• Title/Summary/Keyword: Mask Design

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The Role of Face Masks Changed by COVID-19 in Republic of Korea

  • Jin-Il KIM;Ki-Han KWON
    • The Journal of Industrial Distribution & Business
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    • v.14 no.5
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    • pp.31-39
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    • 2023
  • Purpose: As SARS-CoV-2, which was the main cause of the global pandemic, has repeatedly mutated in various forms, the threat of the virus has decreased considerably, and the spread has also subsided. Therefore, the purpose of this study was to explore the change in the role of masks and sustainable mask consumption according to the change in perception of wearing masks during the pandemic. Research design, data and methodology: This study used a descriptive review method as a literature review, and utilized the literature search method in PubMed, Riss, Scopus, and Google Scholar databases. Among them, a total of 46 papers were selected in the final stage. Results: As a result, it can be seen that during the pandemic, masks changed their roles according to social trends as their perceptions changed from general perceptions of protecting from external environments or diseases to fashion items with quarantine functions. Conclusions: Masks will be continuously consumed as one of the fashion items with the function of quarantine that protects the respiratory tract from the external environment that is indispensable in our daily lives. Therefore, measures should be taken on sustainable consumption measures according to consumer demand for disposable masks.

Study on Chinese Opera Masks Applied Fashion Design -Based on a Patchwork Technique- (중국 경극 가면을 응용한 패치워크 기법의 의상 디자인 연구)

  • Li, Xue Mei;Lee, Sang-Hee;Han, Sul-Ah
    • Journal of the Korean Society of Clothing and Textiles
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    • v.36 no.2
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    • pp.194-205
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    • 2012
  • Historically, garments have been spontaneously made with human instinct in order to warm and decorate the body using textiles that have been made and used by various peoples in different cultures. Contemporary garments have been used as a means of warming as well as express individual personality and a desire to pursue beauty. They have a unique formativeness and a symbolic nature according to cultural phenomena that reflect a cultural outcome that expresses contemporary thinking and ideology as well as their aesthetic consciousness. This study globally promotes Chinese opera mask culture and proposes the possibility of creative thinking through the introduction of Chinese opera mask elements into contemporary fashion, expressing them as patchworks. In order to endow artistic value (required in contemporary fashion) this study creates works by analyzing and applying a formative sense seen in patchwork techniques and the characteristics of Chinese opera masks; in addition, it sought the possibility of new expressions in garment designs. The results obtained from the research involve the following. First, the introduction of the traditional patchwork technique to contemporary garments may be a dynamic theme of garment expression and exceed stereotypical ideas that enable the creation of designs attuned to the globalization era. Second, it was possible to pursue independent formativeness which is in harmony with a modern sense through the restructuring of the harmony of colors and practical characteristics found in patchworks. Third, it was possible to demonstrate their artistry and unique effect in the expression of contemporary garments by the expression of the analyzed results of characteristic patterns of Chinese opera masks with a patchwork technique in creating works. Results show that it is necessary to conduct research into a patchwork technique that applies diverse materials as a new method to develop contemporary garment design also as a creative design. In addition, if the analyzed results of the characteristic patterns of Chinese opera masks can be expressed with a patchwork technique, they may be able to exhibit a genuine effect along with the artistry of expression in contemporary garments; thereby, relevant follow-up research should be further continued.

PC-DRC : Design Rule Check for Integrated Circuit Using PC (PC-DRC : PC를 이용한 집적회로 layout 설계 규칙 검사)

  • Park, In-Cheol;Eo, Kil-Soo;Kyung, Chong-Min
    • Proceedings of the KIEE Conference
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    • 1987.07b
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    • pp.1547-1550
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    • 1987
  • This paper describes a new design rule checking system, PC-DRC, for CIF mask layout, which was written in C language on IBM PC/AT under DOS 3.0 environment. H/W devices and S/W utilities for PC-DRC is identical to that for PC-LADY[6], which makes PC-DRC an ideal post-processing routine for CIF file generated by PC-LADY. Various spurious errors were eliminated by ORing the input ClF data for each layer and the design rule errors were checked by edge based method on rectilinear polygon form. The detected errors are stored in CIF and displayed on CRT simultaneously.

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Computer Aided Design of Sequential Logic Circuits (Case of Synchronous Sequential Logic Circuits) (컴퓨터를 이용한 순차 논리 회로의 설계 (동기식 순차 논리 회로의 경우))

  • 김경식;조동섭;황희영
    • The Transactions of the Korean Institute of Electrical Engineers
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    • v.33 no.4
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    • pp.134-139
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    • 1984
  • This paper presents the computer program to design the synchronous sequential logic circuit. The computer program uses the MASK method to get the circuit of optimal cost. The computer program takes as an input, the minimal reduced state transition table where each state has its internal code. As an output,the optimal design of synchronous sequential logic circuit is generated for each flipflop type of JK,T,D, and RS respectively. And these circuits for 4 flipflop types are evaluated and sorted in ascending order of their costs, so that the user can select the proper flipflop type and its circuit. Furthermore,the proposed computer program may be applied to state assignment with its facility of cost evaluation.

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Optimal Process Design of Super Junction MOSFET (Super Juction MOSFET의 공정 설계 최적화에 관한 연구)

  • Kang, Ey Goo
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.27 no.8
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    • pp.501-504
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    • 2014
  • This paper was developed and described core-process to implement low on resistance which was the most important characteristics of SJ (super junction) MOSFET. Firstly, using process-simulation, SJ MOSFET optimal structure was set and developed its process flow chart by repeated simulation. Following process flow, gate level process was performed. And source and drain level process was similar to genral planar MOSFET, so the process was the same as the general planar MOSFET. And then to develop deep trench process which was main process of the whole process, after finishing photo mask process, we developed deep trench process. We expected that developed process was necessary to develop SJ MOSFET for automobile semiconductor.

