• 대한기계학회논문집B
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• 제30권12호
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• pp.1196-1202
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• 2006

A MEMS methanol reformer was fabricated and its performance was evaluated in the present study. Catalytic steam reforming of methanol was selected because the process had been widely applied in macro scale reformers. Conventional Cu/ZnO catalyst that was prepared by co-precipitation method to give the highest coating quality was used. The reactor structure was made by bonding three layers of glass wafers. The internal structure of the wafer was fabricated by the wet-etching process that resulted in a high aspect ratio. The internal surface of the reactor was coated by catalyst and individual wafers were fusion-bonded to form the reactor structure. The internal volume of the microfabricated reactor was $0.3cm^3$ and the reactor produced exhaust gas with hydrogen concentration at 73%. The production rate of hydrogen was 4.16 ml/hr that could generate power of 350 mW in a typical PEM fuel cell.

• 항공우주시스템공학회지
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• 제9권2호
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• pp.13-18
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• 2015

Micro planar type liquid propellant thruster was fabricated by MEMS manufacturing process for micro/nano satellites applications. 90 wt.% hydrogen peroxide was used as propellant and for propellant decomposition, Pt/Al2O3 was used as catalyst. Micro thruster structure was made by 5 photosensitive glasses patterned with thruster component profiles. Objective thrust was 50 mN and required hydrogen peroxide mass flow was 2.1 ml/min, which was supplied by syringe pump and teflon tube in experimental test. Performance test said that average steady thrust was approximately 30 mN, around 60% of objective thrust, and transient time was about 5 sec. It is estimated that extended response time was due to high thermal energy loss of micro scale thruster and low enthalpy input by propellant mass flow.

• 한국마이크로전자및패키징학회:학술대회논문집
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• 한국마이크로전자및패키징학회 2000년도 Proceedings of 5th International Joint Symposium on Microeletronics and Packaging
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• pp.29-33
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• 2000

MEMS, Micro Electro-Mechanical Systems, present one of the greatest advanced packaging challenges of the next decade. Historically hybrid technology, generally thick film, provided sensors and actuators while integrated circuit technologies provided the microelectronics for interpretation and control of the sensor input and actuator output. Brought together in MEMS these technical fields create new opportunities for miniaturization and performance. Integrated circuit processing technologies combined with hybrid design systems yield innovative sensors and actuators for a variety of applications from single crystal silicon wafers. MEMS packages, far more simple in principle than today's electronic packages, provide only physical protection to the devices they house. However, they cannot interfere with the function of the devices and often must actually facilitate the performance of the device. For example, a pressure transducer may need to be open to atmospheric pressure on one side of the detector yet protected from contamination and blockage. Similarly, an optical device requires protection from contamination without optical attenuation or distortion being introduced. Despite impediments such as package standardization and complexity, MEMS markets expect to double by 2003 to more than ＄9 billion, largely driven by micro-fluidic applications in the medical arena. Like the semiconductor industry before it. MEMS present many diverse demands on the advanced packaging engineering community. With focused effort, particularly on standards and packaging process efficiency. MEMS may offer the greatest opportunity for technical advancement as well as profitability in advanced packaging in the first decade of the 21st century! This paper explores MEMS packaging opportunities and reviews specific technical challenges to be met.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2006년도 춘계학술대회 논문집
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• pp.481-482
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• 2006

Chemical-mechanical polishing, the dominant technology for LSI planarization, is trending to play an important function in micro-electro mechanical systems (MEMS). However, MEMS CMP process has a couple of different characteristics in comparison to LSI device CMP since the feature size of MEMS is bigger than that of LSI devices. Preliminary CMP tests are performed to understand material removal rate (MRR) with blanket wafer under a couple of polishing pressure and velocity. Based on the blanket CMP data, this paper focuses on the consumable approach to enhance MEMS CMP by the adjustment of slurry and pad. As a mechanical tool, newly developed microstructured (MS) pad is applied to compare with conventional pad (IC 1400-k Nitta-Haas), which is fabricated by micro melding method of polyurethane. To understand the CMP characteristics in real time, in-situ friction force monitoring system was used. Finally, the topography change of poly-si MEMS structures is compared according to the pattern density, size and shape as polishing time goes on.

• 센서학회지
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• 제20권1호
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• pp.58-63
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• 2011

A low loss radio frequency(RF) micro electro mechanical systems(MEMS) switch driven by a low actuation voltage was designed for the development of a new RF MEMS switch. The RF MEMS switch should be encapsulated. The glass cap and fabricated RF MEMS switch were assembled by the Au/Sn eutectic bonding principle for wafer-level packaging. The through-vias on the glass substrate was made by the glass dry etching and Au electroplating process. The packaged RF MEMS switch had an actuation voltage of 12.5 V, an insertion loss below 0.25 dB, a return loss above 16.6 dB, and an isolation value above 41.4 dB at 6 GHz.

