• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 1997년도 춘계학술대회 논문집
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• pp.73-77
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• 1997

This paper describes the analysis of measuring error of on the machine measuring(OMM) system which can directly measure the three dimensional machined free surface dimension using scanning probe on milling machine. 21 inch TV shadow mask mould was measured using PTP(point to point)measurement algorithm at pallet clamped and unclamped state on OMM system, and using coordinate measuring machine(CMM) one after another. The OMM system was evaluated probe error, stylus contact error, center shift error, repeatability and so on. Consequencely, the conclusion derived that elastic displacement of pallet had effect on measuring error mainly, and pallet design and setup method would be important.

• 대한전자공학회:학술대회논문집
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• 대한전자공학회 2001년도 하계종합학술대회 논문집(1)
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• pp.383-386
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• 2001

This paper presents a novel multicast architecture for shared multibuffer ATM switch, which is tailored for throughput enhancement in multicast environments. The address queues for multicast cells are separated from those for unicast cells to arbitrate multicast cells independently from unicast cells. Three read cycles are carried out during each cell slot and multicast cells have chances to be read from shared buffer memory(SBM) in the third read cycle provided that the shared memory is not accessed to read a unicast cell. In this architecture, maximum two cells are queued at each fabric output port per time slot and output mask choose only one cell. Extensive simulations are carried out and it shows that the proposed architecture has enhanced throughput comparing with other multicast schemes in shared multibuffer switch architecture.

• 한국초전도ㆍ저온공학회논문지
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• 제4권1호
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• pp.8-12
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• 2002

Since the high performance analog-to-digital converter can be built with Rapid Single Flux Quantum (RSFQ) logic circuits the development of superconductive analog-to-digital converter has attracted a lot of interests as one of the most prospective area of the application of Josephson Junction technology. One of the main advantages in using Rapid Sng1e Flux Quantum logic in the analog-to-digital converter is the low voltage output from the Josephson junction switching, and hence the high resolution. To design an analog-digital converter, first we have used XIC tool to compose a circuit schematic, and then studied the operational principle of the circuit with WRSPICE tool. Through this process, we obtained the proper circuit diagram of an 1-bit analog-digital converter circuit. The optimized circuit was laid out as a mask drawing. Inductance values of the circuit layout were calculated with L-meter.

• 복식
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• 제59권7호
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• pp.34-49
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• 2009

Carnival is an allowed chance to express ordinarily suppressed and overlooked emotions. Especially with strong meaning of daily overthrow masks, masquerades, and mask-costumes are essential for expressing methods and festival personality reasons. Carnival in modern society without losing a significant portion religion in a format suitable for the era of secularization and the transformation has been created of nothing, that is not a reflection of society is also a cultural phenomenon of its own internal social and external conditions through a variety of means can analogy cultural phenomenon is a stage. The purpose of this research comes from the carnival festivities, religious background, but the daily routine of life to know who joined his escape with the conduction of the role, going to enjoy the satire and humor, using the Dress to the eruption, which means that the form of the festival variety of analysis and with the victory of the expression of cultural phenomena and features on the festival and the dress for you should you wish to study.

• 한국정밀공학회지
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• 제19권1호
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• pp.219-226
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• 2002

The mechanical etching technique has recently been developed to a powder blasting technique for various materials, capable of producing micro structures larger than 100$\mu$ m. This paper describes the performance of powder blasting technique in micro-pocketing of stainless steel and the effect of the number of nozzle scanning and the nozzle height on the depth and width of pockets. Experimental results showed that increasing the no. of nozzle scanning and decreasing the nozzle height resulted in the increase of depth and width in pockets. Increase of width results from wear of mask film.

• Design & Manufacturing
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• 제12권1호
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• pp.47-51
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• 2018

As the IT industry rapidly progresses, the functions of electronic devices and display devices are integrated with high density, and the model is changed in a short period of time. To implement the integration technology, a uniform micro-pattern implementation technique to drive and control the product is required. The most important technology for the micro pattern generation is the exposure processing technology. Failure to implement the basic pattern in this process cannot satisfy the demands in the manufacturing field. In addition, the conventional exposure method of the mask method cannot cope with the small-scale production of various types of products, and it is not possible to implement a micro-pattern, so an alternative technology must be secured. In this study, the technology to implement the required micro-pattern in semiconductor processing is presented through the photolithography process and plasma etching.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제53권1호
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• pp.47-52
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• 2004

3D microstructures with different side-wall angles and different scales are fabricated by both methods of inclined exposure and rear-side exposure at each of selected areas on a same substrate. Conventional methods of inclined exposure are used to make side-walls with a same inclined angle on one substrate and to get a scale error due to front-side exposure through thick photoresist layer, But, by using the proposed method, we are able to fabricate 3D microstructures on a same substrate with various side-wall angles and accurate dimensions as the original design. In the rear-side exposure, UV exposure light reflects from the chromium mask pattern after passing through the thick photoresist layer, resulting in fabrication of well-defined, inclined 3D structures inside the thick photoresist layer.

• 한국소음진동공학회논문집
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• 제12권8호
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• pp.639-647
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• 2002

The nonlinear vibration of the thin perforated plate is analyzed in consideration of the V-shaped tension distribution and the effect of wire impact damping. The reduced order FEM model of the tension plate is obtained from dynamic condensation for the mass and stiffness matrices. Tension wire is modeled using the lumped parameter method to effectively describe its contact interactions with the plate. The nonlinear contact-impact model is composed of spring and damper elements, of which parameters are determined from the Hertzian contact theory and the restitution coefficient, respectively. From the evaluation of the computational accuracy and computation time for the deduced impact stiffness and damping coefficient, we determined proper values for the simulation works, accounting for the computational accuracy as well as the computational efficiency. Finally we discussed the results of nonlinear nitration analysis for variations of their design parameters.

• 전자공학회논문지A
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• 제33A권4호
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• pp.136-141
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• 1996

In this paper, a new CMOS on-chip current reference circit for memory, operational amplifiers, comparators, and data converters is proposed. The reference current is almost independent of temeprature and power-supply variations. In the proposed circuit, the current component with a positive temeprature coefficient cancels that with a negative temperature coefficient each other. While conventional curretn and voltage reference circuits require BiCMOS or bipolar process, the presented circuit can be integrated on a single chip with other digiral and analog circits using a standard CMOS process and an extra mask is not needed. The prototype is fabricated employing th esamsung 1.0um p-well double-poly double-metal CMOS process and the chip area is 300um${\times}$135 um. The proposed reference current circuit shows the temperature coefficient of 380 ppm/.deg. C with the temperature changes form 30$^{\circ}C$ to 80$^{\circ}C$, and the output variation of $\pm$ 1.4% with the supply voltage changes from 4.5 V to 5.5 V.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2000년도 하계학술대회 논문집 C
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• pp.2257-2259
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• 2000

This paper reports on the design, fabrication and driving experiment of micro mirror array(MMA) for lithography process to apply to biochip fabrication Photolithography technology is applied to activate specific area on the surface of modified glass surface, DNA monomers are bound on the activated area of the glass surface. After repeat of DNA monomer synthesizing process, DNA single strand probes could be solid-synthesized on the glass substrate. Without using photomask, photolithography process is tried using micro mirror array(MMA). Photomask or mask alignment is not required in maskless photolithography process using micro mirror array.