• Journal of the Korean Vacuum Society
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• v.12 no.1
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• pp.40-45
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• 2003

High quality $Ta_2O_5$ thin films have been obtained from the anodization of deposited tantalum (Ta). The as-deposited amorphous films of 750 $\AA$ thickness have excellent electrical properties. These properties include refractive indices 2.1~2.2 dielectric constants ~25, and leakage currents $10^{-8}$ /A$\textrm{cm}^{-2}$ at 1 MV$\textrm{cm}^{-1}$. We fabricated a MIM element with the $Ta_2O_5$ films. They have perfect current-voltage symmetry characteristics. A high performance MIM device was formed by newly developed processes based on our unique anodization and annealing treatment. The effects of various processing conditions (top-electrode metals, annealing conditions) on the MIM device performances will be extensively discussed throughout this work.

• Journal of the Institute of Electronics Engineers of Korea TC
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• v.45 no.8
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• pp.114-120
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• 2008

In this paper, we extract the parasitic elements of the metal-insulate-metal(MIM) capacitor using short-open calibration (SOC). The scattering matrixes of short, open, and MIM structures in strip lines are measured by full electro-magnetic (EM) simulator and vector network analyser. The full EM simulations are performed by finite element method (FEM) that was fitted three dimensional structure analysis. The electro-magnetic effects of MIM capacitor laminated in the multi-layered structures are proposed the II equivalent circuit with lumped elements, and the relations between the measured scattering parameters of the MIM structures and lumped elements in the circuits are shown by performing 2 port network analysis. The extracted lumped elements using the proposed SOC method are independent to frequencies.

• Membrane Journal
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• v.31 no.3
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• pp.219-227
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• 2021

Molecularly imprinted membrane (MIM) is a porous polymer membrane incorporating with the molecular recognizing sites. In this study, the supporting P(AN-co-MA) asymmetric membrane was prepared by nonsolvent induced phase separation (NIPS) method. And then, MIM with lysozyme template sites was prepared using the surface imprinting method on the P(AN-co-MA) asymmetric membrane introducing a photoactive iniferter and then photo-grafting. The P(AN-co-MA) asymmetric membrane was modified with 3-chloropropyltrimethoxysilane and dithiocarbamate as a photoactive iniferter. To prepare a lysozyme imprinted membrane, the modified P(AN-co-MA) membrane was copolymerized with acrylamide as a functional momomer, N,N'-methylene bisacrylamide as a crosslinker and lysozyme as a template in the UV irradiation environment. The lysozyme imprinted MIM was analyzed by using SEM, FT-IR and EDS measurements. Its results confirm that all the P(AN-co-MA) membranes have an asymmetric structure and the iniferter group is successfully introduced on the membrane surface. The process parameters were adjusted to obtain MIM having the excellent lysozyme adsorption. The maximum lysozyme adsorption capacity reaches at 2.7 mg/g, which is 13 times higher than that of the non imprinted membrane (NIM). The permselective membrane filtration experiments of ovalbumin to lysozyme show that the P(AN-co-MA) MIM preferentially bounds a greater amount of lysozyme.

• The Proceedings of the Korean Institute of Illuminating and Electrical Installation Engineers
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• v.7 no.3
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• pp.34-40
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• 1993

전기전자산업에 유기분자집합체에 대한 전자 device적 기능을 갖게 하는 초전막형성 기술의 하나로서 LB막이 이용되게 된다. 10여년전에 만들어 대기중에 방치되었던 Langmuir Blodgett(LB) 초전막 시료에 대해서 MIM구조소자에 전하가 발생하는 특성을 검토하였다.그 결과 LB막이 무극성일 때는 상하부전극을 동일 금속으로 하면 전압이 발생하지 않고, 서로 다른 금속전극으로 할 때는 전압이 발생하였는데 양전극금속의 일함수값의 차가 클수록 발생전압이 높았고 LB막이 유극성일때는 동일 전극이라도 전압이 발생하였다.따라서 LB초전막의 MIM 소자에서 발생하는 전하는 단순한 화학작용에 의한 것이 아니고양전극 금속의 일함수와 극성에 관계가 있다고 생각된다.

