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Fabrication of 3-D Structures by Inclined and Rear-side Exposures  

이준섭 (한양대 자연과학대 물리학과)
신현준 (한국과학기술연구원)
문성욱 (한국과학기술연구원)
송석호 (한양대 자연과학대 물리학과)
김태엽 (한국과학기술연구원)
Publication Information
The Transactions of the Korean Institute of Electrical Engineers C / v.53, no.1, 2004 , pp. 47-52 More about this Journal
Abstract
3D microstructures with different side-wall angles and different scales are fabricated by both methods of inclined exposure and rear-side exposure at each of selected areas on a same substrate. Conventional methods of inclined exposure are used to make side-walls with a same inclined angle on one substrate and to get a scale error due to front-side exposure through thick photoresist layer, But, by using the proposed method, we are able to fabricate 3D microstructures on a same substrate with various side-wall angles and accurate dimensions as the original design. In the rear-side exposure, UV exposure light reflects from the chromium mask pattern after passing through the thick photoresist layer, resulting in fabrication of well-defined, inclined 3D structures inside the thick photoresist layer.
Keywords
SU-8; V-groove;
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  • Reference
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