• JSTS:Journal of Semiconductor Technology and Science
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• 제7권3호
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• pp.166-176
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• 2007

Radio frequency (RF) microelectromechanical systems (MEMS) have been pursued for more than a decade as a solution of high-performance on-chip fixed, tunable and reconfigurable circuits. This paper reviews our research work on RF MEMS switches and switching circuits in the past five years. The research work first concentrates on the development of lateral DC-contact switches and capacitive shunt switches. Low insertion loss, high isolation and wide frequency band have been achieved for the two types of switches; then the switches have been integrated with transmission lines to achieve different switching circuits, such as single-pole-multi-throw (SPMT) switching circuits, tunable band-pass filter, tunable band-stop filter and reconfigurable filter circuits. Substrate transfer process and surface planarization process are used to fabricate the above mentioned devices and circuits. The advantages of these two fabrication processes provide great flexibility in developing different types of RF MEMS switches and circuits. The ultimate target is to produce more powerful and sophisticated wireless appliances operating in handsets, base stations, and satellites with low power consumption and cost.

• 대한기계학회논문집A
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• 제27권10호
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• pp.1754-1761
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• 2003

The atomic force microscopy (AFM) based lithographic technique has been used directly to machine material surface and fabricate nano components in MEMS (micro electro mechanical system). In this paper, three-dimensional molecular dynamics (MD) simulations have been conducted to evaluate the characteristic of deformation process at atomistic scale for nano-lithography process. Effects of specific combinations of crystal orientations and cutting directions on the nature of atomistic deformation were investigated. The interatomic force between diamond tool and workpiece of copper material was assumed to be derived from the Morse potential function. The variation of tool geometry and cutting depth was also evaluated and the effect on machinability was investigated. The result of the simulation shows that crystal plane and cutting direction significantly influenced the variation of the cutting forces and the nature of deformation ahead of the tool as well as the surface deformation of the machined surface.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2011년도 제42회 하계학술대회
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• pp.1702-1703
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• 2011

MEMS 소자의 Wafer level Package 관련하여 Deep cavity를 가진 Cap Wafer와 Polymer bonding 중 cavity 단차로 인한 Polymer Patterning 및 접합 불량의 어려움을 극복할 수 있는 새로운 공정 flow를 제안하였다. Cavity를 형성할 때 사용하는 Si deep etching Mask인 기존의 Photoresist를 접합용 감광성 Polymer로 대체하고, cavity 형성 후, 별도의 추가 공정 없이 이 Polymer를 이용해 Wafer bonding을 진행하였다. 이를 통해 cavity 단차에 따른 문제를 해결함과 동시에 공정이 단순하고 제작 비용이 저렴하며, 신뢰성 있는 Wafer level Package를 구현하였다.

• 마이크로전자및패키징학회지
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• 제12권3호
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• pp.187-196
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• 2005

MEMS에서 제조 공정 오차 및 외부 응력은 진동형 자이로스코프와 같은 MEMS 소자의 제조 수율에 많은 영향을 미친다. 특히 비연성 진동형 자이로스코프의 경우 감지모드와 구동모드의 주파수 차의 특성은 수율에 직접적인 영향을 미친다. SOI (Silicon-On-Insulator) 공정 및 양극접합 공정으로 패키징된 자이로스코프의 경우, 노칭현상으로 인하여 구조물이 불균일하게 가공되며, 동시에 열팽창계수 차로 인하여 접합된 기판에 큰 휨이 발생한다. 그 결과주파수 차의 분포가 커지고, 동시에 수율은 저하되었다. 이를 개선하기 위하여 SiOG (Silicon On Glass) 기술을 적용하였다. SiOG 공정에서는 접합 후에 기판의 휨을 최소화 하기 위하여 1장의 실리콘 기관과 2장의 유리 기판을 사용하였으며, 노칭을 방지하기 위하여 금속 박막을 사용하였다. 그 결과 노칭 현상이 방지되었으며, 기판의 휨도 감소하였다. 또한 주파수 차의 분포도 매우 균일하게 되었으며, 주파수 차의 편차 또한 개선이 되었다. 그 결과 높은 수율 및 보다 강건한 MEMS 자이로스코프를 개발할 수 있었다.

• 한국항공우주학회지
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• 제48권7호
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• pp.523-528
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• 2020

스프링-메스 시스템의 원리를 이용하여 수평 구동형 MEMS 관성 스위치를 설계하였다. 본 MEMS 스위치는 외부에서 발생하는 가속도를 감지하여 점화안전장치를 장전시키는 역할을 한다. 성능 모델링을 통하여 다양한 가속도 조건에서의 구동 양상을 분석하였다. 시뮬레이션 결과 가속도의 기울기가 10g/msec 이하인 경우에 MEMS 스위치는 10g에서 잘 작동하는 것으로 나타났다. 반면에, 설계 변수들의 공차를 10%로 고려한 시뮬레이션 결과 스프링 폭과 길이에 의해 임계 동작 가속도가 규격(10±2g)을 벗어났다. 제작 공정상 10% 이하의 공차 관리가 어려운 스프링 폭을 두 배로 늘렸을 때 규격을 만족하는 것을 확인하고 설계보완을 제안하였다.