• 대한전기학회논문지:시스템및제어부문D
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• 제51권12호
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• pp.596-603
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• 2002

New layout methods for implementing MOS switches of ultra low channel resistance are presented. These area-effective layout methods include the waffle structure, zipper structure, star zag structure and fingered waffle structure. The design equations for these new layout structures are analyzed. The area-effectiveness of these structures is compared with that of the conventional alternating bar structure. MOS switches of the waffle structure were fabricated using a standard 0.25um CMOS process. The experimental characterization results of the fabricated MOS switches are presented. The analytical comparison and experimental results show that area reductions over 40% are achievable with the new structures.

• 정보처리학회논문지A
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• 제15A권2호
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• pp.69-74
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• 2008

본 논문은 MOS 전류모드 논리회로 (MOS current-mode logic circuit)의 누설전류를 감소시키기 위해 슬립 트랜지스터 (sleep-transistor) 트랜지스터를 이용하여 저 전력 MOS 전류모드 논리회로를 구현하는 새로운 구조를 제안하였다. 슬립 트랜지스터는 누설전류를 최소화하기 위해 고 문턱전압 PMOS 트랜지스터 (high-threshold voltage PMOS transistor)를 사용하였다. $16\;{\times}\;16$ 비트 병렬 곱셈기를 제안한 구조에 적용하여 제안한 구조의 타당성을 입증하였다. 이 회로는 기존 MOS 전류모드 논리회로 구조에 비해 대기전력소모가 1/50으로 감소하였다. 이 회로는 삼성 $0.35\;{\mu}m$ 표준 CMOS 공정을 이용하여 설계하였으며, HSPICE를 이용하여 검증하였다.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1991년도 추계학술대회 논문집 학회본부
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• pp.231-233
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• 1991

This paper discribes a study on the switching character of MOS-GTO and the design of gate drive circuit. Chopping power supply converter, synchronious and asyncronious motor speed adjustment, inverter, etc., needs low drive energy "high frequency" switches. To fulfill these need, switches must have rapid switching time and insulated gate control. MOS-GTO structure is well suited to these constraints. The power switch is serial installation of a GTO thyrister and a MOS Transistor. The gate of the GTO is linked to positive pole of the cascode structure via a MOS high voltage transistor and ground via a transient absorber diode. This high performance MOS-GTO assembly considerably increases the strength which facilitate the drive of GTO thyristers.

• 대한전자공학회논문지
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• 제25권4호
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• pp.417-421
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• 1988

In order to analyze the blooming suppression mechanism of a MOS image sensor, test photodiodes have been fabricated and characterized by attaching a source follower circuit. The blooming suppression ability of npn structure compared to that of np structure is quantitatively analyzed and measured by experiment. The dependency of the blooming current on the substrate voltage, the vertical MOS gate voltage and the video voltage is measured and the optimum condition for blooming suppression is presented.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2005년도 추계학술대회 논문집 Vol.18
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• pp.130-131
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• 2005

In the era of submicron devices, super ultra thin gate oxide characteristics are required. Titanium silicide process has studied gate oxide reliability and dielectric strength characteristics as the composition of gate electrode. In this study the author observed process characteristics on MOS structure. In view point of the process characteristics of MOS capacitor, the oxygen & Ti, Si2 was analyzed by SIMS analysis on before and after annealing with 1,2 step silicidation, the Ti contents[Count/sec]of $9.5{\times}1018$ & $6.5{\times}1018$ on before and after 2'nd anneal. The oxygen contents[Count/sec] of $4.3{\times}104$ & $3.65{\times}104$, the Si contents[Count/sec] of $4.2{\times}104$ & $3.7{\times}104$ on before and after 2'nd anneal. The rms value[A] was 4.98, & 4.03 on before and after 2'nd anneal.

