance characteristics were investigated systematically as a function of the annealing condition. The starting materials, vanadium pentoxide ($V_{2}O_{5}$) powders, were mixed with vehicle to form paste. This paste was screen-printed on $Al_{2}O_{3}$ substrates and then $VO_{2}$ thick films were heat-treated at $450^{\circ}C$ to $600^{\circ}C$, respectively, for 1 hr in $N_{2}$ gas atmosphere for the reduction. As results of the temperature vs. resistance property measurements, the electrical resistance of the $V_{2}O_{5}$ sensor in phase transition range was decreased by $10^{3.9}$ order. The presented critical temperature sensor could be used in fire-protection and control systems.

Growth Mechanism of Self-Catalytic Ga2O3 Nano-Burr Grown by RF Sputtering

  • 박신영;최광현;강현철
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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    • pp.462-462
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    • 2013
  • Gallium Oxide (Ga2O3) has been widely investigated for the optoelectronic applications due to its wide bandgap and the optical transparency. Recently, with the development of fabrication techniques in nanometer scale semiconductor materials, there have been an increasing number of extensive reports on the synthesis and characterization of Ga2O3 nano-structures such as nano-wires, nanobelts, and nano-dots. In contrast to typical vaporliquid-solid growth mode with metal catalysts to synthesis 1-dimensional nano-wires, there are several difficulties in fabricating the nanostructures by using sputtering techniques. This is attributed to the fact that relatively low growth temperatures and higher growth rate compared with chemical vapor deposition method. In this study, Ga2O3 chestnut burr were synthesized by using radio-frequency magnetron sputtering method. In contrast to typical sputtering method with sintered ceramic target, a Ga2O3 powder (99.99% purity) was used as a sputtering target. Several samples were prepared with varying the growth parameters, especially he growth time and the growth temperature to investigate the growth mechanism. Samples were characterized by using XRD, SEM, and PL measurements. In this presentation, the details of fabrication process and physical properties of Ga2O3 nano chestnut burr will be reported.

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