Use of Traditional Mask Images in Design Development for Fashion-Cultural Products (전통 탈의 이미지를 활용한 패션문화상품 디자인 개발)

  • Kim, Sun-Young
    • The Research Journal of the Costume Culture
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    • v.19 no.3
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    • pp.460-472
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    • 2011
  • This paper developed motifs through the use of images of masks with which the Korean innate consciousness of aesthetics is expressed. The motifs were applied to fashion items. This paper investigated the concept, origin and types of traditional masks through the existing literature. Using the computer graphic programs of Illustrator and Photoshop CS2, three basic motifs were set from the images of the nobleman, Bune of Hahoi Tal and Byeongsan Tal. Each motif was extended into two motifs by changing shape and color. For the basic motif design, this study sought to express contemporary images, suitably for each fashion item, while maintaining the basic shape of the masks and their traditional images. In addition, this study set the concept of the design so that could be accepted by various age groups. For the design of handkerchiefs, a rotating array, involving enlargement, reduction, repetition, and the gradation of motifs, as well as a diagonal symmetric array, and all-over patterns were developed. The T-shirt design created here was divided into a half-sleeve box type, a round neckline sleeveless type, a V-neckline close-fitting sleeveless type, and a V-neckline close-fitting cap sleeve type. For the design of necklaces, OLED or LED, which are considered as a future display type, was used. Additionally, the production of an entertainment styled new atmosphere is proposed.

FPGA Implementation for Real Time Sobel Edge Detector Block Using 3-Line Buffers (3-Line 버퍼를 사용한 실시간 Sobel 윤곽선 추출 블록 FPGA 구현)

  • Park, Chan-Su;Kim, Hi-Seok
    • Journal of IKEEE
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    • v.19 no.1
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    • pp.10-17
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    • 2015
  • In this Paper, an efficient method of FPGA based design and implementation of Sobel Edge detector block using 3-Line buffers is presented. The FPGA provides the proper and sufficient hardware for image processing algorithms with flexibility to support Sobel edge detection algorithm. A pipe-lined method is used to implement the edge detector. The proposed Sobel edge detection operator is an model using of Finite State Machine(FSM) which executes a matrix mask operation to determine the level of edge intensity through different of pixels on an image. This approach is useful to improve the system performance by taking advantage of efficient look up tables, flip-flop resources on target device. The proposed Sobel detector using 3-line buffers is synthesized with Xilinx ISE 14.2 and implemented on Virtex II xc2vp-30-7-FF896 FPGA device. Using matlab, we show better PSNR performance of proposed design in terms of 3-Line buffers utilization.

Design Consideration for Structure of 2500-4500V RC-GCT

  • Kim E. D.;Kim S. C.;Zhang C. L.;Kim N. K.;Bai J. B.;Li J. H.;Lu J. Q.
    • Proceedings of the KIPE Conference
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    • 2001.10a
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    • pp.36-38
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    • 2001
  • A basic structure of 2500V-4500V reverse-conducting GCT (RC-GCT) is given in this paper. The punch-through type (PT) is adopted for narrow N-base with high resistivity so that the fast turn-off and low on-state voltage can be achieved. The photo mask design was made upon the both turn-off performance and solution of separation between GCT and integrated freewheeling diode (FWD) part. The turn-on and turn-off characteristics for reserve-conducting gate commutated thyristors (RC-GCTs) were investigated by ISE simulation. Additionally, the local carrier lifetime control by proton irradiation was adopted so as not only to obtain the reduction of turn-off losses of GCT but also to reach a soft reverse recovering characteristics of FWD

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Korean Character Recognition by the Extraction of Feature Points and Neural Chip Design for its Preprocessing (특징점 추출에 의한 한글 문자 인식 및 전처리용 신경 칩의 설계)

  • 김종렬;정호선;이우일
    • Journal of the Korean Institute of Telematics and Electronics
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    • v.27 no.6
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    • pp.929-936
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    • 1990
  • This paper describes the method of the Korean character recognition by means of feature points extraction. Also, the preprocessing neural chip for noise elimination, smoothing, thinning and feature point extraction has been designs. The subpatterns were separated by means of advanced index algorithm using mask, and recognized by means of feature points classification. The separation of the Korean character subpatterns was abtained about 97%, and the recognition of the Korean characters was abtained about 95%. The preprocessing neural chip was simulated on SPICE and layouted by double CMOS 2\ulcorner design rule.

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Design and Implementation of a RFID Transponder Chip using CMOS Process (CMOS 공정을 이용한 무선인식 송수신 집적회로의 설계 및 제작)

  • 신봉조;박근형
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.16 no.10
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    • pp.881-886
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    • 2003
  • This paper describes the design and implementation of a passive transponder chip for RFID applications. Passive transponders do not have their own power supply, and therefore all power required for the operation of a passive transponder must be drawn from the field of the reader. The designed transponder consists of a full wave rectifier to generate a dc supply voltage, a 128-bit mask ROM to store the information, and Manchester coding and load modulation circuits to be used for transmitting the information from the transponder to the reader. The transponder with a size 410 x 900 ${\mu}$m$^2$ has been fabricated using 0.65 ${\mu}$m 2-poly, 2-metal CMOS process. The measurement results show the data transmission rate of 3.9 kbps at RF frequency 125 kHz.