• Electrical & Electronic Materials
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• v.8 no.2
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• pp.176-183
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• 1995

The present work is concerned with the switching conduction characteristics of PI LB films in metal insulator metal sandwiches. By applying various DC voltage bias to MIM junctions, conduction characteristics of junctions can be changed between the high-voltage low-current(off) condition, the low-voltage high-current (on) condition and the medium(mid) condition. Switching conduction characteristics can be also observed in MIM junctions employing some aromatic compounds as insulators. Switching conduction characteristics is assumed to be owing to the existence of aromatic rings, space charge in films, impurities on metal-insulator interface, and difference in work functions of base and top electrodes metal. To study the conduction process of on, off, and mid conductions, we measured I-V, d$^{2}$V/d I$^{2}$-V characteristics of junctions with several different top electrodes under various temperatures. Small conductance changes of junctions can be measured by observing the second derivative, d$^{2}$V/dI$^{2}$, of I-V curve. A dynamical technique is used to get the second derivatives. That is, a finite modulation of the current is applied to the junctions and the second harmonic of the voltage is detected.

• Proceedings of the Materials Research Society of Korea Conference
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• 1994.11a
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• pp.12-12
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• 1994

• The Journal of The Korea Institute of Intelligent Transport Systems
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• v.7 no.5
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• pp.97-105
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• 2008

The micro capacitors are passive elements necessary to electronic circuits and wireless portable PAN(personal area network) and Mobile Communications device modules in the baseband circuits in combination with another passive and active devices. As capacitance is proportionally increased with dielectric constant and electrode areas, in addition, inversely decreased the thickness of the dielectric material, thus thin film capacitors are generally seen as a preferable means to achieve high performance and thin film capacitors are used in a variety of functional circuit devices. In this paper, propose dielectric material as AIN(Aluminium nitride) to make micro thin film capacitor, and this capacitor has the MIM(metal-insulator-metal) structure. AIN thin films are widespread applied because they had more excellent properties such as chemical stability, high thermal conductivity, electrical isolation and so on. In addition, AIN films show low frequency response for baseband signal ranges, I-V and C-V electrical characterization of a thin film micro capacitor. The above experimental test and estimated results demonstrate that the thin film capacitor has sufficient and efficient functional performance to be the baseband range frequency of general electronics circuit and passive device applications.

• Journal of the Korean Vacuum Society
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• v.20 no.5
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• pp.327-332
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• 2011

Plasma polymerized styrene (ppS) thin films were prepared on ITO coated glass substrates for a MIM (metal-insulator-metal) structure with thermally evaporated Au thin film as metal contact. Also the ppS thin films were applied as organic insulator to a MIS (metal-insulatorsemiconductor) device with thermally evaporated pentacene thin film as organic semiconductor layer. After the I-V and C-V measurements with MIM and MIS structures, the ppS revealed relatively higher dielectric constant of k=3.7 than those of the conventional poly styrene and very low leakage current density of $1{\times}10^{-8}Acm^{-2}$ at electric field strength of $1MVcm^{-1}$. The MIS structure with the ppS dielectric layer showed negligible hysteresis in C-V characteristics. It would be therefore expected that the proposed ppS could be applied as a promising dielectric/insulator to organic thin film transistors, organic memory devices, and flexible organic electronic devices.

• 전자공학회논문지 IE
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• v.43 no.4
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• pp.99-104
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• 2006

The Langmuir-Blodgett(LB) technique has attracted considerable interest in the fabrication of electrical and electronic devices. Maxwell displacement current (MDC) measurement has been employed to study the dielectric property of Langmuir-films. MDC flowing across monolayers is analyzed using a rod-like molecular model. A linear relationship between the monolayer compression speed u and the molecular area Am. Compression speed a was about 30, 40, 50mm/min. Langmuir-Blodgett(LB)layers of Arachidic acid deposited by LB method were deposited onto slide glass as Y-type film. The structure of manufactured device is Au/Arachidic acid/Al, the number of accumulated layers are 9$\sim$21. Also, we then examined of the Metal-Insulator-Metal(MIM) device by means of I-V. The I-V characteristics of the device are measured from -3 to +3[V]. The insulation property of a thin film is better as the distance between electrodes is larger.

• Proceedings of the Materials Research Society of Korea Conference
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• 1995.11a
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• pp.19-20
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• 1995