• Journal of Welding and Joining
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• 제9권3호
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• pp.26-33
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• 1991

As it takes very long time for the Transient Liquid Phase(TLP) bonding, we tried to reduce the bonding time by changing insert material for the high diffusivity element. On this study boron powder was doped as a insert material on the bonding surface of Rene 80 superalloy, and diffusion treated at 1150.deg.C under vacuum. On this method differently from the TLP bonding the insert material was not melted during bonding but only the base metal reacted with the boron was inducedly melted. Therefore, as this bonding mechanism is different from the existing ones, it is suggested as a Melting Induced Diffusion Bonding. When this process was used for the diffusion bonding, the bonding time including homogenization decreased greatly compared to the conventional TLP bonding.

• ETRI Journal
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• 제39권2호
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• pp.284-291
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• 2017

Drain-induced barrier lowering (DIBL) is one of the main parameters employed to indicate the short-channel effect for nano metal-oxide semiconductor field-effect transistors (MOSFETs). We propose a new physical model of the DIBL effect under two-dimensional approximations based on the energy-conservation equation for channel electrons in FETs, which is different from the former field-penetration model. The DIBL is caused by lowering of the effective potential barrier height seen by the channel electrons because a lateral channel electric field results in an increase in the average kinetic energy of the channel electrons. The channel length, temperature, and doping concentration-dependent DIBL effects predicted by the proposed physical model agree well with the experimental data and simulation results reported in Nature and other journals.

• JSTS:Journal of Semiconductor Technology and Science
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• 제13권6호
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• pp.647-654
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• 2013

The design and analysis of analog circuit application on CMOS technology are a challenge in deep sub-micrometer process. This paper is a study on the performance value of Double Gate (DG) Metal Oxide Semiconductor Field Effect Transistor (MOSFET) with Gate Stack and the channel engineering Single Halo (SH), Double Halo (DH). Four different structures have been analysed keeping channel length constant. The short channel parameters and different sub-threshold analog figures of merit (FOMs) are analysed. This work extensively provides the device structures which may be applicable for high speed switching and low power consumption application.

• JSTS:Journal of Semiconductor Technology and Science
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• 제4권1호
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• pp.12-17
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• 2004

The body-tied FinFETs (bulk FinFETs) implemented on bulk Si substrate were characterized through 3-dimensional device simulation. By controlling the doping profile along the vertical fin body, the bulk FinFETs can be scaled down to sub-30 nm. Device characteristics with the body shape were also shown. At a contact resistivity of $1{\times}10^{-7}\;{\Omega}\;cm^2$, the device with side metal contact of fin source/drain showed higher drain current by about two. The C-V results were also shown for the first time.

• 전기전자학회논문지
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• 제22권3호
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• pp.565-569
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• 2018

For the conventional power MOSFET (metal-oxide semiconductor field-effect transistor) device structure, there exists a tradeoff relationship between specific on-state resistance (Ron,sp) and breakdown voltage (BV). In order to overcome this tradeoff, a super-junction (SJ) trench MOSFET (TMOSFET) structure with uniform or non-uniform doping concentration, which decreases linearly in the vertical direction from the N drift region at the bottom to the channel at the top, for an optimal design is suggested in this paper. The on-state resistance of $0.96m{\Omega}-cm2$ at the SJ TMOSFET is much less than that at the conventional power MOSFET under the same breakdown voltage of 100V. A design methodology for the edge termination is proposed to achieve the same breakdown voltage and on-state resistance as the main body of the super-junction TMOSFET by using of the SILVACO TCAD 2D device simulator, Atlas.

