• The Transactions of the Korean Institute of Electrical Engineers D
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• v.51 no.12
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• pp.596-603
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• 2002

New layout methods for implementing MOS switches of ultra low channel resistance are presented. These area-effective layout methods include the waffle structure, zipper structure, star zag structure and fingered waffle structure. The design equations for these new layout structures are analyzed. The area-effectiveness of these structures is compared with that of the conventional alternating bar structure. MOS switches of the waffle structure were fabricated using a standard 0.25um CMOS process. The experimental characterization results of the fabricated MOS switches are presented. The analytical comparison and experimental results show that area reductions over 40% are achievable with the new structures.

• The KIPS Transactions:PartA
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• v.15A no.2
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• pp.69-74
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• 2008

This paper proposes a structure of low-power MOS current-mode logic circuit with sleep-transistor to reduce the leakage current. The sleep-transistor is used to high-threshold voltage transistor to minimize the leakage current. The $16\;{\times}\;16$ bit parallel multiplier is designed by the proposed circuit structure. Comparing with the conventional MOS current-model logic circuit, the circuit achieves the reduction of the power consumption in sleep mode by 1/50. This circuit is designed with Samsung $0.35\;{\mu}m$ CMOS process. The validity and effectiveness are verified through the HSPICE simulation.

• Proceedings of the KIEE Conference
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• 1991.11a
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• pp.231-233
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• 1991

This paper discribes a study on the switching character of MOS-GTO and the design of gate drive circuit. Chopping power supply converter, synchronious and asyncronious motor speed adjustment, inverter, etc., needs low drive energy "high frequency" switches. To fulfill these need, switches must have rapid switching time and insulated gate control. MOS-GTO structure is well suited to these constraints. The power switch is serial installation of a GTO thyrister and a MOS Transistor. The gate of the GTO is linked to positive pole of the cascode structure via a MOS high voltage transistor and ground via a transient absorber diode. This high performance MOS-GTO assembly considerably increases the strength which facilitate the drive of GTO thyristers.

• Journal of the Korean Institute of Telematics and Electronics
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• v.25 no.4
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• pp.417-421
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• 1988

In order to analyze the blooming suppression mechanism of a MOS image sensor, test photodiodes have been fabricated and characterized by attaching a source follower circuit. The blooming suppression ability of npn structure compared to that of np structure is quantitatively analyzed and measured by experiment. The dependency of the blooming current on the substrate voltage, the vertical MOS gate voltage and the video voltage is measured and the optimum condition for blooming suppression is presented.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2005.11a
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• pp.130-131
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• 2005

In the era of submicron devices, super ultra thin gate oxide characteristics are required. Titanium silicide process has studied gate oxide reliability and dielectric strength characteristics as the composition of gate electrode. In this study the author observed process characteristics on MOS structure. In view point of the process characteristics of MOS capacitor, the oxygen & Ti, Si2 was analyzed by SIMS analysis on before and after annealing with 1,2 step silicidation, the Ti contents[Count/sec]of $9.5{\times}1018$ & $6.5{\times}1018$ on before and after 2'nd anneal. The oxygen contents[Count/sec] of $4.3{\times}104$ & $3.65{\times}104$, the Si contents[Count/sec] of $4.2{\times}104$ & $3.7{\times}104$ on before and after 2'nd anneal. The rms value[A] was 4.98, & 4.03 on before and after 2'nd anneal.

• Journal of the Korean Institute of Telematics and Electronics A
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• v.29A no.7
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• pp.56-63
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• 1992

A measurement technique of the surface generation velocity S$_o$ using the BC(buried channel) MOS structure with shallow and low doped channel layer (BC MOS S$_o$ measurement technique) is presented and verified analytically and experimentally. Using this measurement technique, S$_o$ can be measured more accurately than that measured using the gate-controlled diode SS1oT measurement technique. When S$_o$ is measured for the two techniques from a BC MOS structure test patten with gate length of 171$\mu$m, the results are 0,66cm/sec and 0.28cm/sec for the former and the latter respectively.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2005.07a
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• pp.195-196
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• 2005

In recent years, as the needs of MOS's a high quality is desired to get the superior electrical characteristics and reliability on MOSFET. As an alternative gate dielectric have drawn considerable alternation due to their superior performance and reliability properties over MOSFET, 2'nd silicidation formation process has been proposed as a dielectric growth/annealing process. In this study the author observed process characteristics on MOS structure. In view points of the process characteristics of MOS capacitor, the oxygen & polysilicon was analyzed by SIMS analysis on l'st & 2'nd Ti process, the oxygen and Si2 contents[Count/sec] of 1.5e3 & 3.75e4 on l'st process and l.1e3 & 2.94e4 on 2'nd process, the Ti contents' of 8.2e18 & 6.5e18 on 1'st and 2'nd process. The sheet resistance[$\Omega/sq.$] was 4.5 & 4.0, the film stress[dyne/cm 2] of 1.09e10 & 1.075e10 on l'st and 2'nd process. I could achieved the superior MOS characteristics by 2'nd silicidation process.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.49 no.5
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• pp.270-277
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• 2000

A new Lateral Trench-MOS Bipolar-Mode Field-Effect Transistor(LTMBMFET) is proposed and verified by MEDICI simulation. By using a trench MOS structure, the proposed device can enhance the current gain without sacrificing other device characteristics such as the breakdown voltage. The channel region of the proposed device is formed between the trench MOS structure. So the effect of the substrate voltage is negligible when compared with the conventional device which has a channel region between the gate junction and the buried oxide layer.

• Proceedings of the KIEE Conference
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• 1994.07a
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• pp.237-239
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• 1994

The MOS-controlled thyristor(MCT) is a new power semi-conductor device that combines four layers thyristor structure presenting regenerative action and MOS-gate providing controlled turn-on and turn-off. The MCT has very fast switching speed owing to voltage controlled MOS-gate, and very low on-state voltage drop resulting from regenerative action of four layers thyristor structure. In addition, because of a higher dv/dt rating and di/dt rating, gate drive circuit and snubber circuit can be simpler comparing to other power switching devices. So recently much interest and endeavor is being applied to develop the performance and ratings of the MCT. This paper describes the switching characteristic of the MCT for its practical applications and presents a model for PSPICE circuit simulation. The model for PSPICE circuit simulation is compared to the experimental result using MCTV75P60F1 made by Harris co..

• Journal of the Korean Institute of Telematics and Electronics A
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• v.33A no.6
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• pp.206-219
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• 1996

This paper describes a data structure and evaluation algorithm to improve the perofmrances MOS logic-with-timing simulation in computation and accuracy. In order to efficiently simulate the logic and timing of driver-load networks, (1) a tree data structure to represent the mutual interconnection topology of switches and nodes in the driver-lod network, and (2) an algebraic modeling to efficiently deal with the new represetnation, (3) an evaluation algorithm to compute the linear resistive and capacitive behavior with the new modeling of driver-load networks are developed. The higher modeling presented here supports the structural and functional compatibility with the linear switch-level to simulate the logic-with-timing of digital MOS circuits at a mixed-level. This research attempts to integrate the new approach into the existing simulator RSIM, which yield a mixed-klevel logic-with-timing simulator MIXIM. The experimental results show that (1) MIXIM is a far superior to RSIM in computation speed and timing accuracy; and notably (2) th etiming simulation for driver-load netowrks produces the accuracy ranged within 17% with respect ot the analog simulator SPICE.