• 전자공학회논문지A
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• 제29A권7호
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• pp.56-63
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• 1992

A measurement technique of the surface generation velocity S$_o$ using the BC(buried channel) MOS structure with shallow and low doped channel layer (BC MOS S$_o$ measurement technique) is presented and verified analytically and experimentally. Using this measurement technique, S$_o$ can be measured more accurately than that measured using the gate-controlled diode SS1oT measurement technique. When S$_o$ is measured for the two techniques from a BC MOS structure test patten with gate length of 171$\mu$m, the results are 0,66cm/sec and 0.28cm/sec for the former and the latter respectively.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2005년도 하계학술대회 논문집 Vol.6
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• pp.195-196
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• 2005

In recent years, as the needs of MOS's a high quality is desired to get the superior electrical characteristics and reliability on MOSFET. As an alternative gate dielectric have drawn considerable alternation due to their superior performance and reliability properties over MOSFET, 2'nd silicidation formation process has been proposed as a dielectric growth/annealing process. In this study the author observed process characteristics on MOS structure. In view points of the process characteristics of MOS capacitor, the oxygen & polysilicon was analyzed by SIMS analysis on l'st & 2'nd Ti process, the oxygen and Si2 contents[Count/sec] of 1.5e3 & 3.75e4 on l'st process and l.1e3 & 2.94e4 on 2'nd process, the Ti contents' of 8.2e18 & 6.5e18 on 1'st and 2'nd process. The sheet resistance[$\Omega/sq.$] was 4.5 & 4.0, the film stress[dyne/cm 2] of 1.09e10 & 1.075e10 on l'st and 2'nd process. I could achieved the superior MOS characteristics by 2'nd silicidation process.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제49권5호
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• pp.270-277
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• 2000

A new Lateral Trench-MOS Bipolar-Mode Field-Effect Transistor(LTMBMFET) is proposed and verified by MEDICI simulation. By using a trench MOS structure, the proposed device can enhance the current gain without sacrificing other device characteristics such as the breakdown voltage. The channel region of the proposed device is formed between the trench MOS structure. So the effect of the substrate voltage is negligible when compared with the conventional device which has a channel region between the gate junction and the buried oxide layer.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1994년도 하계학술대회 논문집 A
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• pp.237-239
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• 1994

The MOS-controlled thyristor(MCT) is a new power semi-conductor device that combines four layers thyristor structure presenting regenerative action and MOS-gate providing controlled turn-on and turn-off. The MCT has very fast switching speed owing to voltage controlled MOS-gate, and very low on-state voltage drop resulting from regenerative action of four layers thyristor structure. In addition, because of a higher dv/dt rating and di/dt rating, gate drive circuit and snubber circuit can be simpler comparing to other power switching devices. So recently much interest and endeavor is being applied to develop the performance and ratings of the MCT. This paper describes the switching characteristic of the MCT for its practical applications and presents a model for PSPICE circuit simulation. The model for PSPICE circuit simulation is compared to the experimental result using MCTV75P60F1 made by Harris co..

• 전자공학회논문지A
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• 제33A권6호
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• pp.206-219
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• 1996

This paper describes a data structure and evaluation algorithm to improve the perofmrances MOS logic-with-timing simulation in computation and accuracy. In order to efficiently simulate the logic and timing of driver-load networks, (1) a tree data structure to represent the mutual interconnection topology of switches and nodes in the driver-lod network, and (2) an algebraic modeling to efficiently deal with the new represetnation, (3) an evaluation algorithm to compute the linear resistive and capacitive behavior with the new modeling of driver-load networks are developed. The higher modeling presented here supports the structural and functional compatibility with the linear switch-level to simulate the logic-with-timing of digital MOS circuits at a mixed-level. This research attempts to integrate the new approach into the existing simulator RSIM, which yield a mixed-klevel logic-with-timing simulator MIXIM. The experimental results show that (1) MIXIM is a far superior to RSIM in computation speed and timing accuracy; and notably (2) th etiming simulation for driver-load netowrks produces the accuracy ranged within 17% with respect ot the analog simulator SPICE.