• 한국응용과학기술학회지
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• 제29권4호
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• pp.626-630
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• 2012

Diagnosis with an ex-vivo gold sensor was done using a modified fluorine-doping sensor, and cyclic voltammetry (CV) redox potentials of 0.4 V anodic and -0.2 V cathodic were obtained. Both peak currents were optimized using square-wave (SW) stripping voltammetry, and an analytical working range of 10-80 ug/L SW was attained. The precision of the 10-mg/L Au was 0.765 (n=8) RSD under the optimum conditions, and the analytical detection limit approached 0.006 ug/L (S/N=3) with only a 60 sec accumulation time. The developed method was used to examine the mouse droppings for medicinal diagnosis.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.413-414
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• 2012

Programmable Metallization Cell (PMC) memory, which utilizes electrochemical control of nanoscale quantities of metal in thin films of solid electrolyte, shows great promise as a future solid state memory. The technology utilizes the electrochemical formation and removal of metallic pathways in thin films of solid electrolyte. Key attributes are low voltage and current operation, excellent scalability, and a simple fabrication sequence. In this study, we investigated the nature of thin films formed by photo doping of Ag+ ions into chalcogenide materials for use in solid electrolyte of programmable metallization cell devices. We measured the I-V characteristics by field-effect of the device. The results imply that a Ag-rich phase separates owing to the reaction of Ag with free atoms from chalcogenide materials.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2015년도 추계학술대회 논문집
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• pp.336-337
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• 2015

$TiO_2$는 표면적이 넓고 안정성이 높아 자체의 높은 밴드갭(3.0~3.2 eV)에도 불구하고 산업적으로 염소분해 전극으로써 사용되며, 최근 물분해 전극 적용 연구가 진행되고 있다. 전기화학적 물분해 반응을 위해서는 높은 과전압이 요구되므로 산업적으로 이용하기 위해 전도성을 향상시키기 위한 연구가 필요하다. 이러한 문제를 해결하기 위해 촉매제의 도핑이 연구되고 있으며 본 연구에서는 표면에 촉매를 도핑시키기 위한 두가지 방법을 연구하였다. 일반적으로 촉매로 사용되는 금속은 루테늄과 이리듐 등의 귀금속이며 촉매가 균일하게 도핑이 될수록 성능은 향상된다. 본 연구에서는 루테늄을 촉매로 선택하였으며 서로 다른 도핑 방법과 용매 하에서 물분해 실험을 진행하여 두 가지 방법의 물분해 효율을 비교하였다.

• EDISON SW 활용 경진대회 논문집
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• 제6회(2017년)
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• pp.372-375
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• 2017

Metal-oxide-semiconductor Field-Effect transistor (MOSFET)을 대체할 기술로서 제안된 Schottky Barrier MOSFET (SB-MOSFET)가 제시되고 있다. 본 연구에서는 SB-MOSFET와 MOSFET을 다양한 소자 파라미터를 변화시킴으로서 양자역학적 전하수송 계산을 바탕으로 특성을 분석한다. MOSFET과 SB-MOSFET은 채널 두께 ($T_{Si}$)가 감소함에 따라 전류량은 증가하고 SS와 DIBL은 증가하였고 Overlap에서는 SS와 DIBL이 커지고 Underlap에서는 작아짐을 보였고 SB-MOSFET는 특히 그 폭이 컸다. 또한 SB 높이가 낮을수록 SB-MOSFET의 전류량이 증가하고 SS는 감소하였고 마찬가지로 Source와 Drain doping concentration이 낮을수록 MOSFET의 전류량은 증가하고 SS는 감소하였다. MOSFET과 SB-MOSFET의 경향은 대체로 비슷하나 변화량의 차이 등이 있었다.

• 세라미스트
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• 제21권2호
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• pp.38-48
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• 2018

This paper reports a comprehensive review of the state-of-the-art in research on the enhancement of sensing properties for the detection of gases in exhaled breath. Daily health monitoring and early diagnosis of specific diseases via the analysis of exhaled breath is possible. Because biomarkers in exhaled breath are emitted in a very small amount, it is necessary to develop highly sensitive gas sensors. In recent years, a number of researches have been carried out using various strategies for the enhancement of sensing properties such as doping, catalyst, hollow sphere, heterojunction, size effect. We introduced each strategy and summarized recent progress on sensing properties for detection of biomarkers in exhaled breath.